한국진공학회:학술대회논문집 (Proceedings of the Korean Vacuum Society Conference)
- 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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- Pages.650-650
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- 2013
Oxidative Line Width Reduction of Imprinted Nanopatterns
- Park, Dae Keun (Department of Chemistry, Sungkyunkwan University (SKKU)) ;
- Kang, Aeyeon (Department of Chemistry, Sungkyunkwan University (SKKU)) ;
- Jeong, Mira (Korea Institute of Machinery and Materials (KIMM)) ;
- Lee, Jaejong (Korea Institute of Machinery and Materials (KIMM)) ;
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Yun, Wan Soo
(Department of Chemistry, Sungkyunkwan University (SKKU))
- 발행 : 2013.02.18
초록
Although imprinted nanopatterns of organic polymer can be modified by the heat treatment [1], it generally requires high process temperatures and is material-dependent since the heat-induced mass loss of the organic polymer is greatly affected by its chemical characteristics. When oxygen is added during the annealing process, one can reduce the process temperature as well as the dependence of the materials. With the oxygen, line width reduction of a polymer (SU-8) patterns could be accomplished at temperature of as low as