• 제목/요약/키워드: crystal defect

검색결과 282건 처리시간 0.031초

독립성분분석을 이용한 TFT-LCD불량의 검출 (Detection of TFT-LCD Defects Using Independent Component Analysis)

  • 박노갑;이원희;유석인
    • 한국정보과학회논문지:소프트웨어및응용
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    • 제34권5호
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    • pp.447-454
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    • 2007
  • 최근 TFT-LCD (Thin film transistor liquid crystal display)패널의 수요증가에 비례하여 공정상 발생하는 LCD 불량의 수도 증가하고 있다. LCD 불량은 배경화면과 미세한 밝기대비 차이를 가지는 패널상의 불균등한 영역으로서 크게 정형과 비정형으로 나누어지며 사람의 눈에 매끄럽지 않게 보여진다. 이러한 불량은 배경과의 대비 차이가 미세하여 기존의 임계수준 검출이나 윤곽선 검출로는 불량을 검출할 수 없다. 본 논문은 비정형 LCD 불량을 독립성분분석, 적응 임계수준 검출 그리고 왜도를 이용하여 검출하는 방법을 제시한다. 본 검출방법은 잡음이 심한 영상에 대해서도 대응력이 뛰어나며, 생산라인에서 성공적으로 적용된다.

Revisiting $H_2$ and CO Interactions with Pt(111) Surfaces

  • Kim, Je-Heon;Jo, Sam-K.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제41회 하계 정기 학술대회 초록집
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    • pp.203-203
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    • 2011
  • The importance of stepped single-crystal surfaces as model catalysts has been well recognized [1]. We re-investigated the adsorption properties of $H_2$ and CO, most important species in platinum-based catalysts, on nearly defect-free and highly stepped surfaces of one and the same Pt(111) crystal. While both being symmetric and single-peaked from the nearly defect-free surface, temperature-programmed desorption (TPD) spectra from the highly stepped surface saturated at 90 K with H and CO were triply- and doubly-peaked, respectively. Once pre-adsorbed, CO preempted step and then terrace sites, inhibiting the dissociative $H_2$ adsorption completely. Pre-adsorbed H inhibited the CO adsorption on terrace sites only, leaving defect sites intact for CO adsorption even at the saturation H precoverage. On defect-free Pt(111), while pre-adsorbed CO inhibited the dissociative $H_2$ adsorption completely, pre-adsorbed H could not inhibit the CO adsorption completely. These intriguing, but interesting results are discussed in terms of energetics/kinetics and the role of surface step sites in the dissociative adsorption of $H_2$ on Pt(111) [2].

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쵸크랄스키 Silicon 단결정의 Large Pit과 Flow Pattern defect의 열적 거동과 Large Pit의 소자 수율에의 영향 (Thermal Behavior of Flow Pattern Defect and Large Pit in Czochralski Silicon Crystals and Effects of Large Pit upon Device Yield)

  • 송영민;문영희;김종오;조기현
    • 한국재료학회지
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    • 제11권9호
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    • pp.781-785
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    • 2001
  • The thermal behavior of Flow Pattern Defect (FPD) and Large Pit (LP) in Czochralski Silicon crystal was investigated by applying high temperature annealing ($\geq$$1100^{\circ}C$) and non-agitated Secco etching. For evaluation of the effect of LP upon device performance/yield, commercial DRAM and ASIC devices were fabricated. The results indicated that high temperature annealing generates LPs whereas it decreases FPD density drastically. However, the origins of FPD and LP seemed to be quite different by not showing any correspondence to their density and the location of LP generation and FPD extinction. By not showing any difference between the performance/yield of devices whose design rule is larger than 0.35 $\mu\textrm{m}$, LP seemed not to have detrimental effects on the performance/yield.

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Size and Crystal Structure Dependence of Photochromism of Nanocrystalline WO3 and MoO3 Prepared by Acid-Precipitation Method

  • Jun Young, Kwak;Young Hee, Jung;Yeong Il, Kim
    • 대한화학회지
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    • 제67권1호
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    • pp.33-41
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    • 2023
  • Nanocrystallne WO3 and MoO3 with several different sizes and crystal structures were prepared by simple acid precipitation and subsequent heat treatment. The photochromic (PC) properties of these samples were comparatively investigated in powder state by monitoring diffuse reflectance spectral changes after bandgap irradiation. The PC effect of hexagonal WO3 and monoclinic WO3 strongly depended upon crystallite size rather than crystal structure. The smaller the crystallite size, the better the PC effect. However, orthorhombic WO·H2O and MoO3 having hexagonal and orthorhombic structures did not follow this trend. One consistent result for all WO3 and MoO3 samples is that the heat treatment in air, which changes crystallinity, whether it changes the crystal structure or only the crystallite size, reduces the PC effect. Since the thermal treatment reduces the surface oxygen defect sites, we believe that the PC effect of WO3 and MoO3 depends critically on the surface oxygen defect sites that serve as deep trap sites for photogenerated electrons and oxygen radical holes. We also found that the proton insertion claimed by double charge injection model is not critical for the PC effect.

Comparison of numerical simulation and experiment for the OiSF-Ring diameter in czochralski-grown silicon crystal

  • Oh, Hyun-Jung;Wang, Jong-Hoe;Yoo, Hak-Do
    • 한국결정성장학회지
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    • 제10권5호
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    • pp.356-361
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    • 2000
  • The radial position of OiSF-ring has been meaningful data in industry. Thus it's position was calculated by application of (V/G)/sub crit/ = 0.138 ㎟/minK and point defect dynamics for industrial scale grower with various pull rates. After the calculation, compared with experimental result. OiSF-ring diameters expected with calculation were good agreement with experimental results. In order to show validity of the predicted temperature distribution using STHAMAS which is one of the global simulator for Cz crystal growing, temperature was measured along the axis of crystal using thermocouples, and compared with the calculated temperature. We found the effective thermal conductivity K/sub m/ (r) which gives in accordance with the temperature distribution at the axis of crystal and crystal/melt interface shape between experimental and computational results. Therefore, effective thermal conductivity K/sub m/ (r) was applied instead of solving melt convection problem.

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6H-SiC wafer의 결정성 및 전기적 특성 (Crystallinity and electrical properties of 6H-SiC wafers)

  • 김화목;임창성;오근호
    • 한국결정성장학회지
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    • 제7권3호
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    • pp.393-399
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    • 1997
  • 승화법에 의한 6H-SiC 단결정의 최적 성장조건을 설정하여 고품질의 6H-Sic 단결정을 성장하였다. 성장된 결정의 직경은 약 33 mm, 길이는 약 11 mm였다. 성장된 결정을 절단하여 연마한 후 광학현미경을 이용하여 연마된 SiC wafer의 micropipe density와 planar defect density를 측정한 결과, micropipe density는 400개/$ \textrm{cm}^2$이었고 planar defect density는 50개/$\textrm{cm}^2$이었다. 이 6H-SiC wafer와 기판으로 사용된 Acheson 결정의 결정성을 비교하기 위하여 Raman 분광법과 double crystal X-ray diffraction 분석법이 사용되었다. 이 분석에 의해 승화법에 의해 성장된 6H-SiC wafer가 Acheson seed보다 결정성이 우수하였다. Hall effect 측정법에 의해 불순물이 첨가되지 않은 6H-SiC wafer의 전기적인 특성을 측정하였으며 그 결과 캐리어 농도는 $3.91{\times}10^{15}/\textrm {cm}^3$이었고, n-type이었다.

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Hot Wall Epitaxy (HWE)법에 의해 성장된 $AgGaSe_2$ 에피레이어의 점결함 연구 (Point defect for $AgGaSe_2$ epilayers grown by hot wall epitaxy)

  • 홍명석;홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.98-99
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    • 2008
  • To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy (HWE) system. The source and substrate temperatures were $630^{\circ}C$ and $420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) 1.9501 eV - ($8.79\times10^{-4}$ eV/K)$T^2$/(T + 250 K). After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence(PL) at 10K. The native defects of $V_{Ag}$, $V_{Se}$, $Ag_{int}$, and $Se_{int}$ obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

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Crystal Growth of Transition Metal Ion Doped Rutile

  • Y.M. Yu;Kim, J.Y.;S.J. Jeong
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1998년도 PROCEEDINGS OF THE 15TH KACG TECHNICAL MEETING-PACIFIC RIM 3 SATELLITE SYMPOSIUM SESSION 4, HOTEL HYUNDAI, KYONGJU, SEPTEMBER 20-23, 1998
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    • pp.71-71
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    • 1998
  • Transition metal ions, such as Sc, V, Cr and Fe, doped rutile crystals were grown by Floating Zone method. Growth conditions for high quality of crystals depending on the concentration of doped ions were investigated. Grown crystals were cut and polished to thin wafers, and then various types of defects such as homogeneities, low angle grain boundaries, scattering centers, and oxygen vacancies were analyzed. The effects of transition metal ions on defect formation are discussed. Results and discussions on absorption and fluorescence spectra and electrical properties of grown crystals were also reported.

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Czochralski법으로 성장된 RE : YAG(RE = Nd3+, Er3+) 단결정의 결함분석 (Defects analysis of RE : YAG (RE = Nd3+, Er3+) single crystal synthesized by Czochralski method)

  • 박청호;주영준;김혜영;심장보;김철진
    • 한국결정성장학회지
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    • 제26권1호
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    • pp.1-7
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    • 2016
  • RE : YAG 단결정은 레이저 발진 소재로 다양한 성장 변수를 제어하면서 Czochralski법으로 성장된다. 성장과정 동안 고액계면의 온도구배 및 회전속도에 의해 발생하는 결함들은 결정의 광학적 특성 저하로 작용하기 때문에 결함 분석을 통한 결정 품질의 향상을 필요로 한다. 격자결함 밀도 분석(EPD)을 통하여 성장된 RE : YAG 단결정의 표면 결함 존재를 확인하였고, 이를 통해 투과전자현미경(TEM) 분석영역을 선택하였다. 선택한 영역의 시편은 트라이포드 연마 방법으로 제작하였고, 200 kV 투과전자현미경과 300 kV 전계 방사형 투과전자현미경(FE-TEM)을 사용하여 buckling, rod shaped, 내부응력에 의한 bend contours, 편석 등의 결함들을 관찰하였다.

Hot Wall Epitaxy (HWE)법에 의해 성장된 $ZnIn_2S_4$ 에피레이어의 점결함 연구 (Study on point defect for $ZnIn_2S_4$ epilayers grown by Hot Wall Epitaxy)

  • 홍광준
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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    • pp.141-142
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    • 2008
  • Single crystal $ZnIn_2S_4$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $450^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $ZnIn_2S_4$ source at $610^{\circ}C$. The temperature dependence of the energy band gap of the $ZnIn_2S_4$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g$(T) = 2.9514eV - ($7.24\times10^{-4}$ eV/K)$T^2$/(T + 489 K). After the as-grown $ZnIn_2S_4$ single crystal thin films was annealed in Zn-, S-, and In-atmospheres, the origin of point defects of $ZnIn_2S_4$ single crystal thin films has been investigated by the photoluminescence(PL) at 10 K. The native defects of $V_{Zn}$, $V_s$, $Zn_{int}$, and $S_{int}$, obtained by PL measurements were classified as a donors or acceptors type. And we concluded that the heat-treatment in the S-atmosphere converted $ZnIn_2S_4$ single crystal thin films to an optical p-type. Also, we confirmed that In in $ZnIn_2S_4$/GaAs did not form the native defects because In in $ZnIn_2S_4$ single crystal thin films existed in the form of stable bonds.

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