• Title/Summary/Keyword: ex-situ

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Ultrathin Metal Films on Single Crystal Electrodes : Electrochemical & UHV Studies

  • ;A.Wieckowski
    • Proceedings of the Korean Vacuum Society Conference
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    • 1999.07a
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    • pp.141-141
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    • 1999
  • 전기화학과 초고진공(ultra-high vacuum, UHV) 분광법을 이용하여 고체/액체의 계면에서 일어나는 현상을 분자단위에서 이해하고 조절하기 위한 연구를 수행하였다. 이들 중 전기화학으로 형성된 구리 및 은 금속(sub)monlayer 박막을 그 예로 선택하여 소개한다. 초박막 금속의 흡착량은 cyclic voltammogram과 새로 개발된 Auger electron spectroscopy (AES) 정량법을 통해 얻어졌고, 이 값들은 low energy electron diffraction (LEED) 및 in-situ atomic force microscopy (AFM)법을 이용한 구조 분석결과와 비교되어졌다. 또한 화학상태를 확인하기 위하여 core-level electron energyy loss spectroscopy (CEELS)를 사용하였다. 먼저 황산 전해질에서 금(111) 단결정 전극상에 전기화학적으로 형성된 굴의 계면특성을 조사하였다. 특정 전위값에서 2/3 ML의 구리와 1/3 ML의 음이온이 상호 흡착하여 ({{{{ SQRT { 3} }}$\times${{{{ SQRT { 3} }}) 격자 구조를 보였고, 전위값이 커지거나 줄어들면, 이 구조가 사라지는 현상이 관찰되었다. 즉 이 ({{{{ SQRT { 3} }}}}$\times${{{{ SQRT { 3} }}}}) 흡착구조는 첫 번째 UPD underpotential deposition) 피크에 특이하게 관련되어 있음을 알 수 있었다. 금속 초박막 형성에 미치는 음이온의 영향을 좀 더 확인하기 위해 초박막 은이 증착된 금 단결정 전극상의 황산 음이온에 관하여 연구하였다. 은의 증착이 일어날 수 없는 양전위값 영역에서 ({{{{ SQRT { 3} }}}}$\times${{{{ SQRT { 3} }}}})의 규칙적인 음이온의 구조를 보였다. 그리고 은의 장착은 세척 과정과 용액의 농도에 따라 p(3$\times$3)과 p(5$\times$5)의 규칙적인 두가지 구조를 가졌다. in-situ AFM에서는 p(3$\times$3)의 은 증착 구조만 나타났고, 음 전위값으로 옮겨가면 p(1$\times$1) 구조로 바뀌었다. ex-situ 초고진공 결과와 이 AFM의 in-situ 결과를 상호 비교 논의할 것이다. 음이온의 흡착이 없는 묽은 플로르산(HF) 전해질에서 은은 전위값을 음전위 쪽으로 이동해 감에 따라 p(3$\times$3), p(5$\times$5), (5$\times$5), (6$\times$6), 그리고 (1$\times$1)의 연속적 구조 변화를 보였다. 이 다양한 구조들을 AES로부터 얻어진 표면 흡착량과 연결시켰더니 정량적으로 잘 일치되는 결과를 보였다. 전기화학적인 증착에서는 기존의 진공 증착과 비교할 때 음이온의 공흡착이 금속 초박막 형성 메카니즘에 큰 영향을 미침을 알 수 있었다. 또한 은의 전기화학적 다층박막 성장은 MSM (monolayer-simultaneous-multilayer) 메카니즘을 따름을 확인하였다. 마지막으로 구조 및 양이 규칙적으로 조절되는 전극의 응용가능성이 간단히 논의될 것이다.

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Formation and Interface Mophologies of the Epitaxial $\textrm{CoSi}_2$ Using the Chemical Oxide on Si(100) Substrate (화학적 산화막을 이용한 epitaxial $\textrm{CoSi}_2$형성과 계면구조)

  • Sin, Yeong-Cheol;Bae, Cheol-Hwi;Jeon, Hyeong-Tak
    • Korean Journal of Materials Research
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    • v.8 no.10
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    • pp.912-917
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    • 1998
  • 화학적 산화막(SiOx)이 형성된 Si(100)기판 위에 Co-silicide의 형성과 계면 형상에 관한 연구를 하였다. 화학적 산화막은 과산화수소수(H2O2)의 인위적 처리에 의해 약 2nm을 형성시켰다. 그 위에 5nm 두께의 Co 박막을 전자빔 증착기에 의해 증착시킨 후 열처리하여 Co-silicide를 형성하였다. 화학적 산화막 위에서 Co-silicide 반응기구를 알아 보기 위해 $500^{\circ}C$-$900^{\circ}C$의 온도 범위에서 ex-situ와 in-situ 열처리를 하였다. 이와같이 형성된 Co-silicide 시편의 상형성, 표면 및 계면 형상, 그리고 화학적 조성을 XRD, SEM, TEM, 그리고 AES를 이용하여 분석하였다. 분석 결과 es-situ 열처리시 $700^{\circ}C$까지 CoSi2 상은 형성되지 않았고 Co의 응집화현상이 일어났다. $800^{\circ}C$ 열처리한 경우에는 CoSI2가 형성되었고 facet 현상이 크게 나타났으며 불연속적인 grain 들이 형성되었다. In-situ 열처리한 경우에는 저온에서 ($550 ^{\circ}C$)반응하여 Co-silicide가 형성되기 시작하였으며 $600^{\circ}C$부터는 facet에 의해 박막의 특성이 나빠지기 시작했다. $550^{\circ}C$에서 Co가 화학적 산화막 층을 통해 확산하여 균질한 Co-silicide를 형성하였다. 이와같이 형성된 균질한 실리사이드 층을 이용하여 다단계(55$0^{\circ}C$-$650^{\circ}C$-$800^{\circ}C$)열처리에 의해 균질한 다결정 CoSI2의 형성이 관찰되었다.

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Work function engineering on transparent conducting ZnO thin films

  • Heo, Gi-Seok;Hong, Sang-Jin;Park, Jong-Woon;Choi, Bum-Ho;Lee, Jong-Ho;Shin, Dong-Chan
    • 한국정보디스플레이학회:학술대회논문집
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    • 2007.08b
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    • pp.1706-1707
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    • 2007
  • A possibility of work function engineering on ZnO thin film is studied by in-situ and ex-situ doping process. The work function of ZnO thin film decreases with increasing boron and phosphorus doping quantity. But, the work function of Al-doped ZnO (AZO) thin film increases as the boron doping quantity incresess. The range of work function change on ZnO thin films is 3.5 eV to 5.5 eV. This result shows that the work function of ZnO thin film is indeed engineerable by changing materials of dopants and their compositional distribution of surface. We also discuss the possible mechanism of work function engineering on ZnO thin films.

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Geographical Variation and Genetic Diversity of Glhenia littoralis Fr. Schmidt et Miquel based on the Analysis of Internal Transcribed Spacer(ITS) sequence and Random Amplified Polymorphic DNA(RAPD) (멸종위기 희귀식물인 갯방풍 자생지별 유전변이 및 유전적 다양성 연구)

  • Moon, Byeong-Cheol;Choo, Byung-Kil;Ji, Yun-Ui;Yoon, Tae-Sook;Kim, Ho-Kyoung
    • Korean Journal of Oriental Medicine
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    • v.14 no.3
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    • pp.49-56
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    • 2008
  • Glehnia littoralis Fr. Schmidt et Miquel is an important medicinal plants in East Asian countries. This plant species naturally distributed in Korea, Japan, China, and Taiwan, but it is a rare plants living in the coastal dune in Korea. To investigate the genetic variation, genetic diversity and genetic evolutionary relationships of 14 different geographical G. littoralis, ITS sequence and random amplified polymorphic DNA (RAPD) were analyzed. On the basis of ITS sequences, it was clearly showed that the ITS1 and ITS2 sequences among 14 populations are identical regardless of geographical origin excepting 2 bp in pair-wise comparison of ITS1. Furthermore, RAPD results also showed that 14 different geographical G. littoralis produce various polymorphic patterns without critical relationship among neighboring regions. These combined results suggest that the geographical variation and genetic evolution of G. littoralis is stable and provide important information on genetic diversity, and conservation of this rare plant species in situ and ex situ.

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A Study on SiC Buffer Layer Prepared by Ultra High Vacuum Electron Cyclotron Resonance CVD (초고진공 전자공명 플라즈마를 이용한 SiC buffer layer 형성에 관한 연구)

  • Joen, Woo-Gon;Pyo, Jae-Hwak;Whang, Ki-Woong
    • Proceedings of the KIEE Conference
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    • 1995.11a
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    • pp.326-328
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    • 1995
  • SiC buffer layers were grown on Si(100) substrates by ultra-high-vacuum electron cryclotron resonance plasma (UHV ECR plasma) from $CH_4/H_2$ mixture at 700$^{\circ}C$. The electron densities and temperature were measured by single probe. The axial plasma potentials measured by emissive probe had the double layer structure at positive substrate bias. Piranha cleaning was carried out as ex-situ wet cleaning. Clean and smooth silicon surface were prepared by in-situ hydrogen plasma cleaning at 540$^{\circ}C$. A short exposure to hydrogen plasma transforms the Si surface from 1$\times$1 to 2$\times$1 reconstruction. It was monitored by reflection high energy electron diffraction (RHEED). The defect densities were analysed by the dilute Schimmel etching. The results showed that the substrate bias is important factor in hydrogen plasma cleaning. The low base pressure ($5\times10^{-10}$ torr) restrains the $SiO_2$ growth on silicon surface. The grown layers showed different characteristics at various substrate bias. RHEED and K-ray Photoelectron spectroscopy study showed that grown layer was SiC.

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Metal-Organic Vapor Phase Epitaxy IV. MOVPE and ALE Reaction Mechanisms (MOVPE 단결정층 성장법 IV. MOVPE 및 ALE 반응경로)

  • 정원국
    • Journal of the Korean institute of surface engineering
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    • v.24 no.1
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    • pp.1-17
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    • 1991
  • Understanding of the detailed reaction mechanisms during MOVPE and ALE is essential to further improve the properties of the grown crystals and the controllability of the growth parameters. The unified models for the detailed reaction paths are not available at this stage. The study, however, has been advanced to the extent that consensus on some of the reaction paths can be drawn from the scattered data. Metalakyls such as TMGa and TMIn seem to nearly fully decompose in the gas phase through homogeneous reaction at the typical MOVPE growth temperature. Hydrides such as AsH3 and PH3, on the contrary. seem to decompose heterogeneously onthe substrate surfaces as well as homogeneously in the gas phase. However, at lower temperatures, where ALE crystals are typically grown, the growth process is strongly dependent on the surface reactions. It seems that steric hindrance effects which the radicals reaching the substrate exhibit on the surface the growth rate a function of the metalalkyle supply durations. In addition, dydrogens released from hydrides seem to play an essential role in removing carbons leberated from the metalalkyls. High growth temperatures also seem to be effective in desorbing carbons from surface. The understanding of the reaction mechanisms was possible though diverse appraaches utilizing many ex-situ and in-situ diagnostic techniques and genuine experimental designs. It is the purpose of this paper to review and discuss many of these efforts and to draw some possible conclusions from them.

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Metal-Organic Vapor Phase Epitaxy IV. MOVPE and ALE Reaction Mechanisms (MOVPE 단결정층 성장법 IV. MOVPE 및 ALE 반응경로)

  • 정원국
    • Journal of the Korean institute of surface engineering
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    • v.24 no.1
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    • pp.1.1-1.1
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    • 1991
  • Understanding of the detailed reaction mechanisms during MOVPE and ALE is essential to further improve the properties of the grown crystals and the controllability of the growth parameters. The unified models for the detailed reaction paths are not available at this stage. The study, however, has been advanced to the extent that consensus on some of the reaction paths can be drawn from the scattered data. Metalakyls such as TMGa and TMIn seem to nearly fully decompose in the gas phase through homogeneous reaction at the typical MOVPE growth temperature. Hydrides such as AsH3 and PH3, on the contrary. seem to decompose heterogeneously onthe substrate surfaces as well as homogeneously in the gas phase. However, at lower temperatures, where ALE crystals are typically grown, the growth process is strongly dependent on the surface reactions. It seems that steric hindrance effects which the radicals reaching the substrate exhibit on the surface the growth rate a function of the metalalkyle supply durations. In addition, dydrogens released from hydrides seem to play an essential role in removing carbons leberated from the metalalkyls. High growth temperatures also seem to be effective in desorbing carbons from surface. The understanding of the reaction mechanisms was possible though diverse appraaches utilizing many ex-situ and in-situ diagnostic techniques and genuine experimental designs. It is the purpose of this paper to review and discuss many of these efforts and to draw some possible conclusions from them.

Genetic diversity and population structure of endangered Neofinetia falcata (Orchidaceae) in South Korea based on microsatellite analysis

  • Han, Jeong Eun;Choi, Byoung-Hee;Kwak, Myounghai
    • Journal of Species Research
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    • v.7 no.4
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    • pp.354-362
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    • 2018
  • Population genetic assessment is essential for the conservation and management of endangered and rare plants. Neofinetia falcata is endangered epiphyte orchid and protected by law in Korea. In Korea, this species is only found on islands in the South Sea of Korea (including Jeju-do) and the southern coast of the Korean Peninsula. We developed nine microsatellite makers to assess the genetic diversity and population genetic structure of three populations of N. falcata. The genetic diversity at the species level was low, which can be attributed to inbreeding or fragmentation into small, isolated populations. A recent bottleneck was detected in one population, likely due to overcollection. N. falcata exhibited moderated levels of differentiation among populations, with the three populations were divided into two clusters based on genetic structure. The genetic diversity and structure of N. falcata are affected by restricted gene flow by pollen or seeds due to isolation and geographic distance. Strategies for in situ and ex situ conservation of this species are been proposed based on the results of our study.

Progress in the co-evaporation technologies developed for high performance REBa2Cu3O7-δ films and coated conductors

  • Lee, J.W.;Yoo, S.I.
    • Progress in Superconductivity and Cryogenics
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    • v.14 no.4
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    • pp.5-11
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    • 2012
  • In this review article, we focus on various co-evaporation technologies developed for the fabrication of high performance $REBa_2Cu_3O_{7-{\delta}}$ (RE: Y and Rare earth elements, REBCO) superconducting films. Compared with other manufacturing technologies for REBCO films such as sputtering, pulsed laser deposition (PLD), metal-organic deposition (MOD), and metal organic chemical vapor deposition (MOCVD), the co-evaporation method has a strong advantage of higher deposition rate because metal sources can be used as precursor materials. After the first attempt to produce REBCO films by the co-evaporation method in 1987, various co-evaporation technologies for high performance REBCO films have been developed during last several decades. The key points of each co-evaporation technology are reviewed in this article, which enables us to have a good insight into a new high throughput process, called as a Reactive Co-Evaporation by Deposition and Reaction (RCE-DR).

PREFERRED ORIENTATION OF TIN FILM STUDIED BT A REAL TIME SYNCHROTRON X-RAY SCATTERING

  • Je, J.H.;Noh, D.Y.
    • Journal of the Korean institute of surface engineering
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    • v.29 no.5
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    • pp.399-406
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    • 1996
  • The orientational cross-over phenomena in an RF sputtering growth of TiN films were studied in an in-situ, real-time synchrotron x-ray scattering experiment. For the films grown with pure Ar sputtering gas, the cross-over from the more strained (002)-oriented grains to the less strained (111)-oriented grains occurred as the film thickness was increased. As the sputtering power was increased, the cross-over thickness, at which the growth orientation changes from the <002> to the <111> direction, was decreased. The addition of $N_2$ besides Ar as sputtering gas suppressed the cross-over, and consequently resulted in the (002) preferred orientation without exhibiting the cross-over. We attribute the observed cross-over phenomena to the competition between the surface and the strain energy. The x-ray powder diffraction, the x-ray reflectivity, and the ex-situ AFM surface topology study consistently suggest that the microscopic growth front was in fact always the (002) planes. In the initial stage of growth, the (002) planes were aligned to the substrate surface to minimize the surface energy. At later stages, however, the (002) growth front tilted away from the surface by about $60^{\circ}$ to relax the strain, which caused the cross-over of the preferred growth direction to the <111> direction.

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