• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.342-345
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• 2002

As the size of chip components and module decreases, new patteming method for fine line and geometry is needed. So far, in LTCC(Low Temperature Cofired Ceramic) process, screen printing method has been used generally. But screen printing method has some disadvantages as follows. First, the geometry including line, vias, etc. smaller than $100{\mu}m$ can't be evaluated easily. Second, the patterned dimension is different from designed value, which makes distortion in charactersitics of not only chip components but also modules. Thick film lithography has advantages of thick film screen printing process, low cost and thin film process, fine line feasibility. Using this method, the line with $30{\mu}m$ width and the geometry with expected dimension can be evaluated. In this study, the fine line with $35{\mu}m$ line/space is formed and the embedded capacitor with very small tolerance is developed using thick film lithography.

• Journal of the Korean Ceramic Society
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• v.41 no.4
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• pp.313-322
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• 2004

Thick film photolithography is a new technology in that the lithography process such as exposure and development is applied to the conventional thick film process including screen-printing. In this research, low-temperature cofireable silver paste, which enabled the formation of thick film fine-line using photolithographic technology, was developed. The optimum composition for fine-line forming was studied by adjusting the amounts of silver powder, polymer and monomer, and the additional amount of photoinitiator, and then the effect of processing parameter such as exposing dose on the formation of fine-line was also tested. As the result, it was found that the ratio of polymer to monomer, silver powder loading, and the amount of photoinitiator were the main factors affecting the resolution of fine-line. The developed photosensitive silver paste was printed on low-temperature cofireable green sheet, then dried, exposed, developed in aqueous process, laminated, and fired. Results showed that the thick film fine-line under 20$\mu\textrm{m}$ width could be obtained after cofiring.

• Journal of IKEEE
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• v.6 no.1 s.10
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• pp.21-29
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• 2002

This paper describes a high resolution DLL(Delay Locked Loop) using all digital circuits. The proposed architecture is based on the three stage of coarse, fine and ultra fine phase tuning block which has a phase detector, selection block and delay line respectively. The first stage, the ultra fine phase tuning block, is tune to accomplish high resolution using a vernier delay line. The second and third stage, the coarse and fine tuning block, are tuning the phase margin of Unit Delay using the delay line and are similar to each other. It was simulated in 0.35um CMOS technology under 3.3V supply using HSPICE simulator. The simulation result shows the phase resolution can be down to lops with the operating range of 250MHz to 800MHz.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.05a
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• pp.12.1-12.1
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• 2009

For the micro conductive line, memory device fabrication process use many expensive processes such as manufactur-ing of photo mask, coating of photo resist, exposure, development, and etching. However, direct printing technology has the merits about simple and cost effective processes because nano-metal particles contained inks are directly injective without mask. And also, this technology has the advantage about fabrication of fine pattern line on various substrates such as FPCB, PCB, glass, polymer and so on. In this work, we have fabricated the fine and thick metal pattern line on flexible PCB substrate for the next generation electronic circuit using Ag nano-particles contained ink. To improve the line tolerance on flexible PCB, metal lines are fabricated by sequential prinitng method. Sequential printing method has vari-ous merits about fine, thick and high resolution pattern lines without bulge.

• Journal of the Korean Graphic Arts Communication Society
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• v.11 no.1
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• pp.71-84
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• 1993

Practically to put use high-photosensitive polymer, poly(vinyl cinnamoyl acetate), we investigated and confirmed UCHIDA`s synthesis, according to control solvent, which is the esterification of poly (vinyl alcohol) with monochloroacetic acid and can be freely conrolled the successive cinnamoyl acetoxyl esterfication of PVCiA, and intruducing photosensitizers,studied the photosensitivity of PVCiA.

• Journal of Oriental Neuropsychiatry
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• v.19 no.3
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• pp.85-100
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• 2008

Objective: This experiment was designed to investigate the effect of the KSKH hot water extract & ultra-fine powder on microglia and memory deficit model. Method: The effects of the KSKH hot water extract on expression of IL-1$\beta$, IL-6, TNF-$\alpha$ mRNA and production of IL-1$\beta$, IL-6, TNF-$\alpha$ in BV2 microglial cell line treated by lipopolysacchaide(LPS) were investigated. The effects of the KSKH hot water extract & ultra-fine-fine powder on the behavior of the memory deficit mice induced by scopolamine and AChE in serum of the memory deficit mice induced by scopolamine were investigated. Results: 1. The KSKH hot water extract suppressed the expression of IL-1$\beta$, IL-6, TNF-$\alpha$ mRNA in BV2 microglial cell line treated by LPS. 2. The KSKH hot water extract suppressed the production of IL-1$\beta$, IL-6, TNF-$\alpha$ in 100$\mu g/m\ell$ concentration of BV2 microglial cell line culture supernatant. 3. The KSKH hot water extract & ultra-fine powder decreased AChE activation significantly in the serum of the memory deficit mice induced by scopolamine. 4. The KSKH hot water extract & ultra-fine powder showed significant effect on memory impairment in the stop-through latency type of Morris water maze test. Conclusions: This experiment shows that the KSKH hot water extract & ultra-fine powder might be effective for the prevention and treatment of amnesia and Alzheimer's disease. Investigation into the clinical use of the KSKH hot water extract & ultra-fine powder for amnesia and Alzheimer's disease is suggested for future research.

• Journal of Oriental Neuropsychiatry
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• v.20 no.1
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• pp.43-57
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• 2009

Objectives : This experiment was designed to investigate the effect of the Hwanso-dan hot water extract & ultra-fine powder on microglia and memory deficit model Methods : The effects of the Hwanso-dan hot water extract on expression of IL-l${\beta}$, IL-6, TNF-${\alpha}$ mRNA and production of IL-l${\beta}$, IL-6, TNF-${\alpha}$ in BV2 microglial cell line treated by lipopolysacchaide were investigated. The effects of the Hwanso-dan hot water extract & ultra-fine powder on the behavior of the memory deficit mice induced by scopolamine and uric acid & AChE in serum of the memory deficit mice induced by scopolamine were investigated. Results : 1. The Hwanso-dan hot water extract suppressed the expression of IL-l${\beta}$, IL-6, TNF-${\alpha}$ mRNA in BV2 microglial cell line treated by lipopolysacchaide. 2. The Hwanso-dan hot water extract suppressed the production of IL-l${\beta}$, IL-6, TNF-${\alpha}$ in BV2 microglial cell line. 3. The Hwanso-dan hot water extract & ultra-fine powder decreased uric acid and AChE significantly in the serum of the memory deficit mice induced by scopolamine. 4. The Hwanso-dan hot water extract & ultra-fine powder groups showed significantly inhibitory effect on the scopolamine${\sim}$induced impairment of memory in the experiment of Morris water maze. Conclusions : This experiment shows that the Hwanso-dan hot water extract & ultra-fine powder might be effective for the prevention and treatment of Memory deficit disease. Investigation into the clinical use of the Hwanso-dan hot water extract & ultra-fine powder for Alzheimer's disease is suggested for future research.

• Journal of the Microelectronics and Packaging Society
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• v.8 no.3
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• pp.69-75
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• 2001

Photoimageable thick film technology is a new technology in that the lithography process such as exposure and development is applied to the conventional thick film process. Line resolution of 25 $\mu\textrm{m}$ width and 25 $\mu\textrm{m}$ space could be obtained by laminating green sheet, printing photoimageable Ag paste, exposing the test patterns, developing, and co-firing. In case of using the alumina substrate, 20 $\mu\textrm{m}$ fine line could be also obtained by similar process. Test results showed that exposing power density and developing time were the most important processing parameters for the fine line formation. Microstrip and series gap resonators with well-defined line morphology and good transmission characteristics in high frequency were formed by this new technology, and thereby dielectric constant and loss of test substrate were calculated.

• Structural Engineering and Mechanics
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• v.3 no.6
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• pp.529-539
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• 1995

The rigid-plastic yield-line analysis of isotropically reinforced concrete slabs acting in conjunction with torsionally weak supporting beams is developed as the lower-bound form of a linear programming formulation. The analysis is extended to consider geometric variation of chosen yield-line patterns by the technique of sequential linear programming. A strategy is followed of using a fine potential yield-line mesh to identify possible collapse modes, followed by analysis using a coarser, simplified mesh to refine the investigation and for use in conjunction with geometric optimization of the yield-line system. The method is shown to be effective for the analysis of three slabs of varying complexity. The modes detected by the fine and simplified analyses are not always similar but close agreement in load factors has been consistently obtained.

• Journal of the Korean Institute of Telematics and Electronics A
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• v.31A no.6
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• pp.26-33
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• 1994

Much time and labor has been conventionally paid for fine adjustment of circuit elements by experience to improve the characteristics of Tap-off for CATV systems. To solve the problem, in this paper, the relations between the even- and odd-mode impedance. Z$_{oe}$ and Z$_{oo}$ of symmetrical 4-port coupled-line directional coupler and power dividing characteristics of Tap-off for CATV system have been derived. After the coupling, the reflectivity and the isolation are represented by Z$_{oe}$ and Z$_{oo}$ only, the fine adjustment of all S-parameters can be performed by controling the elements of Z$_{oe}$ and Z$_{oo}$ only. Furthermore, the validity of the new fine adjustment method proposed here has been confirmed by experiments.