• 제목/요약/키워드: diamond thin film

검색결과 235건 처리시간 0.03초

공정변수에 따른 microwave plasma CVD 다이아몬드/Ti 박막 증착 양상 조사 (Parametric study of diamond/Ti thin film deposition in microwave plasma CVD)

  • 조현;김진곤
    • 한국결정성장학회지
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    • 제15권1호
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    • pp.10-15
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    • 2005
  • Microwave plasma CVD 다이아몬드/Ti 박막 성장 시 CH₄/H₂ 가스의 유량비율, chuck bias, microwave power 등이 다이아몬드 박막의 구조적 특성과 입자밀도에 미치는 영향에 대하여 조사하였다. 2∼3 CH₄ Vol.% 조건일 때 sp³-결합성의 탄소 neutral 들이 우선적으로 형성되고 sp²-결합성의 탄소 neutral 들이 선택적으로 제거됨에 따라 양질의 다이아몬드 박막을 얻을 수 있었으며, 다이아몬드 입자 증착 기구를 해석하였다. Ti 기판에 걸어준 negative chuck bias가 증가함에 따라 다이아몬드 핵생성이 증진되어 다이아몬드 입자 밀도가 증가하였고, 임계 전압은 약 -50V 임을 확인하였다. 또한, microwave power가 증가함에 따라 미세결정질(micro-crystalline) graphite 층 생성이 제어되고 다이아몬드 층이 형성됨을 확인하였다.

Boron-doped Diamond Thin Film for Electrochemical Biosensors

  • Jianzhong-Zhu;Lu-Deren
    • 한국진공학회지
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    • 제7권s1호
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    • pp.156-158
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    • 1998
  • This paper describes the preparation of boron-doped polycrystalline diamond thin film whose electrical resitivity is lower than $10^{-1}\Omega$cm. The 1$\times$1$\textrm{mm}^2$ microelectrodes, its conducting line with 0.2mm wide and 0.5$\times$0.5$\textrm{mm}^2$ pads was patterned by reactive ion beam etching. A glucose microsensor based on diamond film microelectrode and pyramidal containment produced on silicon by anisotropic etching was developed. Its advantages are high sensitivity and high stability.

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고주파 플라즈마 CVD에 의한 $\textrm{H}_2$-$\textrm{CH}_4$ 계로부터 다이아몬드 박막의 합성 (Synthesis of Diamond Thin Film by RF PACVD from $\textrm{H}_2$-$\textrm{CH}_4$ Mixed Gas)

  • 임헌찬
    • 전자공학회논문지T
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    • 제36T권3호
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    • pp.13-18
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    • 1999
  • 다이아몬드 박막은 RF PACVD법에 의해 수소와 메탄으로부터 실리콘 웨이퍼 상에 성장되어졌다. 박막 성장 전에 표면의 핵생성 밀도를 증가시키기 위하여 1㎛의 다이아몬드 페이스트로 기계적 흡집을 내어 사용하였다. 메탄 농도를 변화시켜 제작한 박막에 대한 평가는 XRD, SEM 및 Raman Spectroscopy에 의해 이루어졌다. 성장된 박막의 결정성은 메탄 농도가 낮을수록 증가되었다.

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나노급 다이아몬드 파우더에 ALD로 제조된 ZnO 박막 연구 (Microstructure of ZnO Thin Film on Nano-Scale Diamond Powder Using ALD)

  • 박종성;송오성
    • 한국진공학회지
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    • 제17권6호
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    • pp.538-543
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    • 2008
  • 나노급 다이아몬드는 최근 폭발법이나 증착법에 의한 신공정으로 100 nm 이하의 분말형태의 제조가 가능하다. 나노급 다이아몬드의 소결을 이용하면 이상적인 연마기기의 제작이 가능하다. 이러한 나노급 다이아몬드의 소결 공정에서 생기는 비이상적인 나노결정의 결정립성장과 다이아몬드 결합장애를 방지하기 위해서 나노급 무기물을 균일하게 코팅하는 공정개발이 필요하다. 본 연구에서는 나노급 다이아몬드의 소결 특성을 향상시키기 위해서 ALD(atomic layer deposition)을 이용하여 진공에서 $20{\sim}30\;nm$ 두께의 ZnO 박막을 코팅해 보았다. 나노급 다이아몬드 분말 전면에 경제적으로 ZnO ALD를 위해서 기존의 기계적 진동효과 또는 전용 fluidized bed reactor를 대치하여 새로이 20 mm 석영튜브 안에 다이아몬드 분말을 넣고 다공성 유리필터로 막은 후 펄스와 퍼지 공정시의 압력에 의한 다이아몬드의 부유를 이용한 변형된 fluidized bed 공정을 채용하였다. 다공성 유리필터로 양쪽이 막힌 석영튜브 안에 전구체 DEZn (diethylzinc : $C_4H_{10}Zn$)와 반응기체 $H_2O$를 사용하여 ZnO 박막을 캐니스터 온도 $10^{\circ}C$에서 원자층증착하였다. 공정 순서 및 반응물질 주입 시간은 DEZn pulse-0.1초, DEZn purge-20초, $H_2O$ pulse-0.1초, $H_2O$ purge-40초와 같이 설정하였으며, 이 네 단계를 1 cycle로 정의하여 100 cycle 반복 실시하였다. 다이아몬드 분말과 ZnO 박막이 증착된 다이아몬드 분말의 미세구조를 확인하기 위하여 투과전자현미경 (transmission electron microscope)을 이용하였다. TEM 측정결과, ALD 증착 전 나노급 다이아몬드 분말의 직경이 약 $70{\sim}120\;nm$이었고 사면체, 육면체 등의 다양한 형태를 보임을 확인하였다. ZnO 박막이 ALD코팅된 다이아몬드 분말의 직경은 약 $90{\sim}150\;nm$이었고, 다이아몬드 분말과 ZnO의 명암차이에 의해 약 $20{\sim}30\;nm$ 두께의 균일한 ZnO 박막이 다각형 형태의 다이아몬드 파우더 표면에 성공적으로 증착되었음을 확인하였다.

이온 빔 조사된 SiNx 박막의 액정 배향 효과에 관한 연구 (Investigation on Liquid Crystal Alignment Effects of SiNx Thin Film Irradiated by Ion Beam)

  • 이상극;김영환;김병용;한진우;강동훈;김종환;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 하계학술대회 논문집 Vol.8
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    • pp.398-398
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    • 2007
  • Most recently, the Liquid Crystal (LC) aligning capabilities achieved by ion beam exposure on the diamond-like carbon (DLC) thin film layer have been successfully studied. The DLC thin films have a high mechanical hardness, a high electrical resistance, optical transparency and chemical inertness. Nitrogen doped Diamond Like Carbon (NDLC) thin films exhibit properties similar to those of the DLC films and better thermal stability than the DLC films because C:N bonding in the NDLC film is stronger against thermal stress than C:H bonding in the DLC thin films. Moreover, our research group has already studied ion beam alignment method using the NDLC thin films. The nematic liquid crystal (NLC) alignment effects treated on the SiNx thin film layers using ion beam irradiation for three kinds of N rations was successfully studied for the first time. The SiNx thin film was deposited by plasma-enhanced chemical vapor deposition (PECVD) and used three kinds of N rations. In order to characterize the films, the atomic force microscopy (AFM) image was observed. The good LC aligning capabilities treated on the SiNx thin film with ion beam exposure for all N rations can be achieved. The low pretilt angles for a NLC treated on the SiNx thin film with ion beam irradiation were measure.

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NDLC 박막 위에 Ion Beam 배향한 TN-LCD의 전기광학특성 (EO Characteristics of the ion Beam Aligned TN-LCD on the NDLC Thin Film Surface)

  • 박창준;황정연;강형구;안한진;김경찬;김종복;백홍구;서대식
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 하계학술대회 논문집 Vol.5 No.2
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    • pp.1054-1057
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    • 2004
  • The nitrogenated diamond-like carbon (NDLC) exhibits high electrical resistivity and thermal conductivity that are similar to the properties shown by diamond-like carbon (DLC) films. These diamond-like transparent properties in NDLC come in a material consisting of $sp^2$-bonded carbon versus the $sp^3$-carbon of DLC. The diamond-like properties and nondiamond-like bonding make NDLC an attractive candidate for applications. Liquid crystal (LC) alignment capabilities with ion beam exposure on NDLC thin films and electro-optical (EO) performances of the ion-beam-aligned twisted nematic liquid crystal display (TN-LCD) with oblique ion beam exposure on the NDLC thin film surface were studied. An excellent uniform alignment of the nematic liquid crystal (NLC) alignment with the ion beam exposure on the NDLC thin films was observed. In addition, it can be achieved that the good EO properties of the ion-beam-aligned TN-LCD. Finally, we will present the residual DC property of the ion-beam-aligned TN-LCD on the NDLC thin film surface.

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Charged Cluster Model as a New Paradigm of Crystal Growth

  • Nong-M. Hwang;In-D. Jeon;Kim, Doh-Y.
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 2000년도 Proceedings of 2000 International Nano Crystals/Ceramics Forum and International Symposium on Intermaterials
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    • pp.87-125
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    • 2000
  • A new paradigm of crystal growth was suggested in a charged cluster model, where charged clusters of nanometer size are suspended in the gas phase in most thin film processes and are a major flux for thin film growth. The existence of these hypothetical clusters was experimentally confirmed in the diamond and silicon CVD processes as well as in gold and tungsten evaporation. These results imply new insights as to the low pressure diamond synthesis without hydrogen, epitaxial growth, selective deposition and fabrication of quantum dots, nanometer-sized powders and nanowires or nanotubes. Based on this concept, we produced such quantum dot structures of carbon, silicon, gold and tungsten. Charged clusters land preferably on conducting substrates over on insulating substrates, resulting in selective deposition. if the behavior of selective deposition is properly controlled, charged clusters can make highly anisotropic growth, leading to nanowires or nanotubes.

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Microstructure analysis of DLC thin film fabricated by filtered arc ion plating method

  • Park, Y.P.;Kim, T.G.;Cheon, M.W.
    • Journal of Ceramic Processing Research
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    • 제13권spc2호
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    • pp.363-367
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    • 2012
  • DLC (diamond liked carbon) coating of the tungsten carbide (WC) alloy core surface for molding a glass aspheric lens improves the quality of glass lens and the molding core and is characterized by high hardness, high elasticity, abrasion resistance and chemical stability. In this study, the effect of DLC coating of a thin film by means of the filtered AIP (arc ion plating) technique was examined on Ra and shape of the coated surface. Roughness before and after DLC coating was measured and the result showed that the roughness was improved after coating as compared to before coating. It was observed that DLC coating of the WC alloy core surface for molding had an effect on improving the roughness and shape of the core surface. It is considered that this will have an effect on improving abrasion resistance and the service life of the core surface.

HFCVD법에 의한 ${CH_3}OH/{H_2}O$ 혼합기체의 다이아몬드 박막성장에 관한 연구 (Diamond Film Growth by Vapor Activation Method Using ${CH_3}OH/{H_2}O$ Gas)

  • 이권재;고재귀
    • 한국재료학회지
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    • 제11권12호
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    • pp.1014-1019
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    • 2001
  • The diamond thin film was deposited on Si(100) substrate from$CH_3OH/H_2O$mixtured gas using a hot filament chemical vapor deposition(HFCVD) method. The deposition condition for samples has been varried with the$CH_3OH/H_2O$composition. Scanning electron microscopy(SEM) and Raman spectroscopy has been employed for the sample analysis. The diamond sample has been obtained below 20Pa with$CH_3OH/H_2O$mixtured gas. The crystallinity of diamond film improved as the composition $CH_3OH$decreases from 60Vol% to 52Vol%, and the sample structure changed from the cauliflower to the diamond structure. But the sample structure was becomes cauliflower at 50Vol% of in$CH_3OH$ in the $CH_3OH/H_2O$. It was shown that the$CH_3OH$ has threshold composition.

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