• 제목/요약/키워드: dark silicon

검색결과 78건 처리시간 0.028초

Photoluminescence of Porous Silicon Carbide in Solvents

  • Lee, Ki-Hwan;Lee, Tae-Ho;Yoon, Seok-Won;Lee, Seung-Koo;Jeon, Hae-Kwon;Choi, Chang-Shik
    • Journal of Photoscience
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    • 제12권3호
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    • pp.171-174
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    • 2005
  • The relationship between porous surfaces and photoluminescence (PL) behavior of porous silicon carbide (PSC) in various solvents has been studied. The porous surfaces of p-type silicon carbide can be fabricated by electrochemical anodization from the 6H, 15R, 4H-${\alpha}$-SiC substrates in dark-current mode (DCM) condition. We have been investigated the dependence of the PL spectra of PSC under the medium having the different dielectric constants. It has been found that PL depends sensitively on the environment surrounding the surface. The extent of chemically stability on the surface of PSC due to the various solvents was confirmed by reflectance Fourier transform infrared (FTIR) spectroscopy. Detailed IR experiments on the PSC samples were carried out before and after various solvents immersion. These results will be offered important information on the origin of PL in porous structure.

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a-Si:H Image Sensor for PC Scanner

  • Hur, Chang-Wu
    • Journal of information and communication convergence engineering
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    • 제5권2호
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    • pp.116-120
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    • 2007
  • In this paper, the image sensor using the a-Si:H TFT is proposed. The optimum amorphous silicon thin film is deposited using plasma enhanced chemical vapor deposition (PECVD). TFT and photodiode both with the thin film are fabricated and form image sensor. The photodiode shows that $I_{dark}\;is\;{\sim}10^{-13}\;A,\;I_{photo}\;is\;{\sim}10^{-9}\;A\;and\;I_{photo}/I_{dark}\;is\;{\sim}10^4$, respectively. In the case of a-Si:H TFT, it indicates that $I_{on}/I_{off}\;is\;10^6$, the drain current is a few ${\mu}A\;and\;V_{th}\;is\;2{\sim}4$ volts. For the analysis on the fabricated image sensor, the reverse bias of -5 volts in ITO of photodiode and $70 {\mu}sec$ pulse in the gate of TFT are applied. The image sensor with good property was conformed through the measured photo/dark current.

$Co_2$ 레이저로 열처리된 SOI-PIN Photodiode의 제작 및 전기적 특성 ($Co_2$ Laser Annealed SOI-PIN Photodiode Fabrication and its Electrical Characteristics)

  • 장선호;김기홍;안철
    • 대한전자공학회논문지
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    • 제25권9호
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    • pp.1068-1073
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    • 1988
  • PIN-Photodiodes were fabricated with CO2 laser annealed SOI and their electric characteristics were measured. Dark current decreased and photocurrent-dark current ratio increased as the grain size of polycrystalline silicon in intrinsic region increased. In case of the largest grain, 10-20um, dark current was 30 n A (at - 4V) and photocurrent was proportional to light intensity.

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광조사에 따른 비정질 실리콘의 열화 (Light-Induced Degradation of Hydrogenated Amorphous Silicon)

  • 박진석;한민구;이정한
    • 대한전자공학회논문지
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    • 제25권5호
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    • pp.501-508
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    • 1988
  • This paper presents the light-induced effects on the elelctrical and optical properties of undoped and doped hydrogenated amorphous silicon films. The changes in the conductivities and the activation energies of various types of a-Si:H films due to the prolonged exposure to light have been characterized as a function of deposition conditions and illumination periods. The dark conductivity changes may be quenched for heavier doped a-Si:H films. We have also analyzed the variations of micro-structure of a-Si:H film such as silicon-hydrogen bondings in the rocking and stretching modes utilizing infrared spectroscopy. From the experimental results, it is elucidated that doping effects must be crucial to the degradations of the fundamental properties of a-Si:H due to light-induced effects.

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Thin Film Amorphous/Bulk Crystalline Silicon Tandem Solar Cells with Doped nc-Si:H Tunneling Junction Layers

  • 이선화;이준신;정채환
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2015년도 제49회 하계 정기학술대회 초록집
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    • pp.257.2-257.2
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    • 2015
  • In this paper, we report on the 10.33% efficient thin film/bulk tandem solar cells with the top cell made of amorphous silicon thin film and p-type bulk crystalline silicon bottom cell. The tunneling junction layers were used the doped nanocrystalline Si layers. It has to allow an ohmic and low resistive connection. For player and n-layer, crystalline volume fraction is ~86%, ~88% and dark conductivity is $3.28{\times}10-2S/cm$, $3.03{\times}10-1S/cm$, respectively. Optimization of the tunneling junction results in fill factor of 66.16 % and open circuit voltage of 1.39 V. The open circuit voltage was closed to the sum of those of the sub-cells. This tandem structure could enable the effective development of a new concept of high-efficiency and low cost cells.

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Current-Voltage Characterization of Silicon Quantum Dot Solar Cells

  • Kim, Dong-Ho
    • Transactions on Electrical and Electronic Materials
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    • 제10권4호
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    • pp.143-145
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    • 2009
  • The electrical and photovoltaic properties of single junction silicon quantum dot solar cells are investigated. A prototype solar cell with an effective area of 4.7 $mm^2$ showed an open circuit voltage of 394 mV and short circuit current density of 0.062 $mA/cm^2$. A diode model with series and shunt resistances has been applied to characterize the dark current-voltage data. The photocurrent of the quantum-dot solar cell was found to be strongly dependent on the applied voltage bias, which can be understood by consideration of the conduction mechanism of the activated carriers in the quantum dot imbedded material.

Fabrication of a Hydrogenated a-Si Photodiode

  • Hur, Chang-Wu
    • Journal of information and communication convergence engineering
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    • 제1권1호
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    • pp.23-26
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    • 2003
  • A photodiode capable of obtaining a sufficient photo/dark current ratio at both a forward bias state and a reverse bias state is proposed. The photodiode includes a glass substrate, an aluminum film formed as a lower electrode over the glass substrate, an alumina film formed as a schottky barrier over the aluminum film, a hydrogenated amorphous silicon film formed as a photo conduction layer over a portion of the alumina film, and a transparent conduction film formed as an upper electrode over the hydro-generated amorphous silicon film. Growth of high quality alumina($Al_{2}O_{3}$) film using anodizing technology is proposed and analyzed by experiment. We have obtained the film with a superior characteristics

Interpretation of the Asymmetric Color and Shape of Brownish Ring in Quartz Crucible

  • Jung, YoonSung;Choi, Jae Ho;Min, Kyung Won;Byun, Young Min;Im, Won Bin;Kim, Hyeong-Jun
    • 반도체디스플레이기술학회지
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    • 제21권4호
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    • pp.50-52
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    • 2022
  • Brownish rings (BRs) with white interiors are formed during the manufacture of silicon ingots in quartz glass crucibles. These BRs inhibit the yield of silicon ingots. However, the composition and mechanism of the formation of these BRs remain unclear thus far. Therefore, in this study, we analyzed the color and shape of these BRs. Raman analysis revealed that the brown and white colors appear owing to oxygen deficiency rather than crystallization from excess oxygen supply as previously assumed. Moreover, the dark shade of the brown areas depends on the degree of oxygen deficiency and the asymmetrical width of the brown areas is attributed to the direction of the molten silicon flow, which is influenced by the rotation and heat of the ingot crucible.

Hot-Wire CVD법에 의한 microcrystalline silicon 박막의 저온 증착 및 전기 구조적 특성 (Electrical and Structural Properties of Microcrystalline Silicon Thin Films by Hot-Wire CVD)

  • 이정철;유진수;강기환;김석기;윤경훈;송진수;박이준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2002년도 하계학술대회 논문집
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    • pp.387-390
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    • 2002
  • This paper presents deposition and characterizations of microcrystalline silicon(${\mu}$c-Si:H) films prepared by hot wire chemical vapor deposition at substrate temperature below 300$^{\circ}C$. The SiH$_4$ concentration[F(SiH$_4$)/F(SiH$_4$).+(H$_2$)] is critical parameter for the formation of Si films with microcrystalline phase. At 6% of silane concentration, deposited intrinsic ${\mu}$c-Si:H films shows sufficiently low dark conductivity and high photo sensitivity for solar cell applications. P-type ${\mu}$c-S:H films deposited by Hot-Wire CVD also shows good electrical properties by varying the rate of B$_2$H$\_$6/ to SiH$_4$ gas. The solar cells with structure of Al/nip ${\mu}$c-Si:H/TCO/g1ass was fabricated with single chamber Hot-Wire CVD. About 3% solar efficiency was obtained and applicability of HWCVD for thin film solar cells was proven in this research.

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PN 접합형 Photodiode 제작에 관한 연구 (A Study on Fabrication of PN Junction Type Si Photodiode)

  • 조호성;오종환;홍창희
    • 대한전자공학회논문지
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    • 제26권11호
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    • pp.1652-1657
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    • 1989
  • In this research, the PN junction type Si photodiodes have been fabricated on the low doped P type(Na=7x10**14 cm**-3) and N type (Nd=4x10**14cm**-3) (100) silicon substrates. We could find out that the dark current was lower in the N type substrate than in the P type substrate. Some well designed photodiodes showed relatively good optical and electronic characteristics that the dark current is lower than 5 nA at 10V of reverse bias condition, that the breakdown voltage is higher than 250V, and that the quantum efficiency is larger than 86% at the wavelength of $6328{\AA}$

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