• Proceedings of the KIEE Conference
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• 2000.11c
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• pp.416-418
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• 2000

Thin films of phase-pure perovskite $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ (PLT) were deposited in-situ onto Pt/Ti/$SiO_2$/Si substrates by pulsed laser deposition. We have systematically investigated the variation of grain sizes depending on the process condition. Both in-situ annealing and ex-situ annealing treatments have been compared depending on the annealing time. The grain sizes of PLT thin films were successfully controlled 260 to 350 nm by changing process parameters. Microstructural and electrical properties of the film were investigated by C-V measurement, leakage current measurement and SEM. Two-step process to grow $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3$ (PLT) films was adopted and verified to be useful to enlarge the grain size of the film and to enhance the leakage current characteristics.

• Proceedings of the KIEE Conference
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• 2000.07c
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• pp.1483-1484
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• 2000

Dielectric thin films of PLT(Pb(La.Ti)O3) for the application of highly integrated memory devices have been deposited on Pt/Ti/SiO2/Si substrates in situ by pulsed laser deposition(PLD). We have systematically investigated the variation of grain sizes depending on the condition of post-annealing and the variation of deposition rate. Both in-situ annealing and ex-situ annealing have been compared depending on the annealing time. C-V measurement, ferroelectric properties, leakage current and SEM were performed to investigate the electrical properties and the microstructural properties of Pb(La,Ti)$O_3$ films.

• Journal of the Korean Physical Society
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• v.73 no.9
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• pp.1329-1333
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• 2018

We investigated the mechanism of mobility enhancement after the dehydrogenation process in polycrystalline silicon (poly-Si) thin films. The dehydrogenation process was performed by using an in-situ CVD chamber in a $N_2$ ambient or an ex-situ furnace in air ambient. We observed that the dehydrogenated poly-Si in a $N_2$ ambient had a lower oxygen concentration than the dehydrogenated poly-Si annealed in an air ambient. The in-situ dehydrogenation increased the (111) preferred orientation of poly-Si and reduced the oxygen concentration in poly-Si thin films, leading to a reduction of the trap density near the valence band. This phenomenon gave rise to an increase of the field-effect mobility of the poly-Si thin film transistor.

• Journal of Korean Society of Forest Science
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• v.83 no.2
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• pp.191-204
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• 1994

Due to its topographic complexities and various climatical condition, Korea exhibits diverse forest types. Dominant tree species in this zone are Quercus spp., Betula spp., Zelkova spp., Fraxinus spp., Pinus densiflora, Pinus koraiensis, and Pinus thunbergii ete. Genetic conservation in forest species in Korea there are three ways ; one is in situ, other is ex situ and third is in-facility conservation. In situ conservation include that are the present status of conservation of rare and endangered flora and ecosystem, the reserved forest, the national and provincial park, and the gene pool of natural forests. Ex situ conservation means to be established the new forest from in situ forest stands, progeny and provenance test populations, seed orchard and clone banks, and gene conservation in-facility. As a tool for low temperature storage, several aspects on in vitro system were studied ; (1) establishment of in vitro cultures from juvenile and/or rejuvenated tissues, (2) induction of multiple shoots from the individual micropropagules, (3) elongation of the proliferated shoots. Studies on cold storage for short-and long-term maintenance of in vitro cultures under $4^{\circ}C$ in the refrigerator were conducted. For the cryopreservation at $-196^{\circ}C$, various factors affecting survivability of the plant materials are being examined. The necessity of gene conservation of forest trees is enlarged not only to increase the adaptability for various environments but also to gain the breeding materials in the future. For effective gene conservation of forest trees, I would like to suggest followings ; 1. Forest stands reserved for other than the gene conservation purposes such as national parks should be investigated by botanical and gene-ecological studies for selecting bio-diversity and gene conservation stands. 2. Reserved forest for gene pool should be extented both economically important tree spp. and non-economical species. 3. Reserved forest for progeny test and clone bank should be systematically investigated for the use of Ex situ forest gene conservation. 4. We have to find out a new methodology of genetic analysis determining the proper and effective size of subpopulation for in situ gene conservation. 5. We should develop a new tree breeding systems for successful gene conservation and utilization of the genetic resources. 6. New method of in-facility gene conservation using advanced genetic engineering should be developed to save time and economic resources. 7. For the conservation of species with short-life span of seed or shortage of knowledge of seed physiology, tissue culture techniques will be played a great role for gene conservation of those species. 8. It is are very useful conservation not only of genes but of genotypes which were selected already by breeding program. 9. Institutional and administrative arrangements including legistlation must be necessarily taken for gene conservation of forest trees. 10. It is national problems for conservation of forest resources which have been rapidly destroyed because of degenerating environmental condition and of inexperienced management system of bio-diversity and gene conservation. 11. In order to international cooperation for exchanging data of bio-diversity and gene conservation, we should connect to international net works as soon as possible.

• Journal of Environmental Impact Assessment
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• v.6 no.2
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• pp.153-164
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• 1997

This study was conducted to develop the new Environmental Impact Assessment techniques for the grading of rareness in plant. 17 EISs which were submitted in 1996 were analyzed to know the problems in existent EIA techniques for the conservation of rare plants. Category of rare plant was reevaluated and evaluation technique for the grading of rareness in plant was developed. The results obtained from this study were as follows: 1. The evaluation technique of rareness in plant was not reflected in the current preparation provision for EIS. And t his fact also appeared in most of the EIS which were reexamined in this study. 2. The category of rare species which have been considered as the subject of protection in EIA have to be enlarged to more than legally protected species designated by MOE. 3. The taxonomic characteristics and status of species, characteristics of population, geographical characters, extent of threat and its possibility by man resulted from the habitat loss were investigated. Each item was endowed scores from 1 to 5 and all the scores were summed, and then this value was used to evaluate the order of conservation. 4. Conservation measures for the rare plants have to be applied according to the levels of rareness grade, and they are absolute conservation, in situ conservation, transplanting and ex situ conservation, post observation and none by the levels from A to E. 5. Considering the phenology of rare plants, investigation for the rare plants have to be made a1 least three times. 6. Size of the MVP(Minimum Viable Population), pollination ecology also have to be considered for the conservation of rare plants. And in the case of adopting ex situ conservation measure, the site and methods for the conservation of rare plants have to be proposed in detail.

• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.35-35
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• 2011

반도체 공정 및 디스플레이 공정에서 발생하는 오염입자는 공정 불량을 일으키는 가장 큰 원인 중의 하나이며, 수십 나노에서 수 백 나노의 크기를 갖는다. 최근 디스플레이 및 반도체 산업이 발전함에 따라 회로의 선폭이 점차 감소하고 있으며 오염입자의 임계 직경(critical diameter) 또한 작아지고 있다. 현재 반도체 및 디스플레이 산업에서 사용되는 측정방법은 레이저를 이용하여 공정 후 표면에 남아있는 오염입자를 측정하는 ex-situ 방법이 주를 이루고 있다. Ex-situ 방법을 이용한 오염입자의 제어는 웨이퍼 전체를 측정할 수 없을 뿐만 아니라 실시간 측정이 불가능하기 때문에 공정 모니터링 장비로 사용이 어려우며 오염입자와 공정 간의 상관관계 파악에도 많은 제약이 따르게 된다. 이에 따라 저압에서 in-situ 방법을 이용한 실시간 오염입자 측정 기술 개발이 요구되고 있다. 본 연구에서는 저압 환경에서 실시간으로 입자를 모니터링 할 수 있는 장비를 입자의 광 산란 원리를 이용하여 개발하였으며, 산란 신호를 입자크기로 변환하는 신호 분석 알고리즘 연구를 수행하였다. 빛이 입자와 충돌하게 되면 산란 및 흡수 현상이 발생하게 되는데 이 때 발생하는 산란 및 흡수량과 입자 크기와의 연관성이 Gustav Mie에 의해서 밝혀졌으며, 현재까지 광을 이용한 입자 크기 분석 장치의 기본 원리로 사용되고 있다. 하지만, Mie 이론은 단일입자가 일정한 강도를 가진 광을 통과할 경우인 이상적인 조건에서 적용이 가능하고 실제 조건에서는 광이 가우시안 분포를 가지며 광 집속에 의해서 광 강도가 위치에 따라 변하기 때문에 이러한 조건을 가지는 광을 입자가 통과할 때 발생하는 산란량은 단순히 Mie 이론에 의해서 계산하는 것이 불가능 하다. 본 연구에서는 이러한 현상을 입자 측정의 불확정성 이라고 규정하고 입자가 특정한 위치를 통과할 확률을 이용하여 신호를 분석하는 알고리즘을 개발 및 연구를 수행하였다.

• Korean Journal of Optics and Photonics
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• v.6 no.4
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• pp.259-265
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• 1995

Antireflection coatings on optical lenses commertially available in domestic market are optically analyzed. Transmission spectra and reflection spectra are collected using spectrophotometers. The apparent absorption spectra around the absorption band edge are dominated by the substrate absorption. The reflection spectra and the apparent absorption spectra at visible region between 400nm and 700nm show very strong correlation to each other except a couple samples. The discrepency observed in the latters are due to an increased absorption in visible region by the substrate, which is negative effect of these samples. An antireflection coating consisted of $SiO_2/TiO_2/SiO_2/ZrO_2/Cr$ is made on c-Si substrate for spectroscopic ellispometry analysis. A film-by-film coating is accomplished and between each film deposition, ex-situ spectroscopic ellipsometry measurements are made. The analysis of the spectroscopic ellipsometry data reveals that the average film densities of $ZrO_2$ and $TiO_2$ reach only 80% of their respective packing densities and thick films are inhomogeneous along film growth direction. Discussions are made toward in-situ, real-time monitoring of the film growth so that a real-time feedback is possible to achieve a post-correction to minor deviations occured in the previous step. step.

• Proceedings of the Korean Vacuum Society Conference
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• 2010.02a
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• pp.327-327
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• 2010

디스플레이 및 반도체 산업이 발전함에 따라 회로의 선폭이 점차 줄어들고 있으며, 이에 따라서 대표적인 오염원이 되는 오염입자의 임계 직경(critical diameter) 또한 작아지고 있다. 현재 반도체 및 디스플레이 산업에서 사용되는 측정방법은 레이저를 이용하여 공정 후 표면에 남아 있는 오염입자를 측정하는 ex-situ 방법이 주를 이루고 있다. Ex-situ 방법을 이용한 오염입자의 제어는 웨이퍼 전체를 측정할 수 없을 뿐만 아니라 실시간 측정이 불가능하기 때문에 공정 모니터링 장비로 사용이 어려우며 오염입자와 공정 간의 상관관계 파악에도 많은 제약이 따르게 된다. 이에 따라 저압에서 in-situ 방법을 이용한 실시간 오염입자 측정 기술 개발이 요구되고 있다. 본 연구에서는 저압 환경에서 실시간으로 입자를 모니터링 할 수 있는 장비를 입자의 광산란 원리를 이용하여 개발하였다. 빛이 입자에 조사되면 크게 산란 및 흡수현상이 일어나게 되는데, 이 때 발생하는 산란광은 입자의 크기와 관계가 있으며 Mie 이론으로 널리 알려져 있다. 현재 이를 이용한 연구가 국내 및 국외에서 진행되고 있다. 수 백 nm 대의 입자를 측정하기 위해서는 빛의 강도가일정 수준 이상 되어야 하며, 이를 측정할 수 있는 수신부의 감도 또한 중요하다. 본 연구에서는 빛의 직경을 100 um 이하까지 집속할 수 있는 광학계를 상용 프로그램을 이용하여 설계하였으며, 강도가 약한 산란광 측정을 위하여 노이즈 제거 필터링 기술 등이 적용된 수신부 센서를 개발하여 전체 시스템에 적용하였다. 교정은 상압과 저압에서 수행 하였으며 약 5%의 측정효율로 최소 300 nm 이하의 입자까지 측정이 가능함을 확인 하였다. 또한, 타사의 실시간 입자 측정 센서와의 비교 실험을 통하여 성능평가를 수행하였다. 기존 광산란 방식 센서보다 높은 성능의 센서를 개발하기 위하여 추후 연구를 진행할 계획이며, 약 200 nm 이하의 입자까지 측정이 가능할 것으로 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2015.08a
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• pp.70.2-70.2
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• 2015

현재 반도체 및 디스플레이이 공정 분야는 1 um 이상의 입자에서부터 10 nm이하 크기의 오염입자를 제어해야 한다. 현재 오염원인을 파악하기 위해서 사용하는 방법은 공정 완료 후 대상물(웨이퍼 및 글래스)을 CD-SEM (Critical Dimension Scanning Electron Microscope)와 같은 첨단 분석장비를 사용하여 사후 (Ex-situ) 진행하고 있다. 이러한 방법은 오염원이 이미 공정 대상물을 오염시키고 난 후 그 원인을 분석하는 방법으로 그 원인을 찾기가 어려울 뿐만 아니라, 최근 공정관리가 공정 진행 중(In-situ) 행해져야 하는 추세로 봤을 때 합당한 방법이라 할 수 없다. 이를 해결하기 위해 진공공정 중 레이저를 이용하여 측정하고자 하는 여러 시도들이 있었지만, 여전히 긍정적인 답변을 보여주지 못하고 있다. 본 발표에서 소개하는 PCDS (Particle Characteristic Diagonosis System)은 PBMS (Particle Beam Mass Spectrometer)와 SEM (Scanning Electron Microscope), 그리고 EDS (Energy Dispersive X-ray Spectroscopy)를 통합하여 만든 시스템으로 진공공정 중 (In-situ) 챔버 내부에서 발생하고 있는 입자의 크기 분포, 입자의 형상, 그리고 입자의 성분을 실시간으로 분석할 수 있는 방법을 제공한다. 이러한 방법 (PCDS)에 대한 개념과 원리, 그리고 현재까지 개발된 단계에서 얻어진 결과에 대해 소개할 것이다.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.13 no.12
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• pp.1032-1038
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• 2000

Ni$_{81}$$Fe_{19}$(200 nm) thin films have been deposited by RF-magnetron sputtering on Si(001) substrates, Atomic force microscopy(AFM), X-ray diffraction(XRD) and magnetoresistance(MR) measurements of the thin films for investigating electromagnetic properties and microstructures were employed. During field annelaing for 1hr, there was no big difference n XRD patterns of Ni$_{81}$$Fe_{19}$ thin films. However, there was a significant change in XRD patterns of Ni$_{81}$$Fe_{19}$ thin films deposited at 40$0^{\circ}C$ during in-situ magnetic field deposition. The degree of surface roughness increased with increasing annealing and deposition temperature. With variation of surface roughness, there was no significant difference in MR Characteristics of Ni$_{18}$ $Fe_{19}$ thin films in 1hr-annealed case. High MR ratio was observed in the case of in-situ field deposited Ni$_{81}$$Fe_{19}$ films. 19/ films.