• Title/Summary/Keyword: film uniformity

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Enhanced Adhesion and Transmittance Uniformity in Laminated Polymer-Dispersed Liquid Crystal Films

  • Yoo, Seong-Hyeon;Park, Min-Kyu;Park, Ji-Sub;Kim, Hak-Rin
    • Journal of the Optical Society of Korea
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    • 제18권6호
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    • pp.753-761
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    • 2014
  • We propose a two-step UV irradiation procedure to fabricate polymer-dispersed liquid crystal (PDLC) films by lamination. During the first UV treatment, before lamination, the UV-curable monomers coated on one film substrate are solidified through photo-polymerization as the phase separation between the liquid crystals and the monomers. Introducing an adhesion-enhancement layer on the other plastic substrate and controlling the UV irradiation conditions ensure that UV-induced cross-linkable functional groups remain on the surfaces of the photo-polymerized layers. Thereby, the adhesion stability between the top and bottom films is much improved during a second (post-lamination) UV treatment by further UV-induced cross-linking at the interface. Because the adhesion-enhancement and PDLC layers prepared by the bar-coating process are solidified before lamination, the PDLC droplet distribution and the cell gap between the two plastic substrates remain uniform under the lamination pressure. This ensures that the voltage-controlled light transmittance is uniform across the entire sample.

Module of Carbon Nanotubes Backlight

  • Chou, Lin-En;Lin, Biing-Nan;Jiang, Yau-Chen;Tsou, Te-Hao;Fu, Chuan-Hsu;Hsiao, Ming-Chun;Chang, Yu-Yang;Lin, Wei-Yi;Lin, Ming-Hung;Lee, Cheng-Chung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.150-155
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    • 2006
  • Carbon nanotubes backlight unit (CNT-BLU) that lightened by field emission was developed into practicability. According to our novel structure, AC mode circuit design and simple printing process, CNT-BLU could achieve 85% of uniformity, 8000 nits of brightness and low material and fabrication cost. Based on these performances, this new planar backlight technology has chances to proceed to mass production and has the potential to replace traditional backlight technology because of its good properties, like the simple processes, easy to large scale, low surface temperature, low power consumption, optical film-free and Hg-free, etc.

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The optical, electrical and structural properties in indium zinc oxide films deposited by LF magnetron sputtering

  • Kim, Eun-Lyoung;Jung, Sang-Kooun;Kim, Myung-Chan;Lee, Yun-Su;Song, Kap-Duk;Park, Lee-Soon;Sohn, Sang-Ho;Park, Duck-Kyu
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.1402-1405
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    • 2006
  • Using a indium zinc oxide (IZO) alloy target with a ratio of 90:10 in wt%, highly transparent conducting oxide (TCO) thin films are prepared on polyethersulfone (PES) substrates by lowfrequency (LF) magnetron sputtering system. These films have amorphous structures with excellent electrical stability, surface uniformity and high optical transmittance. Experiments were carried out as a function of applied voltage. At optimal deposition conditions, thin films of IZO with a sheet resistance of 29 ohm/sq. and an optical transmission of over 82 % in the visible spectrum range were achieved. The IZO thin films fabricated by this method do not require substrate heating during the film preparation or any additional post-deposition annealing treatment.

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Fabrication of transparent conducting films of carbon nanotubes using a spray method

  • Geng, Hong Zhang;Lee, Kyu;Song, Young-Il;Kim, Gil-Yong;Choi, Ha-Kyu;Jun, Bae-Jung;Ahn, Kay-Hyeok;Lee, Young-Hee
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2006년도 6th International Meeting on Information Display
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    • pp.525-528
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    • 2006
  • Transparent conducting films were fabricated on polyethylene terephthalate substrate by a spray method using double-walled carbon nanotubes dispersed in organic solvent and water-based solution. We analyzed the films by absorption spectra, sheet resistance, and scanning electron microscopy. Transparent conducting films with high uniformity and high transparency were fabricated by the spray method. We found that the dispersion particularly nanodispersion of CNTs was of crucial importance to improve the film performance.

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반응성 R.F. 스퍼트링에 의한 AC PDP 용 MgO형성에 관한 연구 (The study on MgO formation for AC PDP prepared by R.F. reactive magnetron Sputtering)

  • 하홍주;이우근;남상옥;하석천;조정수;박정후
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 1996년도 하계학술대회 논문집 C
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    • pp.1576-1578
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    • 1996
  • MgO protection layer in ac PDP prevents the dielectric layer from sputtering of ion in discharge plasma in addition to the contribution to the memory function and also have the additional important roll in lowering the firing Voltage due to a large secondary electron emission yield(${\gamma}$). The methode of Sputtering are easy to apply on mass production and to enlarge the size of the panel and are known to have the superior Adhesion and Uniformity of thin film. MgO protection layer of $1000{\AA}$ on dielectric layer by Reactive R.F magnetron sputtering is formed. Discharge characteristics have done with the formation of protection layer.

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저점성 SWNT 분산액 도포용 슬릿 노즐 설계를 위한 유동해석 (A STUDY ON FLOW IN A SLIT NOZZLE FOR DISPENSING A LOW-VISCOSITY SOLUTION OF SINGLE-WALLED CARBON NANOTUBES)

  • 손병철;곽호상;이상현
    • 한국전산유체공학회지
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    • 제14권1호
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    • pp.78-85
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    • 2009
  • A combined theoretical and numerical study is conducted to design a slit nozzle for large-area liquid coating. The objectives are to guarantee the uniformity in the injected flow and to provide the capability of explicit control of flow rate. The woking fluid is a dilute aqueous solution containing single-walled carbon nanotubes and its low viscosity and the presence of dispersed materials pose technical hurdles. A theoretical analysis leads to a guideline for the geometric design of a slit nozzle. The CFD-based numerical experiment is employed as a verification tool. A new flow passage unit, connected to the nozzle chamber, is proposed to permit the control of flow rate by using the commodity pressurizer. The numerical results confirm the feasibility of this idea. The optimal geometry of internal structure of the nozzle has been searched for numerically and the related issues are discussed.

Electrical Properties of a-IGZO Thin Films for Transparent TFTs

  • Bang, J.H.;Song, P.K.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2010년도 제39회 하계학술대회 초록집
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    • pp.99-99
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    • 2010
  • Recently, amorphous transparent oxide semiconductors (TOS) have been widely studied for many optoelectronic devices such as AM-OLED (active-matrix organic light emitting diodes). The TOS TFTs using a-IGZO channel layers exhibit a high electron mobility, a smooth surface, a uniform deposition at a large area, a high optical transparency, a low-temperature fabrication. In spite of many advantages of the sputtering process such as better step coverage, good uniformity over large area, small shadow effect and good adhesion, there are not enough researches about characteristics of a-IGZO thin films. In this study, therefore, we focused on the electrical properties of a-IGZO thin films as a channel layer of TFTs. TFTs with the a-IGZO channel layers and Y2O3 gate insulators were fabricated. Source and drain layers were deposited using ITO target. TFTs were deposited on unheated non-alkali glass substrates ($5cm{\times}5cm$) with a sintered ceramic IGZO disc (3 inch $\varnothing$, 5mm t), Y2O3 disc (3 inch $\varnothing$, 5mm t) and ITO disc (3 inch $\varnothing$, 5mm t) as a target by magnetron sputtering method. The O2 gas was used as the reactive gas. Deposition was carried out under various sputtering conditions to investigate the effect of sputtering process on the characteristics of a-IGZO thin films. Correlation between sputtering factors and electronic properties of the film will be discussed in detail.

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Solution-based Multistacked Active Layer IGZO TFTs

  • Kim, Hyunki;Choi, Byoungdeog
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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    • pp.351.1-351.1
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    • 2014
  • In this study, we prepared the solution-based In-Ga-Zn oxide thin film transistors (IGZO TFTs) of multistacked active layer and characterized the gate bias instability by measuring the change in threshold voltage caused by stacking. The solutions for IGZO active layer were prepared by In:Zn=1:1 mole ratio and the ratio of Ga was changed from 20% to 30%. The TFTs with multistacked active layer was fabricated by stacking single, double and triple layers from the prepared solutions. As the number of active layer increases, the saturation mobility shows the value of 1.2, 0.8 and 0.6 (). The electrical properties have the tendency such as decreasing. However when gate bias VG=10 V is forced to gate electrode for 3000 s, the threshold voltage shift was decreased from 4.74 V to 1.27 V. Because the interface is formed between the each layers and this affected the current path to reduce the electrical performances. But the uniformity of active layer was improved by stacking active layer with filling the hole formed during pre-baking so the stability of device was improved. These results suggest that the deposition of multistacked active layer improve the stability of the device.

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인쇄용 페이스트의 조성변화가 탄소나노튜브 캐소드의 전계방출 특성에 미치는 영향 (Effects of Materials Composition in CNT Paste on Field Emission Properties in Carbon Nanotube Cathodes)

  • 최우석;신허영;김동희;안병건;정원섭;이동구;조영래
    • 한국재료학회지
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    • 제13권10호
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    • pp.663-667
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    • 2003
  • The effects of paste materials on field emission properties in a carbon nanotube(CNT) cathode were investigated for high-efficient field emission displays. The major components in CNT paste for screen printing were a metallic Ag-paste, a dielectric glass-frit and CNT ink. The emission current from the cathode by an electron tunneling effect increased with an increase in the dielectric material fraction in the CNT paste, which is related to an increase of field enhancement factor in Fowler-Nordheim equation. The surface treatment used, after soft baking of the screen-printed CNT films, greatly affected the decrease in the turn-on field in CNT cathode and the uniformity of emission sites over the entire CNT film area.

황산용액에서 Al7075 합금 표면의 양극산화피막 형성거동 (Formation Behavior of Anodic Oxide Films on Al7075 Alloy in Sulfuric Acid Solution)

  • 문성모;양철남;나상조
    • 한국표면공학회지
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    • 제47권4호
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    • pp.155-161
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    • 2014
  • The present work is concerned with the formation behavior of anodic oxide films on Al7075 alloy under a galvanostatic condition in 20 vol.% sulfuric acid solution. The formation behaviour of anodic oxide films was studied by the analyses of voltage-time curves and observations of colors, morphologies and thicknesses of anodic films with anodization time. Hardness of the anodic oxide films was also measured with anodization time and at different positions in the anodic films. Six different stages were observed with anodiziation time : barrier layer formation (stage I), pore formation (stage II), growth of porous films (stage III), abnormal rapid oxide growth (stage IV), growth of non-uniform oxide films (stage V) and breakdown of the thick oxide films under high anodic voltages (stage VI). Hardness of the anodic oxide films appeared to decrease with increasing anodization time and with the position towards the outer surface. This work provides useful information about the thickness, uniformity, imperfections and hardness distribution of the anodic oxide films formed on Al7075 alloy in sulfuric acid solution.