• Title/Summary/Keyword: gas phase decomposition

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A Study on Soil Washing for Diesel-contaminated Soil by using Decomposition of NaOH/H$_2$O$_2$ (디젤유로 오염된 토양의 NaOH/H$_2$O$_2$ 분해를 이용한 토양세척에 관한 연구)

  • Hwang, Jong-Hyun;Choi, Won-Joon;Kim, Min-Chul;Jung, Jong-Hyeon;Ha, Soo-Ho;Oh, Kwang-Joong
    • Journal of Korean Society of Environmental Engineers
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    • v.30 no.10
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    • pp.999-1005
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    • 2008
  • The main reaction for soil washing with using sodium hydroxide(NaOH) and hydrogen peroxide(H$_2$O$_2$) was desorption and flotation of petrochemical contaminant by means of oxygen bubble. We found the rate of decomposition by rate constant according to various temperature. For the purpose of optimizing the operation factor, we examined the effect of concentration of NaOH and H$_2$O$_2$, washing time, and soil:water ratio. The rate of decomposition for H$_2$O$_2$ in liquid phase is the first order reaction by its concentration. The rate constant of k$_1$ was 0.9439 $\times$ exp(-1376.82/RT) when concentration of NaOH was lower than 0.1 M, and the rate constant of k$_2$ was 17.3588 $\times$ exp(-2320.06/RT) when it was higher than NaOH of 0.1 M. It found that NaOH was facilitated at the beyond of specific concentration. We confirmed the optimum concentration of NaOH/H$_2$O$_2$ by means of rate constants during soil washing. Also, the optimum conditions during soil washing were washing time of 15 min, soil : water ratio of 1 : 3, and NaOH/H$_2$O$_2$ concentration of 0.25 M/0.1 M.

Electrical Characteristics of Pt/SBT/${Ta_2}{O_5}/Si$ Structure for Non-Volatile Memory Device (비휘발성 메모리를 위한 Pt/SBT/${Ta_2}{O_5}/Si$ 구조의 전기적 특성에 관한 연구)

  • Park, Geon-Sang;Choe, Hun-Sang;Choe, In-Hun
    • Korean Journal of Materials Research
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    • v.10 no.3
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    • pp.199-203
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    • 2000
  • $Ta_2_O5$ and $Sr_0.8Bi_2.4Ta_2O_9$ films were deposited on p-type Si(100) substrates by a rf-magnetron sputtering and the metal organic decomposition (MOD), respectively.The electrical characteristics of the $Pt/SBT/Ta_2O_5/Si$ structure were obtained as the functions of $O_2$ gas flow ratio during the $Ta_2_O5$ sputtering and $Ta_2_O5$ thickness. And to certify the role of $Ta_2_O5$ as a buffer layer, the electrical characteristics of $Pt/SBT/Ta_2O_5/Si$ were compared. $Pt/SBT/Ta_2O_5/Si$ capacitor with 20% $O_2$ gas flow ratio during the $Ta_2_O5$ sputtering did now show typical C-V curve of metal/ferroelectric/insulator/semiconductor (MFIS) structure. The capacitor with 20% $O_2$ gas flow ratio during the $Ta_2_O5$ sputtering had the largest memory window. And the memory window was decreased as the $Ta_2_O5$ gas flow ratio during the $Ta_2_O5$ sputtering was increased to 40%, 60%. In the C-V characteristics of the $Pt/SBT/Ta_2O_5/Si$ capacitors with the different $Ta_2_O5$ thickness, the capacitor with 26nm thickness of $Ta_2_O5$ had the largest memory window. The C-V and leakage current characteristics of the Pt/SBT/Si structure were worse than those of $Pt/SBT/Ta_2O_5/Si$ structure. These results and Auger electron spectroscopy (AES) measurement showed that $Ta_2_O5$ films as a buffer layer tool a role to prevent from the formation of intermediate phase and interdiffusion between SBT and Si.

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A Design Approach to $CrO_x/TiO_2$-based Catalysts for Gas-phase TCE Oxidation (기상 TCE 제거반응용 $CrO_x/TiO_2$계 복합 산화물 촉매 디자인)

  • Yang, Won-Ho;Kim, Moon-Hyeon
    • Journal of Korean Society of Environmental Engineers
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    • v.28 no.4
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    • pp.368-375
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    • 2006
  • Single and complex metal oxide catalysts supported onto a commercial DT51D $TiO_2$ have been investigated for gas-phase TCE oxidation in a continuous flow type fixed-bed reaction system to develop a better design approach to catalysts for this reaction. Among the $TiO_2$-supported single metal oxides used, i.e., $CrO_x,\;FeO_x,\;MnO_x,\;LaO_x,\;CoO_x,\;NiO_x,\;CeO_x\;and\;CuO_x$, with the respective metal contents of 5 wt.%, the $CrO_x/TiO_2$ catalyst was shown to be most active for the oxidative TCE decomposition, depending significantly on amounts of $CrO_x\;on\;TiO_2$. The use of high $CrO_x$ loadings greater than 10 wt.% caused lower activity in the catalytic TCE oxidation, which is probably due to production of $Cr_2O_3$ crystallites on the surface of $TiO_2$. $CrO_x/TiO_2$-supported $CrO_x$-based bimetallic oxide catalysts were of particular interest in removal efficiency for this TCE oxidation reaction at reaction temperatures above $200^{\circ}C$, compared to that obtained with $CrO_x$-free complex metal oxides and a 10 wt.% $CrO_x/TiO_2$ catalyst. Catalytic activity of 5 wt.% $CrO_x-5$ wt.% $LaO_x$ in the removal reaction was similar to or slightly higher than that acquired for the $CrO_x$-only catalyst. Similar observation was revealed for 5 wt.% $CrO_x$-based bimetallic oxides consisting of either 5 wt.% $MnO_x,\;CoO_x,\;NiO_x\;or\;FeO_x$. These results represent that such $CrO_x$-based bimetallic systems for the catalytic TCE oxidation on significantly minimize the usage of $CrO_x$ that is well known to be one of very toxic heavy metals, and offer a very useful technique to design new type catalysts for reducing chlorinated volatile organic substances.

Nitridation Behavior of Kaolin with Reduced Alumina Content Obtained by Acid Treatment (산처리에 의하여 알루미나 함량을 줄인 카올린의 질화거동)

  • 배원태;정원도;조철구
    • Journal of the Korean Ceramic Society
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    • v.29 no.5
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    • pp.347-356
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    • 1992
  • Various kaolin samples with different alumina content were prepared from calcined admixture of kaolin and ammonium sulfate by varying the treatment time in sulfuric acid. Samples were nitridated under N2 or N2-H2 atmosphere with changing the amount of added carbon, the reaction time and temperature. As the alumina content lowered, the size of kaolin particles decreased and the specific surface area increased. XRD analysis indicated that ${\alpha}$-quartz remained by decomposition of halloysite and meta-halloysite. Experimental results of nitridation behavior are summerized as follows; 1) Nitridation under N2 atmosphere. With the increase of C/SiO2 ratio and with the decrease of Al2O3 content, disappearance of XRD pattern peaks of mullite, ${\alpha}$-quartz and ${\alpha}$-Al2O3 were accelerated at 1300$^{\circ}C$. SiC was the main phase in the reaction product of acid-treated kaolin samples nitridated at 1300$^{\circ}C$ for 10 hours regardless of C/SiO2 ratio. But the XRD peak intensities of ${\beta}$-Si3N4, ${\beta}$-sialon and SiC did not show much difference when untreated raw kaolin was fired at the same condition. When the ratio of C/SiO2 was 3.5, ${\beta}$-sialon and ${\beta}$-Si3N4 existed in the reaction product of about 22% alumina containing kaolin sample fired at 1350$^{\circ}C$ for 7 hours. Only ${\beta}$-sialon existed in the same sample fired at 1400$^{\circ}C$ for 10 hours. ${\beta}$-sialon was obtained from all of the acid-treated kaolin samples fired at 1400$^{\circ}C$ for 40 hours, but AlN and SiC remained in the untreated kaolin sample. Z value of the ${\beta}$-sialon obtained from the 22% alumina containing kaolin sample fired at 1400$^{\circ}C$ for 40 hours was about 1.3(XRD) and 1.5(EDS). 2) Nitridation under 80N2+2OH2 mixed gas atmosphere with the C/SiO2 ratio of 1 Mullite was not found, but ${\alpha}$-Si3N4, and ${\beta}$-sialon were present in the reaction product of about 22% alumina containing kaolin sample fired at 1300$^{\circ}C$ for 10 hours. When untreated kaolin sample was nitridated at the same condition, mullite remained. AlN and SiC were not found in the reaction product of about 22% alumina containing kaolin sample fired at 1350$^{\circ}C$ for 5 hours. On the other hand, AlN and SiC remained in the product of untreated kaolin fired at the same condition.

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Film Properties of MOCVD TiN prepared by TDMAT and TDMAT/$NH_3$ (TDMAT와 TDMAT/$NH_3$ 로 형성한 MOCVD(Metal Organic Chemical Vapor Deposition) Titanium Nitride 박막의 특성)

  • Baek, Su-Hyeon;Kim, Jang-Su;Park, Sang-Uk;Won, Seok-Jun;Jang, Yeong-Hak;O, Jae-Eung;Lee, Hyeon-Deok;Lee, Sang-In;Choe, Jin-Seok
    • Korean Journal of Materials Research
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    • v.5 no.7
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    • pp.775-780
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    • 1995
  • Thin films of titanium nitride are formed using the tetrakis-dimethyl-amino-titanium (TDMAT(Ti[N($CH_3$)$_2$]$_4$)) under various conditions. The formation of TiN films has been obtained from the thermal decomposition of the Ti-precursor and the gas phase reaction between TDMAT and ammonia(NH$_3$). The resistivity of the MOCVD film can be attributed to their impurity. Especially the curve fitting graph of XPS data is revealed that main impurities in the films as carbon and oxygen make various interstitial compounds which has influenced physical and electrical properties of the film. In the contact hole with the aspect ratio of 3:1 and the diameter of 0.5${\mu}{\textrm}{m}$, the SEM morphology shows that the step coverage is more decreased in the films formed y flowing ammonia additionally than the films formed by pyrolysis of TDMAT and the phenomenon is probably related with the activation energy.

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Photocatalysis of Sub-ppm-level Isopropyl Alcohol by Plug-flow Reactor Coated with Nonmetal Elements Irradiated with Visible Light

  • Jo, Wan-Kuen
    • Clean Technology
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    • v.18 no.4
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    • pp.419-425
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    • 2012
  • This work explored the characteristics and the photocatalytic activities of S element-doped $TiO_2$ (S-$TiO_2$) and N element-doped $TiO_2$ (N-$TiO_2$) for the decomposition of gas-phase isopropyl alcohol (IPA) at sub-ppm concentrations, using a plug-flow reactor irradiated by 8-W daylight lamp or visible light-emitting-diodes (LEDs). In addition, the generation yield of acetone during photocatalytic processes for IPA at sub-ppm levels was examined. The surface characteristics of prepared S- and N-$TiO_2$ photocatalysts were analyzed to indicate that they could be effectively activated by visible-light irradiation. Regarding both types of photocatalysts, the cleaning efficiency of IPA increased as the air flow rate (AFR) was decreased. The average cleaning efficiency determined via the S-$TiO_2$ system for the AFR of 2.0 L $min^{-1}$ was 39%, whereas it was close to 100% for the AFR of 0.1 L $min^{-1}$. Regarding the N-$TiO_2$ system, the average cleaning efficiency for the AFR of 2.0 L $min^{-1}$ was above 90%, whereas it was still close to 100% for the AFR of 0.1 L $min^{-1}$. In contrast to the cleaning efficiencies of IPA, both types of photocatalysts revealed a decreasing trend in the generation yields of acetone with decreasing the AFR. Consequently, the N-$TiO_2$ system was preferred for cleaning of sub-ppm IPA to S-$TiO_2$ system and should be operated under low AFR conditions to minimize the acetone generation. In addition, 8-W daylight lamp exhibited higher cleaning efficiency of IPA than for visible LEDs.

Oxidation Behavior of the HVOF-sprayed $\textrm{Cr}_{3}\textrm{C}_{2}$-NiCr Coating Layer (HVOF 용사된 $\textrm{Cr}_{3}\textrm{C}_{2}$-NiCr 용사층의 산화 거동)

  • Kim, Byeong-Hui;Seo, Dong-Su
    • Korean Journal of Materials Research
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    • v.8 no.8
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    • pp.757-765
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    • 1998
  • This study was performed to investigate the influence of fuel/oxygen ratio (F/O= 3.2, 3.0, 2.8) on the oxidation behavior of two kinds of (20wt%NiCr claded $\textrm{Cr}_{3}\textrm{C}_{2}$, and 7wt%NiCr mixed $\textrm{Cr}_{3}\textrm{C}_{2}$) composite powder with different manufacturing method. The results show that the oxidation behavior between the 20wt% NiCr claded $\textrm{Cr}_{3}\textrm{C}_{2}$ and 7wt% NiCr mixed $\textrm{Cr}_{3}\textrm{C}_{2}$ coating was widely different. The surface morphology of the coating composed of 7wt% NiCr mixed $\textrm{Cr}_{3}\textrm{C}_{2}$ was changed to porous with F/O ratio by the aggressive evolution of gas phases($\textrm{CO}_2$, CO and $\textrm{CrO}_3$) and the oxide cluster composed of Ni and Cr were grown after oxidation at $1000^{\circ}C$ for 50 hours. But the surface morphology of the coating composed of 20wt% NiCr claded $\textrm{Cr}_{3}\textrm{C}_{2}$ was not changed to porous after oxidation at $1000^{\circ}C$ for 50 hours. Therefore, the reason for high oxidation rate is due to activation of $\textrm{Cr}_{3}\textrm{C}_{2}$ to oxidation by entrapped oxygen gases within coating layer, and to closely relate with the decomposition of $\textrm{Cr}_{3}\textrm{C}_{2}$ to $\textrm{Cr}_{7}\textrm{C}_{3}$ phase. Accordingly, On the evidence of these results, the study about the oxidation behavoir of the HVOF sprayed $\textrm{Cr}_{3}\textrm{C}_{2}$ coating depending on hydrogen flow rate must be done.

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Effect of Crop Yield and Soil Physical Properties to Application of Organic Resources in Upland (밭 토양에서 유기물 자원의 시용이 작물 수량 및 토양 물리성에 미치는 영향)

  • Han, Kyunghwa;Jung, Kangho;Cho, Heerae;Lee, Hyubsung;Ok, Junghun;Zhang, Yongseon;Kim, Gisun;Seo, Youngho
    • Journal of the Korea Organic Resources Recycling Association
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    • v.25 no.4
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    • pp.15-22
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    • 2017
  • Application of organic resources to agricultural land can increase crop yield by improving soil characteristics. The objective of this study was to evaluate effect of crop yield and soil physical properties including aggregate stability to application of organic resources in upland. The soybean was cultivated in a sandy loam field and a clay loam field located at Suwon and a sandy loam field located at Pyeongchang. The organic resources used in this study were rice straw compost (RSC), composted pig manure with sawdust (CPIG), composted poultry manure with sawdust (CPM), and cocopeat applied before sowing crop. Application rate of organic resources was determined based on carbon content and water content. The inorganic fertilizers were applied based on soil testing. In addition, the decomposition of RSC, CPIG, and cocopeat was characterized by isothermal incubation with sandy loam soil. The decomposition rate was highest for RSC followed by CPIG and cocopeat. Organic resource application increased yield of soybean, which effect was greater in clay loam than in sandy loam. In addition, increase in gas phase proportion by organic resource application was distinct in clay loam soil compared with sandy loam soil. In terms of aggregate stability, increasing effect was more obvious in sandy loam soils than in a clay loam soil. The highest yield was observed in RSC treatment plots for all the fields. Improvement of soybean yield and soil physical characteristics by cocopeat was not as much as that of the other organic resources. The results implied that RSC could be recommended for promoting aggregate stability and crop yield in upland cultivation.

Perfluoropolymer Membranes of Tetrafluoroethylene and 2,2,4Trifluofo- 5Trifluorometoxy- 1,3Dioxole.

  • Arcella, V.;Colaianna, P.;Brinati, G.;Gordano, A.;Clarizia, G.;Tocci, E.;Drioli, E.
    • Proceedings of the Membrane Society of Korea Conference
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    • 1999.07a
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    • pp.39-42
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    • 1999
  • Perfluoropolymers represent the ultimate resistance to hostile chemical environments and high service temperature, attributed to the presence of fluorine in the polymer backbone, i.e. to the high bond energy of C-F and C-C bonds of fluorocarbons. Copolymers of Tetrafluoroethylene (TEE) and 2, 2, 4Trifluoro-5Trifluorometoxy- 1, 3Dioxole (TTD), commercially known as HYFLON AD, are amorphous perfluoropolymers with glass transition temperature (Tg)higher than room temperature, showing a thermal decomposition temperature exceeding 40$0^{\circ}C$. These polymer systems are highly soluble in fluorinated solvents, with low solution viscosities. This property allows the preparation of self-supported and composite membranes with desired membrane thickness. Symmetric and asymmetric perfluoropolymer membranes, made with HYFLON AD, have been prepared and evaluated. Porous and not porous symmetric membranes have been obtained by solvent evaporation with various processing conditions. Asymmetric membranes have been prepared by th wet phase inversion method. Measure of contact angle to distilled water have been carried out. Figure 1 compares experimental results with those of other commercial membranes. Contact angles of about 120$^{\circ}$for our amorphous perfluoropolymer membranes demonstrate that they posses a high hydrophobic character. Measure of contact angles to hexandecane have been also carried out to evaluate the organophobic character. Rsults are reported in Figure 2. The observed strong organophobicity leads to excellent fouling resistance and inertness. Porous membranes with pore size between 30 and 80 nanometers have shown no permeation to water at pressures as high as 10 bars. However high permeation to gases, such as O2, N2 and CO2, and no selectivities were observed. Considering the porous structure of the membrane, this behavior was expected. In consideration of the above properties, possible useful uses in th field of gas- liquid separations are envisaged for these membranes. A particularly promising application is in the field of membrane contactors, equipments in which membranes are used to improve mass transfer coefficients in respect to traditional extraction and absorption processes. Gas permeation properties have been evaluated for asymmetric membranes and composite symmetric ones. Experimental permselectivity values, obtained at different pressure differences, to various single gases are reported in Tab. 1, 2 and 3. Experimental data have been compared with literature data obtained with membranes made with different amorphous perfluoropolymer systems, such as copolymers of Perfluoro2, 2dimethyl dioxole (PDD) and Tetrafluorethylene, commercialized by the Du Pont Company with the trade name of Teflon AF. An interesting linear relationship between permeability and the glass transition temperature of the polymer constituting the membrane has been observed. Results are descussed in terms of polymer chain structure, which affects the presence of voids at molecular scale and their size distribution. Molecular Dyanmics studies are in progress in order to support the understanding of these results. A modified Theodoru- Suter method provided by the Amorphous Cell module of InsightII/Discover was used to determine the chain packing. A completely amorphous polymer box of about 3.5 nm was considered. Last but not least the use of amorphous perfluoropolymer membranes appears to be ideal when separation processes have to be performed in hostile environments, i.e. high temperatures and aggressive non-aqueous media, such as chemicals and solvents. In these cases Hyflon AD membranes can exploit the outstanding resistance of perfluoropolymers.

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