• Korean Chemical Engineering Research
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• v.54 no.4
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• pp.548-554
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• 2016

In this study, semi-aqueous solutions containing carboxylic acids such as oxalic acid (OA), lactic acid (LA) and citric acid (CA) were formulated for the removal of copper etching residues produced at the interconnection process, and their characteristics were analyzed. Carboxylic acids in the solutions were apt to form various copper complexes according to the value of pH. Semi-aqueous solution containing 10 wt% CA showed the lowest etching rate of copper in the range from pH2 to pH7 and the highest selectivity in the range of pH 2 to pH 4. However, the cleaning solution containing 10 wt% LA revealed the superior selectivity at the range from pH 5 to pH 7. Appropriate selection of carboxylic acid should be required to improve the performance of cleaning solution. In the case of CA, the etching selectivity of copper oxide complex to copper was increased with the concentration of CA in the solution, when the solutions contain over 5 wt% CA, the copper interconnection layer has a metallic copper surface more than 88% in the area. The result shows that CA contained semi-aqueous solution has a relatively good cleaning ability.

• Corrosion Science and Technology
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• v.9 no.6
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• pp.276-280
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• 2010

Copper(Cu) as an interconnecting metal layer can replace aluminum (Al) in IC fabrication since Cu has low electrical resistivity, showing high immunity to electromigration compared to Al. However, it is very difficult for copper to be patterned by the dry etching processes. The chemical mechanical polishing (CMP) process has been introduced and widely used as the mainstream patterning technique for Cu in the fabrication of deep submicron integrated circuits in light of its capability to reduce surface roughness. But this process leaves a large amount of residues on the wafer surface, which must be removed by the post-CMP cleaning processes. Copper corrosion is one of the critical issues for the copper metallization process. Thus, in order to understand the copper corrosion problems in post-CMP cleaning solutions and study the effects of DC biases and post-CMP cleaning solution concentrations on the Cu film, a constant voltage was supplied at various concentrations, and then the output currents were measured and recorded with time. Most of the cases, the current was steadily decreased (i.e. resistance was increased by the oxidation). In the lowest concentration case only, the current was steadily increased with the scarce fluctuations. The higher the constant supplied DC voltage values, the higher the initial output current and the saturated current values. However the time to be taken for it to be saturated was almost the same for all the DC supplied voltage values. It was indicated that the oxide formation was not dependent on the supplied voltage values and 1 V was more than enough to form the oxide. With applied voltages lower than 3 V combined with any concentration, the perforation through the oxide film rarely took place due to the insufficient driving force (voltage) and the copper oxidation ceased. However, with the voltage higher than 3 V, the copper ions were started to diffuse out through the oxide film and thus made pores to be formed on the oxide surface, causing the current to increase and a part of the exposed copper film inside the pores gets back to be oxidized and the rest of it was remained without any further oxidation, causing the current back to decrease a little bit. With increasing the applied DC bias value, the shorter time to be taken for copper ions to be diffused out through the copper oxide film. From the discussions above, it could be concluded that the oxide film was formed and grown by the copper ion diffusion first and then the reaction with any oxidant in the post-CMP cleaning solution.

• Korean Journal of Materials Research
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• v.25 no.9
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• pp.462-467
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• 2015

Pellicle is defined as a thin transparent film stretched over an aluminum (Al) frame that is glued on one side of a photomask. As semiconductor devices are pursuing higher levels of integration and higher resolution patterns, the cleaning of the Al flame surface is becoming a critical step because the contaminants on the Al flame can cause lithography exposure defects on the wafers. In order to remove these contaminants from the Al frame, a highly concentrated nitric acid ($HNO_3$) solution is used. However, it is difficult to fully remove them, which results in an increase in the Al surface roughness. In this paper, the pellicle frame cleaning is investigated using various cleaning solutions. When the mixture of sulfuric acid ($H_2SO_4$), hydrofluoric acid (HF), hydrogen peroxide ($H_2O_2$), and deionized water with ultrasonic is used, a high cleaning efficiency is achieved without $HNO_3$. Thus, this cleaning process is suitable for Al frame cleaning and it can also reduce the use of chemicals.

• The Journal of Advanced Prosthodontics
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• v.7 no.2
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• pp.151-159
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• 2015

PURPOSE. To describe and characterize the surface topography and cleanliness of CAD/CAM manufactured zirconia abutments after steaming and ultrasonic cleaning. MATERIALS AND METHODS. A total of 12 ceramic CAD/CAM implant abutments of various manufacturers were produced and randomly divided into two groups of six samples each (control and test group). Four two-piece hybrid abutments and two one-piece abutments made of zirconium-dioxide were assessed per each group. In the control group, cleaning by steam was performed. The test group underwent an ultrasonic cleaning procedure with acetone, ethyl alcohol and antibacterial solution. Groups were subjected to scanning electron microscope (SEM) analysis and Energy-dispersive X-ray spectroscopy (EDX) to verify and characterize contaminant chemical characterization non- quantitatively. RESULTS. All zirconia CAD/CAM abutments in the present study displayed production-induced wear particles, debris as well as organic and inorganic contaminants. The abutments of the test group showed reduction of surface contamination after undergoing an ultrasonic cleaning procedure. However, an absolute removal of pollutants could not be achieved. CONCLUSION. The presence of debris on the transmucosal surface of CAD/CAM zirconia abutments of various manufacturers was confirmed. Within the limits of the study design, the results suggest that a defined ultrasonic cleaning process can be advantageously employed to reduce such debris, thus, supposedly enhancing soft tissue healing. Although the adverse long-term influence of abutment contamination on the biological stability of peri-implant tissues has been evidenced, a standardized and validated polishing and cleaning protocol still has to be implemented.

• Membrane Journal
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• v.27 no.6
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• pp.519-527
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• 2017

Membrane fouling is the main issue hindering the expansion of low pressure membrane processes for surface water treatment. Therefore, applying periodic hydraulic cleaning for fouling control should be well optimized. Better understanding of membrane fouling associated with periodic hydraulic cleaning would be useful to optimize membrane cleaning strategies. By comparing experimental permeability data with the classical Hermia blocking laws, this study aims at analyzing membrane fouling and understanding dominant fouling mechanisms occurring when filtering a synthetic surface water solution with a pressurized membrane process during six filtration cycles of 30 min each, separated with cyclic cleaning of 1 min by backwashing and forward flushing separately and combined. When applying single cleaning technique, membrane fouling during the first cycles was controlled by complete blocking mechanism while the last cycles were dominated by cake formation. Nevertheless, when combining cleaning technique better membrane regeneration was obtained and fouling was mainly due to cake formation.

• Journal of Conservation Science
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• v.11 no.1 s.14
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• pp.28-37
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• 2002

The cleaning in conservation treatment of cultural heritage is very important process. For the best conservation treatment of cultural heritage, except having a good detergency, the cleaning agent must be able to keep the heritage from the secondary deposition and re-soiling, damage and etc. In this paper, the dust (lichen, algae, dust, etc.) on the surface of stone made heritage was treated with some kinds of solvents and analyzed with FT-IR to develop a cleaning agent for stone made cultural heritage. And the cleaning ability to the dust and the corrosion ratio to the granite of the cleaning agent was investigated. Nonionic surfactants were good for treatment of stone-made cultural heritage. The reason is that nonionic surfactants are stable in acidic solution, and possess low reactivity with the compound of stone and low possibility to the second contamination, and build up the reactivities of acids and oxidants. A new cleaning agent composed with $H_2O_2/HF/NP-10$ shows a good cleaning ability for the conservation treatment of stone made cultural heritage.

• Journal of the Korean institute of surface engineering
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• v.49 no.6
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• pp.513-520
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• 2016

Many surface protection methods have been developed to apply to constructional steels which have been used under severe corrosive environments. One of these methods, hot dip galvanizing is being widely used to the numerous constructional steels such as a guard rail of high way, various types of structural steel for manufacturing ship and for some other industrial fields etc.. Recently, the cost of zinc is getting higher and higher, thus, it is considered that improvement of hot dip galvanizing process to reduce the cost of production should be developed possibly. In this study, additives such as acid cleaning solution, $NH_4OH$, $Al(OH)_3$ and $H_2O_2$ were added to flux solution, and omission of water washing treatment after acid cleaning was investigated with some types of flux solutions added with some additives mentioned above. The decrement of pH by adding the acid cleaning solution could be controlled due to neutralization reaction with addition of $NH_4OH$. The flux solution added with both $NH_4OH$ and $Al(OH)_3$ exhibited nearly the same color and pH value as those of orignal flux solution with no added, and the sample dipped to the flux solution which was added with additives mentioned above indicated a relatively good corrosion resistance compared to other samples. However, the flux solution added with $NH_4OH$, $Al(OH)_3$ and $H_2O_2$ exhibited a different color, sediment and a bad corrosion resistance. Consequently, it is considered that omission of water washing treatment may be able to perform by adding optimum additives to the original flux solution.

• Proceedings of the KIPE Conference
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• 2001.07a
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• pp.296-297
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• 2001

In this paper, the minimization of particle wit introduction of face to face to face type in cleaning. Easy input and change of parameter Monitoring function of process data in process function of 3 moving axis. Return Tank for Chem cal solution

• Proceedings of the Materials Research Society of Korea Conference
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• 2005.05a
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• pp.56-56
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• 2005

• Journal of the Korean Recycled Construction Resources Institute
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• v.8 no.3
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• pp.356-364
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• 2020

An experimental study to investigate the effect of self-cleaning of mortar mixed with photocatalyst was performed out in this study. Test parameters included the photocatalyst content and surface roughness of the specimens. The experimental mortar specimens were manufactured by mixing a photocatalyst by cement weight of 2.5%, 5.0%, 7.5% and 10.0%. In addition, the surface roughness was categorized into three cases. They included flat surface condition, little surface roughness(medium roughness), and high surface roughness. After mortar specimens were cured for 28 days, they were illuminated by an ultraviolet lamp for 24 hours and immersed in a methylene blue conditioning solution for 12 hours. Thereafter, an ultraviolet(UV) lamp was illuminated on the specimens for 48 hours in an experimental chamber and then the color change of methylene blue solution was measured by using a spectrophotometer over illuminating time of UV lamp. The color change of methylene blue tended to increase as photocatalyst contents increased. Test results meant that photocatalyst was effective for self-cleaning in mortar. However, the color change of the methylene blue solution did not show a noticeable tendency at different surface roughness conditions. It might be due to the uneven photocatalyst distribution on the surface of mortar specimens.