The fabrication of PVDF organic thin films by thermal evaporation deposition method and their molecular orientation properties

열증착법을 이용한 PVDF 유기박막의 제조와 분자배향특성

  • Published : 1997.05.01

Abstract

In this study, the PVDF organic thin films were fabricated by thermal evaporation deposition which is one of the dry-processing methods. The distance from heat source to substrate was 5 cm. The substrate temperature was maintained at $30 ^{\circ}C$ during deposition. The working pressure was about $2.0\times10^{-5}$Torr and the temperature of heat source was increased at the rate of 6 to $8^{\circ}C$/min. At $270^{\circ}C$, the shutter was opened and the deposition of PVDF has stared. As the electrical field intensity increased, $\alpha$ peaks such $530\textrm{cm}^{-1},795\textrm{cm}^{-1},1182\textrm{cm}^{-1}$ decreased, and $\beta$ peaks such as $510\textrm{cm}^{-1},1273\textrm{cm}^{-1}$ increased. The intensity of $530\textrm{cm}^{-1}$ peak was stronger than that of $510\textrm{cm}^{-1}$ peak velow the 71.4 kV/cm, intensity of electrical field. This result showed the characteristic of film mainly due to $\alpha$-mode. According to these results, the molecular structure of PVDF thin film is transformed from $\alpha$-mode with TGT or TG'T to $\beta$-mode with planar zigzag structure TT, as increasing of intensity of electrical field.

본 연구는 건식 프로세스의 일종인 열증착법을 이용하여 PVDF유기박막을 제조하는 데 있다. 발열원과 기판간의 거리는 5cm로 하였고, 기판의 온도를 $30^{\circ}C$로 유지시키면서 반 응조의 진공도가 $2.0\times10^{-5}$Torr로 되었을 때 발열원의 온도를 6~$8^{\circ}C$/min로 상승시켜, 발열 원의 온도가 $270^{\circ}C$될 때 셔터(shutter)를 열고 증착을 개시하였다. 전계인가 강도의 증가에 따라 $\alpha$형 피크들인 $530\textrm{cm}^{-1},795\textrm{cm}^{-1},1182\textrm{cm}^{-1}$ 피크는 점점 작아지고 $\beta$형 피크 인 $510\textrm{cm}^{-1},1273\textrm{cm}^{-1}$ 피크가 증가함을 알 수 있었다. 전계인가강도 71.4kV/cm 이하에서는 $530\textrm{cm}^{-1}$ 피크가 $510\textrm{cm}^{-1}$피크의 강도보다 큰 것을 알 수 있는데 이는 $\beta$형 성분보다 $\alpha$형 성분이 필름의 특성을 지배함을 알 수 있었다. 이상의 결과로 전계인가 강도의 증가에 따라 PVDF 유기박막의 분자쇄는 $\alpha$형인 TGT 또는 TG'T에서 $\beta$형인 평면지그재그 TT형태로 변화함을 알 수 있다.

Keywords

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