• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2008.11a
• /
• pp.611-612
• /
• 2008

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2002.07b
• /
• pp.976-979
• /
• 2002

A focusing grating coupler (FGC) was not fabricated by the 'Continuous Path Control' writing strategy but by an electron-beam lithography system of more general exposure mode, which matches not only the address grid with the grating period but also an integer multiple of the address grid resolution (5 nm), To more simplify the fabrication, we are able to reduce a process step without large decrease of pattern quality by excluding a conducting material or layer such as metal (Al, Cr, Au), which are deposited on top or bottom of an e-beam resist to prevent charge build-up during e-beam exposure. A grating pitch period and an aperture feature size of the FGC designed and fabricated by e-beam lithography and reactive ion etching were ranged over 384.3 nm to 448.2 nm, and $0.5{\times}0.5mm^2$ area, respectively, This fabrication method presented will reduce processing time and improve the grating quality by means of a consideration of the address grid resolpution, grating direction, pitch size and shapes when exposing. Here our investigations concentrate on the design and efficient fabrication results of the FGC for coupling from slab waveguide to a spot in free space.

• Proceedings of the KIEE Conference
• /
• 1987.07a
• /
• pp.706-709
• /
• 1987

In this paper, the circuit analysis during the retrace period of E.H.T. generator is performed by means of the simplified equivalent circuit. The E.H.T. voltage and the beam current are computed by using Newton-Raphson method and the computed results are compared with those of experiment.

• Journal of the Korean institute of surface engineering
• /
• v.37 no.4
• /
• pp.220-225
• /
• 2004

A new ion beam extraction system is designed using a simple ion mass filter and a micro mass balance and a QMS based detecting system. A quadrupole Mass Filter is used for selective ion beam formation from inductively coupled high density plasma sources with appropriate electrostatic lens and final analyzing QMS. Also a quartz crystal microbalance is set between a QMF and a QMS to measure the etching and polymerization rate of the mass selected ion beam. An inductively coupled plasma was used as a ion/radical source which had an electron temperature of 4-8 eV and electron density of $4${\times}$10^{11}$＃/㎤. A computer interfaced system through 12bit AD-DA board can control the pass ion mass of the qmf by setting RF/DC voltage ratio applied to the quadrupoles so that time modulation of pass ion's mass is possible. So the direct measurements of ion - surface chemistry can be possible in a resolution of $1\AA$/sec based on the qcm's sensitivity. A full set of driving software and hardware setting is successfully carried out to get fundamental plasma information of the ICP source and analysed $Ar^{+}$ beam was detected at the $2^{nd}$ QMS.

• Polymer(Korea)
• /
• v.36 no.3
• /
• pp.344-350
• /
• 2012

New pressure sensitive adhesives (PSAs) for polarizer film were prepared by electron beam (e-beam) radiation to acrylic copolymers, and their adhesive properties were investigated. The acrylic copolymers were synthesized by free radical polymerization of $n$-butylacrylate (BA), 2-hydroxyethyl methacrylate (HEMA), and acrylic acid (AA). The acrylic copolymers were coated on PET release films to a thickness of 25 ${\mu}m$, laminated to polarizer films, and then radiated with e-beam at room temperature. Gel fractions of all the acrylic copolymers after e-beam radiation at 50 kGy were higher than 93%, and their crosslinking densities were increased with increasing the content of HEMA units. PSA prepared by e-beam radiation of acrylic copolymer synthesized with a feed ratio of BA/HEMA/AA = 89.5/10/0.5 (w/w/w) at a dose of 50 kGy exhibited the best adhesion performances in terms of peel strength, creep resistance, durability and reliability, and light leakage. It is expected that the preparation method of PSAs via e-beam irradiation will improve the producibility and workability of polarizer film for liquid crystal display.

• The Transactions of the Korean Institute of Electrical Engineers C
• /
• v.48 no.12
• /
• pp.785-790
• /
• 1999

This research has been carried out to develop a low-energy large-aperture pulsed electron beam generator (LELA), 200keV 1A, for industrial applications. One of the most important feature of this electron beam generator is large electron beam cross section of $190cm^2$. Low energy electron beam generators have been used for water cleaning, flue gas cleaning, and pasteurization, etc. In these applications the cross sectionof the e-beam is related to reaction efficiency. Another important feature of this LELA EB generator is easy maintenance because of its simple structure and relatively low vacuum operation compared to the conventional EB generators. The conventional EB generators need to be scanned because the small cross section thermal electron emitters are used in the conventional EB generators which have small EB cross section. In this research, we use the secondary electrons generated by ion bombardment on the HV cathode surface as a electron source. Therefore we can make any shape of EB cross section without scanning.

• Journal of the Korean Vacuum Society
• /
• v.12 no.1
• /
• pp.16-19
• /
• 2003

Ni thin films on the p-InP (In) substrates were grown at room temperature by using the ion beam-assisted deposition. In order to determine the work function of the Ni thin films, the $\gamma$values were measured as functions of the acceleration voltages by using Ne, Ar, $N_2$. and Xe ion sources. The dependences of the values on various gases and on the acceleration voltages of the focused ion beam were obtained to determine the work function of the Ni thin films. The value of the work function of the Ni thin films grown on the p-InP (100) substrate was 5.8 eV ~ 5.85 eV. These results provide important information on the electronic properties of Ni thin films grown on p-InP (100) substrates at room temperature.

• Journal of the Institute of Electronics and Information Engineers
• /
• v.50 no.6
• /
• pp.43-55
• /
• 2013

In this paper, we propose a cylindrical active phased array antenna of Beam Steering Characteristics in the horizontal plane(H-plane) and vertical plane(E-Plane) on the cylinder form array structure. We design the bent dipole antenna of the cylindrical array structure adapted excellent mutual-coupling characteristics, designed and manufactured the cylindrical array antennas and power combiner/divider unit for power dividing and combining on the antenna. The radiating elements array spacing of Cylindrical array antenna were determined to avoid grating lobes at half power beam steering. Beam steering of the antenna was implemented with 6-bit phase shifter in the transceiver and have been designed based on the characteristics the antenna beam steering at -24 degrees to 24 degrees horizontal, vertical 0 degrees to 36 degrees beam steering. A cylindrical active phased array antenna that produced for verification the performance of the antenna are measured radiation characteristics in accordance with beam steering at L-Band.

• The Transactions of the Korean Institute of Power Electronics
• /
• v.4 no.1
• /
• pp.66-72
• /
• 1999

This paper deals with the output characteristics of resonant PWM inverter type X-ray generators connected to different DC power units i.e. a single phase full bridge rectifier, a three phase full bridge rectifier and a power storage unit(PSU). The quality of X-ray beam depends on the pulsating waveforms of DC voltage supplied to the X-ray tube. In a X-ray generator, the waveform of DC output voltage can be affected from affected from harmonic distortion of DC input power. When a tube voltage waveform is distorted, the property of X-ray beam such as reproducibility, linearity and dose can be reduced. Therefore, we compared DC output waveforms and dose with three type of DC power units and show the experimental results in this paper.

• Proceedings of the KIEE Conference
• /
• 1998.07f
• /
• pp.2127-2129
• /
• 1998

In this paper, discharging part of high voltage pulse power supply of E-beam generating device is simulated and experimented. It is composed of high voltage part and high voltage pulse part. High voltage part is AC 380, DC/DC converter, high voltage high frequency transformer. High voltage pulse part is double pulse forming network and Thyratron. In the result, computer simulation analysis is same to experimental result and high voltage pulse is obtained 10kV, 4A, 10uS.