• 한국지하수토양환경학회지:지하수토양환경
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• 제15권3호
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• pp.34-43
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• 2010

The fate of hydrophobic organic contaminants (HOCs) in ground water is highly affected by the distribution and property of the carbonaceous materials (CMs) in subsurface sediments. CMs in soils consist of organic matters (e.g., cellulose, fulvic acid, humic acid, humin, etc.) and black carbon such as char, soot, etc. The distribution and property of CMs are governed by source materials and geological evolution (e.g., diagenesis, catagenesis, etc.) of them. In this study, the distribution and property of CMs in subsurface sediments near the Imjin river in the Republic of Korea and HOC sorption property to the subsurface sediments were investigated. The organic carbon contents of sand and clay/silt layers were about 0.35% and 1.37%, respectively. The carbon contents of condensed form of CMs were about 0.13% and 0.45%, respectively. The existence of black carbon was observed using scanning electron microscopes with energy dispersive spectroscopy. The specific surface areas (SSA) of CMs in heavy fraction(HFrCM) measured with N2 were $35-46m^2/g$. However, SSAs of those HFrCM mineral fraction was only $1.6-4.3m^2/g$. The results of thermogravimetric analysis show that the mass loss of HFrCM was significant at $50-200^{\circ}C$ and $350-600^{\circ}C$ due to the degradation of soft form and condensed form of CMs, respectively. The trichloroethylene (TCE) sorption capacities of sand and clay/silt layers were similar to each other, and these values were also similar to oxidzed layer of glacially deposited subsurface sediments of the Chanute Air Force Base (AFB) in Rantoul, Illinois. However, these were 7-8 times lower than TCE sorption capacity of reduced layer of the Chanute AFB sediments. For accurate prediction of the fate of hydrophobic organic contaminants in subsurface sediments, continuous studies on the development of characterization methods for CMs are required.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.335-335
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• 2011

Instability of a thin film attached to a compliant substrate often leads to emergence of exquisite wrinkle patterns with length scales that depend on the system geometry and applied stresses. However, the patterns that are created using the current techniques in polymer surface engineering, generally have low aspect ratio of undulation amplitude to wavelength, thus, limiting their application. Here, we present a novel and effective method that enables us to create wrinkles with a desired wavelength and high aspect ratio of amplitude over wavelength as large as to 2.5:1. First, we create buckle patterns with high aspect ratio of amplitude to wavelength by deposition of an amorphous carbon film on a surface of a soft polymer poly(dimethylsiloxane) (PDMS). Amorphous carbon films are used as a protective layer in structural systems and biomedical components, due to their low friction coefficient, strong wear resistance against, and high elastic modulus and hardness. The deposited carbon layer is generally under high residual compressive stresses (~1 GPa), making it susceptible to buckle delamination on a hard substrate (e.g. silicon or glass) and to wrinkle on a flexible or soft substrate. Then, we employ glancing angle deposition (GLAD) for deposition of a high aspect ratio patterns with amorphous carbon coating on a PDMS surface. Using this method, pattern amplitudes of several nm to submicron size can be achieved by varying the carbon deposition time, allowing us to harness patterned polymers substrates for variety of application. Specifically, we demonstrate a potential application of the high aspect wrinkles for changing the surface structures with low surface energy materials of amorphous carbon coatings, increasing the water wettability.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.466-468
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• 2012

Amorphous InGaZnO (${\alpha}$-IGZO) thin-film transistors (TFTs) are are very promising due to their potential use in thin film electronics and display drivers [1]. However, the stability of AOS-TFTs under the various stresses has been issued for the practical AOSs applications [2]. Up to now, many researchers have studied to understand the sub-gap density of states (DOS) as the root cause of instability [3]. Nomura et al. reported that these deep defects are located in the surface layer of the ${\alpha}$-IGZO channel [4]. Also, Kim et al. reported that the interfacial traps can be affected by different RF-power during RF magnetron sputtering process [5]. It is well known that these trap states can influence on the performances and stabilities of ${\alpha}$-IGZO TFTs. Nevertheless, it has not been reported how these defect states are created during conventional RF magnetron sputtering. In general, during conventional RF magnetron sputtering process, negative oxygen ions (NOI) can be generated by electron attachment in oxygen atom near target surface and accelerated up to few hundreds eV by self-bias of RF magnetron sputter; the high energy bombardment of NOIs generates bulk defects in oxide thin films [6-10] and can change the defect states of ${\alpha}$-IGZO thin film. In this paper, we have confirmed that the NOIs accelerated by the self-bias were one of the dominant causes of instability in ${\alpha}$-IGZO TFTs when the channel layer was deposited by conventional RF magnetron sputtering system. Finally, we will introduce our novel technology named as Magnetic Field Shielded Sputtering (MFSS) process [9-10] to eliminate the NOI bombardment effects and present how much to be improved the instability of ${\alpha}$-IGZO TFTs by this new deposition method.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.420-420
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• 2012

ZnO seed layer were deposited on quartz substrate by sol-gel method and prism-like Al-doped ZnO nanorods (AZO nanorods) were grown on ZnO seed layer by hydrothermal method with various Al concentration ranging from 0 to 2.0 at.%. Structural and optical properties of the AZO nanorods were investigated by field-emission scanning electron microscopy (FE-SEM), X-ray diffraction (XRD), photoluminescence (PL). The diameter of the AZO nanorods was smaller than undoped ZnO nanorods and its diameter of the AZO nanorods decreased with increasing Al concentration. In XRD spectrum, it was observed that stress and full width at half maximum (FWHM) of the AZO nanorods decreased and the 'c' lattice constant increased as the Al concentration increased. From undoped ZnO nanorods, it was observed that the green-red emission peak of deep-level emission (DLE) in PL spectra. However, after Al doping, not only a broad green emission peak but also a blue emission peak of DLE were observed.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.210-210
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• 2011

The effects of CH2F2 and N2 gas flow rates on the etch selectivity of silicon nitride (Si3N4) layers to extreme ultra-violet (EUV) resist and the variation of the line edge roughness (LER) of the EUV resist and Si3N4 pattern were investigated during etching of a Si3N4/EUV resist structure in dual-frequency superimposed CH2F2/N2/Ar capacitive coupled plasmas (DFS-CCP). The flow rates of CH2F2 and N2 gases played a critical role in determining the process window for ultra-high etch selectivity of Si3N4/EUV resist due to disproportionate changes in the degree of polymerization on the Si3N4 and EUV resist surfaces. Increasing the CH2F2 flow rate resulted in a smaller steady state CHxFy thickness on the Si3N4 and, in turn, enhanced the Si3N4 etch rate due to enhanced SiF4 formation, while a CHxFy layer was deposited on the EUV resist surface protecting the resist under certain N2 flow conditions. The LER values of the etched resist tended to increase at higher CH2F2 flow rates compared to the lower CH2F2 flow rates that resulted from the increased degree of polymerization.

• 한국재료학회지
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• 제10권2호
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• pp.171-174
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• 2000

본 연구에서는 실리콘 wafer위에 sputtering방법으로 진공증착된 CoNbZr 비정질 박막을 Nd:YAG 레이저로 식각하기 위한 실험을 했는데, 금속의 경우 표면에서 빛의 반사율이 매우 크기 때문에 파장이 $1.06{\mu\textrm{m}}$인 Nd:YAG 레이저의 에너지를 흡수하는 것이 매우 어려우므로 식각이 거의 이루어지지 않았다. 그래서 이러한 문제를 해결하기 위한 새로운 시도로서 본 연구에서는 빛의 흡수율이 좋은 검은색의 polymer막을 금속박막의 표면에 도포하고 이 polymer막 위에 레이저를 조사해서 금속박막의 식각하는 실험을 실시하였다. 기존의 방법으로는 laser power가 332W나 되는데도 식각이 거의 일어나지 않았지만 본 연구의 방법을 이용했을 때는 laser power가 114W로 1/3정도 밖에 안 되는데도 레이저 식각이 비교적 양호하게 이루어졌다. 이는 검은색의 polymer층이 Nd:YAG 레이저 에너지의 흡수 및 전달 층의 역할을 하기 때문인 것으로 생각된다.

• 한국재료학회지
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• 제13권2호
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• pp.126-132
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• 2003

In order to evaluate the corrosion resistance at the anode side separator for molten carbonate fuel cell, STS316 and SACC-STS316 (chromium and aluminum were simultaneously deposited by diffusion into STS316 authentic stainless steel substrate by pack-cementation process) were applied as the separator material. In case of STS316, corrosion proceeded via three steps ; a formation step of corrosion product until stable corrosion product, a protection step against corrosion until breakaway occurs, a advance step of corrosion after breakaway. Especially, STS316 would be impossible to use the separator without suitable surface modification because of rapid corrosion rate after formation of corrosion product, occurs the severe problem on stability of cell during long-time operation. Whereas, SACC-STS316 was showed more effective corrosion resistance than the present separator, STS316 due to the intermetallic compound layer such as NiAl, Ni3Al formed on the surface of STS316 specimen. And it is anticipated that, in order to use SACC-STS316 alternative separator at the anode side, coating process, which can lead to dense coating layer, has to be developed, and by suitable pre-treatment before using it, very effective corrosion resistance will be achieved.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.95.1-95.1
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• 2012

Very High Temperature gas cooler Reactor (VHTR) has been considered as one of the most promising nuclear reactor because of many advantages including high inherent safety to avoid environmental pollution, high thermal efficiency and the role of secondary energy source. The TRISO coated fuel particles used in VHTR are composed of 4 layers as OPyC, SiC, IPyC and buffer PyC. The significance of CVD-SiC coatings used in tri-isotropic(TRISO) nuclear coated fuel particles is to maintain the strength of the whole particle. Various methods have been proposed to evaluate the mechanical properties of CVD-SiC film at room temperature. However, few works have been attempted to characterize properties of CVD-SiC film at high temperature. In this study, micro tensile system was newly developed for mechanical characterization of SiC thin film at elevated temperature. Two kinds of CVD-SiC films were prepared for micro tensile test. SiC-A had [111]-preferred orientation, while SiC-B had [220]-preferred orientation. The free silicon was co-deposited in SiC-B coating layer. The fracture strength of two different CVD-SiC films was characterized up to $1000^{\circ}C$.The strength of SiC-B film decreased with temperature. This result can be explained by free silicon, observed in SiC-B along the columnar boundaries by TEM. The presence of free silicon causes strength degradation. Also, larger Weibull-modulus was measured. The new method can be used for thin film material at high temperature.

• 한국세라믹학회지
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• 제51권4호
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• pp.231-242
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• 2014

An interconnect in solid oxide fuel cells (SOFCs) electrically connects unit cells and separates fuel from oxidant in the adjoining cells. The interconnects can be divided broadly into two categories - ceramic and metallic interconnects. A thin and gastight ceramic layer is deposited onto a porous support, and metallic interconnects are coated with conductive ceramics to improve their surface stability. This paper provides a short review on ceramic materials for SOFC interconnects. After a brief discussion of the key requirements for interconnects, the article describes basic aspects of chromites and titanates with a perovskite structure for ceramic interconnects, followed by the introduction of dual-layer interconnects. Then, the paper presents protective coatings based on spinel-or perovskite-type oxides on metallic interconnects, which are capable of mitigating oxide scale growth and inhibiting Cr evaporation.

• 한국자기학회지
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• 제6권6호
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• pp.411-416
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• 1996

본 연구에서는 dc magnetron sputtering 방법으로 Corning glass 위에 자성층 Co와 비자성층 Cu의 계면에 얇은 Fe 자성층을 삽입하여 다층박막 $Fe(50\;{\AA})/[Co(17\;{\AA})/Fe(t\;{\AA})/Cu(24\;{\AA})]_{20}$을 제작하고 Fe 두께와 열처리 온도에 따른 자기저항 변화를 관찰하였다. 시료진동형자기계로 자기이력곡선을 측정하여 자기적 성질을 조사하였고 구조 및 표면 분석을 위해 각각 X-선 회절장치와 AFM(Atomic Force Microscope)을 이용하였다. 얇은 Fe 사이층을 삽입하지 않은 Co/Cu 다층박막에서 자기저항비가 22%인데 비해 얇은 Fe층을 삽입하였을때는 자기저항비가 26%까지 증가하였고 Fe 사이층의 두께가 점차 두꺼워짐에 따라 자기저항비는 다시 감소함을 나타냈다. $300^{\circ}C$ 까지 열처리한 결과 자기저항비는 증가하였으나 그 이상의 온도에서는 감소하였다.