• 제목/요약/키워드: gas film

검색결과 2,504건 처리시간 0.028초

Analysis of Electron Transport Coefficients in Binary Mixtures of TEOS Gas with Kr, Xe, He and Ne Gases for Using in Plasma Assisted Thin-film Deposition

  • Tuan, Do Anh
    • Journal of Electrical Engineering and Technology
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    • 제11권2호
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    • pp.455-462
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    • 2016
  • The electron transport coefficients in not only pure atoms and molecules but also in the binary gas mixtures are necessary, especially on understanding quantitatively plasma phenomena and ionized gases. Electron transport coefficients (electron drift velocity, density-normalized longitudinal diffusion coefficient, and density-normalized effective ionization coefficient) in binary mixtures of TEOS gas with buffer gases such as Kr, Xe, He, and Ne gases, therefore, was analyzed and calculated by a two-term approximation of the Boltzmann equation in the E/N range (ratio of the electric field E to the neutral number density N) of 0.1 - 1000 Td (1 Td = 10−17 V.cm2). These binary gas mixtures can be considered to use as the silicon sources in many industrial applications depending on mixture ratio and particular application of gas, especially on plasma assisted thin-film deposition.

고감도 에탄올 가스 센서 (High sensitivity ethanol gas sensors)

  • 최동한
    • 센서학회지
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    • 제16권5호
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    • pp.355-360
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    • 2007
  • Highly sensitive thick film ethanol gas sensors based on a nanocrystalline $In_{2}O_{3}$ were fabricated by painting method on alumina substrates. The crystal structure of the $In_{2}O_{3}$ powder was characterised by XRD analysis. The microstructure of the films were characterised using FE-SEM. The experimental results of the ethanol gas sensing characteristics indicated that the undoped $In_{2}O_{3}$ thick film has a high sensitivity. The sensitivity of the film heat treated at $400^{\circ}C$ for 2 hrs. was as high as 32.73 at an operating temperature of $200^{\circ}C$ to 1000 ppm ethanol gas in air.

기판 종류에 따른 박막형 SnO2 가스 센서의 응답특성 (Effects of Substrate on the Characteristics of SnO2 Thin Film Gas Sensors)

  • 김선훈;박신철;김진혁;문종하;이병택
    • 한국재료학회지
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    • 제13권2호
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    • pp.111-114
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    • 2003
  • Effects of substrate materials on the microstructure and the sensitivity of $SnO_2$thin film gas sensors have been studied. Various substrates were studied, such as oxidized silicon, sapphire, polished alumina, and unpolished alumina. It was observed that strong correlation exists between the electrical resistance and the CO gas sensitivity of the manufactured sensors and the surface roughness of $SnO_2$thin films, which in turn was related to the surface roughness of the original substrates. X$SnO_2$thin film gas sensor on unpolished alumina with the highest surface roughness showed the highest initial resistance and CO gas sensitivity. The transmission electron microscopy observation indicated that shape and size of the columnar microstructure of the thin films were not critically affected by the type of substrates.

박막 형 가스 센서에 있어서 가스 감지 속도에 대한 막 두께의 영향 (Effect of Film Thickness on Gas Sensing Behavior of Thin-Film-Type Gas Sensor)

  • 유도준;준 타마키;노리오 미우라;노보루 야마조에;박순자
    • 한국재료학회지
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    • 제6권7호
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    • pp.716-722
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    • 1996
  • 박막 형 가스 센서의 막 두께가 가스 감지 특성에 미치는 영향을 단순화된 모델로부터 수식으로 유도하여 해석하였고, 그것을 ${SnO}_{2}$와 CuO-${SnO}_{2}$ 박막의 ${H}_{2}S$ 감응 특성에 대한 실험 결과에 적용하였다. 유도된 수식으로부터 박막 가스 센서의 가스 감지 특성은 가스의 박막 안으로의 확산성에 크게 의존하며, 그 가스 확산성은 박막의 두께, 가스의 센서 재료의 반응성, 작동 온도 등에 의해서 결정됨을 알 수 있었다. 또한 이 수식은 CuO-${SnO}_{2}$ 박막의 ${H}_{2}S$ 감응 특성에 대한 실험 결과와 비교적 잘 일치하였고, CuO-${SnO}_{2}$ 박막과 ${SnO}_{2}$ 박막의 서로 판이한 ${H}_{2}S$ 감응 특성에 대한 설명에 적용되었다. 이로부터, 일반적인 산화물 반도체식 가스 센서의 가스 감지 특성이 가스 확산성에 의해서 어떻게 지배되는가를 구체적으로 제안하였다.

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EHV Gas VT용 PET Film 절연파괴에 미치는 열처리 영향 (A Heat Treatment effect on Breakdown of PET Film for EHV Gas VT)

  • 김정달;박재윤;김종달;정장근;김종석;하현진
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 영호남학술대회 논문집
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    • pp.212-215
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    • 2000
  • This paper presents the temperature effect of PET Film for insulation EHV Gas VT. We measured the Breakdown Voltage (BDV) and the Partial Discharge Initial Voltage(PDIV) for fresh and heated PET film. In this results, The BDV and PDIV of PET Film was affected by temperature variation and the number of PET Film. The PDIV and BDV of PET Film slightly increased for heating treatment increased as the temperature is increased. however, decreased over about $150^{\circ}C$.

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The Effect of Non-condensable Gas on Direct Contact Condensation of Steam/Air Mixture

  • Lee, Hanchoon;Kim, Moohwan;Park, Suki
    • Nuclear Engineering and Technology
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    • 제33권6호
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    • pp.585-595
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    • 2001
  • A series of experiments have been carried out to investigate the effects of non-condensable gas on the direct contact film condensation of vapor mixture under an adiabatic wall condition. The average heat transfer coefficient of the direct contact condensation was obtained at the atmospheric pressure with four main parameters ; air-mass fraction, mixture velocity, film Reynolds number, and the degree of water film subcooling having an influence on the condensation heat transfer coefficient. With the analysis of 88 experiments, a correlation of the average Nusselt number for direct contact film condensation of steam/air mixture at an adiabatic vertical wall was proposed as functions of film Reynolds number, mixture Reynolds number, air mass fraction, and Jacob number. The average heat transfer coefficient for steam/air mixture condensation decreased significantly while air mass fraction increased. The average heat transfer coefficients also decreased as the Jacob number increased, and were scarcely affected by the film Reynolds number below a mixture Reynolds number of about 245,000.

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탄소의 원료로 일산화탄소를 사용한 다이아몬드 박막 성장 관찰에 대한 분광 Ellipsometry의 응용 (The Spectroscopic Ellipsometry Application to the Diamond Thin Film Growth Using Carbon Monoxide(CO) as a Carbon Source)

  • 홍병유
    • 한국전기전자재료학회논문지
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    • 제11권5호
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    • pp.371-377
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    • 1998
  • The plasma chemical vapor deposition is one of the most utilized techniques for the diamond growth. As the applications of diamond thin films prepared by plasma chemical vapor deposition(CVD) techniques become more demanding, improved fine-tuning and control of the process are required. The important parameters in diamond film deposition include the substrate temperature, $CO/H_2$gas flow ratio, total gas pressure, and gas excitation power. With the spectroscopic ellipsometry, the substrate temperature as well as the various parameters of the film can be determined without the physical contact and the destructiveness under the extreme environment associated with the diamond film deposition. Through this paper, the important parameters during the diamond film growth using $CO+H_2$are determined and it is shown that $sp^2$ C in the diamond film is greatly reduced.

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플라즈마 실리콘 OXYNITRIDE막의 구조적 특성에 관한 고찰 (A Study on the Structure Properties of Plasma Silicon Oxynitride Film)

  • 성영권;이철진;최복길
    • 대한전기학회논문지
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    • 제41권5호
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    • pp.483-491
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    • 1992
  • Plasma silicon oxynitride film has been applied as a final passivation layer for semiconductor devices, because it has high resistance to humidity and prevents from alkali ion's penetration, and has low film stress. Structure properties of plasma silicon oxynitride film have been studied experimentally by the use of FT-IR, AES, stress gauge and ellipsometry. In this experiment,Si-N bonds increase as NS12TO/(NS12TO+NHS13T) gas ratio increases. Peaks of Si-N bond, Si-H bond and N-H bond were shifted to high wavenumber according to NS12TO/(NS12TO+NHS13T) gas ratio increase. Absorption peaks of Si-H bond were decreased by furnace anneal at 90$0^{\circ}C$. The atomic composition of film represents that oxygen atoms increase as NS12TO/(NS12TO+NHS13T) gas ratio increases, to the contrary, nitrogen atoms decrease.

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PREPARATION OF HYDROXYAPATITE COATINGS USING R.F. MAGNETRON SPUTTERING

  • Hosoya, Satoru;Sakamoto, Yukihiro;Hashimoto, Kazuaki;Takaya, Matsufumi;Toda, Yoshitomo
    • 한국표면공학회지
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    • 제32권3호
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    • pp.307-311
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    • 1999
  • The well-crystalline hydroxyapatite($Ca_{10}(PO_4)_6(OH)_2$ ; HAp) layer having a biocompatibility was successfully coated onto titanium substrate using a radio-frequency magnetron sputtering, and effects of sputtering gas and the thickness of HAp film on a crystal growth of the HAp layers were investigated. The deposition rate of the layer sputtered with water-vapour gas was slower than that of the layer sputtered with argon gas. The results of X-ray diffraction demonstrated that the about $0.8\mu\textrm{m}$ thick HAp film under water-vapour gas was an amorphous phase, the about $1.2\mu\textrm{m}$ thick film was (100) plane-oriented HAp, and the about $1.5\mu\textrm{m}$ thick film was (001)plane-oriented HAp. FT-IR analysis proved that hydroxyl group of the layer sputtered with argon gas was defected, but that of the layer sputtered with water-vapour gas was not defected. From these results, it was favorable to use water-vapour gas on the HAp coatings onto metal surface.

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아세토나이트릴 가스 검지를 위한 센스의 제작 및 특성 (Characteristics of metal-loaded TiO2/SnO2 thick film gas sensor for detecting acetonitrile)

  • 박영호;이창섭
    • 한국가스학회지
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    • 제13권2호
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    • pp.23-29
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    • 2009
  • Pt, Pd, In 등의 촉매금속을 사용하여 아세토나이트릴 유독가스에 대한 감도를 향상시키는 SnO2 가스센스에 대하여 연구하였다. Metal-SnO2 후막은 백금전극이 내장된 알루미나 지지체의 스크린법으로 제작되었다. 본 센서의 특성은 검출가스의 농도의 함수로 반응기내 각센서의 전기적 저항을 측정하여 조사하였으며, 10-50ppm 범위의 유독가스 농도에 대하여 검지 측정하였다. 그 결과 촉매금속의 종류에 따라 센서에서 반응하는 감도가 각각 다르게 선택성을 갖고 있는 것으로 나타났다.

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