• 제목/요약/키워드: filling materials

검색결과 862건 처리시간 0.027초

일부 도시 초·중등 학생들의 재료별 영구치 충전율 변화 (Trend change of dental filling materials for permanent teeth of primary and middle school children in a city)

  • 공욱성;김철신
    • 대한치과의사협회지
    • /
    • 제55권5호
    • /
    • pp.339-350
    • /
    • 2017
  • The aim of the study was to analyze the distribution of dental filling materials for carious permanent teeth of school children in a city. The study was designed as time-serial study, using the data of the dental survey for children aged 8-, 10- and 12-year children living in Gimhae city. The samples were selected by stratified clusters sampling. The number of surveyed samples in depth-analysis for types of dental filling materials were 567 in 2009 and 331 in 2013, respectively. They had dental restorations on one or more teeth. The changing pattern of used dental filling materials was analyzed between 2009 and 2013. Statistical analysis was conducted according to variables related to dental filling material type; DMFT and DMFS index, number of fissure sealed teeth and surface and surveyed year. Amalgam filling rate decreased from 27.9% in 2009 to 18.8% in 2013, while filling rate of tooth-colored materials increased from 56.1% in 2009 and 68.9% in 2013. Amalgam filling rate was a negative correlation with filling rate of tooth-colored materials or gold and number of fissure sealed teeth and a positive correlation with DMFT index. Filling rate of tooth-colored materials was a negative correlation with filling rate of amalgam or gold and DMFT index and a positive correlation with number of fissure sealed teeth. The light-curing composite resin should be included in the reimbursement range of National Health Insurance to solve an inequity of dental health care services.

  • PDF

Electrodeposition 변수에 따른 Trench Via의 Cu Filling 특성 (Cu Filling Characteristics of Trench Vias with Variations of Electrodeposition Parameters)

  • 이광용;오택수;오태성
    • 마이크로전자및패키징학회지
    • /
    • 제13권4호
    • /
    • pp.57-63
    • /
    • 2006
  • 칩 스택 패키지의 삼차원 interconnection에 적용을 위해 폭 $75{\sim}10\;{\mu}m$, 길이 3mm의 트랜치 비아에 대해 전기도금전류밀도 및 전류모드에 따른 Cu filling 특성을 분석하였다. 직류모드로 $1.25mA/cm^{2}$에서 Cu filling한 경우, 트랜치 비아의 폭이 $75{\sim}35{\mu}m$ 범위에서는 95% 이상의 높은 Cu filling ratio를 나타내었다. 직류 전류밀도 $2.5mA/cm^{2}$에서 Cu filling한 경우에는 $1.25mA/cm^{2}$ 조건에 비해 열등한 Cu filling ratio를 나타내었으며, 직류모드에 비해 펄스모드가 우수한 Cu filling 특성을 나타내었다.

  • PDF

열린 비아 Hole의 전기도금 Filling을 이용한 Cu 관통비아 형성공정 (Cu Through-Via Formation using Open Via-hole Filling with Electrodeposition)

  • 김재환;박대웅;김민영;오태성
    • 마이크로전자및패키징학회지
    • /
    • 제21권4호
    • /
    • pp.117-123
    • /
    • 2014
  • 써멀비아나 수직 배선으로 사용하기 위한 Cu 관통비아를 열린 비아 hole의 top-down filling 도금공정과 bottom-up filling 도금공정으로 형성 후 미세구조를 관찰하였다. 직류도금전류를 인가하면서 열린 비아 홀 내를 top-down filling 도금하거나 bottom-up filling 도금함으로써 내부기공이 없는 건전한 Cu 관통비아를 형성하는 것이 가능하였다. 열린 비아 홀의 top-down filling 공정에서는 Cu filling 도금 후 시편의 윗면과 밑면에서 과도금된 Cu 층을 제거하기 위한 chemical-mechanical polishing(CMP) 공정이 요구되는데 비해, 열린 비아 홀의 bottom-up filling 공정에서는 과도금된 Cu층을 제거하기 위한 CMP 공정이 시편 윗면에서만 요구되는 장점이 있었다.

Micro-computed tomographic evaluation of the flow and filling ability of endodontic materials using different test models

  • Torres, Fernanda Ferrari Esteves;Guerreiro-Tanomaru, Juliane Maria;Chavez-Andrade, Gisselle Moraima;Pinto, Jader Camilo;Berbert, Fabio Luiz Camargo Villela;Tanomaru-Filho, Mario
    • Restorative Dentistry and Endodontics
    • /
    • 제45권2호
    • /
    • pp.11.1-11.9
    • /
    • 2020
  • Objectives: This study compared the flow and filling of several retrograde filling materials using new different test models. Materials and Methods: Glass plates were manufactured with a central cavity and 4 grooves in the horizontal and vertical directions. Grooves with the dimensions used in the previous study (1 × 1 × 2 mm; length, width, and height respectively) were compared with grooves measuring 1 × 1 × 1 and 1 × 2 × 1 mm. Biodentine, intermediate restorative material (IRM), and mineral trioxide aggregate (MTA) were evaluated. Each material was placed in the central cavity, and then another glass plate and a metal weight were placed over the cement. The glass plate/material set was scanned using micro-computed tomography. Flow was calculated by linear measurements in the grooves. Central filling was calculated in the central cavity (㎣) and lateral filling was measured up to 2 mm from the central cavity. Results: Biodentine presented the least flow and better filling than IRM when evaluated in the 1 × 1 × 2 model. In a comparison of the test models, MTA had the most flow in the 1 × 1 × 2 model. All materials had lower lateral filling when the 1 × 1 × 2 model was used. Conclusions: Flow and filling were affected by the size of the test models. Higher grooves and materials with greater flow resulted in lower filling capacity. The test model measuring 1 × 1 × 2 mm showed a better ability to differentiate among the materials.

Retrofilling시 수종충전재료의 변연누출에 관한 연구 (A COMPARATIVE STUDY ON THE APICAL LEAKAGE OF VARIOUS RETROFILLING MATERIALS)

  • 온영석;손호현
    • Restorative Dentistry and Endodontics
    • /
    • 제16권2호
    • /
    • pp.118-125
    • /
    • 1991
  • Eighty - eight recently extracted teeth were used to evaluate the leakage characteristics of the following retrofilling materials; amalgam, zinc oxide eugenol cement, glass - ionomer cement, and cermet glass - ionomer cement. Root canals were prepared with step - back method and obturated with gutta percha and zinc oxide eugenol sealer. Root apex were resected 2 mm from apex and class I cavities were prepared with 2 mm or 4 mm depth. The cavities were filled with above materials. After application of varnish on all surface except resected surface, the roots were placed in 1 % methylene blue solution for 6 days. After longitudinal polishing to expose cental parts of filled materials, penetrated depths of dye were measured. The results were as follws. 1. As retrofilling material, glass ionomer cement filling groups showed less leakage than the other groups except zinc oxide eugenol cement filling group(p<0.01). 2. Amalgam filling groups had greater leakage than zinc oxide eugenol cement filling group(p<0.01). 3. 4 mm depth of retrofilled cavity had no effect on leakage characteristics compared with 2 mm depth cavity(p>0.05). 4. Glass ionomer cement and cermet glass ionomer cement filling groups showed less apical leakage than amalgam filling groups. But there was no statistical significance(p>0.05). 5. There was no difference in apical leakage between glass ionomer cement filling groups and cermet glass ionomer cement filling groups(p>0.05).

  • PDF

응고현상을 고려한 반용융 알루미늄재료의 단조공정에 관한 충전해석 (A Filling Analysis on Forging Process of Semi-Solid Aluminum Materials Considering Solidification Phenomena)

  • 강충길;최진석;강동우
    • 소성∙가공
    • /
    • 제5권3호
    • /
    • pp.239-255
    • /
    • 1996
  • A new forming technology has been developed to fabricate near-net shape products using light metal. A semi-solid forming technology has some advantages compared with the conventional forming processes such as die casting squeeze casting and hot/cold forging. In this study the numerical analysis of semi-solid filling for a straight die shape and orifice die shape in gate pattern is studied on semi-solid materials(SSM) of solid fraction fs =30% in A356 aluminum alloy. The finite difference program of Navier-Stokes equation coupled with heat transfer and solidification has been developed to predict a filling pattern and the temperature distribution of SSM. The programdeveloped in this study gives die filling patterns of SSM and final solidifica-tion region.

  • PDF

Biocompatibility of root-end filling materials: recent update

  • Saxena, Payal;Gupta, Saurabh Kumar;Newaskar, Vilas
    • Restorative Dentistry and Endodontics
    • /
    • 제38권3호
    • /
    • pp.119-127
    • /
    • 2013
  • The purpose of a root-end filling is to establish a seal between the root canal space and the periradicular tissues. As root-end filling materials come into contact with periradicular tissues, knowledge of the tissue response is crucial. Almost every available dental restorative material has been suggested as the root-end material of choice at a certain point in the past. This literature review on root-end filling materials will evaluate and comparatively analyse the biocompatibility and tissue response to these products, with primary focus on newly introduced materials.

역행충전시 수복재와 와동 형태에 따른 변연누출의 정량적 분석 (QUANTITATIVE ANALYSIS OF MARGINAL MICROLEAKAGE IN VARIOUS RETROGRADE FILLING MATERIALS AND PREPARATION TYPES)

  • 한충경;양홍서
    • Restorative Dentistry and Endodontics
    • /
    • 제15권1호
    • /
    • pp.97-105
    • /
    • 1990
  • When conventional root canal treatment is failed or contraindicated, retrograde root canal filling following apicoectomy is a valuable procedure, aimed at hermetically sealing the root canal against leakage of irritants from the canal into the periapical tissue. In this in vitro investigation, to analyze apical microleakage electrochemically in teeth with different retrograde filling materials and preparation types, single - rooted tooth was cut 2mm from the apex and each Class I and Slot preparation was prepared. Experimental groups : Group 1. Amalgam filling with cavity varnish in Class I preparation Group 2. Scotchbond 2+Silux filling in Class I preparation Group 3. Gutta percha filling with ZOE cement in Class I preparation Group 4. Amalgam filling with cavity varnish in Slot preparation Group 5. Scotchbond 2+Silux filling in Slot preparation Each specimens was immersed in 1% solution of KCl, and applied a potential of 9V external power supply. Measurements of the current flow were obtained at 1, 2, 3, 7, 9, 12, 14, 18, 21, 25 and 28 day after immerson. Marginal microleakage were compared and evaluated. The results were as follows ; 1. The group filled with composite resin with dentin bonding agent shows lower apical microleakage value than the group filled with amalgam following varnish application (P<0.01). 2. In the group filled with gutta percha, apical microleakage value was the hightest 3. There was no significant difference between Class I cavity and Slot type cavity regardless of the used materials.

  • PDF

플라즈마 처리와 결합된 Cu 촉매반응 화학기상증착법의 메커니즘과 고종횡비 패턴의 충진양상 전산모사에 대한 연구 (Study on the Mechanism and Modeling for Super-filling of High-Aspect-Ratio Features with Copper by Catalyst Enhanced Chemical Vapor Deposition Coupled with Plasma Treatment)

  • 김창규;이도선;이원종
    • 대한금속재료학회지
    • /
    • 제49권4호
    • /
    • pp.334-341
    • /
    • 2011
  • The mechanism behind super-filling of high-aspect-ratio features with Cu by catalyst-enhanced chemical vapor deposition (CECVD) coupled with plasma treatment is described and the metrology required to predict the filling feasibility is identified and quantified. The reaction probability of a Cu precursor was determined as a function of substrate temperature. Iodine adatoms are deactivated by the bombardment of energetic particles and also by the overdeposition of sputtered Cu atoms during the plasma treatment. The degree of deactivation of adsorbed iodine was experimentally quantified. The quantified factors, reaction probability and degree of deactivation of iodine were introduced to the simulation for the prediction of the trench filling aspect by CECVD coupled with plasma treatment. Simulated results show excellent agreement with the experimental filling aspects.

Cu 전해도금을 이용한 TSV 충전 기술 (TSV Filling Technology using Cu Electrodeposition)

  • 기세호;신지오;정일호;김원중;정재필
    • Journal of Welding and Joining
    • /
    • 제32권3호
    • /
    • pp.11-18
    • /
    • 2014
  • TSV(through silicon via) filling technology is making a hole in Si wafer and electrically connecting technique between front and back of Si die by filling with conductive metal. This technology allows that a three-dimensionally connected Si die can make without a large number of wire-bonding. These TSV technologies require various engineering skills such as forming a via hole, forming a functional thin film, filling a conductive metal, polishing a wafer, chip stacking and TSV reliability analysis. This paper addresses the TSV filling using Cu electrodeposition. The impact of plating conditions with additives and current density on electrodeposition will be considered. There are additives such as accelerator, inhibitor, leveler, etc. suitably controlling the amount of the additive is important. Also, in order to fill conductive material in whole TSV hole, current wave forms such as PR(pulse reverse), PPR(periodic pulse reverse) are used. This study about semiconductor packaging will be able to contribute to the commercialization of 3D TSV technology.