• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2006.11a
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• pp.388-389
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• 2006

Electro-deposition of carbon film on silicon substrate in methanol solution was carried out with various current density, solution temperature and electrode spacing between anode and cathode. The carbon films with smooth surface morphology and high electrical resistance were formed when the distance between electrode was relatively wider. The electrical resistance of the carbon films were independent of both current density and solution temperature.

• Progress in Superconductivity and Cryogenics
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• v.8 no.4
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• pp.19-21
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• 2006

Biaxially textured Ni was fabricated by electrodeposition process and delaminated from the biaxially textured cathode surface for further buffer layer deposition process. Those electrode posited Ni substrates showed well-developed biaxial texture and smooth surface. In order to improve the thermal stability of Ni substrates, Mn was alloyed by adding Mn precursor into the electrodeposition bath. Subsequently, $CeO_2$ buffer layers are deposited by MOD process to prevent interfacial reaction between superconductor and substrates. In particular, Bismuth oxide was added to $CeO_2$ to realize lower temperature processing of buffer layers. The microstructure and texture development of each layers have been investigated. Preliminary results shows that all electro/chemical process can be a candidate for cost effective route to YBCO coated conductor.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.382-382
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• 2012

CIGS thin films have received great attention as a promising material for solar cells due to their high absorption coefficient, appropriate bandgap, long-term stability, and low cost production. CIGS thin films are deposited by various methods such as co-evaporation, sputtering, spray pyrolysis and electro-deposition. The deposition technique is one of the most important processes in preparing CIGS thin film solar cells. Among these methods, co-evaporation is one of the best technique for obtaining high quality and stoichiometric CIGS films. However, co-evaporation method is known to be unsuitable for commercialization. The sputtering is known to be very effective and feasible process for mass production. In this study, CIGS thin films have prepared by rf magnetron sputtering using a $Cu(In_{1-x}Ga_x)Se_2$ single quaternary target without post deposition selenization. This process has been examined by the effects of deposition parameters on the structural and compositional properties of the films. In addition, we will explore the influences of substrate temperature and additional annealing treatment after deposition on the characteristics of CIGS thin films. The thickness of CIGS films will be measured by Tencor-P1 profiler. The crystalline properties and surface morphology of the films will be analyzed using X-ray diffraction and scanning electron microscopy, respectively. The optical properties of the films will be determined by UV-Visible spectroscopy. Electrical properties of the films will be measured using van der Pauw geometry and Hall effect measurement at room temperature using indium ohmic contacts.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2008.11a
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• pp.330-330
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• 2008

It is widely investigated to liquid crystal (LC) alignment using non-contact alignment method such as ion-beam (IB) irradiation, UV alignment, and oblique deposition. Because conventional rubbing method has some drawbacks. These include defects from dust and electrostatic charges and rubbing scratch during rubbing process. In addition, rubbing method needs additional process to remove these defects. Therefore rubbing-free methods like ion-beam irradiation are strongly required. We studied LC alignment effect on poly imide surface by IB irradiation and electro-optical (EO) characteristics of twisted nematic liquid crystal display (TN-LCD). In this experiment, a good uniform alignment of the nematic liquid crystal (NLC) with the ion-beam exposure on the polyimide (PI) (SE-150 from Nissan Chemical) surface was observed. We also achieved low pretilt angle as a function of ion-beam irradiation intensity. In addition, it can be obtained the good EO properties of the IB-aligned TN-LCD on PI surface. Some other experiments results and discussion will be included in the poster.

• Journal of the Korean Electrochemical Society
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• v.5 no.4
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• pp.221-225
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• 2002

Assisted by the highly sensitive confocal microprobe Raman spectrometer and proper surface roughening procedure, the Raman investigation on the adsorption and reaction of methanol was performed on Pt-Ru electrodes with different coverages. A detailed description of the roughening process of the Pt electrodes and the underpotential deposition of the Ru was given. Reasonably good Raman signal reflecting the metal-carbon vibration and CO vibration was detected. The appearance of vibrations of the Ru oxides, together with the existence of Ru-C, Pt-C and CO bands, clearly demonstrates the participation of the bi-functional mechanism during the oxidation process of methanol on Pt-Ru electrodes. The Pt-Ru electrode was found to have a higher catalytic activity over Pt electrodes. This preliminary study shows that electrochemical Raman spectroscopy can be applied to the study of rough electrode surface.

• Environmental Sciences Bulletin of The Korean Environmental Sciences Society
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• v.10 no.S_3
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• pp.139-148
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• 2001

Heavy metals such as Cu, Ni, Cd, and Pb were chemically extract from the contaminated soils using the chelating agents, EDTA and DTPA. These chemical extraction have been focused on its applicability to a wide range of soils. Results of extractive efficiency for heavy metal follow the order : Cu-EDTA $\geq$ Ni-EDTA > Pb-EDTA > Cd-EDTA > Cu-DTPA> Pb-DTPA. This result is coincided with order of conditional formation constants(Kr) of metal-chelate agent. The second study involved the recovery of the metals and EDTA from complex solutions by an electromembrane process. The overall processes of regeneration, recovery, and reuse were evaluated. The electrochemical studies showed that copper could be chosen as an electrode to plate Cd, Cu, and Pb. At least 95% of 75 of EDTA and associated Cu or Pb could be recovered by the electromembrane process. Recovery of Cd by electodeposition was not possible with the copper electrode. The percent EDTA recovery is equal to the percentage of metal electroplated from the chelates.

• Journal of the Korean Ceramic Society
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• v.45 no.4
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• pp.191-195
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• 2008

Highly ordered silver nanowire with a diameter of 10 nm was arrayed by electroless deposition in a porous anodic aluminum oxide(AAO) membrane. The AAO membrane was fabricated electrochemically in an oxalic acid solution via a two-step anodization process, while growth of the silver nanowire was initiated by using electroless deposition at the long-range-ordered nanochannels of the AAO membrane followed by thermal reduction of a silver nitrate aqueous solution by increasing the temperature up to $350^{\circ}C$ for an hour. An additional electro-chemical procedure was applied after the two-step anodization to control the pore size and channel density of AAO, which enabled us to fabricate highly-ordered silver nanowire on a large scale. Electroless deposition of silver nitrate aqueous solution into the AAO membrane and thermal reduction of silver nanowires was performed by increasing the temperature up to $350^{\circ}C$ for 1 h. The morphologies of silver nanowires arrayed in the AAO membrane were investigated using SEM. The chemical composition and crystalline structure were confirmed by XRD and EDX. The electroless-deposited silver nanowires in AAO revealed a well-crystallized self-ordered array with a width of 10 nm.

• Tribology and Lubricants
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• v.36 no.1
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• pp.1-10
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• 2020

Large-area two-dimensional (2D) materials synthesized by chemical vapor deposition on donor substrates are promising functional materials for conductors, semiconductors, and insulators in flexible and transparent devices. In most cases, 2D materials should be transferred from a donor substrate to a target substrate; however, 2D materials are prone to damage during the transfer process. The damages to 2D materials during transfer are caused by contamination, tearing, and chemical doping. For the commercialization of 2D materials, a damage-free, large-area, and productive transfer process is needed. However, a transfer process that meets all three requirements has yet to be developed. In this paper, we review the recent progress in the development of transfer processes for 2D materials, and discuss the principles, advantages, and limitations of each process. The future prospects of transfer processes are also discussed. To simplify the discussion, the transfer processes are classified into four categories: wet transfer, dry transfer, mechanical transfer, and electro-chemical transfer. Finally, the "roll-to-roll" and "roll-to-plate" dry transfer process is proposed as the most promising method for the commercialization of 2D materials. Moreover, for successful dry transfer of 2D materials, it is necessary to clearly understand the adhesion properties, viscoelastic behaviors, and mechanical deformation of the transfer film used as a medium in the transfer process.

• Journal of the Korean Society for Nondestructive Testing
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• v.24 no.6
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• pp.573-580
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• 2004

The main goal of this study was to develop a micro-fabrication process for the capacitive micromachined ultrasonic transducer (cMUT). In order to achieve this goal, the former research results of the micro-electro-mechanical system (MEMS) process for the cMUT were analyzed. The membrane deposition, sacrificial layer deposition and etching were found to be a main process of fabricating the cMUT. The optimal conditions for those microfabrication were determined by the experiment. The thickness, uniformity, and residual stress of the $Si_3N_3$ deposition which forms the membrane of the cMUT were characterized after growing the $Si_3N_3$ on Si-wafer under various process conditions. As a sacrificial layer, the growth rate of the $SiO_2$ deposition was analyzed under several process conditions. The optimal etching conditions of the sacrificial layer were analyzed. The microfabrication process developed in this study will be used to fabricate the cMUT.

• Proceedings of the Korean Institute of Resources Recycling Conference
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• 2003.10a
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• pp.185-189
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• 2003

The effect of surface roughness of the substrate on HF-CVD diamond coating was researched. The surface roughness was changed variously by electro-chemical etching conditions. The etching process acted to remove the metallic cobalt from the WC-Co. Diamond nucleation density was higher in etched the substrate. Therefore, the etching process was effective in both Co-removal and higher surface roughness, leading to the improving the diamond nucleation and deposition.