• 제목/요약/키워드: crystal

검색결과 11,874건 처리시간 0.037초

Fabrication and electro optical properties of stressed liquid crystal cell

  • Lee, Jung-Min;Park, Jin-Seol;Kang, Dae-Seung
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2009년도 9th International Meeting on Information Display
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    • pp.681-682
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    • 2009
  • We fabricated a stressed liquid crystal cell by mixing liquid crystal with a photo-polymer. By carefully choosing the mixing ratio between liquid crystal and the polymer, and by suitable mechanical shearing of the substrates, we demonstrated feasible electro optical properties for displays.

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Liquid crystal alignment on the inkjet printed polyimide by using new alignment method

  • Hwang, J.Y.;Wonderly, H.;Chien, L.C.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2007년도 7th International Meeting on Information Display 제7권1호
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    • pp.506-508
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    • 2007
  • We studied the nematic liquid crystal (NLC) alignment capability with a new alignment method utilizing an inkjet printed polyimide (PI) layer. A good, uniform LC alignment was achieved by the good PI printing using a new alignment method. The pretilt angle generated on the printed PI layer using the alignment method was almost the same as that on printed PI layer using rubbing alignment method. In addition, the good electro-optical performances of the new aligned twisted nematic (TN) cell with printed PI surface was obtained

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EFG법에 의한 Sapphire Ribbon 단결정 성장 (Sapphire Ribbon Single Crystal Growth by EFG Method)

  • 박신서;류두형;정재우;최종건;오근호;손선기;변영재;전형탁
    • 한국세라믹학회지
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    • 제27권6호
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    • pp.783-789
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    • 1990
  • Shaped crystal growth apparatus were made for sapphire ribbon single crystal growth. Sapphire ribbon single crystal are grown by EFG(Edge-defined Film-fed Growth) methdo for use as watch-glass and SOS(Silicon-On-Sapphire) devices. Sapphire ribbon crystals were grown to be 40min wide, 1.8mm thick, 96mm long. Therelationshiops between growth striation and surface roughness, with various growth rates, were investigated and compared. It was found that sapphire ribbon crystal is suitable for watch-glass by measuring the transmittance in the visible light region.

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액정핏치 형성에 관한연구 (Effect on Formation of Liquid Crystal Pitch)

  • 권영배;류해일
    • 한국기계연구소 소보
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    • 통권13호
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    • pp.15-25
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    • 1984
  • The infrared spectra were determined to discover the characteristics and properties of poff-, PV-, and cc-samples, and studied influence on the formation of mesophase or liquid crystal. The experimental results were as follows; a) Samples with long aliphatic side chain appear cracking texture on temperature forming liquid crystal. b) The fine isotropic microstructure appears in a heterogeneous material containing sulfur, 7.18 w%. c) In the size of molecular weight the lighter than 500 form liquid crystal. d) When poff-sample was treated at $400^{\circ}C$ aliphatic hydrocabon compounds decrease, presented well-oriented bulk liquid crystal.

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Wavelength Divided Trans-reflective Liquid crystal Displays

  • Yang, D.K.;Zhou, F.
    • 한국정보디스플레이학회:학술대회논문집
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    • 한국정보디스플레이학회 2003년도 International Meeting on Information Display
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    • pp.309-310
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    • 2003
  • We have designed novel transreflective liquid crystal displays which utilize dielectric mirrors. The reflective and transmissive modes are operated in different wavelength regions. The displays have the advantages: (1) the brightness as a function of applied voltage is the same for both modes, (2) the backlight and ambient light are utilized efficiently.

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Progress in Si crystal and wafer technologies

  • Tsuya, Hideki
    • 한국결정성장학회:학술대회논문집
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    • 한국결정성장학회 1999년도 PROCEEDINGS OF 99 INTERNATIONAL CONFERENCE OF THE KACG AND 6TH KOREA·JAPAN EMG SYMPOSIUM (ELECTRONIC MATERIALS GROWTH SYMPOSIUM), HANYANG UNIVERSITY, SEOUL, 06월 09일 JUNE 1999
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    • pp.159-166
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    • 1999
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Hot Wall Epitaxy(HWE)범에 의한 $CuInSe_2$ 단결정 박막 성장과 가전자대 갈라짐에 대한 광전류 연구 (Growth and photocurrent study on the splitting of the valence band for $CuInSe_2$ single crystal thin film by hot wall epitaxy)

  • 홍명석;홍광준
    • 한국결정성장학회지
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    • 제14권6호
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    • pp.244-252
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    • 2004
  • $CuISe_2$ 단결정 박막은 수평 전기로에서 합성한 $CuInSe_2$ 다결정을 증발원으로하여, hot wall epitaxy(HWE) 방법으로 증발원과 기판(반절연성-GaAs(100))의 온도를 각각 $620^{\circ}C$, $410^{\circ}C$로 고정하여 단결정 박막을 성장하였다. 이때 단결정 박막의 결정성은 광발광 스펙트럼과 이중결정 선 요동곡선(DCRC) 으로 부터 구하였다. Hall 효과는 van der Pauw 방법에 의해 측정되었으며, 293K에서 운반자 농도와 이동도는 각각 $9.62\times10^{16}/\textrm{cm}^3$, 296 $\textrm{cm}^2$/Vㆍs 였다. $CuAlSe_2$/Si(Semi-Insulated) GaAs(100) 단결정 박막의 광흡수와 광전류 spectra를 293k에서 10K까지 측정하였다. 광흡수 스펙트럼으로부터 band gap $E_g$(T)는 Varshni 공식에 따라 계산한 결과 1.1851 eV-($8.99\times10^{-4} eV/K)T^2$/(T+153k)였다. 광전류 스펙트럼으로 부터 Hamilton matrix(Hopfield quasicubic mode)법으로 계산한 결과 crystal field splitting Δcr값이 0.0087eV이며 spin-orbit Δso값은 0.2329 eV임을 확인하였다. 10K일 때 광전류 봉우리들은 n = 1일때 $A_1-, B_1$-와 $C_1$-exciton봉우리임을 알았다.

Stability of the growth process at pulling large alkali halide single crystals

  • V.I. Goriletsky;S.K. Bondarenko;M.M. Smirnov;V.I. Sumin;K.V. Shakhova;V.S. Suzdal;V.A. Kuznetzov
    • 한국결정성장학회지
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    • 제13권1호
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    • pp.5-14
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    • 2003
  • Principles of a novel pulse growing method are described. The method realized in the crystal growing on a seed from melts under raw melt feeding provided a more reliable control of the crystallization process when producing large alkali halide crystals. The slow natural convection of the melt in the crucible at a constant melt level is intensified by rotating the crucible, while the crystal rotation favors a more symmetrical distribution of thermal stresses over the crystal cross-section. Optimum rotation parameters for the crucible and crystal have been determined. The spatial position oi the solid/liquid phase interface relatively to the melt surface, heaters and the crucible elements are considered. Basing on that consideration, a novel criterion is stated, that is, the immersion extent of the crystallization front (CF) convex toward the melt. When the crystal grows at a <> CF immersion, the raised CF may tear off from the melt partially or completely due to its weight. This results in avoid formation in the crystal. Experimental data on the radial crystal growth speed are discussed. This speed defines the formation of a gas phase layer at the crystal surface. The layer thickness il a function of time a temperature at specific values of pressure in the furnace and the free melt surface dimensions in the gap between the crystal and crucible wall. Analytical expressions have been derived for the impurity component mass transfer at the steady-state growth stage describing two independent processes, the impurity mass transfer along the <> path and its transit along the <> one. The heater (and thus the melt) temperature variation is inherent in any control system. It has been shown that when random temperature changes occur causing its lowering at a rate exceeding $0.5^{\circ}C/min$, a kind of the CF decoration by foreign impurities or by gas bubbles takes place. Short-term temperature changes at one heater or both result in local (i.e., at the front) redistribution of the preset axial growth speed.