• Title/Summary/Keyword: dry-cleaning

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Dry cleaning for metallic contaminants removal after the chemical mechanical polishing (CMP) process (Chemical Mechnical Polishing(CMP) 공정후의 금속오염의 제거를 위한 건식세정)

  • 전부용;이종무
    • Journal of the Korean Vacuum Society
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    • v.9 no.2
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    • pp.102-109
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    • 2000
  • It is difficult to meet the cleanliness requirement of $10^{10}/\textrm{cm}^2$ for the giga level device fabrication with mechanical cleaning techniques like scrubbing which is widely used to remove the particles generated during Chemical Mechanical Polishing (CMP) processes. Therefore, the second cleaning process is needed to remove metallic contaminants which were not completely removed during the mechanical cleaning process. In this paper the experimental results for the removal of the metallic contaminants existing on the wafer surface using remote plasma $H_2$ cleaning and UV/$O_3$ cleaning techniques are reported. In the remote plasma $H_2$ cleaning the efficiency of contaminants removal increases with decreasing the plasma exposure time and increasing the rf-power. Also the optimum process conditions for the removal of K, Fe and Cu impurities which are easily found on the wafer surface after CMP processes are the plasma exposure time of 1min and the rf-power of 100 W. The surface roughness decreased by 30-50 % after remote plasma $H_2$ cleaning. On the other hand, the highest efficiency of K, Fe and Cu impurities removal was achieved for the UV exposure time of 30 sec. The removal mechanism of the metallic contaminants like K, Fe and Cu in the remote plasma $H_2$ and the UV/$O_3$ cleaning processes is as follows: the metal atoms are lifted off by $SiO^*$ when the $SiO^*$is evaporated after the chemical $SiO_2$ formed under the metal atoms reacts with $H^+ \; and\; e^-$ to form $SiO^*$.

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Nano Particle Precipitation and Residual Ozone Decomposition of a Hybrid Air Cleaning System Comprising Dielectric Barrier Discharge Plasma and MnO2 Catalyst or Activated Carbon (활성탄 또는 촉매가 장착된 배리어 유전체 방전 하이브리드. 공기청정 시스템의 나노입자 및 잔류 오존 제거 특성)

  • Byeon, Jeong-Hoon;Hwang, Jung-Ho;Ji, Jun-Ho;Kang, Suk-Hoon
    • Transactions of the Korean Society of Mechanical Engineers B
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    • v.27 no.4
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    • pp.524-533
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    • 2003
  • DBD(Dielectric Barrier Discharge) plasma in air is well established for the production of large quantities of ozone and is more recently being applied to aftertreatment processes for HAPs(Hazardous Air Pollutants). Aim of this work is to determine design and operating parameters of a hybrid air cleaning system. DBD and ESP(Electrostatic Precipitator) are used as nano particle charger and collector, respectively. Pelletized MnO$_2$ catalyst or activated carbon is used fer ozone decomposition or adsorption material. AC voltage of 7~10 KV(rms) and 60 Hz is used as DBD plasma source. DC - 8 KV is applied to the ESP for particle collection. The overall particle collection efficiency for the hybrid system is over 85 % under 0.64 m/s face velocity. Ozone decomposition efficiency with pelletized MnO$_2$ catalyst or activated carbon packed bed is over 90 % when the face velocity is under 0.4 m/s in dry air.

A Study on the corrosion property by post treatment in the metal dry etch (Metal 건식각 후처리에 따른 부식 특성에 관한 연구)

  • Mun, Seong-Yeol;Kang, Seong-Jun;Joung, Yang-Hee
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2007.10a
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    • pp.747-750
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    • 2007
  • This study proposes that chlorine residue after metal etch as the source of metal corrosion, and charges should be removed by optimizing etch, PR strip and cleaning condition. Charges distributed along the metal line acts as a source of tungsten (W) plug corrosion when associated with following cleaning solution. In cleaning process after metal etch and PR strip, chemical selection is significantly important in terms of metal corrosion. Optimal corrosion preventive PH, no metal attack (choice of optimal inhibitants), high by product removal efficiency and optimal de ionized water treatment condition is critical to the metal corrosion prevention.

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A Study on the Dyeing of PTT(polytrimethylene terephthalate)/Silk Mixture Fabrics with Disperse Dyes/Acid Dyes (분산염료/산성염료에 의한 PTT(polytrimethylene terephthalate)/견 교직물의 염색에 관한 연구)

  • Sung, Woo-Kyung
    • Fashion & Textile Research Journal
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    • v.12 no.1
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    • pp.94-102
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    • 2010
  • The dyeing of poly(trimethylene terephthalate)(PTT)/silk mixture fabrics can be accomplished by a two bath dyeing method with separate application of the disperse dyes on the PTT, reduction cleaning of the stained silk and then dyeing the silk with the acid dyes, or by one bath dyeing method with mixed dye ranges, possibly followed by a cleaning treatment. The two bath dyeing method has the advantage of better results with respect to dry cleaning fastness properties thanks to the possibility of an intermediate reduction clear. On the other hand, as compared with the two bath dyeing method, one bath dyeing method with a mixed dye range permits rapid and more reproducible dyeing, without the risk of great difference with respect to the shade of the strike on both substrates as well as savings of time, energy and water usage. This study was carried out to investigate dyeing characteristics of PTT/silk mixture fabrics with disperse dyes/acid dyes by one bath dyeing method in comparison with two bath dyeing method in the interests for rationalization of the dyeing process.

Development of High-Quality Poly(3,4-ethylenedioxythiophene) Electrode Pattern Array Using SC1 Cleaning Process (SC1 세척공정을 이용한 고품질 Poly(3,4-ethylenedioxythiophene) 전극 패턴 어레이의 개발)

  • Choi, Sangil;Kim, Wondae;Kim, Sungsoo
    • Journal of Integrative Natural Science
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    • v.4 no.4
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    • pp.311-314
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    • 2011
  • Application of self-assembled monolayers (SAMs) to the fabrication of organic thin film transistor has been recently reported very often since it can help to provide ohmic contact between films as well as to form simple and effective electrode pattern. Accordingly, quality of these ultra-thin films is becoming more imperative. In this study, in order to manufacture a high quality SAM pattern, a hydrophobic alkylsilane monolayer and a hydrophilic aminosilane monolayer were selectively coated on $SiO_2$ surface through the consecutive procedures of a micro-contact printing (${\mu}CP$) and dip-coating methods under extremely dry condition. On a SAM pattern cleaned with SC1 solution immediately after ${\mu}CP$, poly(3,4-ethylenedioxythiophene) (PEDOT) source and drain electrode array were very selectively and nicely vapour phase polymerized. On the other side, on a SC1-untreated SAM pattern, PEDOT array was very poorly polymerized. It strongly suggests that the SC1 cleaning process effectively removes unwanted contaminants on SAM pattern, thereby resulting in very selective growth of PEDOT electrode pattern.

Surface treatment effects on organic thin film transistors (유기박막트랜지스터의 표면처리 효과)

  • 임상철;김성현;김미경;정태형;이정헌;김도진
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2003.03a
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    • pp.126-126
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    • 2003
  • 유기트랜지스터에 관한 연구는 1980년 이후부터 시작되었으나 근래에 들어 전 세계적으로 본격적인 연구가 진행되고 있다. 제작공정이 간단하고 비용이 저렴하며 충격에 의해 깨지지 않고 구부리거나 접을 수 있는 전자 회로 기판이 미래의 산업에 필수적인 요소가 될 것으로 예상되고 있으며 이러한 요구를 충족시킬 수 있는 유기트랜지스터의 개발은 아주 중요한 연구분야로 대두되고 있다. 본 연구에서는 표면처리에 따른 contact angle, I-V 특성곡선, 표면 morphology 등의 결과로부터 dry cleaning 한 것이 wet cleaning한 것보다 왜 좋은지를 논하고자 한다. 먼저 N-type SiO$_2$ 기판을 이용하여 back면의 oxide층을 제거한 후, back gate용으로 사용하기 위하여 sputtering장치로 Au/Cr을 증차하였다. 그리고 기판에 앞면을 photolithography 공정을 이용하여 Au/Cr를 1000$\AA$ 증착 하여 source-, drain-eldctrode를 제조하였다. 그리고 SiO$_2$ 기판의 표면처리를 달리하여 그 위에 유기박막을 증착하여 특성을 비교하였다.

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COAL DESULFURIZATION BY MAGNETIC SEPARATION METHODS (자력선별법에 의한 선탄의 탈황)

  • Jeon, Ho-Seok;Lee, Jae-Jang
    • Journal of Industrial Technology
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    • v.15
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    • pp.175-185
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    • 1995
  • Under the new environmental regulations announced by the government, utilities will have to cut their sulfur dioxide emissions by 60% from 1991 levels by the year of 1999. Sulfur dioxide emissions can be reduced prior to combustion by physical, chemical or biological coal cleaning. The new technology of high gradient magnetic separation (HGMS) offers the potential of economic separatoins of a variety of fine, weakly magnetic minerals including inorganic sulfur and many ash-forming minerals from coals. In the present paper, magnetic separation tests have been conducted on Korean anthracite and high-sulfur Chinese coal to investigate the feasibility of these techniques for reducing sulfur content from coals. In wet magnetic separation, the studied operating parameters include particle size, pH, matrix types, feed solids content, feed rate, number of cleaning stages and etc. The results shows that for wet separation, 60~70% of total sulfur was removed from coals with over 80% combustible recovery, on the other hand, for dry separation, 47.6% of total sulfur was removed from coals with 75% recovery.

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Analysis of the Extracted Non-fibrous Matters from the Exhumed Textiles of Milchang-gun Burial of Mapo (마포 밀창군 묘 출토 복식유물의 섬유외 물질의 추출분석)

  • 안춘순
    • The Research Journal of the Costume Culture
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    • v.11 no.6
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    • pp.902-912
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    • 2003
  • The purpose of this research was two-folds; first, to investigate the type of soil contaminated in the Hunsang excavated from the Milchang-gun burial of Mapo for the purpose of proposing the adequate washing method, second, to utilize the chemical degradation result obtained from the previous research to identify the natural dye source used in the Hunsang textile. The application of KS K0251 test showed that the soil was more oleophilic than hydrophilic thus indicating that wet cleaning was more adequate that dry cleaning for the removal of Hunsang soil. The GC-MS result of the Hunsang extraction showed dimethyl phthalate and 2,4-di-tert-butylphenol as its degradation product and these coincided with the degradation products from the alizarin standard data of previous research. The comparison of the two suggested that it is likely that Hunsang was dyed with madder which has alizarin as its major chromophore.

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A Preliminary Study on the Source Fingerprints of Volatile Organic Compounds (휘발성유기화합물의 배출원 구성물질 성분비에 관한 기초 연구)

  • 이영재;이학성;강병욱;신대윤
    • Journal of Environmental Science International
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    • v.12 no.4
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    • pp.487-496
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    • 2003
  • The purpose of this study was to develop the preliminary source fingerprints of volatile organic compounds (VOC). The source categories studied were vehicles, gasoline vapor, gasoline storage tank, coating, dry cleaning and road covering. The source samples were collected using 6L electro-polished stainless steel canisters for about 20 seconds. From this study, the main component emitted from VOC sources in Korea was toluene. The toluene proportion for road covering, vehicles, coating and gasoline vapor were 35, 18, 16 and 5%, respec- tively. The C$_2$-C$\sub$5/ alkane and alkene compounds were mainly emitted from vehicles, gasoline vapor and gasoline storage tank. The main compounds of coating were m/p-xylene(34%), toluene(16%), 1,2,4-TMB(10%) and o-xylene(9%), which are aromatic hydrocarbons. In the case of dry cleaning, nonane(41%), 1,2,4-TMB (22%) and 1,3,5-TMB(13%) were mainly emitted.

Adsorption of VOCs from Dry Cleaning (세탁소 배출 휘발성유기화합물의 흡착 제거 기술)

  • Lee, Seung-Jae;Moon, Seung-Hyun
    • Journal of Korean Society of Environmental Engineers
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    • v.31 no.11
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    • pp.1025-1032
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    • 2009
  • This study investigated a possibility to develop an adsorption process for volatile organic compounds (VOCs) of the solvent emitted during dry cleaning. Pitch activated carbon fiber (ACF) was chosen as an adsorbent of VOCs, and an electric swing adsorption process was utilized for the reproduction of the adsorbent after the completion of VOCs adsorption. Effects of ACF types and several solvents such as trichloroethylene (TCE) and toluene were examined on breakthrough curves and amounts of adsorbed VOCs. ACF was pretreated under various conditions in order to enhance the amounts of the adsorbed VOCs. Temperatures and voltages were measured for the reproduction of the ACF after full adsorption. ACF having micropores exhibited high adsorption of TCE, and high surface area of ACF could increase the adsorption property of toluene. In general, ACF could adsorb 41~54% TCE of the adsorbent weight. The increase of inlet VOCs concentration significantly decreased the breakthrough time and slightly lowered the amounts of adsorbed VOCs. Thus, ACF could effectively adsorb VOCs in low concentration in the feed stream. ACF pretreated by heat under vacuum showed excellent toluene adsorption with controlling oxygen functional groups on the ACF surface, which revealed that vacant carbon site could be the adsorption point of toluene. Most adsorbed toluene was desorbed at $150^{\circ}C$.