• 제목/요약/키워드: fine line

검색결과 459건 처리시간 0.035초

Oxidative Line Width Reduction of Imprinted Nanopatterns

  • Park, Dae Keun;Kang, Aeyeon;Jeong, Mira;Lee, Jaejong;Yun, Wan Soo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.650-650
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    • 2013
  • Although imprinted nanopatterns of organic polymer can be modified by the heat treatment [1], it generally requires high process temperatures and is material-dependent since the heat-induced mass loss of the organic polymer is greatly affected by its chemical characteristics. When oxygen is added during the annealing process, one can reduce the process temperature as well as the dependence of the materials. With the oxygen, line width reduction of a polymer (SU-8) patterns could be accomplished at temperature of as low as $250^{\circ}C$ which was not possible in the heat only process. This oxidative line width reduction can be dramatically promoted with the introduction of oxygen plasma. The oxygen plasma, with its highly-reactive oxygen species, vigorously etches away the organic materials, proven to be extremely effective line with reduction method. It is, however, very hard to control the extent and homogeneity of the etching, particularly of very fine patterns. Here, we report an effective and reliable line width reduction method of imprinted nanopatterns by combined plasma and heat treatment. The merits of this process include the reduction of process temperature, time and material-dependence.

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무기고분자의 나노임프린트법에 의한 세라믹 선형 패턴의 제조 (Fabrication of Ceramic Line Pattern by UV-Nanoimprint Lithography of Inorganic Polymers)

  • 박준홍;팜안뚜앙;이재종;김동표
    • 폴리머
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    • 제30권5호
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    • pp.407-411
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    • 2006
  • 액상의 고분자 전구체 polyvinylsilazane (PVS) 혹은 allylhydridopolycarbosilane(AHPCS)를 실리콘 기판 위에 스핀 코팅한 다음, DVD 마스터로부터 제조된 polydimethylsiloxane(PDMS) 몰드를 이용한 자외선 나노임프린트법으로 나노 크기의 고분자 패턴을 제조하였다. 나아가 질소 분위기하에서 $800^{\circ}C$ 열처리함으로써 각각 SiCN, SiC 세라믹 패턴도 제조하였다. 가교된 고분자와 세라믹 패턴의 폭과 넓이를 원자힘현미경(AFM)과 주사전자현미경(SEM)으로 관측한 결과 PVS와 AHPCS의 패턴 높이는 각각 38.5%와 24.1%, 패턴 폭은 18.8%와 16.7%의 수축률을 나타내었다. 즉 전구체의 세라믹 수율이 높을수록 세라믹 패턴 수축률은 낮아졌고, 패턴과 기판과의 접착에 의한 수축억제로 이방성 수축현상도 관찰되었다. 본 연구결과는 새로운 세라믹 MEMS 소자제작공정으로서 나노임프린트법의 가능성과 수축률 제어 연구가 필요함을 제시하고 있다.

PTFE membrane이 코팅된 여과백의 off-line 탈진시 미세먼지 집진 특성 (Filtration Characteristics of Paticulate Matter at Bag Filters Coated with PTFE Membrane During Off-Line Pulsing)

  • 김정훈;문일식;황민영;김량균;고대권
    • 대한환경공학회지
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    • 제39권7호
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    • pp.391-402
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    • 2017
  • 근래에 미세먼지가 대기환경 관련하여 이슈가 되고 있으며, 초미세먼지의 효과적인 집진을 위하여 대용량화가 용이한 여과집진기가 상업적으로 사용될 수 있는지에 대한 평가가 필요하다. 실험실 규모의 여과집진 장치를 제작하여, PTFE 재질의 부직포 여과백 또는 PTFE membrane이 코팅된 PTFE 재질의 부직포 여과백에서의 미세먼지 집진특성을 파악하기 위하여 집진실험을 수행하였다. 실험 변수로 여과속도, 투입 먼지 농도, 입도분포가 다른 먼지 종류 등을 사용한 실험에서, 여과속도가 낮을수록, 먼지 투입농도가 높을수록, 평균입도가 클수록 집진효율이 높았으며, 여과속도가 높고, 먼지 투입농도가 높을수록 압력손실이 높게 나타났다. Pore size가 상대적으로 작은 PTFE membrane이 코팅된 여과백을 사용한 경우, 코팅이 되지 않은 여과백을 사용한 경우에 비하여 집진효율이 높고, 표면여과에 따른 포집 먼지층 저항계수가 낮아져 압력손실이 낮게 나타났다. PTFE membrane이 코팅된 여과백을 사용하여 off-line 탈진을 수행할 경우, 적정 여과속도 범위 내에서 $PM_{2.5}$에 대한 집진효율이 99.99% 이상으로 매우 높게 유지됨에 따라, 여과집진기를 사용하여 초미세먼지를 효과적으로 집진할 수 있음을 확인하였다.

Design and Fabrication of Reflective Array Type Wideband SAW Dispersive Delay Line

  • Choi Jun-Ho;Yang Jong-Won;Nah Sun-Phil;Jang Won
    • Journal of electromagnetic engineering and science
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    • 제6권2호
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    • pp.110-116
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    • 2006
  • A reflective array type surface acoustic wave(SAW) dispersive delay line(DDL) with high time-bandwidth at the V/UHF-band is designed and fabricated for compressive receiver applications. This type of the SAW DDL has the properties of the relative bandwidth of 20 %, the time delay of 49.89 usec, the insertion loss of 38.5 dB and the side lobe rejection of 39 dB. In comparison with a commercial SAW DDL, the insertion loss, amplitude ripple and side lobe rejection are improved by $1.5dB{\pm}0.6dB$ and 4 dB respectively. Using the fabricated SAW DDL, the prototype of the compressive receiver is developed. It is composed of RF converter, fast tunable LO, chirp LO, A/D converter, signal processing unit and control unit. This prototype system shows a fine frequency resolution of below 30 kHz with high scan rate.

Auto-patterned Ag signal line by solution-processed printing on zone-defined surface.

  • Kim, Jae-Hyun;Lee, Bo-Hyun;Moon, Tae-Tyoung;Park, Mi-Kyung;Chae, Gee-Sung;Kang, In-Byeong;Chung, In-Jae
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권2호
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    • pp.1774-1777
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    • 2007
  • Ultra-fine Ag line was automatically patterned to the extent of 10 ${\mu}m$ in width by slit coating on the $10^4$ $mm^2$ glass, which was pre-patterned as hydrophobic and hydrophilic zone by using hydrophobic material. The resistivity of Ag film was about $4{\mu}\;{\Omega}{\cdot}cm$.

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라인파이프용 고강도 열연강판의 기계적 성질 (Mechanical Properties of High Strength Hot Strips For Line Pipe Application)

  • 김문수;김준성;강기봉;노광섭
    • 한국소성가공학회:학술대회논문집
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    • 한국소성가공학회 1999년도 제3회 압연심포지엄 논문집 압연기술의 미래개척 (Exploitation of Future Rolling Technologies)
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    • pp.383-389
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    • 1999
  • The purpose of this study was to investigate the effects of alloying and rolling condition on the mechanical properties and to develop high strength line pipe steels with good toughness. Tests were carried out by the laboratory experiments followed by mill trials and mass production. It was found that a small addition of microalloying elements, such as Nb, V with Mo or Ti remarkably increased the strength and toughness of hot strips. The optimum condition of thermomechanical rolling on low carbon microalloyed steel improved the toughness through the formation of a fine and uniform microstructure. Based on this mill trials following the fundamental research, the production technology of line pipe steels, grade X70∼X100 with high toughness, has been established. These grade steels exhibit excellent low temperature toughness (vTs= under -80$^{\circ}C$) and sufficient strength in both the base metal and the ERW seam weld position, respectively.

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Etching-free 공정 적용 Micro filling 미세 패턴 구현 연구 (Study on fine pattern with Micro filling using Etching-free process)

  • 김완규;윤영우;이성의
    • 한국표면공학회:학술대회논문집
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    • 한국표면공학회 2012년도 추계총회 및 학술대회 논문집
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    • pp.72-73
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    • 2012
  • Metal line을 형성하는 방법에는 그라비아 인쇄, 잉크젯 인쇄, photo 공정 후 박막 증착 공정 등을 많이 사용한다. 본 연구에서는 Micro-imprinting 공정과 DFR photo lithography 공정을 통해 음각의 미세한 pattern을 형성한 후 sputtering과 printing을 이용하여 pattern의 filling을 통해 metal line을 구현하는 것을 목표로 하였다. Pattern을 형성한 후 RIE 공정을 통해 기판 표면의 친수성 처리를 하고, SAM 공정을 통해 코팅 막의 소수성 처리를 하였다. Sputtering과 전면 프린팅 및 건조 후 strip 공정을 통해 metal line을 형성하고, 이에 대한 표면 특성과 전기적 특성을 분석하였다.

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인천국제공항철도와 기존 철도의 효율적인 연계방안 (Effective Connecting Methods Between Incheon International Airport Railroad and Existing Railroads)

  • 한우진
    • 한국철도학회:학술대회논문집
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    • 한국철도학회 2002년도 추계학술대회 논문집(I)
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    • pp.253-258
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    • 2002
  • The Incheon International Amort Railroad (IIAR) is the railroad that connects Incheon International Airport, Gimpo Airport and Seoul Station. IIAR is now under construction, and it will be finished to Gimpo Amort by 2006, to Seoul Station by 2008. But IIAR is not only so late to start but also has no discussion about effective connecting methods to existing railroads and fine operation plan. Therefore, after IIAR opens, it is possible for IIAR to lose to limousine bus using highway. So, this paper proposes 4 effective connecting methods for IIAR - (1) Shuttle transport, (2) Short-distance connecting transport (Inside IIAR, Seoul Subway Line 9, 'Han-River line') (3) Mid-distance connecting transport (Jung-ang, Tae-baek, Young-dong line) (4) Long-distance connecting transport (Korean Train express (korean high speed railroad)) These methods can increase the connectivity of IIAR with existing railroads and the competition power of IIAR against highway.

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Oxidative Etching of Imprinted Nanopatterns by Combination of Vacuum Annealing and Plasma Treatment

  • Park, Dae Keun;Kang, Aeyeon;Jeong, Mira;Lee, Jae-Jong;Yun, Wan Soo
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.251.1-251.1
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    • 2013
  • Combination of oxidative vacuum annealing and oxygen plasma treatment can serve as a simple and efficient method of line-width modification of imprinted nanopatterns. Since the vacuum annealing and oxygen plasma could lead mass loss of polymeric materials, either one of the process can yield a narrowed patterns. However, the vacuum annealing process usually demands quite high temperatures (${\geq}300^{\circ}C$) and extended annealing time to get appreciable line-width reduction. Although the plasma treatment may be considered as an effective low temperature rapid process for the line-width reduction, it is also suffering for the lowered controllability on application to very fine patterns. We have found that the vacuum annealing temperature can be lowered by introducing the oxygen in the vacuum process and that the combination of oxygen plasma treatment with the vacuum annealing could yield the best result in the line-with reduction of the imprinted polymeric nanopatterns. Well-defined line width reduction by more than 50% was successfully demonstrated at relatively low temperatures. Furthermore, it was verified that this process was applicable to the nanopatterns of different shapes and materials.

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Application of Inkjet Technology in Flat Panel Display

  • Ryu, Beyong-Hwan;Choi, Young-Min
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2005년도 International Meeting on Information Displayvol.II
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    • pp.913-918
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    • 2005
  • It is expected that the inkjet technology offers prospect for reliable and low cost manufacturing of FPD (Flat Panel Display). This inkjet technology also offers a more simplified manufacturing process for various part of the FPD than conventional process. For example, recently the novel manufacturing processes of color filter (C/F) in LCD, or RGB patterning in OLED by inkjet printing method have been developed. This elaborates will be considered as the precious point of manufacturing process for the mass production of enlarged-display panel with a low price. On this point of view, we would like to review the status of inkjet technology in FPD, with some results on forming micro line by inkjet patterning of suspension type silver nano ink as below. We have studied the inkjet patterning of synthesized aqueous silver nano-sol on interface-controlled ITO glass substrate. Furthermore, we designed the conductive ink for direct inkjet patterning on bare ITO glass substrate. The first, the highly concentrated polymeric dispersant-assisted silver nano sol was prepared. The high concentration of batch-synthesized silver nano sol was possible to 40 wt%. At the same time the particle size of silver nanoparticles was below $10{\sim}20nm$. The second, the synthesized silver nano sol was inkjet - patterned on ITO glass substrate. The connectivity and width of fine line depended largely on the wettability of silver nano sol on ITO glass substrate, which was controlled by surfactant. The relationship was understood by wetting angle. The line of silver electrode as fine as $50{\sim}100\;{\mu}m$ was successfully formed on ITO glass substrate. The last, the direct inkjet-patternable silver nano sol on bare ITO glass substrate was designed also.

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