• Title/Summary/Keyword: flexible beam

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Optimal Design of the Monolithic Flexure Mount for Optical Mirror Using Response Surface Method (반응표면법을 이용한 광학미러용 일체형 유연힌지 마운트 최적설계)

  • Kyoungho Lee;Byounguk Nam;Sungsik Nam
    • Journal of the Korea Institute of Military Science and Technology
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    • v.26 no.3
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    • pp.205-213
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    • 2023
  • An optimal design of a simple beam-shaped flexure hinge mount supporting an optical mirror is presented. An optical mirror assembly is an opto-mechanically coupled system as the optical and mechanical behaviors interact. This side-supporting mount is flexible in the radial direction and rigid for the remaining degrees of freedom to support the mirror without transferring thermal load. Through thermo-elastic, optical and eigenvalue analysis, opto-mechanical performance was predicted to establish the objective functions for optimization. The key design parameters for this flexure are the thickness and length. To find the optimal values of design parameters, response surface analysis was performed using the design of experiment based on nested FCD. Optimal design candidates were derived from the response surface analysis, and the optimal design shape was confirmed through Opto-mechanical performance validation analysis.

Three-key Triple Data Encryption Algorithm of a Cryptosystem Based on Phase-shifting Interferometry

  • Seok Hee Jeon;Sang Keun Gil
    • Current Optics and Photonics
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    • v.7 no.6
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    • pp.673-682
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    • 2023
  • In this paper, a three-key triple data encryption algorithm (TDEA) of a digital cryptosystem based on phase-shifting interferometry is proposed. The encryption for plaintext and the decryption for the ciphertext of a complex digital hologram are performed by three independent keys called a wavelength key k1(λ), a reference distance key k2(dr) and a holographic encryption key k3(x, y), which are represented in the reference beam path of phase-shifting interferometry. The results of numerical simulations show that the minimum wavelength spacing between the neighboring independent wavelength keys is about δλ = 0.007 nm, and the minimum distance between the neighboring reference distance keys is about δdr = 50 nm. For the proposed three-key TDEA, choosing the deviation of the key k1(λ) as δλ = 0.4 nm and the deviation of the key k2(dr) as δdr = 500 nm allows the number of independent keys k1(λ) and k2(dr) to be calculated as N(k1) = 80 for a range of 1,530-1,562 nm and N(dr) = 20,000 for a range of 35-45 mm, respectively. The proposed method provides the feasibility of independent keys with many degrees of freedom, and then these flexible independent keys can provide the cryptosystem with very high security.

New Approaches for Overcoming Current Issues of Plasma Sputtering Process During Organic-electronics Device Fabrication: Plasma Damage Free and Room Temperature Process for High Quality Metal Oxide Thin Film

  • Hong, Mun-Pyo
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.100-101
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    • 2012
  • The plasma damage free and room temperature processedthin film deposition technology is essential for realization of various next generation organic microelectronic devices such as flexible AMOLED display, flexible OLED lighting, and organic photovoltaic cells because characteristics of fragile organic materials in the plasma process and low glass transition temperatures (Tg) of polymer substrate. In case of directly deposition of metal oxide thin films (including transparent conductive oxide (TCO) and amorphous oxide semiconductor (AOS)) on the organic layers, plasma damages against to the organic materials is fatal. This damage is believed to be originated mainly from high energy energetic particles during the sputtering process such as negative oxygen ions, reflected neutrals by reflection of plasma background gas at the target surface, sputtered atoms, bulk plasma ions, and secondary electrons. To solve this problem, we developed the NBAS (Neutral Beam Assisted Sputtering) process as a plasma damage free and room temperature processed sputtering technology. As a result, electro-optical properties of NBAS processed ITO thin film showed resistivity of $4.0{\times}10^{-4}{\Omega}{\cdot}m$ and high transmittance (>90% at 550 nm) with nano- crystalline structure at room temperature process. Furthermore, in the experiment result of directly deposition of TCO top anode on the inverted structure OLED cell, it is verified that NBAS TCO deposition process does not damages to the underlying organic layers. In case of deposition of transparent conductive oxide (TCO) thin film on the plastic polymer substrate, the room temperature processed sputtering coating of high quality TCO thin film is required. During the sputtering process with higher density plasma, the energetic particles contribute self supplying of activation & crystallization energy without any additional heating and post-annealing and forminga high quality TCO thin film. However, negative oxygen ions which generated from sputteringtarget surface by electron attachment are accelerated to high energy by induced cathode self-bias. Thus the high energy negative oxygen ions can lead to critical physical bombardment damages to forming oxide thin film and this effect does not recover in room temperature process without post thermal annealing. To salve the inherent limitation of plasma sputtering, we have been developed the Magnetic Field Shielded Sputtering (MFSS) process as the high quality oxide thin film deposition process at room temperature. The MFSS process is effectively eliminate or suppress the negative oxygen ions bombardment damage by the plasma limiter which composed permanent magnet array. As a result, electro-optical properties of MFSS processed ITO thin film (resistivity $3.9{\times}10^{-4}{\Omega}{\cdot}cm$, transmittance 95% at 550 nm) have approachedthose of a high temperature DC magnetron sputtering (DMS) ITO thin film were. Also, AOS (a-IGZO) TFTs fabricated by MFSS process without higher temperature post annealing showed very comparable electrical performance with those by DMS process with $400^{\circ}C$ post annealing. They are important to note that the bombardment of a negative oxygen ion which is accelerated by dc self-bias during rf sputtering could degrade the electrical performance of ITO electrodes and a-IGZO TFTs. Finally, we found that reduction of damage from the high energy negative oxygen ions bombardment drives improvement of crystalline structure in the ITO thin film and suppression of the sub-gab states in a-IGZO semiconductor thin film. For realization of organic flexible electronic devices based on plastic substrates, gas barrier coatings are required to prevent the permeation of water and oxygen because organic materials are highly susceptible to water and oxygen. In particular, high efficiency flexible AMOLEDs needs an extremely low water vapor transition rate (WVTR) of $1{\times}10^{-6}gm^{-2}day^{-1}$. The key factor in high quality inorganic gas barrier formation for achieving the very low WVTR required (under ${\sim}10^{-6}gm^{-2}day^{-1}$) is the suppression of nano-sized defect sites and gas diffusion pathways among the grain boundaries. For formation of high quality single inorganic gas barrier layer, we developed high density nano-structured Al2O3 single gas barrier layer usinga NBAS process. The NBAS process can continuously change crystalline structures from an amorphous phase to a nano- crystalline phase with various grain sizes in a single inorganic thin film. As a result, the water vapor transmission rates (WVTR) of the NBAS processed $Al_2O_3$ gas barrier film have improved order of magnitude compared with that of conventional $Al_2O_3$ layers made by the RF magnetron sputteringprocess under the same sputtering conditions; the WVTR of the NBAS processed $Al_2O_3$ gas barrier film was about $5{\times}10^{-6}g/m^2/day$ by just single layer.

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InGaZnO active layer 두께에 따른 thin-film transistor 전기적인 영향

  • U, Chang-Ho;Kim, Yeong-Lee;An, Cheol-Hyeon;Kim, Dong-Chan;Gong, Bo-Hyeon;Bae, Yeong-Suk;Seo, Dong-Gyu;Jo, Hyeong-Gyun
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.11a
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    • pp.5-5
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    • 2009
  • Thin-film-transistors (TFTs) that can be prepared at low temperatures have attracted much attention because of the great potential for transparent and flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited due to low field-effect mobility and rapid degradation after exposing to air. Alternative approach is the use of amorphous oxide semiconductors as a channel. Amorphous oxide semiconductors (AOSs) based TFTs showed the fast technological development, because AOS films can be fabricated at room temperature and exhibit the possibility in application like flexible display, electronic paper, and larges solar cells. Among the various AOSs, a-IGZO has lots of advantages because it has high channel mobility, uniform surface roughness and good transparency. [1] The high mobility is attributed to the overlap of spherical s-orbital of the heavy post-transition metal cations. This study demonstrated the effect of the variation in channel thickness from 30nm to 200nm on the TFT device performance. When the thickness was increased, turn-on voltage and subthreshold swing was decreased. The a-IGZO channels and source/drain metals were deposited with shadow mask. The a-IGZO channel layer was deposited on $SiO_2$/p-Si substrates by RF magnetron sputtering, where RF power is 150W. And working pressure is 3m Torr, at $O_2/Ar$ (2/28 sccm) atmosphere. The electrodes were formed with electron-beam evaporated Ti (30 nm) and Au (70 nm) bilayer. Finally, Al (150nm) as a gate metal was thermal-evaporated. TFT devices were heat-treated in a furnace at 250 $^{\circ}C$ and nitrogen atmosphere for 1hour. The electrical properties of the TFTs were measured using a probe-station. The TFT with channel thickness of 150nm exhibits a good subthreshold swing (SS) of 0.72 V/decade and on-off ratio of $1{\times}10^8$. The field effect mobility and threshold voltage were evaluated as 7.2 and 8 V, respectively.

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Carbon strain sensor using Nd: YAG laser Direct Writing (Nd:YAG Laser 직접 각인을 이용한 Carbon 스트레인 센서)

  • Joo, Donghyun;Yoon, Sangwoo;Kim, Joohan;Park, Woo-Tae
    • Journal of the Microelectronics and Packaging Society
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    • v.25 no.1
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    • pp.35-40
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    • 2018
  • Nd:YAG laser was used to carbonize polyimide films to produce carbon films. This is a simple manufacturing process to fabricate low cost sensors. By applying this method, we studied characteristics of flexible and low-cost piezoresistive. Previously, many studies focused on carbonization of polyimide using $CO_2$ laser with wavelength of $10.6{\mu}m$. In this paper, carbonization (carbonization process) was performed on polyimide films using an Nd:YAG laser with a wavelength of $1.064{\mu}m$. In order to increase the resolution, we optimized the laser conditions of the power density ($W/cm^2$) and the beam scan rate. In previous studies using $CO_2$ laser, the minimum line width was $140{\sim}220{\mu}m$ but in this study, carbon line width was reduced to $35{\sim}40{\mu}m$. The initial sheet resistance of the carbon sensor was $100{\sim}300{\Omega}/{\square}$. The resistance decreased by 30% under stretched with a curvature radius of 21 R. The calculated gauge factor was 56.6. This work offers a simple, highly flexible, and low-cost process to fabricate piezoresistive sensors.

Effects of thickness of GIZO active layer on device performance in oxide thin-film-transistors

  • Woo, C.H.;Jang, G.J.;Kim, Y.H.;Kong, B.H.;Cho, H.K.
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.137-137
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    • 2009
  • Thin-film transistors (TFTs) that can be prepared at low temperatures have attracted much attention due to the great potential for flexible electronics. One of the mainstreams in this field is the use of organic semiconductors such as pentacene. But device performance of the organic TFTs is still limited by low field effect mobility or rapidly degraded after exposing to air in many cases. Another approach is amorphous oxide semiconductors. Amorphous oxide semiconductors (AOSs) have exactly attracted considerable attention because AOSs were fabricated at room temperature and used lots of application such as flexible display, electronic paper, large solar cells. Among the various AOSs, a-IGZO was considerable material because it has high mobility and uniform surface and good transparent. The high mobility is attributed to the result of the overlap of spherical s-orbital of the heavy pest-transition metal cations. This study is demonstrated the effect of thickness channel layer from 30nm to 200nm. when the thickness was increased, turn on voltage and subthreshold swing were decreased. a-IGZO TFTs have used a shadow mask to deposit channel and source/drain(S/D). a-IGZO were deposited on SiO2 wafer by rf magnetron sputtering. using power is 150W, working pressure is 3m Torr, and an O2/Ar(2/28 SCCM) atmosphere at room temperature. The electrodes were formed with Electron-beam evaporated Ti(30nm) and Au(70nm) structure. Finally, Al(150nm) as a gate metal was evaporated. TFT devices were heat treated in a furnace at $250^{\circ}C$ in nitrogen atmosphere for an hour. The electrical properties of the TFTs were measured using a probe-station to measure I-V characteristic. TFT whose thickness was 150nm exhibits a good subthreshold swing(S) of 0.72 V/decade and high on-off ratio of 1E+08. Field effect mobility, saturation effect mobility, and threshold voltage were evaluated 7.2, 5.8, 8V respectively.

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Vibration Analysis of SAR Antenna Reflectors During Satellite Maneuver (위성 기동 시 SAR 안테나 반사판에 발생하는 진동 분석)

  • Kim, Tae-Hyun;Kim, Dae-Yeon;Suh, Jong-Eun;Han, Jae-Hung;Lee, Jae-Eun;Jung, Hwa-Young
    • Journal of the Korean Society for Aeronautical & Space Sciences
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    • v.48 no.3
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    • pp.225-231
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    • 2020
  • Recently, there has been an increasing demand for SAR satellite as it can be operated regardless of the weather condition. In general, main reflector of the SAR is formed of multiple deployable panels to increase performance in the constrained payload envelope. By nature, deployable structure lacks structural stiffness and it is vulnerable to external disturbances and excitation. In particular, SAR satellites may have high levels of vibration occurring at the antenna reflecting surface due to higher angular rate requirements. During image capturing it is important to keep high surface accuracy of the reflector for the quality of images. In this research, a performance degradation of deployable SAR antenna due to structural deformation is analyzed. Panels for main reflectors are assumed to be flexible structures and multi-body simulation environment is established. Then, deflection of the panel is calculated while the satellite performs maneuvers. In addition, antenna gain and beam pointing error are analyzed to determine how these deflections affect antenna performance and mission.

Aerodynamic and Aeroelastic Tool for Wind Turbine Applications

  • Viti, Valerio;Coppotelli, Giuliano;De Pompeis, Federico;Marzocca, Pier
    • International Journal of Aeronautical and Space Sciences
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    • v.14 no.1
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    • pp.30-45
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    • 2013
  • The present work focuses on the unsteady aerodynamics and aeroelastic properties of a small-medium sized wind-turbine blade operating under ideal conditions. A tapered/twisted blade representative of commercial blades used in an experiment setup at the National Renewable Energy Laboratory is considered. The aerodynamic loads are computed using Computational Fluid Dynamics (CFD) techniques. For this purpose, FLUENT$^{(R)}$, a commercial finite-volume code that solves the Navier-Stokes and the Reynolds-Averaged Navier-Stokes (RANS) equations, is used. Turbulence effects in the 2D simulations are modeled using the Wilcox k-w model for validation of the CFD approach. For the 3D aerodynamic simulations, in a first approximation, and considering that the intent is to present a methodology and workflow philosophy more than highly accurate turbulent simulations, the unsteady laminar Navier-Stokes equations were used to determine the unsteady loads acting on the blades. Five different blade pitch angles were considered and their aerodynamic performance compared. The structural dynamics of the flexible wind-turbine blade undergoing significant elastic displacements has been described by a nonlinear flap-lag-torsion slender-beam differential model. The aerodynamic quasi-steady forcing terms needed for the aeroelastic governing equations have been predicted through a strip-theory based on a simple 2D model, and the pertinent aerodynamic coefficients and the distribution over the blade span of the induced velocity derived using CFD. The resulting unsteady hub loads are achieved by a first space integration of the aeroelastic equations by applying the Galerkin's approach and by a time integration using a harmonic balance scheme. Comparison among two- and three- dimensional computations for the unsteady aerodynamic load, the flap, lag and torsional deflections, forces and moments are presented in the paper. Results, discussions and pertinent conclusions are outlined.

Fabrication of Resistive Switching Memory based on Solution Processed AlOx - PMMA Blended Thin Film

  • Sin, Jung-Won;Baek, Il-Jin;Jo, Won-Ju
    • Proceedings of the Korean Vacuum Society Conference
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    • 2015.08a
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    • pp.181.1-181.1
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    • 2015
  • 용액 공정을 이용한 Resistive random access memory (ReRAM)은 간단한 공정 과정, 대면적화, 저렴한 가격 등의 장점으로 인해 큰 관심을 받고 있으며, HfOx, TiOx, AlOx 등의 산화물이 ReRAM 절연 막으로 주로 연구되고 있다. 더 나아가 최근에는 organic 물질을 메모리 소자로 사용한 연구가 보고되고 있다. 이는 경제적이며, wearable 또는 flexible system에 적용이 용이하다. 그럼에도 불구하고, organic 물질을 갖는 메모리 소자는 기존의 산화물 소자에 비해 열에 취약하며 전기적인 특성과 신뢰성이 우수하지 못하다는 단점을 가지고 있다. 이를 위한 방안으로 본 연구에서는 AlOx - polymethylmethacrylate (PMMA) blended thin film ReRAM을 제안하였다. 이는 organic물질의 전기적 특성을 개선시킬 뿐 아니라, inorganic 물질을 wearable 소자에 적용했을 때 발생하는 crack과 같은 기계적 물리적 결함을 해결할 수 있는 새로운 방법이다. 먼저, P-type Si 위에 습식산화를 통하여 SiO2 300 nm 성장시킨 기판을 사용하여 electron beam evaporation으로 10 nm의 Ti, 100 nm의 Pt 층을 차례로 증착하였다. 그리고 PMMA 용액과 AlOx 용액을 초음파를 이용하여 혼합한 뒤, 이 용액을 Pt 하부 전극 상에서 spin coating방법으로 1000 rpm 10초, 5000 rpm 30초의 조건으로 증착하였다. Solvent 및 불순물 제거를 위하여 150, 180, $210^{\circ}C$의 온도로 30 분 동안 열처리를 진행하였고, shadow mask를 이용하여 상부 전극인 Ti를 sputtering 방식으로 100 nm 증착하였다. 150, 180, $210^{\circ}C$로 각각 열처리한 AlOx - PMMA blended ReRAM의 전기적 특성은 HP 4156B semiconductor parameter analyzer를 이용하여 측정하였다. 측정 결과 제작된 소자 전부에서 2 V이하의 낮은 동작전압, 안정된 DC endurance (>150cycles), 102 이상의 높은 on/off ratio를 확인하였고, 그 중 $180^{\circ}C$에서 열처리한 ReRAM은 더 높은 on/off ratio를 갖는 것을 확인하였다. 결론적으로 baking 온도를 최적화하였으며 AlOx - PMMA blended film ReRAM의 우수한 메모리 특성을 확인하였다. AlOx-PMMA blended film ReRAM은 organic과 inorganic의 장점을 갖는 wearable 및 system용 비휘발성 메모리소자에 적용이 가능한 경제적인 기술로 판단된다.

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Vibration Control of a Robot Manipulator with a Parallel Drive Mechanism (평행구동방식 로봇 조작기의 진동제어)

  • 최승철;하영균;박영필
    • Transactions of the Korean Society of Mechanical Engineers
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    • v.15 no.6
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    • pp.2015-2025
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    • 1991
  • A long and light-weight forearm of the vertical 2 DOF robot manipulator with a heavy payload driven by parallel drive mechanism is modelled as a Euler-Bernoulli beam with a tip mass subjected to a high speed rotation. Governing equation is obtained by Hamilton's principle and represented as state variable form using the perturbed variables which describe the perturbed errors at the manipulator's final configuration. Digitial optimal control and observer theory are used to suppress the forearm vibration and control the positions of the joint angles with measured/estimated state feedback. Computer simulations and experimental results are obtained and compared each other.