• Title/Summary/Keyword: f-cvd

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Electrical and Optical Properties of $SnO_2$ : F Thin Films by Pyrosol Method (Pyrosol 법에 의한 $SnO_2$ : F 박막의 전기적 광학적 특성)

  • Yoon, Kyung-Hoon;Song, Jin-Soo;Kang, Gi-Hoan
    • Proceedings of the KIEE Conference
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    • 1990.07a
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    • pp.187-190
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    • 1990
  • A new technique is described for developing low-cost $SnO_2$ : F thin films as TCO (Transparent Conducting Oxide) substrate of a-Si solar cells. A novel Pyrosol equipment has been developed, and $SnO_2$ : F thin films have been deposited under the condition of varing dopant concentration, temperature and composition rate of solution. Futhermore, electrical and optical properties of thin films have been measured, and exhibit resistivity of $4.3{\times}10^{-4}{\Omega}$ cm and transmittance of 80% which is almost at the same level as those of $SnO_2$ : F thin films by CVD.

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The Effect of Characteristics of Laser CVD SiN Films on Reaction Gas and Post-treatment (Laser CVD SiN막에 대한 원료가스와 형성 후처리효과)

  • Yang, J.W.;Hong, S.H.;Ryoo, J.H.;Chu, K.S.;Kim, S.Y.;Sung, Y.K.
    • Proceedings of the KIEE Conference
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    • 1994.07b
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    • pp.1243-1245
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    • 1994
  • SiN films were deposited in $Si_2H_6$(99.9%), $NH_3$(99.99%) gas mixture with carrier gas $N_2$ on Si substrate by ArF Excimer Laser CVD. SiN film deposition conditions that are substrate temperature and Laser average power were varied in order to investigate the dependence of SiN film on the condition. A post-deposition anneal was performed to examine variation of fixed charge density in the films. The deposition rate was increased as the substrate temperature and Laser power were increased during film deposition. The refractive index was increased with increasing substrate temperature, but it didn't have the dependence on Laser power. The fixed charge density was decreased when a post-deposition anneal was performed.

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NEW APPLICATIONS OF R.F. PLASMA TO MATERIALS PROCESSING

  • Akashi, Kazuo;Ito, Shigru
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.371-378
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    • 1996
  • An RF inductively coupled plasma (ICP) torch has been developed as a typical thermal plasma generator and reactor. It has been applied to various materials processings such as plasma flash evaporation, thermal plasma CVD, plasma spraying, and plasma waste disposal. The RF ICP reactor has been generally operated under one atmospheric pressure. Lately the characteristics of low pressure RF ICP is attracting a great deal of attention in the field of plasma application. In our researches of RF plasma applications, low pressure RF ICP is mainly used. In many cases, the plasma generated by the ICP torch under low pressure seems to be rather capacitive, but high density ICP can be easily generated by our RF plasma torch with 3 turns coil and a suitable maching circuiit, using 13.56 MHz RF generator. Plasma surface modification (surface hardening by plasma nitriding and plasma carbo-nitriding), plasma synthesis of AIN, and plasma CVD of BN, B-C-N compound and diamond were practiced by using low pressure RF plasma, and the effects of negative and positive bias voltage impression to the substrate on surface modification and CVD were investigated in details. Only a part of the interesting results obtained is reported in this paper.

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Relationships among Health Behavior, Wellness Condition, and Stage of Change in Health Behavior by Cardiocerebrovascular Risk in Male Office Workers (남성 사무직근로자의 심뇌혈관질환 위험요인에 따른 건강행위, 웰니스 상태 및 건강행위변화단계의 관계)

  • Kang, So Hee;Hwang, Seon Young
    • Journal of muscle and joint health
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    • v.25 no.1
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    • pp.50-59
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    • 2018
  • Purpose: The purpose of this study was to investigate the relationships among health behavior, wellness condition, and stage of change in health behavior by risk of cardiocerebrovascular diseases (CVD) in male office workers. Methods: A total of 205 male office workers participated in the 2017 National Health Examination at a manufacturing/ R&D business in Seongnam and completed self-reported questionnaires. Results: There were significant differences in health behavior scores by risk of CVD (F=4.78, p=.009) and statistically significant differences in no smoking (F=5.86, p=.003), exercise (F=5.49, p=.005), and health checkup (F=4.39, p=.014). There were statistically significant differences in health behavior (t=-4.14, p<.001) and wellness condition (t=-2.61, p=.010) by the stage of change in health behavior. Health behavior had a weak positive correlation with wellness condition (r=.36, p<.001). Logistic regression analysis showed that, when adjusted for age and employment period, the probability of becoming attention or risk group was 11% lower for quitting smoking (OR 0.89, 95% CI 0.81~0.97, p=.006) and 18% lower for regular exercise (OR 0.82, 95% CI 0.70~0.95, p=.009). Conclusion: The direction of health management at the workplace should be changed to promote the wellness of all workers, not the management of the disease, and a health promotion program should be continued to emphasize health behaviors such as smoking cessation and regular exercise.

Effect of Filament Winding Methods on Surface Roughness and Fiber Volume Fraction of SiCf/SiC Composite Tubes (SiCf/SiC 복합체 튜브의 표면조도 및 섬유 부피 분율에 미치는 필라멘트 와인딩 방법의 영향)

  • Kim, Daejong;Lee, Jongmin;Park, Ji Yeon;Kim, Weon-Ju
    • Journal of the Korean Ceramic Society
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    • v.50 no.6
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    • pp.359-363
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    • 2013
  • Silicon carbide and its composites are being considered as a nuclear fuel cladding material for LWR nuclear reactors because they have a low neutron absorption cross section, low hydrogen production under accident conditions, and high strength at high temperatures. The SiC composite cladding tube considered in this study consists of three layers, monolith CVD SiC - $SiC_f$/SiC composite -monolith CVD SiC. The volume fraction of SiC fiber and surface roughness of the composite layer affect mechanical and corrosion properties of the cladding tube. In this study, various types of SiC fiber preforms with tubular shapes were fabricated by a filament winding method using two types of Tyranno SA3 grade SiC fibers with 800 filaments/yarn and 1600 filaments/yarn. After chemical vapor infiltration of the SiC matrix, the surface roughness and fiber volume fraction were measured. As filament counts were changed from 800 to 1600, the surface roughness increased but the fiber volume fraction decreased. The $SiC_f$/SiC composite with a bamboo-like winding pattern has a smaller surface roughness and a higher fiber volume fraction than that with a zigzag winding pattern.

Characterization of thin film Si solar cell with FTO transparent electrode (FTO 투명전극에 따른 박막 실리콘 태양전지 특성평가)

  • Kim, S.H.;Kim, Y.J.;No, I.J.;Cho, J.W.;Lee, N.H.;Kim, J.S.;Shin, P.K.
    • Proceedings of the KIEE Conference
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    • 2009.07a
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    • pp.1351_1352
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    • 2009
  • We deposited $SnO_2$:F thin films by atomospheric pressure chemical vapor deposition(APCVD) on corning glass. $SnO_2$:F films were used as transparent conductive oxide (TCO) electrode for Si thin film solar cells. We have investigated structural, electrical and optical properties of $SnO_2$:F thin films and fabricated thin film Si solar cells by plasma enhanced CVD(PECVD) on $SnO_2$:F thin films The cells were characterized by I-V measurement using AM1.5 spectra. Conversion efficiency of our cells were between 5.61% and 6.45%.

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Physical and electrical properties of a-C:H deposited by RF-PECVD (RF-PECVD에 의해 증착된 a-C:H 박막의 물리적 및 전기적 특성 분석)

  • 김인준;김용탁;최원석;윤대호;홍병유
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2002.07a
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    • pp.296-300
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    • 2002
  • Thin films of Hydrogenated amorphous carbon(a-C:H) are generally exhibited by high electrical resistivities from 10$^2$ to 10$\^$16/ Ω$.$cm, resulting in an interesting material for high power, high temperature MIS devices applications. The hydrogenated amorphous carbon(a-C:H) films were deposited on silicon and glass using an rf plasma enhanced CVD method. The resultant film properties were evaluated in the respect of material based on r.f. power variation. The hydrogenated amorphous carbon(a-C:H) films of thickness ranging from 30 to 50 m were deposited at the pressure of 1 ton with the mixture of methane and hydrogen. We have used rf-IR( courier transform IR) and AFM(Atomic force microscopy) for determining physical properties and current-voltage(I-V) measurement for electrical Properties.

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RF Magnetron Sputter 장비를 이용한 FTO 박막의 특성 측정

  • Jo, Yong-Beom;Jeong, Won-Ho;U, Myeong-Ho;U, Si-Gwan
    • Proceedings of the Korean Vacuum Society Conference
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    • 2014.02a
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    • pp.334.1-334.1
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    • 2014
  • 태양전지, 터치센서와 같이 투명한 전극(TCO: Transparent conducting oxide)이 필요로 하는 곳에는 금속 산화물 형태의 ITO, ZnO, FTO와 같은 투명 전극이 사용된다. 그중에서 FTO는 저렴한 가격과 높은 투과율, 낮은 저항으로 주목을 받고 있다. 뿐만아니라 FTO 박막은 다른 산화물 전도체에 비해 구부림에 강한 저항성을 보여 주고 있다. FTO 박막의 캐리어 전하 생성 원리는 F 원자가 O 원자의 자리를 치환하게 되면서 잉여 전자의 발생으로 전기가 흐를 수 있다. 아직까지는 화학적 조성비에 유리한 CVD를 이용한 증착 방법이 많이 사용되고 있다. 스퍼터 장비 역시 공정 가스에 따라 화학적 조성비 변화가 가능하고 CVD와 비교하여 공정이 간단하며 연속 공정이 쉽고 대면적 적용이 가능하다. 본 실험은 본사에서 R&D용으로 제작한 Daon-1000 S 장비를 사용하였으며 DaON-1000 S는 3개의 2" sputter gun이 장착 되어 있어 co-sputtering이 가능한 장비이다.

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