• 제목/요약/키워드: high-aspect ratio

검색결과 951건 처리시간 0.054초

유동층 반응기 프리보드 내 높이에 따른 CNT 응집체 형상 변화 (Effect of Height on CNT Aggregates Size and Shape in Freeboard Region of a Fluidized Bed)

  • 김성원
    • Korean Chemical Engineering Research
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    • 제57권1호
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    • pp.105-110
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    • 2019
  • CNT 유동층 반응기(내경 0.15 m, 높이 2.6 m) 프리보드 내 미세 CNT 입자(평균입도 $46{\mu}m$, 벌크밀도 $93.2kg/m^3$)의 높이 별 거동을 확인하기 위해 레이저 슬릿광 형상 측정법을 이용하여, CNT 응집체의 크기 및 형태를 측정하였다. 기체 유속 증가에 대해, 비산되는 CNT 응집체의 Feret 직경과 Heywood 직경이 증가하였다. 프리보드 내 높이가 증가할수록 평균 직경은 작아졌고, 응집체 내 CNT 입자수가 감소하였다. 기체 유속 증가에 대해, 응집체의 종횡비는 농후상에 가까울수록 증가하였으나, 높은 높이에서는 감소하였다. 그러나, 견고도는 큰 변화를 보이지 않았다. 응집체의 형상 분석 정보에 기반하여, 높이 별 CNT 입자의 응집과정이 서로 다름을 확인하였다. 유동층 프리보드 내 CNT 응집체의 Heywood 직경을 예측할 수 있는 상관관계식을 제안하였다.

탄소나노튜브 고분자 복합체 기반 스마트 구조건전성 진단 (Smart Structural Health Monitoring Using Carbon Nanotube Polymer Composites)

  • 박영빈;;;김상우
    • Composites Research
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    • 제22권6호
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    • pp.1-6
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    • 2009
  • 탄소나노튜브 고분자 복합체는, 외력에 의한 변형에 따라 전기적 저항이 변화하는 피에조저항(piezoresistivity) 거동을 나타낸다. 피에조저항은 고분자 모재 내에서 탄소나노튜브가 형성하는 전기전도망(conductive network)의 변화에 의해서 발현된다. 피에조저항 낮은 탄소나노튜브 함유량에서 더 현저하게 나타난다. 탄소섬유, 카본블랙 등 타 탄소기반 소재에 비해 전기전도도와 길이 대 직경비(aspect ratio)가 월등히 우수하기 때문에, 낮은 탄소나노튜브의 함유량에서도 스트레인 센싱시스템을 구현할 수 있다. 본 연구에서는, 구조물에 부착 또는 임베드 시켜서 구조물의 건전성을 실시간을 진단할 수 있는 탄소나노튜브 고분자 복합체 기반 센싱시스템을 개발하였다. 센서는 열가소성 수지와 다중벽 탄소나노튜브를 사용하여 필름 형태로 제조되었으며, 센싱 성능은 나노복합체를 구조물에 부착한 후 인장, 굽힘, 압축 등의 다양한 형태의 하중을 가하면서 평가하였다.

나노허니컴 구조물의 인장 및 굽힘 물성 측정 (Measurement of Tensile and Bending Properties of Nanohoneycomb Structures)

  • 전지훈;최덕현;이평수;이건홍;박현철;황운봉
    • Composites Research
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    • 제19권6호
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    • pp.23-31
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    • 2006
  • 나노허니컴 구조물의 영률, 굽힘 탄성 계수. 공칭파괴강도를 구하였다. 양극산화 알루미늄은 잘 정렬된 나노허니컴 구조물의 일종으로서 공정이 간단하고, 높은 종횡비, 자가 정렬된 기공구조를 가지고 있고, 기공의 크기를 조절할 수 있다. 원자현미경으로 외팔보 굽힘 시험을 수행하였고 나노-UTM을 이용한 3점 굽힘 실험결과와 비교하였다. 또한 나노-UTM으로 인장시험을 수행하였다. 나노허니컴 구조물의 한쪽 면은 막혀 있어서, 일반적인 샌드위치 구조물의 면재에 비유될 수 있다. 하지만 이러한 막힌 면은 굽힘 강도 증가에 영향을 끼치지 못하고 균열선단으로 작용한다는 것을 알 수 있었다. 본 연구로 나노허니컴 구조물을 설계하는데 기초적인 물성을 제공하고자 한다.

국내 해안의 해빈-해안사구 지형 및 퇴적물 특성과 입도기반 사구유형 분석 (Morphological and Textural Characteristics of the Beach-dune System in South Korea, with the Possibility of a Dune Type Scheme Based on Grain-size Trend)

  • 류호상;강지현
    • 한국지형학회지
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    • 제27권3호
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    • pp.53-73
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    • 2020
  • Morphology and grain size distribution of coastal dunes should be well documented because they are critical to dune's buffering capacity and resilience against storm surges. The nationwide coastal dune survey produced the dataset, including beach-dune topographic profiles and grain size parameters for frontal beaches, foredunes, and inland dunes. This research investigated the dataset to describe geomorphic and textural properties of coastal dunes: foredune slopes, dune heights above approximately highest high water, mean size, and sorting, together with associated variables of coastal setting that influence coastal dunes. It also explores the possibility of a dune type scheme based on gran size trends. The results are as follows. First, the coast in which dunes are developed is the primary control on foredune morphology and sediment texture. Coastal dunes on the east coast were developed more alongshore rather than inland, with gentler slopes on the higher ground and out of coarser sand. The shore aspect contributes to this pattern because the east coast cannot benefit from prevailing northwesterly. Second, grain size trends from beaches through foredunes to inland dunes were little identified. Third, 12 dune types were identified from 69 dunes, showing the indicative capability for the status of beaches and dunes. We confirmed that the dataset could increase our understanding of the overall characteristics of coastal dune morphology and texture, though there is something to be improved, for example, establishing the refined and comprehensive field survey protocol.

Study on the mixing performance of mixing vane grids and mixing coefficient by CFD and subchannel analysis code in a 5×5 rod bundle

  • Bin Han ;Xiaoliang Zhu;Bao-Wen Yang;Aiguo Liu;Yanyan Xi ;Lei Liu ;Shenghui Liu;Junlin Huang
    • Nuclear Engineering and Technology
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    • 제55권10호
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    • pp.3775-3786
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    • 2023
  • Mixing Vane Grid (MVG) is one of the most important structures in fuel assembly due to its high performance in mixing the coolant and ultimately increasing Critical Heat Flux (CHF), which avoids the temperature rising suddenly of fuel rods. To evaluate the mixing performance of the MVG, a Total Diffusion Coefficient (TDC) mixing coefficient is defined in the subchannel analysis code. Conventionally, the TDC of the spacer grid is obtained from the combination of experiments and subchannel analysis. However, the processing of obtaining and determine a reasonable TDC is much challenging, it is affected by boundary conditions and MVG geometries. In is difficult to perform all the large and costing rod bundle tests. In this paper, the CFD method was applied in TDC analysis. A typical 5 × 5 MVG was simulated and validated to estimate the mixing performance of the MVG. The subchannel code was used to calculate the TDC. Firstly, the CFD method was validated from the aspect of pressure drop and lateral temperature distribution in the subchannels. Then the effect of boundary conditions including the inlet temperature, inlet velocities, heat flux ratio between hot and cold rods and the arrangement of hot and cold rods on MVG mixing and TDC were studied. The geometric effects on mixing are also carried out in this paper. The effect of vane pattern on mixing was investigated to determine which one is the best to represent the grid's mixing performance.

Impact of salt stress on the α-tocopherol, carotenoid derivatives and flocculation efficiency of Euglena sp., Indonesian Strain

  • Ria Amelia;Arief Budiman;Andhika Puspito Nugroho;Eko Agus Suyono
    • Fisheries and Aquatic Sciences
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    • 제27권6호
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    • pp.379-391
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    • 2024
  • Tocopherol, carotenoids, and chlorophyll are the primary components of the antioxidative response in microalgae. Conditions of stress, such salt stress, can trigger the processes responsible for the accumulation of tocopherol and carotene. It has been found that the most difficult part of culturing microalgae is keeping it affordable. This study investigated the effects of different salt types and concentrations on the amount of α-tocopherol, carotenoid derivatives, and flocculation efficiency of Euglena sp. Cultures of Euglena sp. was developed under salt stress conditions of NaCl 200 mM and KCl 200 mM. UV-VIS spectrophotometry was used to confirm the presence of α-tocopherol and carotenoid derivatives under thirteen days of salt stress testing. Increasing salinity has a significant effect on Euglena sp., causing spherical cell morphologies with aspect ratio 1.385 ± 0.031 for NaCl 200 mM and 1.414 ± 0.040 for KCl 200 mM. Increasing salinity also slowing down development with specific growth rate value of 0.171 ± 0.006 per day and 0.122 ± 0.029 per day for NaCl and KCl 200 mM, respectively. Nevertheless, the amount of α-tocopherol in Euglena sp. increases with a high salt concentration; algal cells flocculated more successfully when increasing the salt concentrations (NaCl 200 mM and KCl 200 mM) was added. Due to the inhibition of photosynthetic activity in salt-stressed cells, the control group exhibited higher levels of carotenoid derivatives (ranging from 0.5-1 ㎍/mL) and pheophytin a and b (0.0062 ± 0.001 ㎍/mL and 0.0064 ± 0.001 ㎍/mL) than the group treated with salt stress. In conclusion, salt stress was an effective way to raises the concentration of α-tocopherol and significantly reduce the expense of harvesting Euglena sp.

Characteristic of Ru Thin Film Deposited by ALD

  • Park, Jingyu;Jeon, Heeyoung;Kim, Hyunjung;Kim, Jinho;Jeon, Hyeongtag
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.78-78
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    • 2013
  • Recently, many platinoid metals like platinum and ruthenium have been used as an electrode of microelectronic devices because of their low resistivity and high work-function. However the material cost of Ru is very expensive and it usually takes long initial nucleation time on SiO2 during chemical deposition. Therefore many researchers have focused on how to enhance the initial growth rate on SiO2 surface. There are two methods to deposit Ru film with atomic layer deposition (ALD); the one is thermal ALD using dilute oxygen gas as a reactant, and the other is plasma enhanced ALD (PEALD) using NH3 plasma as a reactant. Generally, the film roughness of Ru film deposited by PEALD is smoother than that deposited by thermal ALD. However, the plasma is not favorable in the application of high aspect ratio structure. In this study, we used a bis(ethylcyclopentadienyl)ruthenium [Ru(EtCp)2] as a metal organic precursor for both thermal and plasma enhanced ALDs. In order to reduce initial nucleation time, we use several methods such as Ar plasma pre-treatment for PEALD and usage of sacrificial RuO2 under layer for thermal ALD. In case of PEALD, some of surface hydroxyls were removed from SiO2 substrate during the Ar plasma treatment. And relatively high surface nitrogen concentration after first NH3 plasma exposure step in ALD process was observed with in-situ Auger electron spectroscopy (AES). This means that surface amine filled the hydroxyl removed sites by the NH3 plasma. Surface amine played a role as a reduction site but not a nucleation site. Therefore, the precursor reduction was enhanced but the adhesion property was degraded. In case of thermal ALD, a Ru film was deposited from Ru precursors on the surface of RuO2 and the RuO2 film was reduced from RuO2/SiO2 interface to Ru during the deposition. The reduction process was controlled by oxygen partial pressure in ambient. Under high oxygen partial pressure, RuO2 was deposited on RuO2/SiO2, and under medium oxygen partial pressure, RuO2 was partially reduced and oxygen concentration in RuO2 film was decreased. Under low oxygen partial pressure, finally RuO2 was disappeared and about 3% of oxygen was remained. Usually rough surface was observed with longer initial nucleation time. However, the Ru deposited with reduction of RuO2 exhibits smooth surface and was deposited quickly because the sacrificial RuO2 has no initial nucleation time on SiO2 and played a role as a buffer layer between Ru and SiO2.

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고강도 강섬유보강 콘크리트의 역학적 특성 및 장기변형 특성에 관한 실험적 연구 (An Experimental Study on the Mechanical Properties and Long-Term Deformations of High-Strength Steel Fiber Reinforced Concrete)

  • 윤의식;박승범
    • 대한토목학회논문집
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    • 제26권2A호
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    • pp.401-409
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    • 2006
  • 본 연구에서는 고강도 강섬유보강 콘크리트(HSFRC)의 설계 및 시공을 위한 기초 자료를 제공하기 위하여 역학적 특성 및 장기변형 특성에 관한 연구를 수행하였으며, 탄성계수, 압축강도, 인장강도, 휨강도, 건조수축 및 크리프에 미치는 강섬유 혼입의 영향을 검토하고, 휨파괴인성을 평가하였다. 연구결과, HSFRC의 압축강도에 미치는 강섬유의 혼입효과는 그다지 크지 않았고, 탄성계수는 섬유혼입률이 증가함에 따라 증가하는 것으로 나타났으며, 인장강도, 휨강도 및 휨인성에 미치는 섬유혼입률($V_f$) 및 섬유형상비($l_f/d_f$)의 영향은 대단히 큰 것으로 나타났다. 이는 $V_f$$l_f/d_f$의 증가와 함께 극한하중에 상응하는 처짐량이 증가하고, 강섬유의 균열구속성능에 의해 하중-처짐곡선의 하강곡선이 완만하게 감소하기 때문인 것으로 판단된다. 또한 크리프 및 건조수축에 미치는 섬유혼입률($V_f$)의 영향은 대단히 큰 것으로 나타났으며, 특히 고강도 콘크리트에 강섬유를 혼입하면 크리프 변형에 비해 건조수축 변형의 저감에 더욱 효과가 큰 것으로 나타났다.

국내 10개 댐저수지 인공습지의 운영현황 및 개선방안 (Operating Status and Improvement Plans of Ten Wetlands Constructed in Dam Reservoirs in Korea)

  • 최광순;김세원;김동섭;이요상
    • 한국습지학회지
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    • 제16권3호
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    • pp.431-440
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    • 2014
  • 국내 10개 댐저수지 인공습지를 대상으로 수심분포, 유입량 및 유출량, 물흐름분포, 체류시간, 수처리효율, 종횡비, 개방수역/폐쇄수역 구성비 등 습지의 운영현황 및 구조적 형상에 대한 분석을 통해 인공습지의 수질정화기능을 회복시킬 수 있는 개선대책 및 운영방안을 제시하였다. 조사대상 인공습지의 처리수는 하수처리장 방류수 또는 하천수였으며, 처리수의 수질은 외국의 인공습지에 비해 전반적으로 낮은 것으로 나타났다. 특히 처리수의 BOD는 모든 습지에서 3 mg/L 이하로 매우 낮았는데, 이는 하수처리장의 고도처리 및 평수기 저농도 하천수 취입에 기인된 것으로 판단된다. 수처리효율은 TN이 7.6~67.6%(평균 24.9%), TP가 -4.9~74.5%(평균 23.7%)의 범위로 하수처리장 방류수를 처리수로 하는 인공습지에서 높은 값을 보였다. BOD는 -133.3~41.7% 범위로 습지에 따라 큰 차이를 보였으며, 대부분 습지에서 처리효율이 없거나 낮은 것으로 나타났다. 인공습지의 낮은 처리효율은 습지의 부적합한 종행비, 과도한 개방수역 면적 등의 구조적인 문제와 수위관리 미흡, 초기우수 취입시스템 및 운영관리 미흡, 강우시 모니터링 부재 등의 운영적인 문제에 의한 것으로 나타났다. 그러므로 댐저수지 인공습지가 비점오염 저감시설로서의 역할을 할 수 있기 위해서는 댐저수지 인공습지에 적합한 습지설계 및 운영방안이 필요하다. 또한 습지 운영매뉴얼에 비점오염물질이 유출되는 강우시 모니터링이 반드시 포함되어야 하며, 댐저수지 인공습지의 수처리효율도 강우시 모니터링 자료를 토대로 평가되어야 할 것이다.

GPU Based Feature Profile Simulation for Deep Contact Hole Etching in Fluorocarbon Plasma

  • Im, Yeon-Ho;Chang, Won-Seok;Choi, Kwang-Sung;Yu, Dong-Hun;Cho, Deog-Gyun;Yook, Yeong-Geun;Chun, Poo-Reum;Lee, Se-A;Kim, Jin-Tae;Kwon, Deuk-Chul;Yoon, Jung-Sik;Kim3, Dae-Woong;You, Shin-Jae
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2012년도 제43회 하계 정기 학술대회 초록집
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    • pp.80-81
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    • 2012
  • Recently, one of the critical issues in the etching processes of the nanoscale devices is to achieve ultra-high aspect ratio contact (UHARC) profile without anomalous behaviors such as sidewall bowing, and twisting profile. To achieve this goal, the fluorocarbon plasmas with major advantage of the sidewall passivation have been used commonly with numerous additives to obtain the ideal etch profiles. However, they still suffer from formidable challenges such as tight limits of sidewall bowing and controlling the randomly distorted features in nanoscale etching profile. Furthermore, the absence of the available plasma simulation tools has made it difficult to develop revolutionary technologies to overcome these process limitations, including novel plasma chemistries, and plasma sources. As an effort to address these issues, we performed a fluorocarbon surface kinetic modeling based on the experimental plasma diagnostic data for silicon dioxide etching process under inductively coupled C4F6/Ar/O2 plasmas. For this work, the SiO2 etch rates were investigated with bulk plasma diagnostics tools such as Langmuir probe, cutoff probe and Quadruple Mass Spectrometer (QMS). The surface chemistries of the etched samples were measured by X-ray Photoelectron Spectrometer. To measure plasma parameters, the self-cleaned RF Langmuir probe was used for polymer deposition environment on the probe tip and double-checked by the cutoff probe which was known to be a precise plasma diagnostic tool for the electron density measurement. In addition, neutral and ion fluxes from bulk plasma were monitored with appearance methods using QMS signal. Based on these experimental data, we proposed a phenomenological, and realistic two-layer surface reaction model of SiO2 etch process under the overlying polymer passivation layer, considering material balance of deposition and etching through steady-state fluorocarbon layer. The predicted surface reaction modeling results showed good agreement with the experimental data. With the above studies of plasma surface reaction, we have developed a 3D topography simulator using the multi-layer level set algorithm and new memory saving technique, which is suitable in 3D UHARC etch simulation. Ballistic transports of neutral and ion species inside feature profile was considered by deterministic and Monte Carlo methods, respectively. In case of ultra-high aspect ratio contact hole etching, it is already well-known that the huge computational burden is required for realistic consideration of these ballistic transports. To address this issue, the related computational codes were efficiently parallelized for GPU (Graphic Processing Unit) computing, so that the total computation time could be improved more than few hundred times compared to the serial version. Finally, the 3D topography simulator was integrated with ballistic transport module and etch reaction model. Realistic etch-profile simulations with consideration of the sidewall polymer passivation layer were demonstrated.

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