• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 추계학술대회 논문집
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• pp.914-917
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• 2000

Application of ceramics, carbide, ferrite has grown considerably due to significant improvement in their mechanical properties such as light weight, chemical stability , super wear resistance and electronical. Despite these character, the me of advanced material has not increased because of poor machinability. The method of using of metal bond wheel was proposed. But it is difficult that metal bond wheel can be dressed. Recently, the technology of in-process electrolytic dressing is developed to solve this problem. This method need wheel for electrolytic dressing, power supply and electrolyte. But development of wheel for electrolytic dressing is the most need. The aim of this study is development of wheel for electrolytic and appraisement of CIB-diamond lapping wheel

• International Journal of Precision Engineering and Manufacturing
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• 제2권1호
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• pp.18-25
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• 2001

Electrolytic polishing is the anodic dissolution process in the transpassive state. It removes non-metallic inclusion and improves mechanical and corrosion resistance of stainless steel. If there is a Bailby layer, it will be removed and the true structure of the surface will be restored. Electrolytic polishing is normally used to remove a very thin layer of material from the surface of metal object. A new electrolyte composed of phosphoric, sulfuric and distilled water has been developed in this study. Two current density, high & low current density regions, have been applied in this study. In this study, In the region of high current density, there is no plateau region but excellent electrolytic polishing effect can be accomplished in short machining time because material removel process and leveling process occur simultaneously. In the low current density region, there can be found plateau region. The material removal process and leveling process occur successively. The aim of this work is to determine electrolytic polishing for stainless steel in terms of high & low current density and workpiece surface roughness.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 2000년도 춘계학술대회 논문집
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• pp.858-861
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• 2000

Application of ceramics, carbide, ferrite has grown considerably due to significant improvement in their mechanical properties such as light weight chemical stability super wear resistance and electronical. Despite these character, the use of hi-tech material has not increased because of poor machinability. The method of using of metal bond wheel was proposed. But it is difficult that metal bond wheel can be dressed. Recently, the technology of in-process electrolytic dressing is developed to solve this problem. This method need wheel for electrolytic dressing, power supply and electrolyte. But development of wheel for electrolytic dressing is the most need. The aim of this study is development of wheel for electrolytic and appraisement of CIB-diamond lapping wheel

• 한국정밀공학회지
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• 제18권11호
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• pp.132-137
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• 2001

Application of ceramics, carbide, ferrite has grown considerably due to their mechanical properties such as high degree hardness, chemical stability, super wear resistance. Despite these characters, the use of advanced material has not increased because of poor machinability. The application of metal bonded wheel was proposed. But it is difficult that metal bond wheel can be dressed. Recently, to solve this problem, the technology of in-process electrolytic dressing is developed. This method need wheel for electrolytic dressing, power supply and electrolyte. The aim of this study is development of CIB-D wheel for electrolytic and its evaluation of electrolytic characteristics, and achieve ultra-precision lapping of carbide, optic glass.

• Tribology and Lubricants
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• 제37권6호
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• pp.208-212
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• 2021

Chemical mechanical polishing (CMP) is a key technology used for the global planarization of thin films in semiconductor production and smoothing the surface of substrate materials. CMP is a type of hybrid process using a material removal mechanism that forms a chemically reacted layer on the surface of a material owing to chemical elements included in a slurry and mechanically removes the chemically reacted layer using abrasive particles. Sapphire is known as a material that requires considerable time to remove materials through CMP owing to its high hardness and chemical stability. This study introduces a technology using electrolytic ionization and ultraviolet (UV) light in sapphire CMP and compares it with the existing CMP method from the perspective of the material removal rate (MRR). The technology proposed in the study experimentally confirms that the MRR of sapphire CMP can be increased by approximately 29.9, which is judged as a result of the generation of hydroxyl radicals (·OH) in the slurry. In the future, studies from various perspectives, such as the material removal mechanism and surface chemical reaction analysis of CMP technology using electrolytic ionization and UV, are required, and a tribological approach is also required to understand the mechanical removal of chemically reacted layers.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집 Vol.14 No.1
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• pp.61-64
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• 2001

This study relates to a method for manufacturing a solid electrolytic capacitor using a functional polymer composition. The method comprises immersing the rolled aluminum electrolytic capacitor device in polyaniline solution with high electric conductivity to impregnate the device with polyaniline, drying the impregnated device in a drying oven which is maintained at constant temperature to fully remove the solvent, inserting the dried device to a capacitor aluminum can and then sealing with epoxy resin, to manufacture a solid electrolytic capacitor using a conducting polymer. As such, the impregnation can be performed well at not only normal temperature and pressure, but also high temperature and reduced pressure. The solid electrolytic capacitor has the advantages of high capacity, low impedance and low ESR, and also, low manufacturing cost, simple processes and high reliability.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2001년도 추계학술대회 논문집
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• pp.61-64
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• 2001

This study relates to a method for manufacturing a solid electrolytic capacitor using a functional polymer composition. The method comprises immersing the rolled aluminum electrolytic capacitor device in polyaniline solution with high electric conductivity to impregnate the device with polyaniline, drying the impregnated device in a drying oven which is maintained at constant temperature to fully remove the solvent, inserting the dried device to a capacitor aluminum can and then sealing with epoxy resin, to manufacture a solid electrolytic capacitor using a conducting polymer. As such, the impregnation can be performed well at not only normal temperature and pressure, but also high temperature and reduced pressure. The solid electrolytic capacitor has the advantages of high capacity, low impedance and low ESR, and also, low manufacturing cost, simple processes and high reliability.

• 대한기계학회논문집
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• 제17권6호
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• pp.1486-1496
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• 1993

본 연구에서는 새로운 연속 전해드레싱 시스템을 구축하고 현재 전자재료로 널리 사용되고 있는 훼라이트에 대하여, 경면연삭을 실현하기 위한 제반 연삭조건 즉, 전해액의 영향, 파크전류와 펄스폭의 영향, 전해드레싱과 취성파괴와의 관계 등을 규명하였다.

• 한국정밀공학회지
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• 제15권2호
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• pp.14-20
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• 1998

Automatic finishing process requires the development of high efficient and precision abrasive machining method for dies and molds. This study describes the evaluation of the finishing characteristics, such as surfrace roughness, topography and material removal depth of the electrolytic mixed abrasive machining methods. Experimental setup is composed of 3 axis machining center, a newly developed finishing attachment with constant pressure, electrode and electrolytic bath. Finally, we achieved a successful result that surface roughness is $0.01\mu$m Ra and material removal depth is $120\mu$m using electrolytic(0.8A. 30V) mixed abrasive (#400 CBN, #320 SiC) machining method.

• 한국정밀공학회:학술대회논문집
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• 한국정밀공학회 1997년도 춘계학술대회 논문집
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• pp.937-941
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• 1997

Utomatic finishing process requires the development of high efficient and precision abrasive machining method for die and molds. This study describes the evaluation of the finishing characteristics, such as sufrace roughness, topography and material removal depth, of the electrolytic chemical mixed abrasive machining method. Experimental setup is composed of 3 axis machining center, a newly developed finishing attachment with constant pressure, electrode and electrolytic bath. Finally, we achieved a successful result that surface roughness is 0.01 .mu. m Ra and material removal depth is 145 .mu. m after 100 times repeat-finishing using electrolytic (0.8A,30V) mixed abrasive (#400 CBN, #320 Sic) machining method.