On the silicon nitride film formation and characteristic study by chemical vapor deposition method using electron cyclotron resonance plasma (전자 싸이클로트론 공명 플라즈마 화학 증착법에 의한 실리콘 질화막 형성 및 특성 연구)
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- Journal of the Korean institute of surface engineering
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- v.25 no.6
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- pp.287-292
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- 1992