• 한국전기전자재료학회논문지
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• 제31권2호
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• pp.85-89
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• 2018

In this study, functional transparent conducting layers were investigated for Si-based photoelectric applications. Double transparent conductive oxide (TCO) films were deposited on a Si substrate in the sequence of indium tin oxide (ITO) followed by aluminum-doped zinc oxide (AZO). First, we observed that the conductivity and transparency of AZO dominate the overall performance of the double TCO layers. Secondly, the double layered TCO film (consisting of AZO/ITO) deposited by sputtering was compared to a AZO-only film in terms of their optical and electrical properties. We prepared three different AZO films: ITO:3min/AZO:10min, ITO:5min/AZO:7min, and ITO:7min/AZO:4min. The results show that the optical properties (transmittance, absorbance, and reflection) can be controlled by the film composition. This may provide a significant pathway for the manipulation of the optical and electrical properties of photoelectric devices.

• 한국세라믹학회지
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• 제34권1호
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• pp.79-87
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• 1997

졸-겔 스핀코팅법을 이용하여 VDT 기판에 반사방지 및 정전기방지 복층막을 코팅하고 코팅졸과 겔분말의 특성 및 코팅막의 전기적, 광학적, 기계적 특성을 조사하였다. 1층막은 복층막의 간섭조건을 만족시키는 굴절율을 얻기위해 투명 전도성 재료인 ATO(Antimony doped Tin Oxide) 졸과 SiO2 졸을 몰비 68:32로 혼합한 ATO-SiO2 복합졸을, 2층막에는 저굴절율의 SiO2 졸을 사용하였다. 각 코팅막을 45$0^{\circ}C$에서 30분간 열처리하였을 때 잔류 유기물은 완전히 제거되었다. ATO막의 표면저항은 3mol%의 Sb 첨가시 약 6$\times$107$\Omega$/$\square$로 최소를 나타내었고 SiO2 졸과의 혼합시 약 30mol% 까지는 표면저항이 완만히 증가하다가 그 이후에는 급격히 증가하는 경향을 나타내었으며, 간섭조건을 만족시키는 조성인 32mol%에서는 약 3$\times$108$\Omega$/$\square$를 나타내었다. 복층막의 반사율은 550nm의 기준파장에서 약 0.64%를 나타내었으며 광투과율은 약 3.20% 증가하였다. 복층막의 미소경도는 약 471.4kg.f/mm2로 코팅하지 않은 VDT기판의 경도와 유사한 값을 나타내었다.

• 전자공학회논문지A
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• 제30A권1호
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• pp.44-50
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• 1993

In an attempt to improve the electrical characteristics of tantalum pentoxide dielectric film, silicon substrate was reacted with a nitrogen plasma to form a silicon nitride of 50.angs. and then tantalum pentoxide thin films were formed by reactive sputtering in the same chamber. Breakdown field and leakage current density were measured to be 2.9 MV/cm and 9${\times}10^{8}\;A/cm^{2}$ respectively in these films whose thickness was about 180.angs.. With annealing at rectangular waveguides with a slant grid are investigated here. In particular, 900.deg. C in oxygen ambient for 100 minutes, breakdown field and leakage current density were improved to be 4.8 MV/cm and 1.61.6${\times}10^{8}\;A/cm^{2}$ respectively. It turned out that the electrical characteristics could also be improved by oxygen plasma post-treatment and the conduction mechanism at high electric field proved to be Schottky emission in these double-layered films.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 춘계학술대회 논문집 초전도 자성체
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• pp.21-24
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• 2002

In this paper, for the study on the fabrication of YBCO superconductor wire, a double layered YBCO superconductor wire was fabricated by electrophoretic method on metal Ag wire(${\Psi}$0.8 mm). On the basis of previous researches for the fabrication of superconductor wire, the acetone suspension solution with 8 vol.% of 1% PEG(1000) was used and high molecular adhesive was experimentally performed for an improvement of the critical current density of superconductor wire. It was found that the Ag inter-layer deposited on the superconductor wire affect to the state of second YBCO film and its critical current density.

• 한국자기학회지
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• 제4권3호
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• pp.244-248
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• 1994

NdTbFeCo 합금막 및 NdTbFeCo/TbFeCo 이층막에 대한 자기광학 Kerr 회전각(${\theta}_{k}$)의 파장의존성 및 자기적 특성을 조사하였다. FeCo의 조성을 일정하게 유지하고 NdTbFeCo 합금막에서 Tb의 일부를 Nd로 치환한 결과, Nd 조성이 증가할 수록 400 nm의 파장영역에서 ${\theta}_{k}$는 증대되었으나, 보자력과 각형비가 급격히 감소하였다. NdTbFeCo 막이 단파장에서 큰 ${\theta}_{k}$를 나타냄에도 불구하고 보자력이 작아 단파장용 광자기기록 매체로서 응용가능성이 희박할 것으로 생각되어, 보자력이 큰 TbFeCo 막과 교환결합 이층막을 제작하였다. 제작된 시료중 $Nd_{16.9}Tb_{15.2}Fe_{50.4}Co_{17.5}(150\;{\AA})/Tb_{21.1}Fe_{65.0}Co_{13.9}(300\;{\AA})$ 교환결합 이층막이 6.0 KOe의 보자력과 500 nm에서 $0.32^{\circ}$의 ${\theta}_{k}$를 나타내었다.

• Journal of Korean Vacuum Science & Technology
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• 제7권2호
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• pp.39-44
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• 2003

Recent ULSI and multilevel structure trends in microelectronic devices minimize the line width down to a quarter micron and below, which results in the high current densities in thin film interconnections. Under high current densities, an EM(electromigration) induced failure becomes one of the critical problems in a microelectronic device. This study is to improve thin film interconnection materials by investigating the EM characteristics in PSG(phosphosilicate glass)/SiO$_2$ passivated Al-l%Si thin film interconnections. Straight line patterns, wide and narrow link type patterns, and meander type patterns, etc. were fabricated by a standard photholithography process. The main results are as follows. The current crowding effects result in the decrease of the lifetime in thin film interconnections. The electric field effects accelerate the decrease of lifetime in the double-layered thin film interconnections. The lifetime of interconnections also depends upon the current conditions of P.D.C.(pulsed direct current) frequencies applied at the same duty factor.

• 멤브레인
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• 제15권3호
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• pp.198-205
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• 2005

방사능 오염도 측정에 사용하기 위한 이중구조 고분자막이 폴리설폰과 세륨활성화된 이트륨실리케이트(CAYS)를 이용하여 제조되었다. 제조된 막은 순수 고밀도 고분자 지지층과 이에 제막된 고분자 용액의 상전환 공정에 의해 고형화된 CAYS 함침 활성층의 이중구조로 구성된다. 제막공정에서 대기방치 공정이 생략되었을 때 CAYS를 포함하는 활성층은 전형적인 비대칭 구조를 지니며, CAYS 입자들이 고분자 구조 사이에 박혀있는 형상을 지닌다. 제막공정에서 대기에 방치하는 시간이 증가할수록 막의 형상은 스폰지 구조를 띠며 CAYS는 고분자 구조로부터 분리되어 막 내부에 셀 같은 공간에 밀집되어 존재함을 보였다. 한편, 두 충 사의 계면형상은 고분자 고형화 과정에서의 상전환 속도와 밀접한 관련되었으며, 대기방치 시간의 증가에 따라 계면의 구분이 뚜렷하게 나타나지 않았다. 방사능 탐지 특성에서 스폰지 구조를 지니는 막의 고분자 구조는 방사성핵종이 통과할 수 없는 밀집된 형상을 지니면서 탐지효율의 감소를 초래하는 것으로 나타났다.

• ETRI Journal
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• 제44권1호
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• pp.147-154
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• 2022

We demonstrate a new double-layer structure for stretchable interconnects, where the top surface of a serpentine polyimide support is coated with a thin eutectic gallium-indium liquid metal layer. Because the liquid metal layer is constantly fixed on the solid serpentine body in this liquid-on-solid structure, the overall stretching is accomplished by widening the solid frame itself, with little variation in the total length and cross-sectional area of the current path. Therefore, we can achieve both invariant resistance and infinite fatigue life by combining the stretchable configuration of the underlying body with the freely deformable nature of the top liquid conductor. Further, we fabricated various types of double-layer interconnects as narrow as 10 ㎛ using the roll-painting and lift-off patterning technique based on conventional photolithography and quantitatively validated their beneficial properties. The new interconnecting structure is expected to be widely used in applications requiring high-performance and high-density stretchable circuits owing to its superior reliability and capability to be monolithically integrated with thin-film devices.

• International journal of advanced smart convergence
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• 제2권2호
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• pp.16-18
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• 2013

In this paper, we develop a method to design a flexible thin film audio systems utilizing Polyvinylidene fluoride. The system we designed showed the properties of increased transparency and sound pressure levels. As an input terminal transparent oxide thin film is adopted. In order to provide dielectric insulation, a transparent insulating oxide thin film is coated to obtain double -layered structure. In the range of visible light, the output from the output of the system showed an increased and improved sound pressure level. The piezoelectric polymer film of polyvinylidene fluoride (PVDF) is used to produce mechanical vibration due to the applied electrical voltage signal. An analog electric voltage signal is transformed into sound waves in the audio system.

• 한국정보디스플레이학회:학술대회논문집
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• 한국정보디스플레이학회 2004년도 Asia Display / IMID 04
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• pp.44-47
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• 2004

Fabrication of barrier layer on PES substrate and plastic OLED device by atomic layer deposition are carried out. Simultaneous deposition of 30nm of $AlO_x$ film on both sides of PES gives film MOCON value of 0.0615g/$m^2$.day (@38$^{\circ}C$, 100% R.H). Introduction of conformal $AlO_x$ film by ALD resulted in enhanced barrier properties for inorganic double layered film including PECVO $SiN_x$. Preliminary life time to 91% of initial luminance (1300 cd/$m^2$ ) for 100nm of PECVD $SiN_x$/30nm of ALD $AlO_x$ coated plastic OLED device was 260 hours.