• Title/Summary/Keyword: film studies

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A Study on the Removal Characteristics of Dissolved Organic and Ammonia Compounds in PFR of Aerated Submerged Bio-film (ASBF) Reactor (PFR 공정의 ASBF 구조에 의한 유기물제거와 질산화의 영향에 대한 연구)

  • Choi, Young-Ik
    • Journal of Environmental Science International
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    • v.17 no.11
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    • pp.1265-1271
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    • 2008
  • Aerated submerged bio-film (ASBF) pilot plant has been developed. The presented studies optimized an inexpensive method of enhanced wastewater treatment. The objectives of this research were to describe pilot scale experiments for efficient removal of dissolved organic and nitrogen compounds by using ASBF reactor in plug-flow reactor (PFR) and improve understanding of dissolved organic matter and nitrogen compounds removal rates with dynamic relationships between heterotrophs and autotrophs in the fixed-film reactor. This research explores the possibility of enhancing the performance of shallow wastewater treatment lagoons through the addition of specially designed structures. This direct gas-phase contact should increase the oxygen transfer rate into the bio-film, as well as increase the micro-climate mixing of water, nutrients, and waste products into and out of the bio-film. This research also investigated the efficiency of dissolved organic matter and ammonia nitrogen removals in the ASBF. As it was anticipated, nitrification activity was highest during periods when the flow rate was lower, but it seemed to decline during times when the flow rate was highest. And ammonia nitrogen removal rates were more sensitive than dissolved organic matter removal rates when flow rates exceeded 2.2 L/min.

A Study on the Silicon Nitride for the poly-Si Thin film Transistor (다결정 박막 트랜지스터 적용을 위한 SiNx 박막 연구)

  • 김도영;김치형;고재경;이준신
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.16 no.12S
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    • pp.1175-1180
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    • 2003
  • Transformer Coupled Plasma Chemical Vapor Deposited (TCP-CVD) silicon nitride (SiNx) is widely used as a gate dielectric material for thin film transistors (TFT). This paper reports the SiNx films, grown by TCP-CVD at the low temperature (30$0^{\circ}C$). Experimental investigations were carried out for the optimization o(SiNx film as a function of $N_2$/SiH$_4$ flow ratio varying ,3 to 50 keeping rf power of 200 W, This paper presents the dielectric studies of SiNx gate in terms of deposition rate, hydrogen content, etch rate and leakage current density characteristics lot the thin film transistor applications. And also, this work investigated means to decrease the leakage current of SiNx film by employing $N_2$ plasma treatment. The insulator layers were prepared by two step process; the $N_2$ plasma treatment and then PECVD SiNx deposition with SiH$_4$, $N_2$gases.

Large-area Uniform Deposition of Amorphous Hydrogenated Carbon Films using a Plasma CVD Method (플라즈마 CVD 법을 이용한 대면적 균일한 비정질 탄소 막 증착)

  • Yun, Sang-Min;Yang, Sung-Chae
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.22 no.5
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    • pp.411-414
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    • 2009
  • It has been investigated for the film uniformity and deposition rate of a-C:H films on glass substrate and polymeric materials in the presence of the modulated crossed magnetic field. We used Plasma CVD, i.e, using a crossed electromagnetic field, for uniform depositing thin film. The optimum discharge condition has been discussed for the gas pressure, the magnetic flux density and the distance between substrate and electrodes, As a result, it is found that the optimum discharge conditions are $CH_4$ concentration $CH_4$=10 %, modulated magnetic flux density B=48 Gauss, pressure P=100 mTorr, discharge power supply voltage V=l kV under these experimental conditions. By using these experimental condition, it is possible to prepare the most uniform film extends over about 160 mm of the film width. In this study, we deposited a-C:H thin film on glass substrate, and have a plan that using this condition, study depositing a-C:H thin film on polymeric substrate in next studies.

Probabilistic analysis of micro-film buckling with parametric uncertainty

  • Ying, Zuguang;Wang, Yong;Zhu, Zefei
    • Structural Engineering and Mechanics
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    • v.50 no.5
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    • pp.697-708
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    • 2014
  • The intentional buckling design of micro-films has various potential applications in engineering. The buckling amplitude and critical strain of micro-films are the crucial parameters for the buckling design. In the reported studies, the film parameters were regarded as deterministic. However, the geometrical and physical parameters uncertainty of micro-films due to manufacturing becomes prominent and needs to be considered. In the present paper, the probabilistic nonlinear buckling analysis of micro-films with uncertain parameters is proposed for design accuracy and reliability. The nonlinear differential equation and its asymptotic solution for the buckling micro-film with nominal parameters are firstly established. The mean values, standard deviations and variation coefficients of the buckling amplitude and critical strain are calculated by using the probability densities of uncertain parameters such as the film span length, thickness, elastic modulus and compressive force, to reveal the effects of the film parameter uncertainty on the buckling deformation. The results obtained illustrate the probabilistic relation between buckling deformation and uncertain parameters, and are useful for accurate and reliable buckling design in terms of probability.

Comparison of Durability for PUA Type Resin using Wear and Nano-indentation Test (마모 및 나노 압입 시험을 이용한 PUA계 레진의 내구성 비교)

  • Choi, Hyun Min;Kwon, Sin;Jung, Yoon-Gyo;Cho, Young Tae
    • Journal of the Korean Society of Manufacturing Process Engineers
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    • v.17 no.5
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    • pp.8-15
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    • 2018
  • Films with special properties (e.g., water-repellent films, optical films, anti-reflection films, and flexible films) are referred to as functional films. Recently, there has been interest in fine patterning methods for film fabrication. In particular there have been many studies that use a UV nanoimprint process involving a UV curing method. In this paper, a polymer film was fabricated by the UV nanoimprint process with a micro-pattern, and its durability was evaluated by a wear test and a nano-indentation test. The film mechanical properties (such as coefficient of friction, hardness, and modulus of elasticity) were measured. Moreover, the choice of PUA type resin used in the UV nanoimprint process was confirmed to impact the durability of the thin film. Despite making the polymer film samples using the same method and PUA type resin, different coefficient of friction, hardness, and modulus of elasticity values were obtained. PUA 4 resin had the most favorable coefficient of friction, hardness, and modulus of elasticity. This material is predicted to produce a high durability functional film.

Artistic expression in fashion film of Prada (Prada 패션 필름에 나타난 예술적 표현)

  • Beom, Seo Hee;Yim, Eunhyuk
    • The Research Journal of the Costume Culture
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    • v.26 no.6
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    • pp.888-898
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    • 2018
  • The purpose of this study was to review and establish the two concepts of art film and artistic expression in Prada fashion films, through a literature review of domestic and international case studies, as a form of luxury branded content, Prada fashion films are considered to artistic film genre. For the study, aesthetic expression in art films as discussed in the previous research was divided into four types. The study method was to review fashion / art films from the founding of YouTube, specially, works that used digital images from Thunder Perfect Mind, which was introduced in Prada in 2005, to Nylon Farm in 2018, stylistic features were searched by film. In addition, for this study, fashion film was analyzed based on the typology of art films. The following conclusions regarding artistic expression were drawn from this study : First, the Prada fashion films represent a transition to advanced art through a conceptual approach. Second, the causal relationships personality psychology can be cited through the disturbed and fragmented narrative lines. Third, the films help people identity Prada's aesthetics by humanizing the luxury brand. Fourth, the films are a feature of serialization.

Oxygen Control in CdS Thin Film by UV Illumination in Chemical Bath Deposition (용액성장법에서 자외선 조사를 이용한 CdS의 산소함량 제어)

  • Baek, Hyeon-ji;Oh, Ji-A;Seo, Young-Eun;Shin, Hye-Jin;Cho, Sung-Wook;Jeon, Chan-Wook
    • Current Photovoltaic Research
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    • v.7 no.2
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    • pp.33-37
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    • 2019
  • In this paper, we compared the performance of $Cu(In,Ga)(S,Se)_2$ (CIGSSe) thin film solar cell with CdS buffer layer deposited by irradiating 365 nm UV light with 8 W power in Chemcial Bath Deposition (CBD) process. The effects of UV light irradiation on the thin film deposition mechanism during CBD-CdS thin film deposition were investigated through chemical and electro-optical studies. If the UV light is irradiated during the solution process, the hydrolysis of Thiourea is promoted even during the same time, thereby inhibiting the formation of the intermediate products developed in the reaction pathway and decreasing the pH of the solution. As a result, it is suggested that the efficiency of the CdS/CIGSSe solar cell is increased because the ratio of the S element in the CdS thin film increases and the proportion of the O element decreases. This is a very simple and effective approach to control the S/O ratio of the CdS thin film by the CBD process without artificially controlling the process temperature, solution pH or concentration.