• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 추계학술대회 논문집 Vol.15
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• pp.342-345
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• 2002

As the size of chip components and module decreases, new patteming method for fine line and geometry is needed. So far, in LTCC(Low Temperature Cofired Ceramic) process, screen printing method has been used generally. But screen printing method has some disadvantages as follows. First, the geometry including line, vias, etc. smaller than $100{\mu}m$ can't be evaluated easily. Second, the patterned dimension is different from designed value, which makes distortion in charactersitics of not only chip components but also modules. Thick film lithography has advantages of thick film screen printing process, low cost and thin film process, fine line feasibility. Using this method, the line with $30{\mu}m$ width and the geometry with expected dimension can be evaluated. In this study, the fine line with $35{\mu}m$ line/space is formed and the embedded capacitor with very small tolerance is developed using thick film lithography.

• 한국세라믹학회지
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• 제41권4호
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• pp.313-322
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• 2004

후막 광식각 기술은 스크린 인쇄 등의 일반적인 후막공정에 노광 및 현상 등의 리소그라피 공정을 접목시킨 새로운 기술이다. 본 연구에서는 후막 광식각 기술을 이용하여 미세라인을 형성할 수 있는 저온동시소성용 Ag 페이스트를 개발하였다. 페이스트를 구성하는 Ag분말과 폴리머, 모노머, 광개시제 등의 양을 조절하여 미세라인을 형성할 수 있는 최적 조성을 연구하였으며. 또한 노광량과 같은 공정변수가 미세라인 형성에 미치는 영향을 연구하였다. 실험결과 폴리머/모노머비, Ag 분말 중량비, 광개시제의 양 등이 미세라인의 해상도에 영향을 미치는 주요 인자임을 확인할 수 있었다. 개발된 감광성 Ag 페이스트를 저온동시소성용 그린 시트에 전면 인쇄한 후 건조, 노광, 현상, 적층, 소성 과정을 통하여, 소성 후 20$\mu\textrm{m}$ 이하의 선폭을 가지는 후막 미세라인을 형성할 수 있었다.

• 전기전자학회논문지
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• 제6권1호
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• pp.21-29
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• 2002

본 논문에서는 전부 디지털 회로로 구성된 고 해상도의 DLL(Delay Locked Loop)를 제안하였다. 제안된 회로는 위상 검출기, 지연 선택 블록, 그리고 각각의 지연 체인을 가지는 Coarse, Fine 그리고 Ultra Fine 위상조정 블록의 삼 단의 형식으로 되어 있다. 첫 번째 단은 Ultra Fine 위상조정블록으로 고 해상도를 얻기 위하여 Vernier Delay Line을 사용하였다. 두 번째와 세 번째 단은 Coarse와 Fine 위상조정블록으로 각각의 단위 지연 체인을 이루는 단위 지연 소자의 해상도 만큼의 위상 제어를 하게 되며, 두 단은 상당히 비슷한 구조를 이루고 있다. 회로는 HSPICE를 이용하여 공급 전압이 3.3V인 $0.35{\mu}m$ CMOS 공정으로 시뮬레이션 되었다. 시뮬레이션 결과 회로의 해상도를 약 10ps로 높일 수 있었으며, 동작 범위는 250MHz에서 800MHz 이다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2009년도 춘계학술발표대회
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• pp.12.1-12.1
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• 2009

For the micro conductive line, memory device fabrication process use many expensive processes such as manufactur-ing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because nano-metal particles contained inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as FPCB, PCB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line on flexible PCB substrate for the next generation electronic circuit using Ag nano-particles contained ink. To improve the line tolerance on flexible PCB, metal lines are fabricated by sequential prinitng method. Sequential printing method has vari-ous merits about fine, thick and high resolution pattern lines without bulge.

• 한국인쇄학회지
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• 제11권1호
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• pp.71-84
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• 1993

Practically to put use high-photosensitive polymer, poly(vinyl cinnamoyl acetate), we investigated and confirmed UCHIDA`s synthesis, according to control solvent, which is the esterification of poly (vinyl alcohol) with monochloroacetic acid and can be freely conrolled the successive cinnamoyl acetoxyl esterfication of PVCiA, and intruducing photosensitizers,studied the photosensitivity of PVCiA.

• 동의신경정신과학회지
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• 제19권3호
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• pp.85-100
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• 2008

Objective: This experiment was designed to investigate the effect of the KSKH hot water extract & ultra-fine powder on microglia and memory deficit model. Method: The effects of the KSKH hot water extract on expression of IL-1$\beta$, IL-6, TNF-$\alpha$ mRNA and production of IL-1$\beta$, IL-6, TNF-$\alpha$ in BV2 microglial cell line treated by lipopolysacchaide(LPS) were investigated. The effects of the KSKH hot water extract & ultra-fine-fine powder on the behavior of the memory deficit mice induced by scopolamine and AChE in serum of the memory deficit mice induced by scopolamine were investigated. Results: 1. The KSKH hot water extract suppressed the expression of IL-1$\beta$, IL-6, TNF-$\alpha$ mRNA in BV2 microglial cell line treated by LPS. 2. The KSKH hot water extract suppressed the production of IL-1$\beta$, IL-6, TNF-$\alpha$ in 100$\mu g/m\ell$ concentration of BV2 microglial cell line culture supernatant. 3. The KSKH hot water extract & ultra-fine powder decreased AChE activation significantly in the serum of the memory deficit mice induced by scopolamine. 4. The KSKH hot water extract & ultra-fine powder showed significant effect on memory impairment in the stop-through latency type of Morris water maze test. Conclusions: This experiment shows that the KSKH hot water extract & ultra-fine powder might be effective for the prevention and treatment of amnesia and Alzheimer's disease. Investigation into the clinical use of the KSKH hot water extract & ultra-fine powder for amnesia and Alzheimer's disease is suggested for future research.

• 동의신경정신과학회지
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• 제20권1호
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• pp.43-57
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• 2009

Objectives : This experiment was designed to investigate the effect of the Hwanso-dan hot water extract & ultra-fine powder on microglia and memory deficit model Methods : The effects of the Hwanso-dan hot water extract on expression of IL-l${\beta}$, IL-6, TNF-${\alpha}$ mRNA and production of IL-l${\beta}$, IL-6, TNF-${\alpha}$ in BV2 microglial cell line treated by lipopolysacchaide were investigated. The effects of the Hwanso-dan hot water extract & ultra-fine powder on the behavior of the memory deficit mice induced by scopolamine and uric acid & AChE in serum of the memory deficit mice induced by scopolamine were investigated. Results : 1. The Hwanso-dan hot water extract suppressed the expression of IL-l${\beta}$, IL-6, TNF-${\alpha}$ mRNA in BV2 microglial cell line treated by lipopolysacchaide. 2. The Hwanso-dan hot water extract suppressed the production of IL-l${\beta}$, IL-6, TNF-${\alpha}$ in BV2 microglial cell line. 3. The Hwanso-dan hot water extract & ultra-fine powder decreased uric acid and AChE significantly in the serum of the memory deficit mice induced by scopolamine. 4. The Hwanso-dan hot water extract & ultra-fine powder groups showed significantly inhibitory effect on the scopolamine${\sim}$induced impairment of memory in the experiment of Morris water maze. Conclusions : This experiment shows that the Hwanso-dan hot water extract & ultra-fine powder might be effective for the prevention and treatment of Memory deficit disease. Investigation into the clinical use of the Hwanso-dan hot water extract & ultra-fine powder for Alzheimer's disease is suggested for future research.

• 마이크로전자및패키징학회지
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• 제8권3호
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• pp.69-75
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• 2001

후막광식각 기술은 스크린 인쇄 등의 일반적 후막공정에 노광 및 현상등의 리소그라피 공정 을 접목시킨 새로운 기술이다. 그린시트를 적층한 후 감광성 Ag 페이스트를 도포하고, 패턴을 노광, 현상, 동시소성하여 스크린 인쇄법으로는 어려운 25 $\mu\textrm{m}$ 선폭과 25 $\mu\textrm{m}$ 선간공백을 구현하였다. 알루미나 기판을 사용하였을 경우에도 유사한 방법으로 20 $\mu\textrm{m}$에 가까운 선폭이 구현 가능하였으며, 노광량과 현상시간이 미세라인 형성에 있어서 가장 중요한 공정변수임을 확인하였다. 또한, 광식각 기술을 이용하여 정밀도가 높고 고주파 대역에서 전송특성이 우수한 microstrip 전송선로와 series gap 공진기를 제작하여, 이로부터 기판의 유전률 및 유전손실을 계산하였다.

• Structural Engineering and Mechanics
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• 제3권6호
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• pp.529-539
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• 1995

The rigid-plastic yield-line analysis of isotropically reinforced concrete slabs acting in conjunction with torsionally weak supporting beams is developed as the lower-bound form of a linear programming formulation. The analysis is extended to consider geometric variation of chosen yield-line patterns by the technique of sequential linear programming. A strategy is followed of using a fine potential yield-line mesh to identify possible collapse modes, followed by analysis using a coarser, simplified mesh to refine the investigation and for use in conjunction with geometric optimization of the yield-line system. The method is shown to be effective for the analysis of three slabs of varying complexity. The modes detected by the fine and simplified analyses are not always similar but close agreement in load factors has been consistently obtained.

• 전자공학회논문지A
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• 제31A권6호
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• pp.26-33
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• 1994

Much time and labor has been conventionally paid for fine adjustment of circuit elements by experience to improve the characteristics of Tap-off for CATV systems. To solve the problem, in this paper, the relations between the even- and odd-mode impedance. Z$_{oe}$ and Z$_{oo}$ of symmetrical 4-port coupled-line directional coupler and power dividing characteristics of Tap-off for CATV system have been derived. After the coupling, the reflectivity and the isolation are represented by Z$_{oe}$ and Z$_{oo}$ only, the fine adjustment of all S-parameters can be performed by controling the elements of Z$_{oe}$ and Z$_{oo}$ only. Furthermore, the validity of the new fine adjustment method proposed here has been confirmed by experiments.