• Title/Summary/Keyword: deposition intensity

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Growth and Characterization of Vertically well Aligned Crbon Nanotubes on Glass Substrate by Plasma Enhanced Hot Filament Chemical Vapor deposition

  • Park, Chong-Yun;Yoo, Ji-Beom
    • Proceedings of the Korean Vacuum Society Conference
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    • 2000.02a
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    • pp.210-210
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    • 2000
  • Vertically well aligned multi-wall carbon nanotubes (CNT) were grown on nickel coated glass substrates by plasma enhanced hot filament chemical vapor deposition at low temperatures below 600$^{\circ}C$. Acetylene and ammonia gas were used as the carbon source and a catalyst. Effects of growth parameters such as pre-treatment of substrate, plasma intensity, filament current, imput gas flow rate, gas composition, substrate temperature and different substrates on the growth characteristics of CNT were systematically investigated. Figure 1 shows SEM image of CNT grown on Ni coated glass substrate. Diameter of nanotube was 30 to 100nm depending on the growth condition. The diameter of CNT decreased and density of CNT increased as NH3 etching time etching time increased. Plasma intensity was found to be the most critical parameter to determine the growth of CNT. CNT was not grown at the plasma intensity lower than 500V. Growth of CNT without filament current was observed. Raman spectroscopy showed the C-C tangential stretching mode at 1592 cm1 as well as D line at 1366 cm-1. From the microanalysis using HRTEM, nickel cap was observed on the top of the grown CNT and very thin carbon amorphous layer of 5nm was found on the nickel cap. Current-voltage characteristics using STM showed about 34nA of current at the applied voltage of 1 volt. Electron emission from the vertically well aligned CNT was obtained using phosphor anode with onset electric field of 1.5C/um.

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Low-Intensity Pulsed Ultrasound Promotes BMP9 Induced Osteoblastic Differentiation in Rat Dedifferentiated Fat Cells

  • Fumiaki Setoguchi;Kotaro Sena;Kazuyuki Noguchi
    • International Journal of Stem Cells
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    • v.16 no.4
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    • pp.406-414
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    • 2023
  • Dedifferentiated fat cells (DFATs) isolated from mature adipocytes have a multilineage differentiation capacity similar to mesenchymal stem cells and are considered as promising source of cells for tissue engineering. Bone morphogenetic protein 9 (BMP9) and low-intensity pulsed ultrasound (LIPUS) have been reported to stimulate bone formation both in vitro and in vivo. However, the combined effect of BMP9 and LIPUS on osteoblastic differentiation of DFATs has not been studied. After preparing DFATs from mature adipose tissue from rats, DFATs were treated with different doses of BMP9 and/or LIPUS. The effects on osteoblastic differentiation were assessed by changes in alkaline phosphatase (ALP) activity, mineralization/calcium deposition, and expression of bone related genes; Runx2, osterix, osteopontin. No significant differences for ALP activity, mineralization deposition, as well as expression for bone related genes were observed by LIPUS treatment alone while treatment with BMP9 induced osteoblastic differentiation of DFATs in a dose dependent manner. Further, co-treatment with BMP9 and LIPUS significantly increased osteoblastic differentiation of DFATs compared to those treated with BMP9 alone. In addition, upregulation for BMP9-receptor genes was observed by LIPUS treatment. Indomethacin, an inhibitor of prostaglandin synthesis, significantly inhibited the synergistic effect of BMP9 and LIPUS co-stimulation on osteoblastic differentiation of DFATs. LIPUS promotes BMP9 induced osteoblastic differentiation of DFATs in vitro and prostaglandins may be involved in this mechanism.

The Molecular Orientation of PVDF Organic Thin Film by Vapor Deposition Method (진공증착법을 이용한 PVDF 유기박막의 분자배향)

  • 박수홍;이선우;임응춘;최충석;이덕출
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1997.04a
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    • pp.297-300
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    • 1997
  • In this study, The PVDF thin film was fabricated on the one method of dry-process the physical vapor deposition method, applied electric field, and evaporation control in $\beta$-PVDF thin film preparation. A study on the electric-field-phase change of PVDF thin film in physical vapor deposition using the polymer deposition apparatus which are manufactured for oneself. In the analysis of Fourier-Transform Infrared spectra, according to increasing of electric field intensity, the 510$cm^{-1}$ / peak and 1273$cm^{-1}$ / peak which are showed in $\beta$-PVDF increase, on the contrary the 530$cm^{-1}$ / peak and 977$cm^{-1}$ / peak which are showed in $\alpha$-PVDF decrease.

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A Study on Deposition Mechanism of Laser CVD $SiO_2$ by Process Simulation (공정 Simulation에 의한 Laser CVD $SiO_2$막 형성 기구 규명에 관한 연구)

  • Shin, Sang-Woo;Lee, Sang-Kwon;Kim, Tae-Hun;Sung, Yung-Kwon
    • Proceedings of the KIEE Conference
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    • 1997.07d
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    • pp.1301-1303
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    • 1997
  • This study was performed to investigate the deposition mechanism of $SiO_2$ by ArF excimer Laser(193nm) CVD with $Si_2H_6$ and $N_2O$ gas mixture and evaluate Laser CVD quantitatively by modeling. In this study, new model of $SiO_2$ deposition process by Laser CVD is introduced and deposition rates are simulated by computer with the basis on this modeling. And simulation results are compared with experimental results measured at various conditions such as reaction gas ratio, chamber pressure, substrate temperature and laser beam intensity.

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Characteristics of ZnO Thin Films Grown on p-type Si and Sapphire Substrate by Pulsed Laser Deposition

  • Lee, K. C.;Lee, Cheon
    • KIEE International Transactions on Electrophysics and Applications
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    • v.3C no.6
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    • pp.241-245
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    • 2003
  • ZnO thin films on (l00) p-type Si and sapphire substrates have been deposited by a pulsed laser deposition technique using an Nd:YAG laser with a wavelength of 266 nm. The influence of the deposition parameters such as oxygen pressure, substrate temperature and laser energy density on the properties of the grown films was studied. The experiments were performed for substrate temperatures in the range of 200∼50$0^{\circ}C$ and oxygen pressure in the range of 100∼700 sccm. All of the films grown in this experiment show strong c-axis orientation with (002) textured ZnO peak. With increasing substrate temperature, the FWHM (full width at half maximum) and surface roughness were decreased. In the case of using sapphire substrate, the intensity of PL spectra increased with increasing ambient oxygen flow rate. We investigated the structural and morphological properties of ZnO thin films using X-ray diffraction (XRD), scanning electron microscopy (SEM) and atomic force microscopy (AFM).

A study on bulk deposition flux of dustfall and insoluble components by the wind intensity in Busan, Korea (바람의 강도에 따른 강하먼지와 불용성 성분의 조성특성)

  • 황용식;김유근;박종길;문덕환
    • Journal of Environmental Science International
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    • v.11 no.7
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    • pp.651-662
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    • 2002
  • Weather elements were observed by the AWS (Automatic Weather System) and dustfall particles were collected by the modified American dust jar (wide inlet bottle type) at 4 sampling sites in Busan area from March. 1999 to February, 2000. Thirteen chemical species (Al, Ca, Cd, Cr, Cu, Fe, K, Mg, Mn, Ni, Pb, Si, and Zn) were analyzed by AAS and ICP. The purposes of this study were to estimate qualitatively various bulk deposition flux of dustfall and insoluble components by applying regional and seasonal wind intensity. Frequency of wind speed were found in order of low(1-3m/s), very low(<1m/s), medium(3-8m/s) and high(>8m/s), and annual mean had higher range at low(1-3m/s) for 56.3%. Strong negative linear correlation were observed between dustfall and wind direction (northeastern and eastern), but strong positive linear correlation were observed between dustfall and wind direction (western and northwestern) at industrial, commercial and coastal zone(p<0.05). While a negative correlation were observed between wind speed frequency of very low(<1 m/s) and dustfall, and positive correlation were observed between wind speed frequency of low(1-3m/s) and dustfall in coastal zone(p<0.05). The correlation coefficient was observed 0.556 between wind speed frequency of low(1-3m/s) and Ni by commercial zone(p<0.05). The correlation coeffcient show well-defined insoluble trace metals (Al, Ca, Cr, Cu, Fe, Pb, and Zn) and wind speed frequency of low(1-3m/s) at coastal zone, which was found significant difference(p<0.01).

The fabrication of PVDF organic thin films by thermal evaporation deposition method and their molecular orientation properties (열증착법을 이용한 PVDF 유기박막의 제조와 분자배향특성)

  • 임응춘;이덕출
    • Journal of the Korean Vacuum Society
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    • v.6 no.2
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    • pp.122-128
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    • 1997
  • In this study, the PVDF organic thin films were fabricated by thermal evaporation deposition which is one of the dry-processing methods. The distance from heat source to substrate was 5 cm. The substrate temperature was maintained at $30 ^{\circ}C$ during deposition. The working pressure was about $2.0\times10^{-5}$Torr and the temperature of heat source was increased at the rate of 6 to $8^{\circ}C$/min. At $270^{\circ}C$, the shutter was opened and the deposition of PVDF has stared. As the electrical field intensity increased, $\alpha$ peaks such $530\textrm{cm}^{-1},795\textrm{cm}^{-1},1182\textrm{cm}^{-1}$ decreased, and $\beta$ peaks such as $510\textrm{cm}^{-1},1273\textrm{cm}^{-1}$ increased. The intensity of $530\textrm{cm}^{-1}$ peak was stronger than that of $510\textrm{cm}^{-1}$ peak velow the 71.4 kV/cm, intensity of electrical field. This result showed the characteristic of film mainly due to $\alpha$-mode. According to these results, the molecular structure of PVDF thin film is transformed from $\alpha$-mode with TGT or TG'T to $\beta$-mode with planar zigzag structure TT, as increasing of intensity of electrical field.

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Effect of RTA on Leakage Current of $Ta_2O_5$ Thin Films Deposited by PECVD (PECVD법으로 증착된 $Ta_2O_5$박막의 누설전류에 미치는 RTA의 영향)

  • Kim, Jin-Beom;Lee, Seung-Ho;So, Myeong-Gi
    • Korean Journal of Materials Research
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    • v.4 no.5
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    • pp.550-555
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    • 1994
  • The effects of RTA treatment on the leakage current have been studied for tantalum pentoxide( $Ta_2O_5$) films deposited by PECVD on P-type(100) Si substrate using $TaCl_5$(99.99%) and $N_2O$(99.99%) gaseous mixture. The refractive index increased with increasing the deposition temperature and the maximum deposition rate was obtained at $500^{\circ}C$. The Ta-0 bond peak intensity of as-deposited $Ta_2O_5$ increased with increasing the deposition temperature through FT-IR analysis and the leakage current value was decreased with increasing the deposition temperature. The small leakage current value obtained after RTA treatment of as-deposited $Ta_2O_5$ was found to be due to the reduction of 0-deficient structure in the film. The increases of the oxygen coacentration and the Ta-0 bond peak intensity in the film after RTA treatment were measured by AES and FT-IR analyses.

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In-situ Monitoring of GaN Epilayers by Spectral Reflectance (분광 반사법을 이용한 GaN 박막의 실시간 관찰)

  • Na, Hyun-Seok
    • Journal of the Korean Vacuum Society
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    • v.20 no.5
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    • pp.361-366
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    • 2011
  • An in-situ, real-time monitoring of GaN epilayers grown by low pressure metalorganic chemical vapor deposition system modified for spectral reflectance was performed. Reflectance spectrums from 190~861 nm were observed using p-polarized light with incident angle of $75^{\circ}$. All reflectance spectrums showed interference oscillation caused by multiple reflection within GaN epilayers, and the spectrum from GaN with low crystalline quality showed weak reflectance intensity and much low amplitude of the oscillation because many defects in GaN resulted in light scattering and absorption. Signal variation of reflected light which was selected around strong constructive wavelength range was also observed during $NH_3$ supplying and $NH_3$ cut-off. There was no significant change in signal intensity when $NH_3$ cut-off for 10 sec, but it showed higher intensity when $NH_3$ was cut off for over 30 sec and its intensity kept unchanged. This result indicates that GaN surface was N-terminated during $NH_3$ supplying but Ga-terminated during $NH_3$ cut-off because of high nitrogen equilibrium vapor pressure of GaN, and metallic Ga-terminated surface caused slightly higher reflectance intensity.

Amorphous Carbon Films on Ni using with $CBr_4$ by Thermal Atomic Layer Deposition

  • Choe, Tae-Jin;Gang, Hye-Min;Yun, Jae-Hong;Jeong, Han-Eol;Kim, Hyeong-Jun
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2011.10a
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    • pp.28.1-28.1
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    • 2011
  • We deposited the carbon films on Ni substrates by thermal atomic layer deposition (th-ALD), for the first time, using carbon tetrabromide ($CBr_4$) precursors and H2 reactants at two different temperatures (573 K and 673 K). Morphology of carbon films was characterized by scanning electron microscopy (SEM). The carbon films having amorphous carbon structures were analyzed by X-ray photoemission spectroscopy (XPS) and Raman spectroscopy. As the working temperature was increased from 573 K to 673 K, the intensity of C1s spectra was increased while that of O1s core spectra was reduced. That is, the purity of carbon films containing bromine (Br) atoms was increased. Also, the thin amorphous carbon films (ALD 3 cycle) were transformed to multilayer graphene segregated on Ni layer, through the post-annealing and cooling process.

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