• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.26 no.7
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• pp.92-98
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• 2012

It is made compulsory to install SPD for the purpose of protecting electric and electronic devices when an abnormal voltage such as lightning occurs to power line using power frequency of 60Hz. Recently, the high speed communication technology utilizing power line is receiving attention again as a communication technology for smart grid. The SPD influences the performances of power line communication when using SPD and power line communication system together. In order to improve the performance of power line communication, a proposed scheme for series connection of gas discharge tube to ZnO varistor was presented. This paper measured the impacts of series connection of GDT to SPD using ZnO varistor on the limit voltage of Class III SPD. This paper also presented the DC operating voltage of GDT which satisfies the limit voltage of power line communication system and SPD simultaneously.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.12a
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• pp.43-47
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• 2006

In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma (ICP). As results at several dependences of 20~100mTorr Xenon pressure, the brightness of discharge tube was higher (4,900 $cd/m^2$) than other conditions when Xe pressure was 20mTorr and RF power was 200W. In that case, the electron temperature and density were 3.58eV and $3.56{\times}10^{12}cm^2$, respectively. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

• Journal of the Korean Institute of Illuminating and Electrical Installation Engineers
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• v.16 no.6
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• pp.130-136
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• 2002

A novel ozonizer has been developed using a high frequency surface discharge and a high purity Ti-Si-Al ceramic catalyst as its dielectric component. A cylindrical thin compound ceramic catalyst in reactor is adhered to inside of the film-like outside electrode. And, when experiment condition are oxygen gas temperature of 20 ［$^{\circ}C$］, inner reactor pressure of 1.6 atm 600［Hz］ and flow late of 2［l/min］. the ozonizer can easily produce ozone concentration(50～60［g/㎥］for oxygen) and power efficiency(180［g/kWh］for oxygen) without using a special enrichment means. At 2［l/min］, 20［$^{\circ}C$］, 1.6［atm］, 600［Hz］and 40［W］, the result of simulation to gas temperature of reactor using general code Phoenics, the maximum temperature of reactor was 132［$^{\circ}C$］in reactor. Ant the result electric field simulation of Ti-Si-Al type reactor using general code Flux 2D, maximum electric field was 0.131E.08［V/m］.

• 연구논문집
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• s.33
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• pp.99-109
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• 2003

Recently the utilization of the ozone dissolved de-ionized water(DIW-$O_3$) in semiconductor wet cleaning process and photoresist stripping process to replace the conventional sulfuric acid and hydro peroxide mixture(SPM) method has been studied. In this paper, we propose the water-electrode type ozone generator which has the characteristics of the high concentration and purity to produce the high concentration DIW-$O_3$ for the photoresist strip process in the semiconductor fabrication. The proposed ozone generator has the dual dielectric tube structure of silent discharge type and the water is both used to electrode and cooling water. Through this study, we obtained the results of the 10.3 wt% of ozone gas concentration at the oxygen gas of 0.5 [liter/min.] and the DIW-$O_3$ concentration of 79.5 ppm.. Through the photoresist stripping test using the produced DIW-$O_3$, we confirmed that the photoresist coated on the silicon wafer was removed effectively in the 12 minutes.

• Journal of Korean Society of Environmental Engineers
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• v.34 no.7
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• pp.459-466
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• 2012

In order to improved treatment performance of dielectric barrier discharge (DBD) plasma, plasm + UV process and gas-liquid mixing method has been investigated. This study investigated the degradation of N, N-Dimethyl-4-nitrosoaniline (RNO, indicator of the generation of OH radical). The basic DBD plasma reactor of this study consisted of a plasma reactor (consist of quartz dielectric tube, titanium discharge (inner) and ground (outer) electrode), air and power supply system. Improvement of plasma reactor was done by the combined basic plasma reactor with the UV process, adapt of gas-liquid mixer. The effect of UV power of plasma + UV process (0~10 W), gas-liquid mixing existence and type of mixer, air flow rate (1~6 L/min), range of diffuser pore size (16~$160{\mu}m$), water circulation rate (2.8~9.4 L/min) and UV power of improved plasma + UV process (0~10 W) were evaluated. The experimental results showed that RNO degradation of optimum plasma + UV process was 7.36% higher than that of the basic plasma reactor. It was observed that the RNO decomposition of gas-liquid mixing method was higher than that of the plasma + UV process. Performance for RNO degradation with gas-liquid mixing method lie in: gas-liquid mixing type > pump type > basic reactor. RNO degradation of improved reactor which is adapted gas-liquid mixer of diffuser type showed increase of 17.42% removal efficiency. The optimum air flow rate, range of diffuser pore size and water circulation rate for the RNO degradation at improved reactor system were 4 L/min, 40~$100{\mu}m$ and 6.9 L/min, respectively. Synergistic effect of gas-liquid mixing plasma + UV process was found to be insignificant.

• Journal of Environmental Science International
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• v.21 no.7
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• pp.797-804
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• 2012

A dielectric barrier discharge (DBD) plasma reactor was investigated for the inactivation of Ralstonia Solanacearum which causes bacterial wilt in aquiculture. The DBD plasma reactor of this study was divided into power supply unit, gas supply unit and plasma reactor. The plasma reactor consisted of a quartz dielectric tube, discharge electrode (inner) and ground electrode (outer). The experimental results showed that the optimum 1st voltage, 2nd voltage, air flow rate and pH were for 100 V (1st voltage), 15 kV (2nd voltage), 4 L/min, and pH 3, respectively. At a low 1st voltage, shoulder and tailing off phenomena was observed. The shoulder phenomenon was decreased as the increase of 1st voltage. R. Solanacearum disinfection in the lower air flow rate was showed shoulder and tailing off phenomenon because the active species generated less. Under optimum condition, shoulder and tailing off phenomenon was reduced. When the 2nd voltage was less than 7.5 kV, tailing off phenomenon was observed and this was not vanishes even though the increase of the disinfection time. The inactivation efficiency increased as the increase of air flow rate, however, the efficiency decreased when the air flow rate was above 4 L/min. R. Solanacearum disinfection at pH 3 showed somewhat higher than in pH 11. The pH effect of R. Solanacearum deactivation is less than the impact on other factor.

• Analytical Science and Technology
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• v.15 no.6
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• pp.514-520
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• 2002

The electrothermal vaporization (ETV) hollow cathode glow discharge atomic emission spectrometer for analysis of liquid sample has been developed and characterized. This system has improved the sample introduction method of electrothermal vaporization and the hollow cathode glow discharge. The sample introduction method was possible to provide high analyte transport efficiency to the plasma by helix coil made of tungsten material. In addition, small volume samples (<$30{\mu}{\ell}$) could be used. The system has glow discharge cell with special design for improvement of precision. The effect of discharge parameters such as discharge power, gas flow rate has been studied to find optimum condition. The emitted light was effectively carried into detector by fiber optic cable in UV region. The calibration curve of Pb, Cd were obtained with 3 samples.

• Journal of the Korean Vacuum Society
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• v.17 no.6
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• pp.495-500
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• 2008

The amount of vapor mercury for the generation of glow discharge plasma has been calculated in a fine tube fluorescent lamp having a mixed gas of Ne+Ar including a mercury. When the ionization of atom is considered by the collision between neutral atoms (Ne, Ar, Hg) and electrons of energy $kT_e{\sim}1\;eV$, the density of vapor mercury atom has been obtained as $n(Hg){\sim}3.43{\times}10^{22}m^{-3}$ for the plasma density $n_o{\sim}10^{17}m^{-3}$. In the fluorescent lamps of out diameter 4 mm used for $32{\sim}42$-inch LCD-TVs having a mixture gas of Ne(95%)+Ar(5%) with the pressure of 50 Torr, the quantity of vapor mercury for the glow discharge has been caculated as 0.02{\sim}0.08\;mg$.

• Journal of the Semiconductor & Display Technology
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• v.21 no.4
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• pp.106-109
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• 2022

The green-emitting Zn₂SiO₄:Mn²⁺ phosphor film was evaluated in a xenon excimer lamp. The phosphor film with 2 ㎛ thick was formed of monolithic structure on the inner side of quartz through a long-time annealing process of coated ZnO solution doped with Mn²⁺ ion and SiO₂ of quartz tube. The coated quartz was filled with 100 torr of xenon gas, and simultaneously both sides was melt and sealed. The xenon-field quartz tube was discharge by applying the voltage of 15 kV with a frequency of 26 kHz, and emitted the glow with dominant peak at 172 nm. The vacuum ultraviolet excited the inner-side coated Zn₂SiO₄:Mn²⁺ phosphor film, which emitted the pure and strong green light.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.33 no.5
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• pp.367-372
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• 2020

As packaging processes for atomic gyroscope vapor cells, the glass tube tip-off process, anodic bonding, and paste sealing have been widely studied. However, there are stability issues in the alkali metal which are caused by impurity elements and leakage during high-temperature processes. In this study, we investigated the applicability of a vapor cell low-temperature packaging process by depositing Au on a Pyrex cell in addition to forming an Au-Sn thin film on a cap to cover the cell, followed by laser irradiation of the Au/Au-Sn interface. The mechanism of the thin film bonding was evaluated by XRD, while the packaging reliability of an Ne gas-filled vapor cell was characterized by variation of plasma discharge behavior with time. Furthermore, we confirmed that the Rb alkaline metal inside the vapor cell showed no color change, indicating no oxidation occurred during the process.