• 한국정밀공학회지
• /
• 제13권11호
• /
• pp.32-37
• /
• 1996

Using the are ion plating(AIP) process, TiN coating was deposited onto high speed steel substrates. The effects of coating thickness, titanisum interlayer and shield on wear resisting capability of the coated tools were investigated. In order to promote good adhesion between the substrate and the TiN coating a thin Ti interlayer was deposited. A shield was set up also between Ti target and high speed steel substrates to prevent molten droplets from reaching the substrate. Three series of varying thickness of TiN coated layer were prepared with or without the Ti interlayer, and with or without the shield. The tools with the Ti layer and the shield showed longer tool lifes than those of other series of tools and the commercially available TiN coated HSS tools, by up to 70%.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2010년도 제39회 하계학술대회 초록집
• /
• pp.112-112
• /
• 2010

Zinc Oxide (ZnO) thin-films were deposited according to the magnetron sputtering method. The deposited ZnO films were annealed with RTA equipment at various annealing temperatures in an vacuum ambient. The influence of the annealing temperature on the structural, electrical, and optical properties of the ZnO films was experimentally investigated, and the effect of conductivity of the ZnO active layer on the device performance of the oxide-TFT was tested. As a result, an increase of the annealing temperature was attributed to improvements of crystallinity in ZnO films. The grain size was found to lead to an increase of conductivity in the ZnO films. Fabricated ZnO TFTs with annealed ZnO active layer provided good performance in the TFT devices. Consequently, the performance of the TFT was determined by the conductivity of the ZnO film, which was related to the structural properties of the ZnO film.

• 한국진공학회:학술대회논문집
• /
• 한국진공학회 2011년도 제40회 동계학술대회 초록집
• /
• pp.334-334
• /
• 2011

We applied N-ion bombardment and heat treatment to the Cu thin films deposited on aluminum oxide layer for the enhancement of adhesion. With e-beam evaporation method. $1,000{\AA}$ thick Cu pre-bombardment layer was deposited on the aluminum oxide surface and then N-ion beam was bombared in order to mix the atoms at the film/substrate interface. Additional $4,000{\AA}$-thick Cu film was the coated. Subsequently, the ion mixide Cu on aluminum oxide was annealed at $200^{\circ}C$ and $300^{\circ}C$ in vacuum.

• 센서학회지
• /
• 제21권5호
• /
• pp.385-388
• /
• 2012

This paper describes the synthesis and characterization of graphene by RTA process. Amorphous 3C-SiC were deposited using APCVD for carbon source and Ni layer were employed for transition layer. Various parameters of the ramping speed, the annealing time and the cooling speed are evaluated for the optimized combination allowed for the reproducible fabrication of graphene using 3C-SiC thin film. For analysis of crystalline Raman spectra was employed. Transferred graphene shows a high IG/ID ratio of 2.73. SEM and TEM images show the optical transparency and 6 carbon network, respectively. Au electrode deposited on the transferred graphene shows linear I-V curve and its resistance is 358 ${\Omega}$.

• 한국정보디스플레이학회:학술대회논문집
• /
• 한국정보디스플레이학회 2000년도 제1회 학술대회 논문집
• /
• pp.149-150
• /
• 2000

Lead-doped calcium sulfide(CaS:Pb) thin film electroluminescent devices were deposited using atomic layer deposition(ALD). CaS:Pb is a very promising blue phosphor showing very high luminance and the color coordinate close to the blue of cathode ray tube. The luminance, $L_{25}$, of CaS:Pb(1.6 mol.%) EL device was higher than 80 $cd/cm^2$ at a driving frequency of 60Hz. The color coordinates of blue EL emission of CaS:Pb deposited by ALD are consistent with the Pb concentration ranging from approximately 0.5 to 3 mol.%.

• JSTS:Journal of Semiconductor Technology and Science
• /
• 제14권1호
• /
• pp.117-123
• /
• 2014

The fabrication and characterization of a Si/ZnO thin film heterojunction ultraviolet photodiode has been presented in this paper. ZnO thin film of ~100 nm thick was deposited on <100> Silicon (Si) wafer by atomic layer deposition (ALD) technique. The Photoluminescence spectroscopy confirms that as-deposited ZnO thin film has excellent visible-blind UV response with almost no defects in the visible region. The room temperature current-voltage characteristics of the n-ZnO thin film/p-Si photodiodes are measured under an UV illumination of $650{\mu}W$ at 365 nm in the applied voltage range of ${\pm}2V$. The current-voltage characteristics demonstrate an excellent UV photoresponse of the device in its reverse bias operation with a contrast ratio of ~ 1115 and responsivity of ~0.075 A/W at 2 V reverse bias voltage.

• Bulletin of the Korean Chemical Society
• /
• 제30권4호
• /
• pp.869-872
• /
• 2009

Double-doped magnetic particles that incorporated magnetites into both the surface and inside the silica cores were fabricated via the sol-gel reaction of citrate-stabilized magnetites with silicon alkoxide. Double-doped magnetic particles were easily fabricated and exhibited an higher magnetism in comparison to the singledoped magnetic particles that were prepared by the erosion of surface-deposited magneties from double-doped magentic particles. Thin gold layer was formed over magnetic silica nanospheres via nanoseed-mediated growth of gold clusters. The plasmon-derived absorption bands of double-doped magnetic silica-gold nanoshells were more broadened and shifted down by ca. 20 nm as compared to those of single-doped magnetic silicagold nanoshells, which were attributed to not only the surface scattering of incident light due to relatively rough surafce morphology, but also heterogeneous permittivity of dielectric cores due to surface-deposited magnetites.

• 한국세라믹학회지
• /
• 제52권5호
• /
• pp.315-319
• /
• 2015

Yttria-stabilized zirconia (YSZ)-based micro tubular SOFC single cells were fabricated by electrophoretic deposition (EPD) process. Stable slurries for the EPD process were prepared by adding phosphate ester (PE) as a dispersant in order to control the pH, conductivity, and zeta-potential. NiO-YSZ anode support, NiO-YSZ anode functional layer (AFL), and YSZ electrolyte were consecutively deposited on a graphite rod using the EPD process; materials were then co-sintered at $1400^{\circ}C$ for 4 h. The thickness of the deposited layer increased with increasing of the applied voltage and the deposition time. A YSZ-based micro tubular single cell fabricated by the EPD process exhibited a maximum power density of $0.3W/cm^2$ at $750^{\circ}C$.

• 한국전기전자재료학회:학술대회논문집
• /
• 한국전기전자재료학회 2007년도 추계학술대회 논문집
• /
• pp.107-108
• /
• 2007

In order to investigate the electrical properties of Hf-silicate as a function of annealing temperature, Hf-silicate deposited by atomic layer deposition (ALD) was studied. After Hf-silicate film deposition, annealing was proceeded at $500^{\circ}C\;and\;700^{\circ}C$. The hysteresis of C-V curves and trapping charge densities were decreased after annealing process. As annealing temperature became higher from $500^{\circ}C\;to\;700^{\circ}C$, the capacitance equivalent thickness (CET) was increased from 1.66 nm to 1.76 nm and the leakage current at -1 V was decreased from $1.70{\times}10^{-4}\;to\;5.68{\times}10^{-5}\;A/cm^2$.

• 한국전기전자재료학회논문지
• /
• 제13권5호
• /
• pp.426-430
• /
• 2000

We have studied the field emission characteristics of multi-layered diamond-like-carbon (DLC) films deposited by vertical electrodes type plasma enhanced chemical vapor deposition with CH$_4$ and H$_2$ mixture. We deposited a thin layer of DLC on the p$^{+}$-Si substrate and then turned off plasma before another deposition of a new DLC layer. The thickness and the number of DLC layers are varied. The emission characteristics of multi-layered DLC films were compared with conventional one. The multi-layered DLC film shows higher emission current than conventional one.e.