• 제목/요약/키워드: hall-effect sensors

검색결과 80건 처리시간 0.022초

Hot Wall Epitaxy(HWE)법에 의한 AgGaSe2 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류 연구 (Growth and study on photocurrent of valence band splitting for AgGaSe2 single crystal thin film by hot wall epitaxy)

  • 이관교;홍광준
    • 센서학회지
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    • 제15권6호
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    • pp.397-405
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    • 2006
  • Single crystal $AgGaSe_{2}$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $420^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $AgGaSe_{2}$ source at $630^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $AgGaSe_{2}$ thin films measured with Hall effect by van der Pauw method are $4.05{\times}10^{16}/cm^{3}$, $139cm^{2}/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $AgGaSe_{2}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}(T)$=1.9501 eV-($8.79{\times}10^{-4}{\;}eV/K)T^{2}$/(T+250 K). The crystal field and the spin-orbit splitting energies for the valence band of the $AgGaSe_{2}$ have been estimated to be 0.3132 eV and 0.3725 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}So$ definitely exists in the ${\Gamma}_{5}$ states of the valence band of the $AgGaSe_{2}$. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1}-$, $B_{1}-$, and $C_{1}-$exciton peaks for n=1.

펄스 레이저 증착(PLD)법에 의한 ZnO 박막 성장과 가전자대 갈라짐에 대한 광전류 연구 (Growth of ZnO thin film by pulsed laser deposition and photocurrent study on the splitting of valance band)

  • 홍광준
    • 센서학회지
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    • 제14권3호
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    • pp.160-168
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    • 2005
  • ZnO epilayer were synthesized by the pulesd laser deposition(PLD) process on $Al_{2}O_{3}$ substrate after irradiating the surface of the ZnO sintered pellet by the ArF(193 nm) excimer laser. The epilayers of ZnO were achieved on sapphire ($Al_{2}O_{3}$) substrate at a temperature of $400^{\circ}C$. The crystalline structure of epilayer was investigated by the photoluminescence. The carrier density and mobility of ZnO epilayer measured with Hall effect by van der Pauw method are $8.27{\times}1016cm^{-3}$ and $299cm^{2}/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the ZnO obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}(T)$=3.3973 eV-($2.69{\times}10^{-4}$ eV/K)$T^{2}$/(T+463K). The crystal field and the spin-orbit splitting energies for the valence band of the ZnO have been estimated to be 0.0041 eV and 0.0399 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_{6}$ states of the valence band of the ZnO. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1}-$, $B_{1}-$, and $C_{1}-$exciton peaks for n = 1.

Hot Wall Epitaxy (HWE)법에 의한 ZnIn2S4 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류 연구 (Growth and photocurrent study on the splitting of the valence band for ZnIn2S4 single crystal thin film by hot wall epitaxy)

  • 홍광준
    • 센서학회지
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    • 제16권6호
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    • pp.419-427
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    • 2007
  • Single crystal $ZnIn_{2}S_{4}$ layers were grown on a thoroughly etched semi-insulating GaAs(100) substrate at $450^{\circ}C$ with the hot wall epitaxy (HWE) system by evaporating the polycrystal source of $ZnIn_{2}S_{4}$ at $610^{\circ}C$ prepared from horizontal electric furnace. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $ZnIn_{2}S_{4}$ thin films measured with Hall effect by van der Pauw method are $8.51{\times}10^{17}\;electron/cm^{-3}$, $291{\;}cm^{2}/v-s$ at 293 K, respectively. The photocurrent and the absorption spectra of $ZnIn_{2}S_{4}$/SI(Semi-Insulated) GaAs(100) are measured ranging from 293 K to 10 K. The temperature dependence of the energy band gap of the $ZnIn_{2}S_{4}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)$=2.9514 eV. ($7.24{\times}10^{-4}\;eV/K$)$T^{2}$/(T+489 K). Using the photocurrent spectra and the Hopfield quasicubic model, the crystal field energy(${\Delta}cr$) and the spin-orbit splitting energy(${\Delta}so$) for the valence band of the $ZnIn_{2}S_{4}$ have been estimated to be 167.8 meV and 14.8 meV at 10 K, respectively. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1}$-, $B_{1}$-, and $C_{41}$-exciton peaks.

AlN 버퍼층위에 성장된 M/NEMS용 다결정 3C-SiC 박막의 특성 (Characteristics of polycrystalline 3C-SiC thin films grown on AlN buffer layer for M/NEMS applications)

  • 정귀상;김강산;이종화
    • 센서학회지
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    • 제16권6호
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    • pp.457-461
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    • 2007
  • This paper describes the characteristics of poly (polycrystalline) 3C-SiC grown on $SiO_{2}$ and AlN substrates, respectively. The crystallinity and the bonding structure of poly 3C-SiC grown on each substrate were investigated according to various growth temperatures. The crystalline quality of poly 3C-SiC was improved from resulting in decrease of FWHM (full width half maximum) of XRD and FT-IR by increasing the growth temperature. The minimum growth temperature of poly 3C-SiC was $1100^{\circ}C$. The surface chemical composition and the electron mobility of poly 3C-SiC grown on each substrate were investigated by XPS and Hall Effect, respectively. The chemical compositions of surface of poly 3C-SiC films grown on $SiO_{2}$ and AlN were not different. However, their electron mobilities were $7.65{\;}cm^{2}/V.s$ and $14.8{\;}cm^{2}/V.s$, respectively. Therefore, since the electron mobility of poly 3C-SiC films grown on AlN buffer layer was two times higher than that of 3C-SiC/$SiO_{2}$, a AlN film is a suitable material, as buffer layer, for the growth of poly 3C-SiC thin films with excellent properties for M/NEMS applications.

Hot Wall Epitaxy 법에 의한 CdIn2S4 단결정 박막의 성장과 광전류 특성 (Growth and Photocurrent Properties of CdIn2S4/GaAs Single Crystal Thin Film by Hot Wall Epitaxy)

  • 이상열;홍광준;박진성
    • 센서학회지
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    • 제11권5호
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    • pp.309-318
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    • 2002
  • 수평 전기로에서 $CdIn_2S_4$ 다결정을 합성하여 HWE(Hot Wall Epitaxy)방법으로 $CdIn_2S_4$ 단결정 박막을 반절연성 GaAs (100)기판에 성장시켰다. $CdIn_2S_4$ 단결정 박막의 성장 조건은 증발원의 온도 $630^{\circ}C$, 기판의 온도 $420^{\circ}C$였고 성장 속도는 $0.5\;{\mu}m/hr$였다. $CdIn_2S_4$ 단결정 박막의 결정성의 조사에서 10 K에서 광발광(photoluminescence) 스펙트럼이 463.9 nm (2.6726 eV)에서 exciton emission 스펙트럼이 가장 강하게 나타났으며, 또한 이중 결정 X-선 요동 곡선(DCRC)의 반폭치(FWHM)도 127 arcsec로 가장 작아 최적 성장 조건임을 알 수 있었다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293K에서 각각 $9.01{\times}10^{16}/cm^3$, $219\;cm^2/V{\cdot}s$였다. $CdIn_2S_4$/SI(Semi-Insulated) GaAs(100) 단결정 박막의 광흡수와 광전류 spectra를 293K에서 10K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap $E_g(T)$는 Varshni 공식에 따라 계산한 결과 $2.7116eV-(7.74{\times}10^{-4}eV/K)T^2$/(T+434K)이었으며 광전류 스펙트럼으로부터 Hamilton matrix(Hopfield quasicubic mode)법으로 계산한 결과 crystal field splitting ${\Delta}cr$값이 0.1291 eV이며 spin-orbit ${\Delta}so$값은 0.0248 eV임을 확인하였다. 10K일 때 광전류 봉우리들은 n = 1일때 $A_1$-, $B_1$-와 $C_1$-exciton 봉우리임을 알았다.

Bridgeman법에 의한 CdIn2Te4 단결정 성장과 광발광 특성 (Properties of Photoluminescence and Growth of CdIn2Te4 Single Crystal by Bridgeman method)

  • 문종대
    • 센서학회지
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    • 제12권6호
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    • pp.273-281
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    • 2003
  • 수평 전기로에서 $CdIn_2Te_4$ 다결정을 합성하여 Bridgeman 법으로 3단 수직 전기로에서 $CdIn_2Te_4$ 단결정을 성장하였다. 성장된 결정의 특성은 x선 회절과 광발광 측정으로 조사하였다. $CdIn_2Te_4$ 단결정 시료는 Laue에 배면 반사법에 의해서 (001)면으로 성장되었음을 확인하였다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 온도에 의존하는 운반자 농도와 이동도는 293K에서 각각 $8.61{\times}10^{16}/cm^3$, $242\;cm^2/V{\codt}s$였다. $CdIn_2Te_4$ 단결정의 광흡수와 광전류 spectra를 293K에서 10K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap $E_g(T)$는 Varshni공식에 따라 계산한 결과 1.4750eV - $(7.69{\times}10^{-3}\;eV/K)T^2$/(T+2147 K)임을 확인하였다. 막 성장된(as-grown) $CdIn_2Te_4$ 단결정 시료를 Cd-, In-, Te 분위기에서 열처리하여 10K에서 Photoluminescence(PL) spectra를 측정하여 점 결함의 기원을 알아보았다. $CdIn_2Te_4$ 단결정내에서 내재된 결함들의 기원을 10 K에서 광발광을 측정하여 연구되었다. PL 측정으로 부터 얻어진 $V_{Te}$, $Cd_{int}$, $V_{Cd}$, 그리고 $Te_{int}$는 주개와 받개로 분류되어졌다. $CdIn_2Te_4$ 단결정 시료를 Cd 분위기에서 열처리하면 n형으로 변환됨을 악 수 있었고, In 분위기에서 열처리하면 열처리 이전의 PL spectra를 보이고 있어서 $I_2$, $I_1$ 및 S.A emission에 의한 PL peak에는 영향을 주지 않는다고 보았다.

Hot Wall Epitaxy(HWE)법에 의한 CuAlSe2 단결정 박막의 성장과 가전자대 갈라짐에 대한 광전류 연구 (Photocurrent Study on the Splitting of the Valence Band and Growth of CuAlSe2 Single Crystal Thin Film by Hot Wall Epitaxy)

  • 박창선;홍광준;박진성;이봉주;정준우;방진주;김현
    • 센서학회지
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    • 제13권2호
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    • pp.157-167
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    • 2004
  • A stoichiometric mixture of evaporating materials for $CuAlSe_{2}$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $CuAlSe_{2}$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $680^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $CuAlSe_{2}$ single crystal thin films measured with Hall effect by van der Pauw method are $9.24{\times}10^{16}cm^{-3}$ and $295cm^{2}/V{\codt}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuAlSe_{2}$ obtained from the absorption spectra was well described by the Varshni's relation, $E_{g}(T)$ = 2.8382 eV - ($8.68{\circ}10^{-4}$ eV/K)$T^{2}$/(T + 155 K). The crystal field and the spin-orbit splitting energies for the valence band of the $CuAlSe_{2}$ have been estimated to be 0.2026 eV and 0.2165 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_{5}$ states of the valence band of the $CuAlSe_{2}$. The three photocurrent peaks observed at 10 K are ascribed to the $A_{1-}$, $B_{1-}$, and $C_{1-}$ exciton peaks for n = 1.

Hot Wall Epitaxy(HWE)법에 의한 BaIn2Se4 에피레어 성장과 가전자대 갈라짐에 대한 광전류 연구 (Photocurrent Study on the Splitting of the Valence Band and Growth of BaIn2Se4 epilayers by Hot Wall Epitaxy)

  • 정준우;이기정;정경아;홍광준
    • 센서학회지
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    • 제23권2호
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    • pp.134-141
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    • 2014
  • A stoichiometric mixture of evaporating materials for $BaIn_2Se_4$ epilayers was prepared from horizontal electric furnace. To obtain the single crystal thin films, $BaIn_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $620^{\circ}C$ and $400^{\circ}C$, respectively. The crystalline structure of the epilayers was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $BaIn_2Se_4$ epilayers measured from Hall effect by van der Pauw method are $8.94{\times}10^{17}cm^{-3}$ and 343 $cm^2/vs$ at 293 K, respectively. The temperature dependence of the energy band gap of the $BaIn_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)$=2.6261 eV-$(4.9825{\times}10^{-3}eV/K)T^2/(T+558 K)$. The crystal field and the spin-orbit splitting energies for the valence band of the $BaIn_2Se_4$ have been estimated to be 116 meV and 175.9 meV, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_5$ states of the valence band of the $BaIn_2Se_4/GaAs$ epilayer. The three photocurrent peaks observed at 10 K are ascribed to the $A_1-$, $B_1$-exciton for n = 1 and $C_{21}$-exciton peaks for n=21.

Hot Wall Epitaxy(HWE)법에 의한 BaAl2Se4 단결정 박막 성장과 광전도 특성 (Growth and Optical Conductivity Properties for BaAl2Se4 Single Crystal Thin Film by Hot Wall Epitaxy)

  • 정준우;이기정;홍광준
    • 센서학회지
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    • 제24권6호
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    • pp.404-411
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    • 2015
  • A stoichiometric mixture of evaporating materials for $BaAl_2Se_4$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $BaAl_2Se_4$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the Hot Wall Epitaxy (HWE) system. The source and substrate temperatures were $610^{\circ}C$ and $410^{\circ}C$, respectively. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of $BaAl_2Se_4$ single crystal thin films measured from Hall effect by van der Pauw method are $8.29{\times}10^{-16}cm^{-3}$ and $278cm^2/vs$ at 293 K, respectively. The temperature dependence of the energy band gap of the $BaAl_2Se_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=3.4205eV-(4.3112{\times}10^{-4}eV/K)T^2/(T+232 K)$. The crystal field and the spin-orbit splitting energies for the valence band of the $BaAl_2Se_4$ have been estimated to be 249.4 meV and 263.4 meV, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the ${\Delta}so$ definitely exists in the ${\Gamma}_5$ states of the valence band of the $BaAl_2Se_4/GaAs$ epilayer. The three photocurrent peaks observed at 10 K are ascribed to the $A_1$-, $B_1$-exciton for n =1 and $C_{31}$-exciton peaks for n=31.

CBD(Chemical Bath Deposition)방법에 의한 ZnSe 박막성장과 광전기적 특성 (Growth and Opto-electric Characterization of ZnSe Thin Film by Chemical Bath Deposition)

  • 홍광준;유상하
    • 센서학회지
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    • 제10권1호
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    • pp.62-70
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    • 2001
  • CBD방법으로 성장하여 $450^{\circ}C$로 열처리한 ZnSe 박막은 회전 무늬로부터 외삽법으로 구한 격자상수 $a_0$$5.6678\;{\AA}$인 zinc blend임을 알았다. Van der Pauw 방법으로 측정한 Hall 데이터에 의한 이동도는 10 K에서 150 K 까지는 불순물 산란 (impurity scatterimg)에 의하여, 150 K에서 293 K까지는 격자산란 (lattice scattering)에 의하여 감소하는 경향을 나타냈다. 또한 운반자 농도의 ln n대 1/T에서 구한 활성화 에너지($E_a$)는 0.27 eV였다. 투과 곡선의 투과단으로 본 띠 간격은 293 k에서 $2,700{\underline{5}}\;eV$이었던 것이 10K에서는 $2.873{\underline{9}}\;eV$로 변하였다. 광전류 봉우리 위치를 투과단과 비교할 때 293 K에서 30 K까지 관측된 한 개의 봉우리는 가전자대 ${\Gamma}_8$에서 전도대 ${\Gamma}_6$로 전이에 의한 광전류 봉우리이고, 10K에서 관측된 단파장대 417.3 nm($2.971{\underline{4}}\;eV$)의 봉우리는 가전자대 ${\Gamma}_7$에서 전도대 ${\Gamma}_6$로, 431.5 nm($2.873{\underline{3}}\;eV$)의 봉우리는 가전자대 ${\Gamma}_8$에서 전도대 ${\Gamma}_6$로 전이에 의한 광전류 봉우리가 관측된 것으로 판단된다. 광전류 봉우리의 10K에서 단파장대의 가전자대 갈라짐(splitting)에 의해서 측정된 ${\Delta}so$(spin orbit coupling)는 $0.098{\underline{1}}\;eV$ 였다. 10 K에서 광발광 봉우리의 440.7 nm($2.812{\underline{7}}\;eV$)는 자유 엑시톤(free exciton : $E_x$), 443.5 nm ($2.795{\underline{5}}\;eV$)는 주개-얽매인 엑시톤(donor-bound exciton) 인 $I_2(D^0,\;X)$와 445.7 nm ($2.781{\underline{8}}\;eV$)는 반개-얽매인 엑시톤(acceptor-bound exciton) 인 $I_1(A^0,X)$이고, 460.5 nm ($2.692{\underline{3}}\;eV$)는 주개-받개쌍(donor-acceptor pair:DAP) 발광, 580 nm ($2.137{\underline{6}}\;eV$)는 self activated(A)에 기인하는 광발광 봉우리로 분석된다.

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