• Journal of electromagnetic engineering and science
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• 제1권1호
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• pp.73-77
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• 2001

We studied the fabrication of GaAs-based pseudomorphic high electron mobility transistors(PHEMT`s) for the purpose of millimeter- wave applications. To fabricate the high performance GaAs-based PHEMT`s, we performed the simulation to analyze the designed epitaxial-structures. Each unit processes, such as 0.1 m$\mu$$\Gamma$-gate lithography, silicon nitride passivation and air-bridge process were developed to achieve high performance device characteristics. The DC characteristics of the PHEMT`s were measured at a 70 $\mu$m unit gate width of 2 gate fingers, and showed a good pinch-off property ($V_p$= -1.75 V) and a drain-source saturation current density ($I_{dss}$) of 450 mA/mm. Maximum extrinsic transconductance $(g_m)$ was 363.6 mS/mm at $V_{gs}$ = -0.7 V, $V_{ds}$ = 1.5 V, and $I_{ds}$ =0.5 $I_{dss}$. The RF measurements were performed in the frequency range of 1.0~50 GHz. For this measurement, the drain and gate voltage were 1.5 V and -0.7 V, respectively. At 50 GHz, 9.2 dB of maximum stable gain (MSG) and 3.2 dB of $S_{21}$ gain were obtained, respectively. A current gain cut-off frequency $(f_T)$ of 106 GHz and a maximum frequency of oscillation $(f_{max})$ of 160 GHz were achieved from the fabricated PHEMT\\`s of 0.1 m$\mu$ gate length.h.

• Journal of electromagnetic engineering and science
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• 제11권1호
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• pp.16-26
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• 2011

This paper presents high power and high efficiency Doherty amplifiers for 2.345 GHz wireless broadband (WiBro) applications that use a Nitronex 125-W ($P_{3dB}$) GaN high electron mobility transistor (HEMT). Two- and three-way Doherty amplifiers and a saturated Doherty amplifier using Class-F circuitry are implemented. The measured result for a center frequency of 2.345 GHz shows that the two-way Doherty amplifier attains a high $P_{3dB}$ of 51.5 dBm, a gain of 12.5 dB, and a power-added efficiency (PAE) improvement of about 16 % compared to a single class AB amplifier at 6-dB back-off power region from $P_{3dB}$. For a WiBro OFDMA signal, the Doherty amplifier provides an adjacent channel leakage ratio (ACLR) at 4.77 MHz offset that is -33 dBc at an output power of 42 dBm, which is a 9.5 dB back-off power region from $P_{3dB}$. By employing a digital pre-distortion (DPD) technique, the ACLR of the Doherty amplifier is improved from -33 dBc to -48 dBc. The measured result for the same frequency shows that the three-way Doherty amplifier, which has a $P_{3dB}$ of 53.16 dBm and a gain of 10.3 dB, and the saturated Doherty amplifier, which has a $P_{3dB}$ of 51.1 dBm and a gain of 10.3 dB, provide a PAE improvement of 11 % at the 9-dB back-off power region and 7.5 % at the 6-dB back-off region, respectively, compared to the two-way Doherty amplifier.

• 한국재료학회지
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• 제13권8호
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• pp.519-523
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• 2003

We report the synthesis of cubic spinel $ZnCo_2$$O_4$thin films and the tunability of the conduction type by control of the oxygen partial pressure ratio. Zinc cobalt oxide films were grown on$ SiO_2$(200 nm)/Si substrates by reactive magnetron sputtering method using Zn and Co metal targets in a mixed Ar/$O_2$atmosphere. We found from X-ray diffraction measurements that the crystal structure of the zinc cobalt oxide films grown under an oxygen-rich condition (the $O_2$/Ar partial pressure ratio of 9/1) changes from wurtzite-type $Zn_{1-x}$ $Co_{X}$O to spinel-type $ZnCo_2$$O_4$with the increase of the Co/Zn sputtering ratio,$ D_{co}$ $D_{zn}$ . We noted that the above structural change accompanied by the variation of the majority electrical conduction type from n-type (electrons) to p-type (holes). For a fixed $D_{co}$ $D_{zn}$ / of 2.0 yielding homogeneous spinel-type $_2$O$ZnCo_4$films, the type of the majority carriers also varied, depending on the$ O_2$/Ar partial pressure ratio: p-type for an $O_2$-rich and n-type for an Ar-rich atmosphere. The maximum electron and hole concentrations for the Zn $Co_2$ $O_4$films were found to be 1.37${\times}$10$^{20}$ c $m^{-3}$ and 2.41${\times}$10$^{20}$ c $m^{-3}$ , respectively, with a mobility of about 0.2 $\textrm{cm}^2$/Vs and a high conductivity of about 1.8 Ω/$cm^{-1}$ /.

• 한국전기전자재료학회논문지
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• 제33권3호
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• pp.214-218
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• 2020

In this study, Mg_xZn_1-xO thin films, which can be applied not only to active layers of light-emitting devices (LEDs), such as UV-LEDs, but also to solar cells, high mobility field-effect transistors, and power semiconductor devices, are fabricated using the sol-gel method. ZnO and Mg_0.3Zn_0.7O solution synthesized by the sol-gel method and the thin film were grown by spin coating on a Si (100) substrate and sapphire substrate. The solutions are synthesized by dissolving precursor materials in 2-methoxyethanol (2-ME) solvent, and then monoethanolamine (MEA) was added to the mixed solution as a sol stabilizer. Zinc acetate dihydrate is used as a ZnO precursor, while Mg nitrate hexahydrate and Mg acetate tetrahydrate are used as an MgO precursor. Then, the optical and structural characteristics of the fabricated thin films are compared. The molar concentration of the Zn precursor in the solvent is fixed at 0.3 M, and the amount of the Mg precursor is 30% of Mg²⁺/Zn²⁺. The optical characteristics are measured using an UV-vis spectrophotometer, and the transmittance of each wavelength is measured. Structural characteristics are measured using X-ray diffraction (XRD) and transmission electron microscopy (TEM). Composition analyses are performed using energy dispersive X-ray spectroscopy (EDS). The Mg_0.3Zn_0.7O thin film was well formed at the ratio of the Mg precursor added regardless of the type of Mg precursor, and the c-axis of the thin film was decreased, while the band gap was increased to 3.56 eV.

• 한국진공학회지
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• 제14권4호
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• pp.207-214
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• 2005

본 연구에서는 스위치, 위상변위기, 감쇄기등 전파제어회로를 설계 및 제작할 수 있는 pHEMT스위치 소자에 적합한 에피구조를 설계하였다. 고성능의 스위치 소자를 위한 pHEMT 채널층 구조는 이중 면도핑층을 가지며 사용 중 게이트 전극의 전계강도가 약한 깊은 쪽 채널층의 Si 면농도가 상층부보다 약 1/4정도 낮을 경우 격리도등 우수한 특성을 보였다. 설계된 에피구조와 ETRI의 $0.5\mu$m pHEMT MMIC 공정을 이용하여 2.4GHz 및 5GHz 대역 표준 무선랜 단말기에 활용 가능한 SPDT Tx/Rx MMIC 스위치를 설계 및 제작하였다. 제작된 SPDT형 스위치는 주파수 6.0 GHz, 동작전압 0/-3V에서 삽입손실 0.849 dB, 격리도 32.638 dB, 그리고 반사손실 11.006 dB의 특성을 보였으며, 전력전송능력인 $P\_{1dB}$는 약 25dBm, 그리고 선형성의 척도인 IIP3는 42 dBm 이상으로 평가되었다. 이와 같은 칩의 성능은 본 연구에서 개발된 SPDT 단일고주파집적회로 스위치가 2.4GHz뿐만 아니라 SGHB 대역 무선랜 단말기에 활용이 충분히 가능함을 말해준다.

• 한국패류학회지
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• 제29권3호
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• pp.251-258
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• 2013

본 연구에서는 굴, Crassostrea gigas의 계획적인 인공종묘생산 및 우량형질의 정자를 보존하기 위하여 냉동보존 시 적정 결빙억제제 (cryprotective agent, CPA) 및 농도를 알아보고자, CPA 종류 및 농도별 독성 및 냉동보존 효과를 파악하고 해동 후 정자의 세포 손상을 조사하였다. CPA 종류 및 농도별 침지시간에 따른 굴 정자의 독성평가를 실시한 결과, 생존율 및 운동성은 DMSO가 가장 좋았으며, 다음으로 EG, glycerol, Methanol 순이었다. 희석액으로 여과해수를 사용하여 CPA 종류 및 농도별 냉동보존 결과, 15% DMSO로 냉동보존 한 정자의 생존율 및 운동성이 가장 높았다. 굴의 냉동/해동 정자를 주사전자현미경으로 관찰한 결과, DMSO, EG, methanol, glycerol 순으로 세포 손상이 적었으며, 농도는 15, 20, 10, 5% 순이었다. 이상의 결과를 종합한 결과, 굴 정자의 냉동보존 시 여과해수를 희석액으로 사용할 경우 적정 CPA는 DMSO이며, 농도는 15%였다.

• 한국전자파학회논문지
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• 제30권4호
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• pp.282-285
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• 2019

본 연구에서는 2단계 게이트 리세스 방법을 사용하여 T-형 게이트 길이가 100 nm인 mHEMT 소자를 제작하였다. 제작한 소자는 65 mA의 드레인전류($I_{dss}$), 1090 mS/mm의 트랜스콘덕턴스($g_m$), -0.65 V의 문턱전압 ($V_{th}$) 등의 DC 특성을 보였다. 또한 차단주파수($f_T$) 190 GHz와 최대 공진주파수($f_{MAX}$) 260 GHz인 우수한 고주파 특성을 나타내었다. 제작한 mHEMT 소자는 향후에 W-대역의 MMIC 개발에 활용될 수 있을 것으로 기대된다.

• 한국잠사곤충학회지
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• 제24권2호
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• pp.55-72
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• 1983

가잠의 휴면성을 난각의 조직학적 특성을 보고자 난각층에 대한 전자현미경상을 관찰하였고 또한 난각의 물리화학적 특성에 대해서는 수분투과성, 염산투과성, 염색성 및 난각 구조단백질을 조사한 결과를 요약하면 다음과 같다. 1. 난각구조를 전자현미경으로 보면 뚜렷이 4층으로 되어 있으며, 또한 휴면난과 비휴면난 및 즉침난 사이에 구조적인 차이가 보인다. 즉 외층 밖에 또 다른 전자밀도가 낮은 얇은 층이 휴면난에는 존재하고 있으나 비휴면 및 즉침난에는 이 층을 볼 수 없다. 2. 산난후 20∼24시간째의 휴면난과 비휴면난 및 즉침난 사이에 난각염산투과성의 차이를 보면 휴면난에 비해 즉침난 및 비휴면난이 모두 투과성이 높았고 또한 난령이 지남에 따라 휴면난은 투과성이 떨어지는데 반하여 즉침난 및 비휴면난은 투과성이 높아졌다. 3. 휴면난의 ether 처리난은 무처리난에 비해 난각의 투과성이 변하는 것으로 보아 난각물질 중 ether 용출물이 존재한다. 4. 난각의 수분투과성도 염산투과성에 있어서와 같이 휴면난이 즉침난 및 비휴면난에 비해 수분투과성이 낮았다. 5. 가잠난각의 조직화학적 특성은 단백질과 당에 대한 염색성이 높아 난각에는 단백질과 당이 풍부하며 특히 지질에 대한 염색성은 거의 음성이나 내층으로 갈수록 진하게 염색되었다. 6. 누에의 난각점착물은 PAS-alcian 반응으로 보아 mucopolysaccharides이다. 7. 난각 구조단백질 중 SH단백질에 대한 전기영동상에 있어서 휴면난과 비휴면난 모두 2개의 band가 인정되나 비휴면난의 경우 이동거리가 빠른 band는 매우 흔적적이며 또한 영동거리도 원점으로부터 멀리 이동하여 두 처리간에 minor component에 차이가 보였다. 8. SH단백질에 대한 아미노산조성에 있어서는 휴면난 및 비휴면난 사이에 큰 차이를 인정할 수 없었고 난각단백질중 SH단백질의 구성아미노산에는 glycine이 가장 많고 cystine함량은 적었다. SI K-2 는 Penicillin, Ampicillin과 Cephalothin에 저항성을 나타냈고 ts-U171, A-N92와 A-N115는 이 세항생제에 민감성을 나타냈다. Temperature - sensitive돌연변이균주를 42$^{\circ}C$에서 24시간 배양후에 28$^{\circ}C$로 옮기어 배양한 결과 ts-U601, -U603, -U604와 -U171은 성장을 더 이상하지 않았다.ta-exotoxin을 생산했는데, 48시간 배양 배지 $m\ell$당 70$\mu\textrm{g}$을 분비한 균주는 BTK-1이고, BTK-37 균주는 $m\ell$당 88$\mu\textrm{g}$(6.1$\times$$10^{8}$ Cells/$m\ell$) BTK-35 균주는 $m\ell$당 81$\mu\textrm{g}$(5.2$\times$$10^{8}$ Cells/$m\ell$)을 생산했고. 그외는 모두 70$\mu\textrm{g}$미만이었다. 3. Beta-exotoxin과 B. thuringiensis 균체을 동시에 per os, interaperitoneal injection, subcuntaneous injection, nasal cavity inoculation, intracerebral injection을 120시간 처리했어도 치사효과를 나타내지 않았다.삼각호마법 and Japan#s 병음한자변환방식 have prospect to be prevalent. The following suggestions can be made from these results, 1) All the

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.284-284
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• 2016

Topological insulator (TI) is a bulk-insulating material with topologically protected Dirac surface states in the band gap. In particular, $Bi_2Se_3$ attracted great attention as a model three-dimensional TI due to its simple electronic structure of the surface states in a relatively large band gap (~0.3 eV). However, experimental efforts using $Bi_2Se_3$ have been difficult due to the abundance of structural defects, which frequently results in the bulk conduction being dominant over the surface conduction in transport due to the bulk doping effects of the defect sites. One promising approach in avoiding this problem is to reduce the structural defects by heteroepitaxially grow $Bi_2Se_3$ on a substrate with a compatible lattice structure, while also preventing surface degradation by encapsulating the pristine interface between $Bi_2Se_3$ and the substrate in a clean growth environment. A particularly promising choice of substrate for the heteroepitaxial growth is hexagonal boron nitride (h-BN), which has the same two-dimensional (2D) van der Waals (vdW) layered structure and hexagonal lattice symmetry as $Bi_2Se_3$. Moreover, since h-BN is a dielectric insulator with a large bandgap energy of 5.97 eV and chemically inert surfaces, it is well suited as a substrate for high mobility electronic transport studies of vdW material systems. Here we report the heteroepitaxial growth and characterization of high quality topological insulator $Bi_2Se_3$ thin films prepared on h-BN layers. Especially, we used molecular beam epitaxy to achieve high quality TI thin films with extremely low defect concentrations and an ideal interface between the films and substrates. To optimize the morphology and microstructural quality of the films, a two-step growth was performed on h-BN layers transferred on transmission electron microscopy (TEM) compatible substrates. The resulting $Bi_2Se_3$ thin films were highly crystalline with atomically smooth terraces over a large area, and the $Bi_2Se_3$ and h-BN exhibited a clear heteroepitaxial relationship with an atomically abrupt and clean interface, as examined by high-resolution TEM. Magnetotransport characterizations revealed that this interface supports a high quality topological surface state devoid of bulk contribution, as evidenced by Hall, Shubnikov-de Haas, and weak anti-localization measurements. We believe that the experimental scheme demonstrated in this talk can serve as a promising method for the preparation of high quality TI thin films as well as many other heterostructures based on 2D vdW layered materials.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2016년도 제50회 동계 정기학술대회 초록집
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• pp.292-292
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• 2016

Transition metal dichalcogenides (TMDs) with a two-dimensional layered structure have been considered highly promising materials for next-generation flexible, wearable, stretchable and transparent devices due to their unique physical, electrical and optical properties. Recent studies on TMD devices have focused on developing a suitable doping technique because precise control of the threshold voltage ($V_{TH}$) and the number of tightly-bound trions are required to achieve high performance electronic and optoelectronic devices, respectively. In particular, it is critical to develop an ultra-low level doping technique for the proper design and optimization of TMD-based devices because high level doping (about $10^{12}cm^{-2}$) causes TMD to act as a near-metallic layer. However, it is difficult to apply an ion implantation technique to TMD materials due to crystal damage that occurs during the implantation process. Although safe doping techniques have recently been developed, most of the previous TMD doping techniques presented very high doping levels of ${\sim}10^{12}cm^{-2}$. Recently, low-level n- and p-doping of TMD materials was achieved using cesium carbonate ($Cs_2CO_3$), octadecyltrichlorosilane (OTS), and M-DNA, but further studies are needed to reduce the doping level down to an intrinsic level. Here, we propose a novel DNA-based doping method on $MoS_2$ and $WSe_2$ films, which enables ultra-low n- and p-doping control and allows for proper adjustments in device performance. This is achieved by selecting and/or combining different types of divalent metal and trivalent lanthanide (Ln) ions on DNA nanostructures. The available n-doping range (${\Delta}n$) on the $MoS_2$ by Ln-DNA (DNA functionalized by trivalent Ln ions) is between $6{\times}10^9cm^{-2}$ and $2.6{\times}10^{10}cm^{-2}$, which is even lower than that provided by pristine DNA (${\sim}6.4{\times}10^{10}cm^{-2}$). The p-doping change (${\Delta}p$) on $WSe_2$ by Ln-DNA is adjusted between $-1.0{\times}10^{10}cm^{-2}$ and $-2.4{\times}10^{10}cm^{-2}$. In the case of Co-DNA (DNA functionalized by both divalent metal and trivalent Ln ions) doping where $Eu^{3+}$ or $Gd^{3+}$ ions were incorporated, a light p-doping phenomenon is observed on $MoS_2$ and $WSe_2$ (respectively, negative ${\Delta}n$ below $-9{\times}10^9cm^{-2}$ and positive ${\Delta}p$ above $1.4{\times}10^{10}cm^{-2}$) because the added $Cu^{2+}$ ions probably reduce the strength of negative charges in Ln-DNA. However, a light n-doping phenomenon (positive ${\Delta}n$ above $10^{10}cm^{-2}$ and negative ${\Delta}p$ below $-1.1{\times}10^{10}cm^{-2}$) occurs in the TMD devices doped by Co-DNA with $Tb^{3+}$ or $Er^{3+}$ ions. A significant (factor of ~5) increase in field-effect mobility is also observed on the $MoS_2$ and $WSe_2$ devices, which are, respectively, doped by $Tb^{3+}$-based Co-DNA (n-doping) and $Gd^{3+}$-based Co-DNA (p-doping), due to the reduction of effective electron and hole barrier heights after the doping. In terms of optoelectronic device performance (photoresponsivity and detectivity), the $Tb^{3+}$ or $Er^{3+}$-Co-DNA (n-doping) and the $Eu^{3+}$ or $Gd^{3+}$-Co-DNA (p-doping) improve the $MoS_2$ and $WSe_2$ photodetectors, respectively.