• Title/Summary/Keyword: etching solution.

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A Fabrication Method of Blade Type Tip for Probe Unit Device (프르브유닛 소자용 블레이드형 팁 제조방법)

  • Lee, Keun-Woo;Lee, Jae-Hong;Kim, Chang-Kyo
    • The Transactions of The Korean Institute of Electrical Engineers
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    • v.56 no.8
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    • pp.1436-1440
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    • 2007
  • Beryllium copper has been known to be an important material for the various fields of industry because it can be used for mechanical and electrical/electronic components that are subjected to elevated temperatures (up to $400^{\circ}C$ for short times). Blade type tip for probing the cells of liquid crystal display(LCD) was fabricated using beryllium copper foil. The dry film resist was employed as a mask for patterning of the blade type tip. The beryllium copper foil was etched using hydrochloric acidic iron-chloride solution. The concentration, temperature, and composition ratio of hydrochloric acidic iron-chloride solution affect the etching characteristics of beryllium copper foil. Nickel with the thickness of $3{\mu}m$ was electroplated on the patterned copper beryllium foil for enhancing its hardness, followed by electroplating gold for increasing its electrical conductivity. Finally, the dry film resist on the bridge was removed and half of the nickel was etched to complete the blade type tip.

An Electron Microscopic Investigation of the Structure of Thin Film Tin Oxide Material

  • Jeon, Eok-Gui;Choy, Jin-Ho;Choi, Q.-won;Kim, Ha-Suck
    • Bulletin of the Korean Chemical Society
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    • v.6 no.5
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    • pp.304-308
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    • 1985
  • Morphological structure of tin oxide thin films was examined by transmission electron microscopy. TEM samples were prepared by chemical etching in hydrogen fluoride solution: firstly floating for 2-3 minutes in acid solution, then suspending on water found to be useful for the preparation of TEM samples. Electron micrographs showed the size of grains of the tin oxide crystal was dependent upon the temperature of the film preparation. Dopant concentration and heating time also influence the grain size. The resistivity of tin oxide material was explained by grain size and grain boundaries in a limited temperature and dopant concentration ranges.

A study on the Separation of Acetic Acid, Nitric Acid and Hydrofluoric Acid from Waste Etching Solution of Si Wafer Manufacturing Process (Silicon wafer 에칭공정시 발생(發生)되는 폐(廢)에칭액 으로부터 초산(醋酸), 질산(窒酸) 및 불산(弗酸)의 분리.회수(分離.回收)에 관한 연구(硏究))

  • Kim, Jun-Young;Lee, Hyang-Sook;Shin, Chang-Hoon;Kim, Ju-Yup;Kim, Hyun-Sang;Ahn, Jae-Woo
    • Resources Recycling
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    • v.16 no.1 s.75
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    • pp.59-67
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    • 2007
  • Recovery of acids from the waste etching solution of containing acetic, nitric and hydrofluoric acid discharged from silicon wafer manufacturing process has been attempted by using solvent extraction method. EHA(2-Ethylhexlalcohol) for acetic acid and TBP(Tri-butly Phosphate) for nitric and hydrofluoric acid as a extraction agent was used to the experiment to obtain the process design data in separation procedure. From the experimental data and McCabe-Thiele diagram analysis, we obtained the optimum conditions of phase ratio(O/A) and stages to separate each acid sequently from the mixed acids. The recovery yield was obtained above 90% for acetic acid from the acid mixtures, 90% for nitric acid from acetic acid extraction raffinate and then above 67% for hydrofluoric acid from final extraction raffinate.

The Optimization of Solvent Extraction Process of Iron Chloride Etching Waste Solution (염화철 에칭폐액의 용매추출공정 최적화에 관한 연구)

  • Park, Il-Jeong;Kim, Dae-Weon;Kim, Geon-Hong;Chae, Hong-jun;Lee, Sang-Woo;Jung, Hang-Chul
    • Clean Technology
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    • v.23 no.3
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    • pp.279-285
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    • 2017
  • In this study, a new organophosphorus acid-based solvent (KMC-P) from KMC Co., Ltd. was used for the recovery of the iron chloride etching waste solution. In order to increase the extraction efficiency for the new solvent in the solvent extraction process, we selected the process variables and conducted the optimization experiment according to the DOE to investigate the correlation between the variables. Solvent concentration, pH, and O/A ratio were found to be factors affecting extraction and stripping efficiency. The optimum stripping efficiency was 69.7% when the solvent concentration was 29.4 wt%, the HCl addition amount was 0 mL, and the O/A ratio was 7, and the reliability was more than 86%.

Gravure Halftone Dots by Laser Direct Patterning (레이저 직접 패터닝에 의한 그라비아 망점 형성)

  • Suh, Jeong;Han, You-Hie;Kang, Lae-Heuck
    • Journal of the Korean Society for Precision Engineering
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    • v.17 no.11
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    • pp.191-198
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    • 2000
  • Laser direct patterning of the coated photoresist (PMER-NSG31B) layer was studied to make halftone dots on gravure printing roll. The selective laser hardening of photoresist by Ar-ion laser(wavelength: 333.6~363.8nm) was controlled by the A/O modulator. The coating thickness in the range of 5~11$\mu m$ could be obtained by using the up-down directional moving device along the vertically located roll. The width, thickness and hardness of the hardened lines formed under the laser power of 200~260㎽ and irradiation time of 4.4~6.6 $\mu$sec/point were investigated after developing. The hardened width increased as the coating thickness increased. Though the hardened thickness was changed due to the effect of the developing solution, the hardened layer showed good resistance to the scratching of 2H pencil. Also, the hardened minimum line widths of 10$\mu m$ could be obtained. The change of line width was also found after etching, and the minimum line widths of 6$\mu m$ could be obtained. The hardened lines showed the good resistance to the etching solution. Finally, the experimental data could be applied to make gravure halftone dots using the developed imaging process, successfully.

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Convergence Study on FTO Film Etchant (FTO 필름 식각액에 관한 융합연구)

  • Han, Doo-Hee;Yang, Ui-Dong
    • Journal of Convergence for Information Technology
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    • v.8 no.6
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    • pp.43-48
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    • 2018
  • An etchant capable of forming a circuit in an FTO film that can replace ITO, which depends on full imports, was prepared. The etching solution is composed of 1 to 30% by weight of fluoride, 1 to 20% by weight of acid, 0.5 to 5% by weight of surfactant, 5 to 20% by weight of solvent, 0.5 to 10% by weight of corrosion inhibitor and the balance of water. This etchant can be etched using a dry film, thereby reducing the cost, and is free from bubbles and residue of the etchant. The characteristics of the etchant were etched in a time of 2 minute with a 100 nm thick FTO, and the etchant temperature was maintained at $50^{\circ}C$. An undercut of -0.00364% was obtained when put into a 2 minute etching solution. No harmful substances such as Cd, Pb, Hg and Cr components were measured. The use of FTO in Korea where rare earths do not exist can achieve localization and import substitution effect.

Electrochemical Properties of Individual Carbon Nanotube Fabricated by Reactive Ion Etching (반응성 이온 식각법에 의해 제작된 탄소나노튜브 전극의 전기화학적 특성)

  • Hwang, Sook-Hyun;Choi, Hyon-Kwang;Kim, Sang-Hyo;Han, Young-Moon;Jeon, Min-Hyon
    • Korean Journal of Materials Research
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    • v.21 no.2
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    • pp.89-94
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    • 2011
  • In this work, fabrication and electrochemical analysis of an individual multi-walled carbon nanotube (MWNT) electrode are carried out to confirm the applicability of electrochemical sensing. The reactive ion etching (RIE) process is performed to obtain sensitive MWNT electrodes. In order to characterize the electrochemical properties, an individual MWNT is cut by RIE under oxygen atmosphere into two segments with a small gap: one segment is applied to the working electrode and the other is used as a counter electrode. Electrical contacts are provided by nanolithography to the two MWNT electrodes. Dopamine is specially selected as an analytical molecule for electrochemical detection using the MWNT electrode. Using a quasi-Ag/AgCl reference electrode, which was fabricated by us, the nanoelectrodes are subjected to cyclic voltammetry inside a $2{\mu}L$ droplet of dopamine solution. In the experiment, RIE power is found to be a more effective parameter to cut an individual MWNT and to generate "broken" open state, which shows good electrochemical performance, at the end of the MWNT segments. It is found that the pico-molar level concentration of analytical molecules can be determined by an MWNT electrode. We believe that the MWNT electrode fabricated and treated by RIE has the potential for use in high-sensitivity electrochemical measurement and that the proposed scheme can contribute to device miniaturization.

Synthesis of vertically aligned silicon nanowires with tunable irregular shapes using nanosphere lithography

  • Gu, Ja-Hun;Lee, Tae-Yun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.88.1-88.1
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    • 2012
  • Silicon nanowires (SiNWs), due to their unusual quantum-confinement effects that lead to superior electrical and optical properties compared to those of the bulk silicon, have been widely researched as a potential building block in a variety of novel electronic devices. The conventional means for the synthesis of SiNWs has been the vapor-liquid-solid method using chemical vapor deposition; however, this method is time consuming, environmentally unfriendly, and do not support vertical growth. As an alternate, the electroless etching method has been proposed, which uses metal catalysts contained in aqueous hydrofluoric acids (HF) for vertically etching the bulk silicon substrate. This new method can support large-area growth in a short time, and vertically aligned SiNWs with high aspect ratio can be readily synthesized with excellent reproducibility. Nonetheless, there still are rooms for improvement such as the poor surface characteristics that lead to degradation in electrical performance, and non-uniformity of the diameter and shapes of the synthesized SiNWs. Here, we report a facile method of SiNWs synthesis having uniform sizes, diameters, and shapes, which may be other than just cylindrical shapes using a modified nanosphere lithography technique. The diameters of the polystyrene nanospheres can be adjustable through varying the time of O2 plasma treatment, which serve as a mask template for metal deposition on a silicon substrate. After the removal of the nanospheres, SiNWs having the exact same shape as the mask are synthesized using wet etching technique in a solution of HF, hydrogen peroxide, and deionized water. Different electrical and optical characteristics were obtained according to the shapes and sizes of the SiNWs, which implies that they can serve specific purposes according to their types.

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Adhesion Improvement of Electroless Copper Plated Layer on PET Film - Effect of Pretreatment Conditions - (무전해 동도금 피막의 접착력 향상에 관한 연구 - PET 필름의 전처리 조건의 영향 -)

  • 오경화;김동준;김성훈
    • Polymer(Korea)
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    • v.25 no.2
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    • pp.302-310
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    • 2001
  • Cu/PET film composites were prepared by electroless copper plating method. In order to improve adhesion between electroless Cu plated layer and polyester (PET) film, the effect of pretreatment conditions such as etching method and mixed catalyst composition, and accelerator was investigated. Compared to NaOH etching medium, PET film was more finely etched by HCl solution, resulting in an improvement in adhesion between Cu layer and PET film. However, there were no significant differences in electromagnetic interference shielding effectiveness as a function of etching medium. The surface morphology of Cu plated PET film revealed that Pd/Sn colloidal particles became more evenly distributed in the smaller size by increasing the molar ratio of PdCl$_2$ : SnCl$_2$ from 1 : 4 to 1 : 16. With increasing the molar ratio of mixed catalyst, the adhesion and the shielding effectiveness of Cu plated PET film were increased. Furthermore, HCl was turned out to be a better accelerator than NaOH in order to enhance the activity of the mixed PdCl$_2$/SnCl$_2$ catalyst, which facilitated the formation of more uniform copper deposit on the PET film.

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AN EXPERIMENTAL STUDY ON PULPAL RESPONSE TO THE PHOSPHORIC ESTER CEMENT IN DOGS (인산(燐酸) ESTER계(系) 접착성(接着性) 시멘트의 치수반응(齒髓反應)에 관(關)한 실험적(實驗的) 연구(硏究))

  • Lee, Hye-Young;Choi, Dae-Gyun;Choi, Boo-Byung;Park, Nam-Soo
    • The Journal of Korean Academy of Prosthodontics
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    • v.24 no.1
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    • pp.125-138
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    • 1986
  • It is considered that etching solution or material itself of phosphoric ester cement will induce not a little pulpal irritation, if applied directly onto unsealed dentinal tubules. This study was designed to confirm above consideration by comparing two different conditions between $Ca(OH)_2$-based and non-$Ca(OH)_2$-based group. Posterior teeth of 15 male dogs were selected for this experiment. One experimental group was filled with cement after $Ca(OH)_2$-basing and enamel-etching, the other experimental group after enamel etching without $Ca(OH)_2$-basing. And both of two experimental groups were observed at 2 hours, 15 hours, 3 days, 1 week, 2 weeks, 4 weeks, and 6 weeks after filling. The findings reached to the following conclusions histologically. 1. In both groups, the damaged odontoblasts were atrophied and eventually disappeared. 2. In non-based group at early stage, odontoblasts were severely atrophied and defective areas were appeared between odontoblast cell layers. However, in based group, the odontoblasts were arranged slight irregularly. 3. In non-based group, a small number of undifferentiated cells below the odontoblast cell layers started to appear at 1 week after filling. However, in based group, the undifferentiated cells were appeared at 15 hours after filling. 4. In non-based group, formation of reparative dentin was not begun until late stage of experiment. However, in based group, formation of reparative dentin matrix was begun at 2 weeks after filling and very thickened reparative dentin was formed at 6 weeks after filling. 5. In odontoblast cell layers of both groups, dilated capillaries were observed. 6. Argyrophilic fibers were reticularly condensed in zone of Weil, and they were connected to the pulp tissue and dentin.

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