• Title/Summary/Keyword: e-beam 장치

Search Result 59, Processing Time 0.029 seconds

Optical design of soft X-ray region monochromator (Soft X-ray 영역 단색화 장치의 광학적 설계에 관한 연구)

  • 성면창;최원국;황정남;정광호;김영식
    • Korean Journal of Optics and Photonics
    • /
    • v.3 no.2
    • /
    • pp.86-91
    • /
    • 1992
  • We describe the design of a soft X-ray grating monochromator for synchrotron radiation in the photon energy range 300~1200eV. We investigate the optimum condition in optical parameters of CEM (cylindrical element monochromator), whose performance is well known by Dragon beam line installed recently at Brookhaven National Laboratory by C. T. Chen, fitting the parameter of PLS (Pohang Light Source) storage ring construction.

  • PDF

Development of an impact test device for Light-weight Automotive Reinforcements (자동차 보강재 경량화을 위한 충격 실험장치 개발)

  • Kim, Ick-Tae;Kang, Hyung-Sun
    • Journal of the Korea Academia-Industrial cooperation Society
    • /
    • v.15 no.10
    • /
    • pp.5963-5967
    • /
    • 2014
  • Reducing the impact of collisions of cars is a major issue for reducing the injury and death of passengers. According to the statistical data of the Road Traffic Authority, the deaths from side collision accidents caused by the collision of passenger cars is greater than the deaths from head-on collision accidents. To accommodate this, vehicle designers have added a reinforcing material called the impact frame and impact beam on the inside of the door. Many experiments are needed to develop the door impact beam. These reinforcements to develop a collision experiment is essential. Collision experiments are costly and time consuming. This study used a drop Impactor to obtain the impulse and a strain experimental device was developed for this purpose. The economic costs were reduced and the ideal experiment device configuration was determined. A comparison of the experimental results with numerical value analysis revealed $3.5{\tiimes}10-3sec$ strain ranging from $3.49{\tiimes}10-3$ to $3.99{\tiimes}10-3$.

취급제품소개

  • 권태영
    • Proceedings of the Korean Vacuum Society Conference
    • /
    • 2000.02a
    • /
    • pp.39-39
    • /
    • 2000
  • 당사는 1996년 SPUTTERING SYSTEM 제작을 시작으로 하여 진공관련장치 및 부품을 제작, 납품하는 기업입니다. 그 동안 산업체 및 대학, 연구소 등에 제작 납품된 품목은 양산용SPUTTER 연구실험용SPUTTER, ION PLATING, RIE SYSTEM, E-BEAM 증착기 산업용 AL-EVAPORATOR, 산업용 AIP SYSTEM, 고온열처리로, 진공건조장치 진공 배기SYSTEM, 기타 진공관련장치가 있으며 진공부품으로는 OIL ROTARY PUMP, DIFFUSION PUMP, VALVE 및 배관부품 등이 있습니다. 그밖에 취급하는 품목으로는 진공게이지류 및 터보펌프를 판매하고 있습니다. 일부 장치는 기술력을 인정받아 일본, 동남아시아, 중국 등에 수출되었습니다. 당사는 항상 고객이 필요로 하는 진공응용장치를 다년간 축적된 제조기술과 연구력을 바탕으로 만족스러운 제품을 공급하고 있기에 이를 소개하고자 합니다.

  • PDF

Multiple Electron Beam Lithography for High Throughput (생산성 향상을 위한 멀티빔 리소그라피)

  • Choi, Sang-Kook;Yi, Cheon-Hee
    • Korean Journal of Optics and Photonics
    • /
    • v.16 no.3
    • /
    • pp.235-238
    • /
    • 2005
  • A Multiple electron beam lithography system with arrayed microcolumns has been developed for high throughput applications. The small size of the microcolumn opens the possibility for arrayed operation on a scale commensurate. The arrayed microcolumns based on of Single Column Module (SCM) concept has been fabricated and successfully demonstrated. Low energy microcolumn lithography has been operated in the energy range from 250 eV to 300 eV for the generation of nano patterns. Probe beam current at the sample was measured about >1 nA at a total beam current of $0.5\;{\mu}A$ and a working distance of $\~1\;mm$. The magnitude of probe beam current is strong enough for the low energy lithography. The thin layers of PMMA resist have been employed. The results of nano-patterning by low energy microcolumn lithography will be discussed.

The Research Relating to QA of the Absorbed Dose in the 10 MeV E-beam Facility in Accordance with the International Standards (국제표준에 따른 10 MeV급 전자빔 조사시설의 흡수선량 품질보증에 관한 연구)

  • Ha, Tae-Sung;Ahn, Cheol;Jung, Pyeong-Hwan;Cho, Jeong-Hee;Lee, Jong-Seok;Lee, Hye-Nam;Yoo, Beong-Gyu
    • Journal of radiological science and technology
    • /
    • v.33 no.4
    • /
    • pp.387-394
    • /
    • 2010
  • In the field of healthcare, the conventional sterilization treatments have been replaced by irradiation methods which are in accordance with internationally well established quality standards. The quality control in radiation sterilization assures that the absorbed dose of the irradiated material is in agreement with its requirements and standards. The electron beam irradiation requires technical assessments of more process parameters than gamma irradiation does. Korea has witnessed wide uses of electron accelerators since early 2000 but there hasn't been research experiences relating to quality system in accordance with international standards. The new large scale e-beam irradiation system with the specification of 10 MeV, 8 kW was installed and operated in 2008 by Seoul Radiology Services Co. It consists of the electron accelerator, product handling system, safety, documentation and control subsystems into an integrated system to meet the requirement of the Good Manufacturing Practice such as process quality assurance and management of product tracking records. To implement the international standard such as EN ISO11137, it is necessary to understand the purposes aimed in the standard and carry out the tests following the procedures required. This study presented the specification of the e-beam facility and showed what its design requirements and features are. The test results on a variety of process parameters were presented and validated it they are within the required limits.

The Electroluminescence Display using Electron Beam evaporation (E-Beam 증착기를 이용한 전계발광 표시장치)

  • Hur, Chang-Wu
    • Journal of the Korea Institute of Information and Communication Engineering
    • /
    • v.12 no.6
    • /
    • pp.1051-1055
    • /
    • 2008
  • If ZnS receive electric energy, it can generate light. Thin film ELD has merits of excellent sight effect, solid state and easy fabrication but has problems of low emission density, high power loss and high operating voltage. Thin film deposited by electron beam evaporator has good uniformity of 6%. We fabricate excellent thin film ELD for solution of this problems. The thin film ELD made in this study has brightness of 650fL at yellow light and 350fL at green light.

Modification of Electron beam welding system for Micro joining (미세접합을 위한 전자빔 용접장치의 개조)

  • Seo, Jung;Lee, Je-Hoon;Kim, Jung-Oh;Kang, Hee-Sin
    • Proceedings of the KWS Conference
    • /
    • 2003.11a
    • /
    • pp.24-26
    • /
    • 2003
  • In this study EB(Electron Beam) welder was modified to apply EB welder to micro-joining with solder ball and Pt wire. The power and beam current of EB welder is 6kW, 100mA and the minimum current was 1mA. The minimum current of EB welder was modified to decrease the amount of beam current to 0.0lmA and the monitoring system to observe materials was made up. The control system and CAD/CAM software for e-beam direct writing was developed and the deflection beam was controlled without moving workpieces. the possibility of applying EB welder to micro-joining with solder ball and Pt wire was studied through this experiments.

  • PDF