• Title/Summary/Keyword: hard Coating

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Analysis of Commercial Recycling Technology and Research Trend for Waste Cu Scrap in Korea (국내 구리 함유 폐자원의 재활용 상용화 기술 및 연구동향 분석)

  • Kang, Leeseung;An, HyeLan;Kang, Hong-Yoon;Lee, Chan Gi
    • Resources Recycling
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    • v.28 no.1
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    • pp.3-14
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    • 2019
  • Copper is used in many electronic components and construction parts due to its excellent electrical conductivity and heat transfer characteristics, and also used for pre-plating for double layer coating such as nickel, so that copper is an essential material in modern industry. Despite the expected increase of usage and importance on wiring, sensors and data equipment in the next generation industries, it is hard for securing stable copper supply and resource management resulting from the copper prices are fluctuating owing to the economic crisis in Europe, the low economic growth trend in China, and President Trump's commitment to public industrial facilities investment in U.S.. Since most of the domestic copper consumption is used by electrolytic copper cathode, we studied not only copper recycling technology which is being commercialized but also current research trend under the research stage. This study aims to examine the characteristics of each process and the areas where future recycling technology development is required.

Organic-inorganic Hybrid Materials for Spin Coating Hardmask (스핀코팅 하드마스크용 유-무기 하이브리드 소재에 관한 연구)

  • Yu, Je Jeong;Hwang, Seok-Ho;Kim, Sang Bum
    • Applied Chemistry for Engineering
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    • v.22 no.2
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    • pp.230-234
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    • 2011
  • In this work, the primary material for a single layered hardmask which can afford a spin-on process was prepared by the minture of organic and inorganic sources. The preparation of hybrid polymer was attempted by esterification from silanol terminated siloxane compounds and acetonide-2,2-bis(methoxy)propionic acid. The optical, thermal and morphological properties of the test hardmask film was examined in terms of cross-linking agent and additives. In addition, the etch rate of hardmask film and photo resist layer were compared. The hybrid polymer prepared from organic and inorganic materials was found to be useful for hardmask film to form the nano-patterns.

Effect of sowing italian ryegrass using unmanned helicopter under the established rice field on labour saving and rice growth

  • Kim, Young-Gwang;Seong, Deok-Gyeong;Nam, Jin-Woo;Choi, Young-Jo;Hong, Kwang-Pyo
    • Proceedings of the Korean Society of Crop Science Conference
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    • 2017.06a
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    • pp.268-268
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    • 2017
  • Common sowing method of italian ryegrass (IRG) has been using the backpack seed sprayer (BSS) in Korea. It has weak point including a hard work and a little sowing area. This study was conducted to find out the effects of sowing IRG using unmanned helicopter (UH) under the established rice field. We checked the labour saving of sowing IRG and the growth and yield of rice after using IRG as forage crop. Two sowing implements(using by UH and backpack seed sprayer (BSS)) were tested for the ability of sowing IRG. For proper pretreatment of IRG seeds for aerial sowing using with UH, we tested one-day soaking seeds, iron-coated seeds, coated seeds sold in stores and untreated seeds. Aerial sowing of IRG seeds using UH was tested under the speed 10 km/h and flying altitude 3~4m. We tried to confirm the effects on rice growth in a paddy field after IRG had been used as forage in mid May. In 6 hours of seeding per day, UH had a seeding area of 21.8 hectares, three times wider than BSS. UH had a decrease of about 63 percent of sowing-seed cost in comparison with BSS. In the IRG aerial sowing using UH, coating seeds had the wider sowing width of 5~6 meter than 3~4 meter untreated seeds. Residual dry matter of IRG after using forage had 4.5 ton per hectare and 20 percent of top dry matter. The amount of nitrogen remaining in residual IRG in the soil was 12 kg per hectare, and the other nutrients such as calcium and potassium was incorporated into the soil with less than 10 kg/ha. The rice yield after the harvesting IRG was 5 percent higher than that of rice single cropping. Consequently, IRG sowing using UH was effective in reducing sowing time and sowing cost compared with conventional methods and, it is considered that there is a positive effect on the rice cultivation compared to rice single cropping.

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PEMOCVD of Ti(C,N) Thin Films on D2 Steel and Si(100) Substrates at Low Growth Temperatures

  • Kim, Myung-Chan;Heo, Cheol-Ho;Boo, Jin-Hyo;Cho,Yong-Ki;Han, Jeon-Geon
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.211-211
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    • 1999
  • Titanium nitride (TiN) thin films have useful properties including high hardness, good electrical conductivity, high melting point, and chemical inertness. The applications have included wear-resistant hard coatings on machine tools and bearings, decorative coating making use of the golden color, thermal control coatings for widows, and erosion resistant coatings for spacecraft plasma probes. For all these applications as feature sizes shrink and aspect ratios grow, the issue of good step coverage becomes increasingly important. It is therefore essential to manufacture conformal coatings of TiN. The growth of TiN thin films by chemical vapor deposition (CVD) is of great interest for achieving conformal deposition. The most widely used precursor for TiN is TiCl4 and NH3. However, chlorine impurity in the as-grown films and relatively high deposition temperature (>$600^{\circ}C$) are considered major drawbacks from actual device fabrication. To overcome these problems, recently, MOCVD processes including plasma assisted have been suggested. In this study, therefore, we have doposited Ti(C, N) thin films on Si(100) and D2 steel substrates in the temperature range of 150-30$0^{\circ}C$ using tetrakis diethylamido titanium (TDEAT) and titanium isopropoxide (TIP) by pulsed DC plamsa enhanced metal-organic chemical vapor deposition (PEMOCVD) method. Polycrystalline Ti(C, N) thin films were successfully grown on either D2 steel or Si(100) surfaces at temperature as low as 15$0^{\circ}C$. Compositions of the as-grown films were determined with XPS and RBS. From XPS analysis, thin films of Ti(C, N) with low oxygen concentration were obtained. RBS data were also confirmed the changes of stoichiometry and microhardness of our films. Radical formation and ionization behaviors in plasma are analyzed by optical emission spectroscopy (OES) at various pulsed bias and gases conditions. H2 and He+H2 gases are used as carrier gases to compare plasma parameter and the effect of N2 and NH3 gases as reactive gas is also evaluated in reduction of C content of the films. In this study, we fond that He and H2 mixture gas is very effective in enhancing ionization of radicals, especially N resulting is high hardness. The higher hardness of film is obtained to be ca. 1700 HK 0.01 but it depends on gas species and bias voltage. The proper process is evident for H and N2 gas atmosphere and bias voltage of 600V. However, NH3 gas highly reduces formation of CN radical, thereby decreasing C content of Ti(C, N) thin films in a great deal. Compared to PVD TiN films, the Ti(C, N) film grown by PEMOCVD has very good conformability; the step coverage exceeds 85% with an aspect ratio of more than 3.

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HIPIMS Arc-Free Reactive Deposition of Non-conductive Films Using the Applied Material ENDURA 200 mm Cluster Tool

  • Chistyakov, Roman
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.96-97
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    • 2012
  • In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

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Automotive Pre-primed Coatings with Automotive Structural Adhesive for Non-weldable Binding Process (자동차 구조용 접착제를 이용한 자동차용 Pre-primed 도료의 비용접식 접합공정 적용)

  • Moon, Je-Ik;Lee, Yong-Hee;Kim, Hyun-Joong;Noh, Seung Man;Nam, Joon Hyun;Kim, Min-Su;Kim, Jun-Ki;Kim, Jong-Hoon
    • Journal of Adhesion and Interface
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    • v.12 no.3
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    • pp.99-104
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    • 2011
  • Currently, automotive pre-primed coatings has been developed to overcome environmental regulations and to reduce manufacturing cost in automotive industry. By these reasons, an automotive pre-primed system has been investigated to remove the wash and pre-treatment process using a roll coating application. It is required to develop non-weldable pre-primed system for automotive structural adhesives, because pre-primed sheet coated with organic compounds is hard to be assembled by welding process. Primer 1 (polyester type) and primer 2 (urethane type) were designed to satisfy flexibility and formability for non-weldable pre-primed system. According to the results of physical property test of the primers, adhesion test such as single-lap shear test and T-peel test, primer 1 (polyester type) had better physical properties such as pencil hardness, solvent resistance, flexibility and adhesion with automotive adhesive than that of primer 2 (polyurethane type). In addition, the possibility of the non-weldable pre-primed system was applicable to automotive assembly process in place of welding process.

The Application of an EU REACH Protocol to the Occupational Exposure Assessment of Methanol: Targeted Risk Assessment (메탄올 작업장 노출 평가에의 EU REACH 프로토콜 적용: Targeted Risk Assessment)

  • Ra, Jin-Sung;Song, Moon Hwan;Choe, Eun Kyung
    • Journal of Environmental Health Sciences
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    • v.47 no.5
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    • pp.432-445
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    • 2021
  • Background: The European Centre for Ecotoxicology and Toxicology of Chemicals' Targeted Risk Assessment (ECETOC TRA) tool has been recognized by EU REACH as a preferred approach for calculating worker health risks from chemicals. Objectives: The applicability of the ECETOC TRA to occupational exposure estimation from industrial uses of methanol was studied by inputting surveyed and varied parameters for TRA estimation as well as through comparison with measured data. Methods: Information on uses of methanol was collected from seven working environment monitoring reports along with the measured exposure data. Input parameters for TRA estimation such as operating conditions (OCs), risk management measures (RMMs) and process categories (PROCs) were surveyed. To compare with measured exposures, parameters from the surveyed conditions of ventilation but no use of respiratory protection were applied. Results: PROCs 4, 5, 8a, 10, and 15 were assigned to ten uses of methanol. The uses include as a solvent for manufacturing sun cream, surfactants, dyestuffs, films and adhesives. Methanol was also used as a component in a release agent, hardening media and mold wash for cast products as well as a component of hard-coating solution and a viscosity-controlling agent for manufacturing glass lenses. PROC 8a and PROC 10 of a cast product manufacturer without LEV (local exhaust ventilation) and general ventilation as well as no respiratory protection resulted in the highest exposure to methanol. Assuming the identical worst OCs and RMMs for all uses, exposures from PROC 5, 8a, and 10 were the same and the highest followed by PROC 4 and 15. The estimation resulted in higher exposures in nine uses except one use where measured exposure approximated exposures without RMMs. Conclusions: The role of ECETOC TRA as a conservative exposure assessment tool was confirmed by comparison with measured data. Moreover, it can guide which RMMs should be applied for the safe use of methanol.

Effects of smartphone app-based oral muscle strength training on functional improvement in the elderly (노인 대상 스마트폰 앱 콘텐츠를 이용한 구강 근력 강화 훈련의 기능 개선 효과)

  • Kyeong-Hee Lee;Yoon-Young Choi;Eun-Seo Jung;Hyun-Young Moon;Mi-Sook Yoon;Kyeong-Jin Lee
    • Journal of Korean society of Dental Hygiene
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    • v.24 no.3
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    • pp.209-218
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    • 2024
  • Objectives: This study aimed to develop educational content for a smartphone app on oral muscle training and examine its effects on the elderly population. Methods: A total of twelve training sessions were delivered through the smartphone app over a six-week period, from late August to early October 2023. Each session lasted approximately 60 minutes. Participants were followed up after the program. Results: The experimental group showed significant improvements in oral health before and after using the smartphone app. These improvements included decreased dental plaque (p<0.05) by 0.69 units, decreased gingivitis (p<0.001) by 0.99 units, decreased tongue plaque (p<0.01) by 1.11 units, increased salivary secretion rate (p<0.001) by 0.73 units, increased hard palate strength (p<0.001) by 5.25 units, and increased soft palate strength (p<0.01) by 6.82 units. Compared to the control group, the experimental group showed significant improvements in dental plaque (p<0.001), gingivitis (p<0.001), and tongue coating (p<0.01). Conclusions: This study found that oral muscle strengthening training using the smartphone app effectively improved oral health in the elderly. The developed app content has the potential to be a valuable tool for promoting oral health in this population within their daily routines. However, further efforts are needed to ensure clear communication and effective utilization of the training program through user training or educational materials.

Improving Curing Rate and Physical Properties of Korean Dendropanax Lacquer with Thermal and Photo Initiator by Dual Curing (이중경화법을 이용한 열개시제 및 광개시제가 배합된 황칠도료의 경화속도 촉진 및 물성향상 연구)

  • Hwang, Hyeon-Deuk;Moon, Je-Ik;Park, Cho-Hee;Kim, Hyun-Joong;Hwang, Baik
    • Journal of the Korean Wood Science and Technology
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    • v.38 no.4
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    • pp.333-340
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    • 2010
  • The Korean Dendropanax lacquer, made from a natural resinous sap from Dendropanax orbifera Lev., was used as a golden and transparent varnish for the traditional artifacts (armor uits, helmets, arrowheads, etc.) to make them be brilliant golden color. The cured film of the acquer has excellent protective properties such as weatherability, water resistance, and nticorrosive. But, one of disadvantages is that takes a long time and much energy to fulfill curing the lacquer. The chemical constituents of the lacquer contained conjugated diene compounds s the photopolymerizable monomers. These monomers easily polymerized in sunlight to form olden-colored, hard-coating films in a short time. Photooxidation may be one of the most mportant reactions in the chemistry of the lacquer. Although the Korean Dendropanax Lacquer hould be dried to a thoroughly dry stage to achieve optimal film properties, curing with elevated emperatures may be required for the protracted curing time at atmospheric temperature. So we ntended to accelerate the curing rate of the lacquer by dual curing of thermal and radiation uring. The effect of thermal initiator on the thermal curing reaction was evaluated by monitoring he changes in double bond peak with FT-IR. Then the curing rate of the lacquer blended with hermal initiator and photoinitiator together was measured during dual curing using a RPT with V spot curing machine. Thermal initiator not only accelerated the curing rate but also improved he physical property. And the curing rate of the Korean Dendropanax lacquer was improved by ual curing method of thermal and UV curing. According to these results, the application area of he Korean Dendropanax lacquer could be expanded to surface coatings for electronic devices uch as mobile phones or electronics.

Permanent Preservation and Use of Historical Archives : Preservation Issues Digitization of Historical Collection (역사기록물(Archives)의 항구적인 보존화 이용 : 보존전략과 디지털정보화)

  • Lee, Sang-min
    • The Korean Journal of Archival Studies
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    • no.1
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    • pp.23-76
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    • 2000
  • In this paper, I examined what have been researched and determined about preservation strategy and selection of preservation media in the western archival community. Archivists have primarily been concerned with 'preservation' and 'use' of archival materials worth of being preserved permanently. In the new information era, preservation and use of archival materials were faced with new challenge. Life expectancy of paper records was shortened due to acidification and brittleness of the modem papers. Also emergence of information technology affects the traditional way of preservation and use of archival materials. User expectations are becoming so high technology-oriented and so complicated as to make archivists act like information managers using computer technology rather than traditional archival handicraft. Preservation strategy plays an important role in archival management as well as information management. For a cost-effective management of archives and archival institutions, preservation strategy is a must. The preservation strategy encompasses all aspects of archival preservation process and practices, from selection of archives, appraisal, inventorying, arrangement, description, conservation, microfilming or digitization, archival buildings, and access service. Those archival functions should be considered in their relations to each other to ensure proper preservation of archival materials. In the integrated preservation strategy, 'preservation' and 'use' should be combined and fulfilled without sacrificing the other. Preservation strategy planning is essential to determine the policies of archives to preserve their holdings safe and provide people with a maximum access in most effective ways. Preservation microfilming is to ensure permanent preservation of information held in important archival materials. To do this, a detailed standardization has been developed to guarantee the permanence of microfilm as well as its product quality. Silver gelatin film can last up to 500 years in the optimum storage environment and the most viable option for permanent preservation media. ISO and ANIS developed such standards for the quality of microfilms and microfilming technology. Preservation microfilming guidelines was also developed to ensure effective archival management and picture quality of microfilms. It is essential to assess the need of preservation microfilming. Limit in resources always put a restraint on preservation management. Appraisal (and selection) of what to be preserved was the most important part of preservation microfilming. In addition, microfilms with standard quality can be scanned to produce quality digital images for instant use through internet. As information technology develops, archivists began to utilize information technology to make preservation easier and more economical, and to promote use of archival materials through computer communication network. Digitization was introduced to provide easy and universal access to unique archives, and its large capacity of preserving archival data seems very promising. However, digitization, i.e., transferring images of records to electronic codes, still, needs to be standardized. Digitized data are electronic records, and st present electronic records are very unstable and not to be preserved permanently. Digital media including optical disks materials have not been proved as reliable media for permanent preservation. Due to their chemical coating and physical character using light, they are not stable and can be preserved at best 100 years in the optimum storage environment. Most CD-R can last only 20 years. Furthermore, obsolescence of hardware and software makes hard to reproduce digital images made from earlier versions. Even if when reformatting is possible, the cost of refreshing or upgrading of digital images is very expensive and the very process has to be done at least every five to ten years. No standard for this obsolescence of hardware and software has come into being yet. In short, digital permanence is not a fact, but remains to be uncertain possibility. Archivists must consider in their preservation planning both risk of introducing new technology and promising possibility of new technology at the same time. In planning digitization of historical materials, archivists should incorporate planning for maintaining digitized images and reformatting them in the coming generations of new applications. Without the comprehensive planning, future use of the expensive digital images will become unavailable. And that is a loss of information, and a final failure of both 'preservation' and 'use' of archival materials. As peter Adelstein said, it is wise to be conservative when considerations of conservations are involved.