• Title/Summary/Keyword: electronic characteristics measurements

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Characteristics for High Efficiency and Wideband Band Pass Filter Using Rectangular Resonator and Step-Impedance-Open-Stubs (구형 공진기와 계단 임피던스 개방 스터브를 사용한 고효율 광대역 대역 통과 필터 특성)

  • Lee, Young-Hun;Kwon, Won-Hyun
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.20 no.2
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    • pp.200-207
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    • 2009
  • This paper presents a compact, low insertion loss, sharp rejection and wide band microstrip band pass filter that is composed rectangular loop resonator and Step-Impedance-Open-Stub(SIOS). The SIOS can be reduce length about 30 % more than general 0.25 $\lambda$ open stub. And the stub can the advantage of tuning impedance magnitude. In order to demonstrate agrement of this paper prove, the optimized wide band pass filters are realized and experimented. A transmission line model used to calculate the frequency response of the new filters shows good agreement with measurements. The filter has 3 dB fractional bandwidth of 51.75 %(3.206 GHz), an insertion loss of better than 0.44 dB from 4.587 GHz to 7.793 GHz, and two rejection of greater than 30 dB within 221 MHz($4.326{\sim}4.587\;GHz$) at low frequency band, 181 MHz($7.739{\sim}7.954\;GHz$) at high frequency band. Maximum rejection characteristics of the filter are -61.8 dB at low frequency and -76.3 dB at high frequency.

Growth of p-type ZnSe/GaAs epilayers by Rf reactive sputtering and Its characteristics (고주파 반응성 스퍼터링에 의한 p형 ZnSe/GaAs 박막성장 및 특성연구)

  • 유평렬;정태수;신영진
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.9 no.1
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    • pp.107-112
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    • 1999
  • The ZnSe/GaAs epilayers were grown by RF reactive sputtering. In order to obtain the optimum condition of the growth, we have studied the dependence of Ar pressure, input power of sputter, temperature of substrate, and the distande between substrate and target. Through the observation of the grown epilayer via electronic microscope, we confirmed that the layer's surface was uniform and the boundary of the substrate and the layer was well defined. The defotmation of lattice distortion and the distortion ratio were obtained by DCRC measurements. From mrasurements of photoluminescence, in the ZnSe/GaAs sample without injection of $N_2$gas, we found that the intensity of bound exciton $I_2$is stronger than that of $I_1$and the bound exiton $I_1$represents the deep acceptor level, $I_1\;^d$. On the other hand, in the ZnSe/GaAs sample with injection of$N_2$gas, the peak of$I_1$ was much higher than that of the $I_2$and the half width appeared to be narrow. We concluded that the p-type of ZnSe/GaAs epilayer was grown successfully, because of stronger peak of the bound exciton $I_1$due to the $N_2$dopping.

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Carotid Artery Intima-Media Thickness Measured by Iterated Layer-cluster Discrimination (순차적 층위군집(層位群集)판별에 의한 경동맥 내중막 두께 측정)

  • Hwang Jae-Ho;Kim Wuon-Shik
    • Journal of the Institute of Electronics Engineers of Korea SC
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    • v.43 no.5 s.311
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    • pp.89-100
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    • 2006
  • The carotid intima-media thickness (IMT) is very important, because the severity of it is an independent predictor of transient cerebral ischemia, stroke, and coronary events such as myocardial infarction. The conventional image processing to measure the IMT has not been satisfactory, because the methods have relied on the manual section drawing and a regional segmentation by differential estimation. We propose a new image processing technology effective to extract features from the carotid artery image whose pixels have the directional vector properties with composed color distribution. The technique we presented here is not by differential variation but by verification of the layer properties of carotid artery image. Iterated vertical and horizontal analysis and segmentation of the IMT image show the vector characteristics. This new technique makes it possible to cluster the layers statistically, and to classify mathematical correlation between regions and resulting in correct measurements of thickness and its variation. The advantages and effectiveness of this approach are applicable to region process and character extraction of such a vector image.

Plasma Polymerized Styrene for Gate Insulator Application to Pentacene-capacitor (유기박막트랜지스터 응용을 위해 플라즈마 중합된 Styrene 게이트 절연박막)

  • Hwang, M.H.;Son, Y.D.;Woo, I.S.;Basana, B.;Lim, J.S.;Shin, P.K.
    • Journal of the Korean Vacuum Society
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    • v.20 no.5
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    • pp.327-332
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    • 2011
  • Plasma polymerized styrene (ppS) thin films were prepared on ITO coated glass substrates for a MIM (metal-insulator-metal) structure with thermally evaporated Au thin film as metal contact. Also the ppS thin films were applied as organic insulator to a MIS (metal-insulatorsemiconductor) device with thermally evaporated pentacene thin film as organic semiconductor layer. After the I-V and C-V measurements with MIM and MIS structures, the ppS revealed relatively higher dielectric constant of k=3.7 than those of the conventional poly styrene and very low leakage current density of $1{\times}10^{-8}Acm^{-2}$ at electric field strength of $1MVcm^{-1}$. The MIS structure with the ppS dielectric layer showed negligible hysteresis in C-V characteristics. It would be therefore expected that the proposed ppS could be applied as a promising dielectric/insulator to organic thin film transistors, organic memory devices, and flexible organic electronic devices.

Effect of RuO$_2$ Thin Film Microstructure on Characteristics of Thin Film Micro-supercapacitor ($RuO_2$박막의 미세 구조가 박막형 마이크로 슈퍼캐패시터의 특성에 미치는 영향)

  • Kim, Han-Ki;Yoon, Young-Soo;Lim, Jae-Hong;Cho, Won-Il;Seong, Tae-Yeon;Shin, Young-Hwa
    • Korean Journal of Materials Research
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    • v.11 no.8
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    • pp.671-678
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    • 2001
  • All solid-state thin film micro supercapacitor, which consists of $RuO_2$/LiPON/$RuO_2$ multi layer structure, was fabricated on Pt/Ti/Si substrate using a $RuO_2$ electrode. Bottom $RuO_2$ electrode was grown by dc reactive sputtering system with increasing $O_2/[Ar+O_2]$ ratio at room temperature, and a LiPON electrolyte film was subsequently deposited on the bottom $RuO_2$ electrode at pure nitrogen ambient by rf reactive sputtering system. Room temperature charge-discharge measurements based on a symmetric $RuO_2$/LiPON/$RuO_2$ structure clearly demonstrates the cyclibility dependence on the microstructure of the $RuO_2$ electrode. Using both glancing angle x-ray diffraction (GXRD) and transmission electron microscopy (TEM) analysis, it was found that the microstructure of the $RuO_2$ electrode was dependent on the oxygen flow ratio. In addition, x- ray photoelectron spectroscopy(XPS) examination shows that the Ru-O binding energy is affected by increasing oxygen flow ratio. Furthermore, TEM and AES depth profile analysis after cycling demonstrates that the interface layer formed by interfacial reaction between LiPON and $RuO_2$ act as a main factor in the degradation of the cyclibility of the thin film micro-supercapacitor.

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Design of Low Noise Readout Circuit for 2-D Capacitive Microbolometer FPAs (정전용량 방식의 이차원 마이크로볼로미터 FPA를 위한 저잡음 신호취득 회로 설계)

  • Kim, Jong Eun;Woo, Doo Hyung
    • Journal of the Institute of Electronics and Information Engineers
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    • v.51 no.10
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    • pp.80-86
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    • 2014
  • A low-noise readout circuit is studied for 2-D capacitive microbolometer focal plane arrays (FPAs). In spite of the merits of the integration method, a simple and effective pixelwise readout circuit without integration is used for input circuit because of a small pixel size and narrow noise bandwidth. To reduce the power consumption and the kT/C noise, which is the dominant noise of the capacitive microbolometer FPAs with small capacitance, a new correlated double sampling (CDS) is used for columnwise circuit. The proposed circuit has been designed using a $0.35-{\mu}m$ 2-poly 4-metal CMOS process for a microbolometer array with a pixel size of $50{\mu}m{\times}50{\mu}m$. The proposed circuit effectively reduces the kT/C noise and the other low-frequency noise of microbolometer, and the noise characteristics of the fabricated chip have been verified by measurements. The rms noise voltage of the proposed circuit is reduced from 30 % to 55 % compared to that of the simple readout input circuit, and the noise equivalent temperature difference (NETD) of the proposed circuit is very low value of 21.5 mK.

A Compact 3-Layer EBG Structure with Square Ring Stripline (사각 링 스트립선로를 결합시킨 소형 3층 EBG 구조)

  • An Sung-Nam;Shin Dong-Gu;Kim Sang-ln;Choo Ho-Sung;Kim Moon-Il;Park Ikmo;Lim H.
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.16 no.3 s.94
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    • pp.300-310
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    • 2005
  • In this paper we propose the compact three-layer EBG structure. The unit cell of the proposed EBG structure is composed of a square patch in the upper layer and a square ring stripline in the lower layer that are connected to the ground plane through conducting vias. Reflection phase analysis method and tangential transmission method were considered to accomplish effective EM simulation and measurement. EM simulation results indicate that bandgap characteristics of the EBG structure using both methods is nearly identical. Parametric studies have been performed with the EM simulator to analyze the properties of the EBG structure by investigating the phase shift of the normally incident plane wave, and the transmission measurements between simple monopole antennas positioned near the EBGstructure have been done. The operating fiefuency bandgap of the proposed EBG structure is about 34 $\%$ lower than the conventional EBG structure with the same size. Measured results show bandgap from 0.930 GHz to 0.945 GHz.

RF and Optical properties of Graphene Oxide

  • Im, Ju-Hwan;Rani, J.R.;Yun, Hyeong-Seo;O, Ju-Yeong;Jeong, Yeong-Mo;Park, Hyeong-Gu;Jeon, Seong-Chan
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2012.05a
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    • pp.68.1-68.1
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    • 2012
  • The best part of graphene is - charge-carriers in it are mass less particles which move in near relativistic speeds. Comparing to other materials, electrons in graphene travel much faster - at speeds of $10^8cm/s$. A graphene sheet is pure enough to ensure that electrons can travel a fair distance before colliding. Electronic devices few nanometers long that would be able to transmit charge at breath taking speeds for a fraction of power compared to present day CMOS transistors. Many researches try to check a possibility to make it a perfect replacement for silicon based devices. Graphene has shown high potential to be used as interconnects in the field of high frequency electrical devices. With all those advantages of graphene, we demonstrate characteristics of electrical and optical properties of graphene such as the effect of graphene geometry on the microwave properties using the measurements of S-parameter in range of 500 MHz - 40 GHz at room temperature condition. We confirm that impedance and resistance decrease with increasing the number of graphene layer and w/L ratio. This result shows proper geometry of graphene to be used as high frequency interconnects. This study also presents the optical properties of graphene oxide (GO), which were deposited in different substrate, or influenced by oxygen plasma, were confirmed using different characterization techniques. 4-6 layers of the polycrystalline GO layers, which were confirmed by High resolution transmission electron microscopy (HRTEM) and electron diffraction analysis, were shown short range order of crystallization by the substrate as well as interlayer effect with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups on its layers. X-ray photoelectron Spectroscopy (XPS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation, and Fourier Transform Infrared spectroscopy (FTIR) and XPS analysis shows the changes in oxygen functional groups with nature of substrate. Moreover, the photoluminescent (PL) peak emission wavelength varies with substrate and the broad energy level distribution produces excitation dependent PL emission in a broad wavelength ranging from 400 to 650 nm. The structural and optical properties of oxygen plasma treated GO films for possible optoelectronic applications were also investigated using various characterization techniques. HRTEM and electron diffraction analysis confirmed that the oxygen plasma treatment results short range order crystallization in GO films with an increase in interplanar spacing, which can be attributed to the presence of oxygen functional groups. In addition, Electron energy loss spectroscopy (EELS) and Raman spectroscopy confirms the presence of the $sp^2$ and $sp^3$ hybridization due to the disordered crystal structures of the carbon atoms results from oxidation and XPS analysis shows that epoxy pairs convert to more stable C=O and O-C=O groups with oxygen plasma treatment. The broad energy level distribution resulting from the broad size distribution of the $sp^2$ clusters produces excitation dependent PL emission in a broad wavelength range from 400 to 650 nm. Our results suggest that substrate influenced, or oxygen treatment GO has higher potential for future optoelectronic devices by its various optical properties and visible PL emission.

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Characteristics of TiN Barrier Metal Prepared by High Density Plasma CVD Method (고밀도 플라즈마 CVD 방법에 의한 TiN barrier metal 형성과 특성)

  • Choe, Chi-Gyu;Gang, Min-Seong;O, Gyeong-Suk;Lee, Yu-Seong;O, Dae-Hyeon;Hwang, Chan-Yong;Son, Jong-Won;Lee, Jeong-Yong;Kim, Geon-Ho
    • Korean Journal of Materials Research
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    • v.9 no.11
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    • pp.1129-1136
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    • 1999
  • TIN films were prepared on Si(100) substrate by ICP-CVD(inductive1y coupled plasma enhanced chemical vapor deposition) using TEMAT(tetrakis ethylmethamido titanium : Ti$[\textrm{N}\textrm{(CH)}_{3}\textrm{C}_{2}\textrm{H}_{5}]_{4}$) precursor at various deposition conditions. Phase, microstructure, and the electrical properties of TIN films were characterized by x-ray diffraction (XRD), x-ray photoelectron spectroscopy (XPS), high resolution transmission electron microscopy (HRTEM) and electrical measurements. Polycrystalline TiN films with B1 structure were grown at temperatures over $200^{\circ}C$. Preferentially oriented along TiN(111) films were obtained at temperatures over $300^{\circ}C$ with the flow rates of 10, 5, and 5 sccm for TEMAT, $\textrm{N}_{2}$ and Ar gas. The TiN/Si(100) interface was flat and no chemical reaction between TIN and $\textrm{SiO}_2$ was found. The resistivity, carrier concentration and the carrier mobility for the TiN sample prepared at $500^{\circ}C$ are 21 $\mu\Omega$cm, 9.5$\times\textrm{10}^{18}\textrm{cm}^{-3}$ and $462.6\textrm{cm}^{2}$/Vs, respectively.

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Study on the Radiation Pattern of Radiated Emission above 1 GHz (1 GHz 이상에서의 복사 방출 방사 패턴에 관한 연구)

  • Chung, Yeon-Choon;Lee, Soon-Yong;Kwun, Suk-Tai
    • The Journal of Korean Institute of Electromagnetic Engineering and Science
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    • v.22 no.3
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    • pp.336-344
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    • 2011
  • The purpose of this study is to analyze the radiation-pattern characteristics above 1 GHz for the electromagnetic wave radiated from multi-slot such as ventilations, etc. on the enclosure of an EUT and so to make recommendations for suitable test methods. An experimental EUT was formed by putting a comb-generator at the center of a rectangular enclosure with 4 slots, and its radiation pattern was analyzed in the frequency range of 1~6 GHz. As analysis results, multi-lobe appears above 2 GHz and the number of multi-lobes is growing as the frequency increases. And real radiated-emission measurements were performed for the experimental EUT by scanning a receiving antenna in the height of 1~4 m and tilting toward maximum radiation, as well as setting the height of a receiving antenna to the central position of the EUT which is prescribed at the present standards. The measured results are +12.8 dB in the scanning and +16.4 in the scanning and tilting compared with the present standard test method. Therefore, the latter must be revised in order to consider the radiation pattern above 1 GHz.