• The Bulletin of The Korean Astronomical Society
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• v.35 no.1
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• pp.29.2-29.2
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• 2010

The Extreme ultraviolet Imaging Spectrometer (EIS) on board Hinode provide us with excellent imaging spectroscopic data with very good spatial and spectral resolutions, which can be used for detecting Doppler flows in transition region and coronal lines as well as diagnosing plasma properties such as temperature, density, and non-thermal velocity. In this study we have made an EUV-imaging spectroscopic study of the source region of a partial halo coronal mass ejection (CME) that occurred on 2007 July 9 in NOAA 10961. Dopplergrams are obtained before and after the CME eruption using 12 EIS spectral lines (Log T= 4.9~7.2). Major results are summarized as follows. First, it is noted that either red shifts disappeared or blue shifts newly appeared for all spectral lines lower than Log T =6.0. Second, there were significant intensity increases for all wavelengths. Third, there were no significant variations in non-thermal motions for all wavelengths. We found one interesting bright point that newly appeared after the CME eruption. We discuss the implication on the results in terms of the CME eruption.

• Journal of The Korean Astronomical Society
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• v.50 no.4
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• pp.125-129
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• 2017

We investigate the solar cycle variation of microwave and extreme ultraviolet (EUV) intensity in latitude to compare microwave polar brightening (MPB) with the EUV polar coronal hole (CH). For this study, we used the full-sun images observed in 17 GHz of the Nobeyama Radioheliograph from 1992 July to 2016 November and in two EUV channels of the Atmospheric Imaging Assembly (AIA) $193{\AA}$ and $171{\AA}$ on the Solar Dynamics Observatory (SDO) from 2011 January to 2016 November. As a result, we found that the polar intensity in EUV is anti-correlated with the polar intensity in microwave. Since the depression of EUV intensity in the pole is mostly owing to the CH appearance and continuation there, the anti-correlation in the intensity implies the intimate association between the polar CH and the MPB. Considering the report of Gopalswamy et al. (1999) that the enhanced microwave brightness in the CH is seen above the enhanced photospheric magnetic field, we suggest that the pole area during the solar minimum has a stronger magnetic field than the quiet sun level and such a strong field in the pole results in the formation of the polar CH. The emission mechanism of the MPB and the physical link with the polar CH are not still fully understood. It is necessary to investigate the MPB using high resolution microwave imaging data, which can be obtained by the high performance large-array radio observatories such as the ALMA project.

• The Bulletin of The Korean Astronomical Society
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• v.39 no.1
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• pp.74.1-74.1
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• 2014

We have investigated a supra-arcade structure associated with an M1.6 flare, which occurred on the south-east limb in the 4th of November 2010. It is ob- served in extreme ultraviolet (EUV) with the Atmospheric Imaging Assembly (AIA) onboard the Solar Dynamics Observatory (SDO), microwaves at 17 and 34 GHz with the Nobeyama Radioheliograph (NoRH), and soft X-rays of 8-20 keV with the Reuven Ramaty High Energy Solar Spectroscopic Imager (RHESSI). Interestingly, we found exceptional properties of the supra-arcade thermal plasma from the AIA 131 A and the NoRH: 1) plasma upflows along large coronal loops and 2) enhancing microwave emission. RHESSI detected two soft X-ray sources, a broad one in the middle of supra-arcade structure and a bright one just above the flare-arcade. We estimated the number density and thermal energy for these two source regions during the decay phase of the flare. In the supra-arcade source, we found that there were increases of the thermal energy and the density at the early and the last stages, respectively. On the contrary, the density and thermal energy of the source on the top of the flare-arcade decreases throughout. The observed upflows imply that there is continuous energy supply into the supra- arcade structure from below during the decay phase of the flare. It is hard to be explained by the standard flare model in which the energy release site is located high in corona. Thus, we suggest that the potential candidate as the energy source for the hot supra-arcade structure is the flare-arcade which has exhibited a predominant emission throughout.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.31 no.3
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• pp.137-142
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• 2021

In this study, the development of the room temperature curable silica-based coating compositions for anticorrosive and antifouling performance in marine environments was carried out. The marine (plant) structures with many exposed parts are operated in harsh marine environments such as strong ultraviolet rays, extreme temperature differences and salt water corrosion. Organic paints that are easily degraded under these environments and easily eroded by physical stimuli such as waves can not play a role properly. Dense ceramic coatings on marine structures provide careful protections even in saltwater environments due to their high hardness and rust resistance. Therefore, in the case of ceramic coatings, their use and application range in marine structures can be greatly improved due to their functional advantages. In the present study, silica-based coating compositions based on colloidal silica with silane coupling agents, curing salts, and ceramic fillers were developed, and their applications as protective coatings for corrosion protection and fouling prevention in seawater were also studied.

• Journal of the Semiconductor & Display Technology
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• v.20 no.4
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• pp.29-37
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• 2021

A 7 nm technology node using extreme ultraviolet lithography with a wavelength of 13.5 nm has been recently developed and applied to the semiconductor manufacturing process. Furthermore, the development of sub-3 nm technology nodes continues to be required. In this study, design factors of an electrostatic deflector for an ultra-miniaturized microcolumn system that can realize an electron wavelength of below 1.23 nm with an acceleration voltage of above 1 eV were investigated using a three-dimensional simulator. Particularly, the optimal design of the electrostatic octupole floating deflector was derived by optimizing the design elements and improving the driving method of the 1 keV low energy ultra-miniaturized microcolumn deflector. As a result, the entire wide field of view greater than 330 ㎛ at a working distance of 4 mm was realized with an ultra-high-resolution electron beam spot smaller than 10 nm. The results of this study are expected to be a basis technology for realizing a wafer-scale multi-array microcolumn system, which is expected to innovatively improve the throughput per unit time, which is the biggest drawback of electron beam lithography.

• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.93-93
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• 2016

Large scale integrated circuits (LSIs) has been improved by the shrinkage of the circuit dimensions. The smaller chip sizes and increase in circuit density require the miniaturization of the line-width and space between metal interconnections. Therefore, an extreme precise control of the critical dimension and pattern profile is necessary to fabricate next generation nano-electronics devices. The pattern profile control of plasma etching with an accuracy of sub-nanometer must be achieved. To realize the etching process which achieves the problem, understanding of the etching mechanism and precise control of the process based on the real-time monitoring of internal plasma parameters such as etching species density, surface temperature of substrate, etc. are very important. For instance, it is known that the etched profiles of organic low dielectric (low-k) films are sensitive to the substrate temperature and density ratio of H and N atoms in the H2/N2 plasma [1]. In this study, we introduced a feedback control of actual substrate temperature and radical density ratio monitored in real time. And then the dependence of etch rates and profiles of organic films have been evaluated based on the substrate temperatures. In this study, organic low-k films were etched by a dual frequency capacitively coupled plasma employing the mixture of H2/N2 gases. A 100-MHz power was supplied to an upper electrode for plasma generation. The Si substrate was electrostatically chucked to a lower electrode biased by supplying a 2-MHz power. To investigate the effects of H and N radical on the etching profile of organic low-k films, absolute H and N atom densities were measured by vacuum ultraviolet absorption spectroscopy [2]. Moreover, using the optical fiber-type low-coherence interferometer [3], substrate temperature has been measured in real time during etching process. From the measurement results, the temperature raised rapidly just after plasma ignition and was gradually saturated. The temporal change of substrate temperature is a crucial issue to control of surface reactions of reactive species. Therefore, by the intervals of on-off of the plasma discharge, the substrate temperature was maintained within ${\pm}1.5^{\circ}C$ from the set value. As a result, the temperatures were kept within $3^{\circ}C$ during the etching process. Then, we etched organic films with line-and-space pattern using this system. The cross-sections of the organic films etched for 50 s with the substrate temperatures at $20^{\circ}C$ and $100^{\circ}C$ were observed by SEM. From the results, they were different in the sidewall profile. It suggests that the reactions on the sidewalls changed according to the substrate temperature. The precise substrate temperature control method with real-time temperature monitoring and intermittent plasma generation was suggested to contribute on realization of fine pattern etching.

• Korean Journal of Environmental Biology
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• v.18 no.1
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• pp.1-20
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• 2000

There are increasing evidences of climate change in the Antarctic and Arctic Oceans, especially elevated temperature due to the continuous burning of the fossil fuels and ultraviolet B(UV-B) flux within the ozone hole. Light-dependent, temperature-sensitive, and fast-growing organisms respond to these physical and biogeochemical changes. Polar marine phytoplankton, which are pioneer endemic species and important carbon contributors in the polar waters, are therefore highly suitable biological indicators of such changes. By virtue of light requirement, the primary producers are exposed to extreme seasonal fluctuations in temperature, photosynthetically active radiation, and UV radiation. Local environmental warming and increased UV-B radiation during ozone depletion may have profound effects on the primary producers that are primary carbon producers in the polar water. Small changes in climate temperature and solar radiation may have profound effects on the activity threshold of the polar phytoplanktion. To demonstrate biological response to the environmental changes, standardized representative natural and biological parameters are needed so that replicate samples (including controls) can be taken over extended periods of time. In this paper, we review general characteristics of polar phytoplankton, their environment, environmental changes in the polar waters, the effects on the environmental changes to the polar phytoplankton, and the importance of the polar phytoplankton to understand the global environmental changes. [Biological indicators, Global environmental change, Polar phytoplankton, UV].

• Journal of the Korean Vacuum Society
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• v.15 no.6
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• pp.581-586
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• 2006

We have generated the argon plasma in the diode chamber based on the established coaxial electrode type and investigated the emitted visible light for emission spectroscopy. We applied various voltages $2\sim3.5kV$ to the device by 0.5kV, and obtained the emission spectrum data for the focused plasma in the diode chamber on the argon pressure of 330 mTorr. The Ar I and Ar II emission line are observed. The electron temperature and ion density have been measured by the Boltzmann plot and Saha equation from assumption of local thermodynamic equilibrium (LTE) The Ar I and Ar II ion densities have been calculated to be $\sim10^{15}/cc\;and\;~10^{13}/cc$, respectively, from Saha equation.

• Journal of the Microelectronics and Packaging Society
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• v.30 no.2
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• pp.65-70
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• 2023

Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

• Journal of Astronomy and Space Sciences
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• v.24 no.1
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• pp.55-68
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• 2007

We carried out a validation study on AURIC FUV/EUV dayglow calculation with $OII\;834{\AA},\;OI\;989{\AA},\;OI\;1027{\AA},\;NII\;1085{\AA},\;NI\;1134{\AA},\;NI\;1200{\AA},\;OI\;1304{\AA},\;OI\;1356{\AA}$ dayglows observed by STP78-1 satellite. Comparison between calculated and observed values indicates that they are in agreement within about 20% for dayglows of $OII\;834{\AA},\;OI\;1027{\AA},\;NI\;1200{\AA},\;OI\;1304{\AA}$. However, the calculated intensities of $OI\;989{\AA},\;NII\;1085{\AA},\;NI\;1134{\AA}$ are only 42, 74 and 45% of the observed values, respectively, showing serious differences from the observation. It was surmised that the differences in $OI\;989{\AA}\;and\;NI\;1134{\AA}$ are due to incomplete calculation of radiative transfer and uncertain photochemical processes in AURIC model, respectively. The difference in $NII\;1085{\AA}$ is conjectured to be due to variation of the input solar EUV flux rather than due to AURIC model itself. For up-looking dayglows from the satellite, the calculated values from AURIC are all less than those of STP78-1, which may imply that AURIC model does not include dayglow contribution from regions below the satellite altitude when it computes dayglows in up-looking direction. The differences are particularly serious for $OI\;989{\AA},\;NI\;1134{\AA},\;NI\;1200{\AA}$ dayglows. The calculated latitudinal variation of $OII\;834{\AA}$ dayglow is also significantly different from the observed one, especially at mid-latitude regions. This may be due to inability of MSISE-90 (in input of AURIC) to simulate oxygen atom densities at mid-latitudes during auroral storms at those days of STP78-1 observations. Our findings of the validation study should be resolved when AURIC model is revised in future.