• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.401-404
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• 2004

The electron beam machining provides very high resolution up to nanometer scale, hence the E-beam writing technology is rapidly growing in MEMS and nano-engineering areas. In the optical column of the e-beam writer, there are several lenses condensing and focusing electron beams from electron gun with fringing magnetic fields. To achieve small spot size as 1-2 nm for higher power of electron beam, magnetic lenses should be designed considering their magnetic field distribution. In this paper, the magnetic field at two condenser lenses and object lens are calculated with finite element method and discussed its performances.

• Proceedings of the KOSOMBE Conference
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• v.1997 no.11
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• pp.161-163
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• 1997

In this paper, a two-dimensional electron beam dose calculational algorithm implented for use in a two-dimensional radiation therapy planning system is described. The 2-D electron beam calculations have been in use clinically for a few decades. Our algorithm uses Age-diffusion model based int the Boltzman Transport Equation. Our implementation provides convenient user interface associated with electron beam therapy planning and displays radiation dose distribution according to different electron energy on patient images.

• Transactions of the Korean Society of Machine Tool Engineers
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• v.16 no.6
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• pp.163-167
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• 2007

A field emission electron gun including 3 electrodes including one cathode and two anodes is very important for high resolution electron microscope. To have functions to control the initially-emitted electron beam, two anodes act as an electrostatic lens according to equipotential lines by adjusting the spot size, intensity, and working distance. To verify the action of the electron beam by the electrostatic lens by changing several parameters such as electrode shape, displacement and applied voltage to the electrodes, the two lenses were design and simulated and then their performances were analyzed with angular beam intensity(distribution), electrical optic axis variation and their stability.

• Transactions on Electrical and Electronic Materials
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• v.3 no.3
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• pp.1-7
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• 2002

The developed patterns by direct writing of electron beam are measured by AFM, FESEM and optical profiler of WYKO NT3300. From different measurement methods, the measured linewidths of the patterns are shown a little bit wider than designed pattern size due to electrons scattering effect during direct writing of electron beam. The optimized conditions of these experiments are suggested and explained for the forming of structures below 0.1 ㎛ dimension size. Because of electron scattering effects from the different under layers such as Si, Si$_3$N$_4$ and aluminum, the developed pattern size is also influenced by the accelerated energy of electrons, dose, resist and soft and hard bake conditions in PMMA. The distributions of electron beam and calculations of backscattering coefficient are demonstrated by Monte Carlo simulation. From the measured results, the developed linewidth of PMMA/Al /silicon is shown a little bit wider than that of PMMA/Si$_3$N$_4$/silicon structure due to the backscattering effects.

• Journal of Korea Technical Association of The Pulp and Paper Industry
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• v.47 no.5
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• pp.68-73
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• 2015

Electron beam irradiation is also an eco-friendly treatment compared to other physical and chemical treatments. In this study, we attempted to evaluate the possibilities of energy savings by applying electron beam irradiation to the refining process. After softwood unbleached kraft pulp (UKP) was irradiated with electron beams at 50 and 100 kGy, it was beaten in a laboratory beater, and then its freeness and fiber properties were analyzed. The physical properties of their fiber handsheet were also and measured. As the irradiation dose of the electron beam and the beating time increased, lower freeness and fiber lengths of the UKP were observed. Handsheets made from UKP that was irradiated by electron beam and beaten showed a reciprocal relationship with the irradiation dose of the electron beam, in particular, the strength of the handsheets decreased dramatically at 100 kGy of irradiation. Therefore, it was confirmed that electron beam irradiation is effective in reducing the beating time or beating energy. But the irradiation dose must be controlled under 50 kGy to minimize the loss of paper strength.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.44 no.11
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• pp.43-50
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• 2007

We have investigated the electro-optical characteristics and reliability of LEDs with the Indium-Tin-Oxide (ITO) electrodes formed by different deposition methods: electron beam evaporation, sputtering, and hybrid method of electron beam evaporation and subsequent sputtering. The deposition method of the ITO electrode has significant influence on the electro-optical characteristics and reliability of LEDs. The LEDs with the ITO electrodes formed by sputtering and electron beam evaporation have problems caused by sputtering damage and increased electrical resistance, respectively, and the problems have been solved by the hybrid method.

• Journal of the Korean Society of Manufacturing Technology Engineers
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• v.22 no.6
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• pp.931-936
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• 2013

Recently, the use of large-electron-beam polishing for polishing complex metal surfaces has been proposed. In this study, the temperature induced by a large electron beam was predicted using the heat transfer theory. A finite element (FE) model of a continuous wave (CW) electron beam was constructed assuming Gaussian distribution. The temperature distribution and melting depth of an SUS304 sample were predicted by changing electron-beam polishing process parameters such as energy density and beam velocity. The results obtained using the developed FE model were compared with experimental results for verifying the melting depth prediction capability of the developed FE model.

• Journal of Ginseng Research
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• v.22 no.4
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• pp.252-259
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• 1998

Electron beam, electrically produced from an electron accelerator, was compared with gamma energy in terms of its influence on color and organoleptic qualities of ginseng powders when exposed to the energy used for their microbial decontamination. Hunter color L and b values were suitable for measuring color characteristics of ginseng powders, which were not significantly changed by the exposure to 5 to 7.5 kGy electron beam and gamma energy. Fifty percent ethanol extracts of irradiated ginseng powders at 10 key showed negligible differences from the non-irradiated control in the pattern of absorption spectra at 280∼800 am, but showed increased values in overall color difference (AE) as compared with powdered samples. Irradiation more than 10 kGy and storage at ambient temperature for 4 months caused browning of powdered samples. Irradiation at more than 10 kGy of electron beam was found a critical level to bring about appreciable changes (p<0.05) in or-ganoleptic qualities such as color and odor of sterilized samples, and red ginseng powder was more susceptible than white one to organoleptic changes by irradiation.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.12 no.3
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• pp.1319-1326
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• 2011

We have investigated the characteristics of the electron beam (e-beam) in the miniaturized free electron laser module by using the commercial 3D simulation tool OPERA. The e-beam was made parallel before entering the slit-type wiggler by the negative bias applied to the central electrode of the electron lens. With respect to the different structures of the wiggler, we obtained the inner distributions of the electrical potential and the electric field, which was, in turn, used to calculate the trajectory of the e-beam in the wiggler.

• The Transactions of the Korean Institute of Electrical Engineers C
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• v.48 no.12
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• pp.785-790
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• 1999

This research has been carried out to develop a low-energy large-aperture pulsed electron beam generator (LELA), 200keV 1A, for industrial applications. One of the most important feature of this electron beam generator is large electron beam cross section of $190cm^2$. Low energy electron beam generators have been used for water cleaning, flue gas cleaning, and pasteurization, etc. In these applications the cross sectionof the e-beam is related to reaction efficiency. Another important feature of this LELA EB generator is easy maintenance because of its simple structure and relatively low vacuum operation compared to the conventional EB generators. The conventional EB generators need to be scanned because the small cross section thermal electron emitters are used in the conventional EB generators which have small EB cross section. In this research, we use the secondary electrons generated by ion bombardment on the HV cathode surface as a electron source. Therefore we can make any shape of EB cross section without scanning.