• Proceedings of the Korean Society of Precision Engineering Conference
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• 2006.05a
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• pp.587-588
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• 2006

Drop-on-Demand (DOD) inkjet printing technology, especially piezo-typed, has been paid attention by industries due to its inherent nature of unbeatable material usage and low cost manufacturing cost. Despite of these key advantages over any other competing manufacturing technologies, the primary disadvantage has been considered as its limited capability to produce fine resolution patterns with a commercially available DOD inkjet print head. Although the main effort has been focused on the production of a DOD inkjet print head with smaller nozzles to overcome this challenging issue, an alternative approach could be taken and it would enable to expand the employment of DOD inkjet printing technology to applications requiring fine patterns further more.

• Proceedings of the KSME Conference
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• 2008.11a
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• pp.1806-1809
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• 2008

Study that form micro pattern by direct ink jet printing method is getting attention recently. Direct ink jet printing spout fine droplet including nano metal particle by force or air pressure. There is reason which ink jet printing method is profitable especially in a various micro-patterning technology. It can embody patterns directly without complex process such as mask manufacture or screen-printing for existent lithography. In this study, research of a technology that ejects fine droplet form of Pico liter and forms metal micro pattern was carried with inkjet head of piezoelectricity drive system. Droplet established pattern while ejecting consecutively and move on the surface at the fixed speed. Patterns formed in ink are mixed with organic solvent and polymer that act as binder. So added thermal hardening process after evaporate organic solvent at isothermal after printing. I executed high frequency special quality estimation of CPW transmission line to confirm electrical property of manufactured circuit board. We tried a large area printing to confirm application possibility of an ink jet technology.

• Transactions of the Korean Society of Mechanical Engineers B
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• v.37 no.9
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• pp.873-877
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• 2013

The application of inkjet technology has been broadening from home printers to manufacturing tools. Recently, there have been demands for high-resolution printing, especially in the field of printed electronics applications. To improve upon the conventional inkjet printing patterning method, electrohydrodynamic (EHD) inkjet technology has recently attracted attention because droplets smaller than the nozzle diameter can be ejected and materials with wider viscosity range can be used for jetting. In this study, an EHD jet printing system for fine patterning is presented. To print various patterns based on drop on demand printing, vector and raster printing algorithm are implanted in the printing software. Fine conductive patterns with line width of less than $7{\mu}m$ can be easily achieved via EHD jet using a nozzle with inner diameter of $8{\mu}m$.

• 한국정보디스플레이학회:학술대회논문집
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• 2005.07a
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• pp.797-798
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• 2005

We report a novel structure for a full-color AMOLED (Active Matrix Organic Light Emitting Diode) eliminating the patterning process of a blue emitting layer. The patterning of the three primary colors, RGB, is a key technology in the OLED fabrication process. Conventional full color AMOLED containing RGB layers includes the three opportunities of the defects to make an accurate position and fine resolution using various technologies such as fine metal mask, ink-jet printing and laser-induced transfer system. We can skip the blue patterning step by simply stacking the blue layer as a common layer to the whole active area after pixelizing two primary colors, RG, in the conventional small molecular OLED structure. The red and green pixel showed equivalent performances without any contribution of the blue emission.

• Journal of the Semiconductor & Display Technology
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• v.19 no.1
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• pp.79-84
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• 2020

Unlike a printing process, it is difficult to pattern organic thin films in the longitudinal (coating) direction using a coating process. In this paper, we have investigated the feasibility of patterning organic thin films using needles. To this end, we have slot-coated an aqueous poly(3,4-ethylenedioxythiophene):poly(4-styrenesulfonate) (PEDOT:PSS) solution in the form of a fine stripe or large area and then applied the dual needle; one for discharging the main solvent of the underlying thin film and the other for sucking the dissolved thin film. We have found that the pattern width and depth increase as the moving speed of the plate decreases. However, it is observed that the sidewall slope is very gentle (the length of the slope is of the order of 200 ㎛) due to the fact that the discharged main solvent is widely spread and then isotropic etching occurs. With this scheme, we have also demonstrated that a fine stripe can be obtained by scanning the dual needle closely. To demonstrate its applicability to solution-processable organic light-emitting diodes (OLEDs), we have also fabricated OLED with the patterned PEDOT:PSS stripe and observed the insulation property in the strong light-emitting stripe.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2003.05c
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• pp.116-119
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• 2003

Self-patterning of thin films using photosensitive sol solution has advantages such as simple manufacturing process compared to photoresist/dry etching process. In this study, ferroelectric $Sr_{0.9}Bi_{2.1}Ta_2O_9$(SBT) and $La_{0.5}Sr_{0.5}CoO_3$(LSCO)thin films have been prepared by spin coating method using photosensitive sol solution. $Sr(OC_2H5)_2$, $Bi(TMHD)_3$ and $Ta(OC_2H)_5)_5$ were used as starting materials for SBT solution and $La(OCH_2CH_2OCH_3)_3$, $Sr(OC_2H_5)_2$, $CO(OCH_2CH_2OCH_3)_2$ were used for LSCO solution. Solubility difference by UV irradiation on LSCO thin film allows to obtain a fine patterning due to M-O-M bond formation. The lowest resistivity($4{\times}10^{-3}{\Omega}cm$) of LSCO thin films was obtained by annealing at $740^{\circ}C$.

• Proceedings of the Polymer Society of Korea Conference
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• 2006.10a
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• pp.39-40
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• 2006

Lithography and other patterning processes are powerful tools catalyzing many developments in science and engineering. The controlled formation of nanometer scale structures in 2 and 3 dimensions is therefore of increasing importance in many applications ranging from biotechnology to nanotechnology. This presentation will discuss new approaches for the construction of small-scale (a few tens of nm) structures using both 1- and 2-photon processes. Several approaches to fine feature lithography including the use of molecular glasses will be described. Such small scale structures can be used in a variety of biological applications including study of cell function and will be described.

• 한국정보디스플레이학회:학술대회논문집
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• 2002.08a
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• pp.989-993
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• 2002

Barrier ribs in the color plasma display panel(PDP) function to maintain the discharge space between to glass plates as well as to prevent optical crosstalk. Patterning of barrier ribs is one of unique processes for making PDP. In this work photosensitive barrier rib pastes were prepared by incorporating binder polymer, solvent, functional monomers photoinitiator, mid barrier rib powder. Study on the function of materials for the barrier rib paste were undertaken. After optimization of paste formulation, both photolithographic and transparent soft molding method resulted in fine pattern of barrier ribs with high aspect ratio.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.48 no.6
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• pp.7-14
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• 2011

This paper is related to a roll-type micro-contact printing process. The proper parameters such as coating velocity, inking velocity, printing velocity and printing pressure as well as Ag contents of Ag ink were extracted to perform the fine patterning of Ag electrodes. Additionally we developed a process for PDMS with high uniform thickness. Finally, we obtained the Ag fine electrodes on $4.5cm\;{\times}\;4.5cm$ plastic substrate with the line width of 10 um, thickness less than 300 nm, surface roughness less than 40 nm, and the specific resistance of $2.08\;{\times}\;10^{-5}{\Omega}{\cdot}cm$.

• Journal of the Semiconductor & Display Technology
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• v.10 no.4
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• pp.65-70
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• 2011

These days, printed electronics attract attention from electronics industry. In this paper, the fabrication of the fine patterns by Near Field Electro Spinning (NFES) was studied by using Ag ink on silicon wafer (substrate). Two types of ink, the high viscous ink Ag-200 and low viscous ink Ag-15, were used. The fine and uniform patterns were easily fabricated by using Ag-200 because jet breakup is less occurred in high viscosity solution. As increasing flow rate of solution, aspect ratio of Ag pattern decreased. And there was optimum applied voltage for fine pattern. In case of Ag-200, the optimum applied voltage was about 2.02KV. When pattern was fabricated by NFES, the pattern width and height were affected by many factors such as viscosity, flow rate of solution, applied voltage etc.