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Stability of the growth process at pulling large alkali halide single crystals  

V.I. Goriletsky (Scientific Research Department of Alkali Halide Crystals STC)
S.K. Bondarenko (Scientific Research Department of Alkali Halide Crystals STC)
M.M. Smirnov (Scientific Research Department of Alkali Halide Crystals STC)
V.I. Sumin (Scientific Research Department of Alkali Halide Crystals STC)
K.V. Shakhova (Scientific Research Department of Alkali Halide Crystals STC)
V.S. Suzdal (Scientific Research Department of Alkali Halide Crystals STC)
V.A. Kuznetzov (Scientific Research Department of Alkali Halide Crystals STC)
Abstract
Principles of a novel pulse growing method are described. The method realized in the crystal growing on a seed from melts under raw melt feeding provided a more reliable control of the crystallization process when producing large alkali halide crystals. The slow natural convection of the melt in the crucible at a constant melt level is intensified by rotating the crucible, while the crystal rotation favors a more symmetrical distribution of thermal stresses over the crystal cross-section. Optimum rotation parameters for the crucible and crystal have been determined. The spatial position oi the solid/liquid phase interface relatively to the melt surface, heaters and the crucible elements are considered. Basing on that consideration, a novel criterion is stated, that is, the immersion extent of the crystallization front (CF) convex toward the melt. When the crystal grows at a <> CF immersion, the raised CF may tear off from the melt partially or completely due to its weight. This results in avoid formation in the crystal. Experimental data on the radial crystal growth speed are discussed. This speed defines the formation of a gas phase layer at the crystal surface. The layer thickness il a function of time a temperature at specific values of pressure in the furnace and the free melt surface dimensions in the gap between the crystal and crucible wall. Analytical expressions have been derived for the impurity component mass transfer at the steady-state growth stage describing two independent processes, the impurity mass transfer along the <> path and its transit along the <> one. The heater (and thus the melt) temperature variation is inherent in any control system. It has been shown that when random temperature changes occur causing its lowering at a rate exceeding $0.5^{\circ}C/min$, a kind of the CF decoration by foreign impurities or by gas bubbles takes place. Short-term temperature changes at one heater or both result in local (i.e., at the front) redistribution of the preset axial growth speed.
Keywords
Crystal growth; Process control; Mass transfer; Crystallization front; Gas phase;
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