Journal of the Korean institute of surface engineering (한국표면공학회지)

The Korean Institute of Surface Engineering (한국표면공학회)
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PREPARATION OF HYDROXYAPATITE COATINGS USING R.F. MAGNETRON SPUTTERING

  • Hosoya, Satoru (Graduate school, Chiba Institute of Technology) ;
  • Sakamoto, Yukihiro (Department of Precision Engineering, Chiba Institute of Technology) ;
  • Hashimoto, Kazuaki (Department of Industrial Chemistry, Chiba Institute of Technology) ;
  • Takaya, Matsufumi (Department of Precision Engineering, Chiba Institute of Technology) ;
  • Toda, Yoshitomo (Department of Industrial Chemistry, Chiba Institute of Technology)
  • Published : 1999.06.01
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Abstract

The well-crystalline hydroxyapatite($Ca_{10}(PO_4)_6(OH)_2$ ; HAp) layer having a biocompatibility was successfully coated onto titanium substrate using a radio-frequency magnetron sputtering, and effects of sputtering gas and the thickness of HAp film on a crystal growth of the HAp layers were investigated. The deposition rate of the layer sputtered with water-vapour gas was slower than that of the layer sputtered with argon gas. The results of X-ray diffraction demonstrated that the about $0.8\mu\textrm{m}$ thick HAp film under water-vapour gas was an amorphous phase, the about $1.2\mu\textrm{m}$ thick film was (100) plane-oriented HAp, and the about $1.5\mu\textrm{m}$ thick film was (001)plane-oriented HAp. FT-IR analysis proved that hydroxyl group of the layer sputtered with argon gas was defected, but that of the layer sputtered with water-vapour gas was not defected. From these results, it was favorable to use water-vapour gas on the HAp coatings onto metal surface.

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