• Proceedings of the Korean Vacuum Society Conference
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• 2011.08a
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• pp.145-145
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• 2011

Recently, multi-hole electrode RF capacitively coupled plasma discharge is being used in the deposition of microcrystalline silicon for thin film solar cell to increase the speed of deposition. To make efficient multi-hole electrode RF capacitively coupled plasma discharge, the hole diameter is to be designed concerning the plasma parameters. In past studies, the relationship between plasma parameters such as pressures and gas species, and hole diameter for efficient plasma density enhancement is experimentally shown. In the presentation, the relationship between plasma deriving frequency and hole diameter for efficient multi-hole electrode RF capacitively coupled plasma discharge is shown. In usual capacitively coupled plasma discharge, plasma parameter, such as plasma density, plasma impedence and plasma temperature, change as frequency increases. Because of the change, the optimum hole diameter of the multi-hole electrode RF capacitively coupled plasma for high density plasma is thought to be modified when the plasma deriving frequency changes. To see the frequency effect on the multi-hole RF capacitively coupled plasma is discharged and one of its electrode is changed from a plane electrode to a variety of multi-hole electrodes with different hole diameters. The discharge is derived by RF power source with various frequency and the plasma parameter is measured with RF compensated single Langmuir probe. The shrinkage of the hole diameter for efficient discharge is observed as the plasma deriving frequency increases.

• Journal of Biomedical Engineering Research
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• v.17 no.4
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• pp.499-506
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• 1996

Blood flow velocimeter is an essential device to measure the blood flow in skin tissue. In this study, we developed a high-speed LDV(laser Doppler Velocimeter) that has real time processing capability using a DSP(digital signal processing) chip and is able to continuously measure information about blood-flow based on a noninvasive method using self-mixing type laser diode. This LDV system has a simpler structure than any other typical blood flow velocimeter and is composed of new self-mixing probe, stabilizer circuits DSP board, and interf'ace boule We measured velocity of speaker-unit by operational frequencies to identify Doppler effect of this system, performed clinical experiment on bare finger tip and compared it with a commercial euipment BPM403A(USA).

• Proceedings of the Korean Vacuum Society Conference
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• 1999.07a
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• pp.163-163
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• 1999

MOSFET, MESFET 그리고 MODFET는 Logic ULSIs, high speed ICs, RF MMICs 등에서 중요한 역할을 하고 있으며, 그것의 gate electrode, contact, interconnect 등의 물질로는 refractory metal을 이용한 CoSi2, MoSi2, TaSi2, PtSi2, TiSi2 등의 효과를 얻어내고 있다. 그중 TiSi2는 비저항이 가장 낮고, 열적 안정도가 좋으며 SAG process가 가능하므로 simpler alignment process, higher transconductance, lower source resistance 등의 장점을 동시에 만족시키고 있다. 최근 소자차원이 scale down 됨에 따라 TiSi2의 silicidation 과정에서 C49 TiSi2 phase(high resistivity, thermally unstable phase, larger grain size, base centered orthorhombic structure)의 출현과 그것을 제거하기 위한 노력이 큰 issue로 떠오르고 있다. 여러 연구 결과에 따르면 PAI(Pre-amorphization zimplantation), HTS(High Temperature Sputtering) process, Mo(Molybedenum) implasntation 등이 C49를 bypass시키고 C54 TiSi2 phase(lowest resistivity, thermally stable phase, smaller grain size, face centered orthorhombic structure)로의 transformation temperature를 줄일 수 있는 가장 효과적인 방법으로 제안되고 있지만, 아직 그 문제가 완전히 해결되지 않은 상태이며 C54 nucleation에 대한 physical mechanism을 밝히진 못하고 있다. 본 연구에서는 증착 시 기판온도의 변화(400~75$0^{\circ}C$)에 따라 silicon 위에 DC/RF magnetron sputtering 방식으로 Ti/Si film을 각각 제작하였다. 제작된 시료는 N2 분위기에서 30~120초 동안 500~85$0^{\circ}C$의 온도변화에 따라 RTA법으로 각각 one step annealing 하였다. 또한 Al을 cosputtering함으로써 Al impurity의 존재에 따른 영향을 동시에 고려해 보았다. 제작된 시료의 분석을 위해 phase transformation을 XRD로, microstructure를 TEM으로, surface topography는 SEM으로, surface microroughness는 AFM으로 측정하였으며 sheet resistance는 4-point probe로 측정하였다. 분석된 결과를 보면, 고온에서 제작된 박막에서의 C54 phase transformation temperature가 감소하는 것이 관측되었으며, Al impuritydmlwhswork 낮은온도에서의 C54 TiSi2 형성을 돕는다는 것을 알 수 있었다. 본 연구에서는 결론적으로, 고온에서 증착된 박막으로부터 열적으로 안정된 phase의 낮은 resistivity를 갖는 C54 TiSi2 형성을 보다 낮은 온도에서 one-step RTA를 통해 얻을 수 있다는 결과와 Al impurity가 존재함으로써 얻어지는 thermal budget의 효과, 그리고 그로부터 기대할 수 있는 여러 장점들을 보고하고자 한다.

• 대한공업교육학회지
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• v.34 no.2
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• pp.346-362
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• 2009

The purpose of this study was to develop the handy non-contact measurement device of the surface roughness by using the optical fiber sensor. The advantages of fiber optic sensors are high-speed responsibility, non-effect of the magnetic, convenience of the product and high precision. The measurement theory for surface roughness of optical fiber sensor is one to one correspondence between the reflected light intensity based on the surface roughness of the object and the measurement value of previously known for surface roughness. The reflected light intensity was determined using the distance to the surface from the sensor probe and the limit reflection angle based on the surface roughness. Therefore, in this study, the sensor probe was produced for determining the value of surface roughness only using the limit reflection angle based on the surface roughness with the fixed distance from the surface. A prototype measurement system was composed of a transmitting part, a receiving part and a signal processing circuit. The materials of standard measurement which was used in this experiment were SM45C, STS303 and Al60. According to the results of this study, approximation surface roughness formulas which was deduced from the correlation of between the standard surface roughness and the sensing output were verified that they were effect against the surface roughness measurement value of the option sample. And handy optical fiber surface roughness measurement device which was produced by an order was verified that it was effect for measuring of the precision surface roughness.

• Journal of Welding and Joining
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• v.31 no.2
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• pp.16-20
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• 2013

Titanium and its alloys have been widely using in the various field of industry application due to high corrosion resistant properties and mechanical properties. Titanium is highly reactive in the high temperature state and the formation of titanium oxide and porosities in the nuggets of fusion welding will results in the degradation of the mechanical properties. For this reason the studies of friction stir welding for titanium have been investigated recently. The FSW zones of titanium were classified by the weld nugget (WN), the linear transition boundary (TB) and the heat affected zone (HAZ). The WN along with titanium parent was characterized by the presence of twins and dislocations. The average grain size and hardness of WN has been changed according to heat input. The grain refinement resulted from the FSW increased the hardness in the stir zone. Sound dissimilar joints between SUS 304 and CP-Ti were achieved using an advancing speed of 50 mm/min and rotation speeds in the range of 700-1100 rpm. Aluminum 1060 and titanium alloy Ti-6Al-4V plates were lap joined by friction stir welding, hence the ultimate tensile shear strength of joint reached 100% of Al 1060. Mg alloy and Ti were successfully butt joined by inserting a probe into the Mg alloy plate with slightly offsetting. But Ti-Al intermetallic compound layers formed at the interface of these joints.

• Korean Journal of Materials Research
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• v.21 no.5
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• pp.255-262
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• 2011

This paper has relatively high technical standard and experimental skill. The fabrication of TCO film with high transparency, low resistance and low chromaticity require exact control of several competing factors. This paper has resolved these problems reasonably well, thus recommended for publication. Indium tin oxide(ITO) thin films were by D.C. magnetron roll-to-roll sputter system utilizing ITO and $SiO_2$ targets of ITO and $SiO_2$. In this experiment, the effect of D.C. power, winding speed, and oxygen flow rate on electrical and optical properties of ITO thin films were investigated from the view point of sheet resistance, transmittance, and chromaticity($b^*$). The deposition of $SiO_2$ was performed with RF power of 400W, Ar gas of 50 sccm and the deposition of ITO, DC power of 600W, Ar gas of 50 sccm, $O^2$ gas of 0.2 sccm, and winding speed of 0.56m/min. High quality ITO thin films without $SiO_2$ layer had chromaticity of 2.87, sheet resistivity of 400 ohm/square, and transmittance of 88% and $SiO_2$-doped ITO Thin film with chromaticity of 2.01, sheet resistivity of 709 ohm/square, and transmittance of more than 90% were obtained. As a result, $SiO_2$ was coated on PET before deposition of ITO, their chromaticity($b^*$) and transmittance were better than previous results of ITO films. These results show that coating of $SiO_2$ induced arising chromaticity($b^*$) and transmittance. If the thickness of $SiO_2$ is controlled, sheet resistance value of ITO film will be expected to be better for touch screen. A four point probe and spectrophotometer are used to investigate the properties of ITO thin films.

• Proceedings of the Korean Vacuum Society Conference
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• 2000.02a
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• pp.186-186
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• 2000

After LeComber et al. reported the first amorphous hydrogenated silicon (a-Si: H) TFT, many laboratories started the development of an active matrix LCDs using a-Si:H TFTs formed on glass substrate. With increasing the display area and pixel density of TFT-LCD, however, high mobility TFTs are required for pixel driver of TF-LCD in order to shorten the charging time of the pixel electrodes. The most important of these drawbacks is a-Si's electron mobiliy, which is the speed at which electrons can move through each transistor. The problem of low carier mobility for the a-Si:H TFTs can be overcome by introducing polycrystalline silicon (poly-Si) thin film instead of a-Si:H as a semiconductor layer of TFTs. Therefore, poly-Si has gained increasing interest and has been investigated by many researchers. Recnetly, fabrication of such poly-Si TFT-LCD panels with VGA pixel size and monolithic drivers has been reported, . Especially, fabricating poly-Si TFTs at a temperature mach lower than the strain point of glass is needed in order to have high mobility TFTs on large-size glass substrate, and the monolithic drivers will reduce the cost of TFT-LCDs. The conventional methods to fabricate poly-Si films are low pressure chemical vapor deposition (LPCVD0 as well as solid phase crystallization (SPC), pulsed rapid thermal annealing(PRTA), and eximer laser annealing (ELA). However, these methods have some disadvantages such as high deposition temperature over $600^{\circ}C$, small grain size (<50nm), poor crystallinity, and high grain boundary states. Therefore the low temperature and large area processes using a cheap glass substrate are impossible because of high temperature process. In this study, therefore, we have deposited poly-Si thin films on si(100) and glass substrates at growth temperature of below 40$0^{\circ}C$ using newly developed high rate magnetron sputtering method. To improve the sputtering yield and the growth rate, a high power (10~30 W/cm2) sputtering source with unbalanced magnetron and Si ion extraction grid was designed and constructed based on the results of computer simulation. The maximum deposition rate could be reached to be 0.35$\mu$m/min due to a high ion bombardment. This is 5 times higher than that of conventional sputtering method, and the sputtering yield was also increased up to 80%. The best film was obtained on Si(100) using Si ion extraction grid under 9.0$\times$10-3Torr of working pressure and 11 W/cm2 of the target power density. The electron mobility of the poly-si film grown on Si(100) at 40$0^{\circ}C$ with ion extraction grid shows 96 cm2/V sec. During sputtering, moreover, the characteristics of si source were also analyzed with in situ Langmuir probe method and optical emission spectroscopy.

• The Journal of The Korea Institute of Intelligent Transport Systems
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• v.7 no.6
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• pp.21-30
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• 2008

The travel speed collected by the prove-car equipped with the GPS has the problems, which are the data's stability and finding out the representative travel speed, by the influence of the traffic signal and etc. at the interrupted traffic. This study was conducted to develop the method of filtering the outlier data from the data collected by the prove-car. The method to remove the outlier data from the serial data which were collected by the prove-car was adapted to each of the quartile deviation statistics model and the management graphic statistics model. The rate of removing the outlier data by the quartile deviation method was $0{\sim}3.7%$ while the rate by the management graphic statistic methods was $0.3{\sim}7.2%$. Both methods show the low removal rate at the dawn time when the traffic is inactivity, on the other hand the remove rate is high during the daytime. However, both methods have the problem such that the threshold level for removing the outlier data was established at the low bound in the case as good as the statistics model. Therefore, it is required for the experience calibration.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.35 no.1
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• pp.44-49
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• 2022

In this paper, we investigated current (I)- and voltage (V)-sweeping properties in a double-stack structure, Ge₂Sb₂Te₅/Ti/W-doped Ge₈Sb₂Te₁₁, a candidate medium for applications to multilevel phase-change memory. 200-nm-thick and W-doped Ge₂Sb₂Te₅ and W-doped Ge₈Sb₂Te₁₁ films were deposited on p-type Si(100) substrate using magnetron sputtering system, and the sheet resistance was measured using 4 point-probe method. The sheet resistance of amorphous-phase W-doped Ge₈Sb₂Te₁₁ film was about 1 order larger than that of Ge₂Sb₂Te₅ film. The I- and V-sweeping properties were measured using sourcemeter, pulse generator, and digital multimeter. The speed of amorphous-to-multilevel crystallization was evaluated from a graph of resistance vs. pulse duration (t) at a fixed applied voltage (12 V). All the double-stack cells exhibited a two-step phase change process with the multilevel memory states of high-middle-low resistance (HR-MR-LR). In particular, the stable MR state is required to guarantee the reliability of the multilevel phase-change memory. For the Ge₂Sb₂Te₅ (150 nm)/Ti (20 nm)/W-Ge₈Sb₂Te₁₁ (50 nm), the phase transformations of HR→MR and MR→LR were observed at t<30ns and t<65ns, respectively. We believe that a high speed and stable multilevel phase-change memory can be optimized by the double-stack structure of proper Ge-Sb-Te films separated by a barrier metal (Ti).

• Korean Chemical Engineering Research
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• v.47 no.5
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• pp.572-579
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• 2009

This study is to investigate experimentally the flame structure and propagation mechanism in dust explosions and to provide the fundamental knowledge. Upward propagating laminar dust flames in a vertical duct of 1.8 m height and 0.15 m square cross-section are observed and flame front is visualized using by a high-speed video camera. Also, the thicknesses of preheated and reaction zone have been determined by a schlieren, electrostatic probe and thermocouple. The thickness of preheated zone in lycopodium dust flame is observed to be 4~13 mm, about several orders of magnitude higher than that of premixed gaseous flames. From the experimental results by a PIV(Particle Image Velocimetry) system, a certain residence time of the unburned particle in preheated zone is needed to generate combustible gas from the particle. The residence time will depend on preheated zone thickness, particle velocity and flame propagation velocity.