• Title/Summary/Keyword: cleaning solution

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Surface Treatment Technology for Metal Corrosion Layer Focusing on Copper Alloy

  • Yang, Eun-Hee;Han, Won-Sik;Choi, Kwang-Sun;Lee, Young-Hoon;Ham, Chul-Hee;Hong, Tae-Kee
    • Journal of the Korean Applied Science and Technology
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    • v.31 no.2
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    • pp.176-182
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    • 2014
  • Using alkali treatment solution, neutrality treatment solution and acid treatment solution, the surface corrosion layer of copper plates and bronze plates that have been artificially corroded using HCl, $H_2SO_4$ and $HNO_3$ solutions were removed. In the case of alkali treatment solution, only air oxidation in the form of black tenorite and white cuproous chloride remained without being removed. In the case of using a neutrality treatment solution, a anhydrous type layer of reddish brown cupric chloride remained without being removed, together with this black and white corrosion substance. In the case of using an acid treatment solution, this red corrosion substance also remained, but all of the oxide was removed on the surface of the specimen that was treated by alternatively using alkali treatment solution and acid treatment solution. In the case of this treatment solution with the order of alkali-acid, oxidation no longer proceeded only through the distilled water cleaning process after treatment, thereby showing that oxidation from the cleaning solution no longer proceeded.

Ultrasonic Cleaning이 Resin 의치상의 안정에 미치는 영향에 관한 실험적 연구

  • Lee, Han-Moo
    • The Journal of the Korean dental association
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    • v.12 no.1
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    • pp.37-42
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    • 1974
  • To ascertain if the ultrasonic cleaning technique caused any dimensional changes in heat and cold curing and fluid resin denture bases and in addition to evaluate the dimensional changes of the resin denture bases stored in water and air, the author measured the distance between the outsides of two pins embedded in methyl methacrylate test denture bases by mean of 12 inch vernier caliper, accurate to 0.02mm. The results were as follows; (1) Ultrasonic cleaning didn't cause any permanent dimensional changes, but only affected temporary dimensional expansion in 16 test denture bases. (2) Temporary expansion rate caused by 10 minutes' ultrasonic cleaning was 0.29% and at the maximal temperature of the cleaning solution it was 0.64%. (3) The half of the denture bases stored in water showed the dimensional expansion rate of 0.47% while the others stored in air showed the dimensional shrinkage rate of 0.15% after 4 months.

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Evaluation of Cleaning Ability of Aqueous Cleaning Agents according to their Additives (수계세정제의 첨가제에 따른 세정성 평가연구)

  • Kim, Hansung;Bae, Jae Heum
    • Clean Technology
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    • v.12 no.1
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    • pp.1-9
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    • 2006
  • Aqueous cleaning agents which are considered to be environmental-friendly and promising alternative ones among various industrial cleaning agents were evaluated in this words. In order to formulate aqueous cleaning agents, primary alcohol ethoxylates with 3, 5 and 7 moles of ethylene oxides among nonionic surfactants were selected as main surfactants. And anionic surfactants and alcohols were chosen as their cosurfactants. Builders such as NaOH, KOH, $Na_2CO_3$ and $NaHCO_3$ were also evaluated as additives for improvement of cleaning efficiency of aqueous cleaning agents. The experimental results of cleaning ability tests show that introduction of anionic surfactant TLS as cosurfactant in alcohol ethoxylate-based aqueous solution gives the best cleaning efficiency for removing mixed soil of cutting oil and grease. NaOH and $Na_2CO_3$ are also shown to play an important role for improvement of cleaning efficiency in a aqueous cleaning agent.

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Optimization of chemical cleaning for reverse osmosis membranes with organic fouling using statistical design tools

  • Park, Ki-Bum;Choi, Changkyoo;Yu, Hye-Weon;Chae, So-Ryong;Kim, In S.
    • Environmental Engineering Research
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    • v.23 no.4
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    • pp.474-484
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    • 2018
  • The cleaning efficiency of reverse osmosis (RO) membranes inevitably fouled by organic foulants depends upon both chemical (type of cleaning agent, concentration of cleaning solution) and physical (cleaning time, flowrate, temperature) parameters. In attempting to determine the optimal procedures for chemical cleaning organic-fouled RO membranes, the design of experiments concept was employed to evaluate key factors and to predict the flux recovery rate (FRR) after chemical cleaning. From experimental results and based on the predicted FRR of cleaning obtained using the Central Composite Design of Minitab 17, a modified regression model equation was established to explain the chemical cleaning efficiency; the resultant regression coefficient ($R^2$) and adjusted $R^2$ were 83.95% and 76.82%, respectively. Then, using the optimized conditions of chemical cleaning derived from the response optimizer tool (cleaning with 0.68 wt% disodium ethylenediaminetetraacetic acid for 20 min at $20^{\circ}C$ with a flowrate of 409 mL/min), a flux recovery of 86.6% was expected. Overall, the results obtained by these experiments confirmed that the equation was adequate for predicting the chemical cleaning efficiency with regards to organic membrane fouling.

Effect of Post-CMP Cleaning On Electrochemical Characteristics of Cu and Ti in Patterned Wafer

  • Noh, Kyung-Min;Kim, Eun-Kyung;Lee, Yong-Keun;Sung, Yun-Mo
    • Korean Journal of Materials Research
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    • v.19 no.3
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    • pp.174-178
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    • 2009
  • The effects of post-CMP cleaning on the chemical and galvanic corrosion of copper (Cu) and titanium (Ti) were studied in patterned silicon (Si) wafers. First, variation of the corrosion rate was investigated as a function of the concentration of citric acid that was included in both the CMP slurry and the post-CMP solution. The open circuit potential (OCP) of Cu decreased as the citric acid concentration increased. In contrast with Cu, the OCP of titanium (Ti) increased as this concentration increased. The gap in the OCP between Cu and Ti increased as citric acid concentration increased, which increased the galvanic corrosion rate between Cu and Ti. The corrosion rates of Cu showed a linear relationship with the concentrations of citric acid. Second, the effect of Triton X-$100^{(R)}$, a nonionic surfactant, in a post-CMP solution on the electrochemical characteristics of the specimens was also investigated. The OCP of Cu decreased as the surfactant concentration increased. In contrast with Cu, the OCP of Ti increased greatly as this concentration increased. Given that Triton X-$100^{(R)}$ changes its micelle structure according to its concentration in the solution, the corrosion rate of each concentration was tested.

A Study on characteristics of thin oxides depending on Si wafer cleaning conditions (Si기판 세정조건에 따른 산화막의 특성연구)

  • Jeon, Hyeong-Tak;Gang, Eung-Ryeol;Jo, Yun-Seong
    • Korean Journal of Materials Research
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    • v.4 no.8
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    • pp.921-926
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    • 1994
  • The characteristics of gate oxide significantly depend on the last chemical solution used in cleaning process. The standard RCA, HF-last, SC1-last, and HF-only processes are the pre-gate oxide cleaning processes utilized in this experiment. Cleaning process was followed by thermal oxidation in oxidation furnace at $900^{\circ}C$. A 100$\AA$ gate oxide was grown and characterized with using lifetime detector, VPD AAS, SIMS, TEM, and AFM. The results of HF-last and HF-only were shown to be very effective to remove the metallic impurities. And these two splits also showed long minority carrier lifetimes. The surface and interface morphologies of the oxide were examined with AFM and TEM. The rough surface morphologies were observed with the cleaning splits containing the SC1 solution. The smooth surface and interface was observed with the HF-only cleaning process.

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Evaluation of Self-Cleaning Performance of Mortar Using Nano-Titanium Dioxide Photocatalytic Coating (나노 이산화티탄 광촉매 코팅을 적용한 모르타르의 자기정화성능 평가)

  • Yang, In-Hwan;Jeon, Hyo-Jin;Lee, Seung-Jin
    • Journal of the Korean Recycled Construction Resources Institute
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    • v.10 no.1
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    • pp.56-65
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    • 2022
  • This paper aims at estimating self-cleaning performance of mortar coated with photocatalytic suspension under various conditions. Experimental variables included the concentration (1.5 % and 3.0 %) of photocatalytic suspension for coating mortar specimen, the presence of hydrophilic agent in photocatalytic suspension, and applying the primer on the surface of mortar. The color change of methylene blue solution increased and accordingly self-cleaning performance increased as photocatalytic concentration increased. The presence of hydrophilic agent in photocatalytic suspension slightly decreased the self-cleaning performance compared to the conventional photocatalytic suspension. Test results also showed that mortar specimen including primer and specimen not including primer did not show significantly different self-cleaning performance. In addition, cracks on the surface of mortar specimens decreased as the photocatalytic concentration increased. Therefore, increase in cracks on the surface of mortar at different photocatalytic concentration might adversely affect the self-cleaning performance of mortar specimens.

A Study on Chemical Cleaning of Electrolytic Facilities with Sea Water (해수전해설비의 화학세정 최적화 방안에 관한 연구)

  • 이한철;이창우;현성호
    • Journal of the Korean Society of Safety
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    • v.14 no.4
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    • pp.114-119
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    • 1999
  • When NaOCl was generated and put into sea-water cooling machine in order to overcome the biological hindrances against sea-water cooling machine, it was converted into metallic ion, particularly Ca and Mg, as a hydrate in sea-water and is to stick to electrolyte as a side reaction. This phenomena make the distance between the electrolytes narrow to decrease the flow rate, which induces the local vortex flow which erodes the pole plate. Moreover, this increases the resistance of the electrolyte as well as voltage to decrease the electrolytic efficiency, which has curtailed a chlorine yield and caused a pole plate cut. We are able to overcome these problems by chemical cleaning and intend to extend the life-time of electrolyte and to increase output of the sea-water electrolysis facilities by studying optimal policy regarding chemical cleaning of electrolytic cell. Cleaning time of electrolytic facilities is determined when both increase in electrolytic efficiency and decrease in pole-plate voltage are 10%. At this time as operating current of electrolytic facilities is high, operating time is diminished. Whereas, parameter of end point determination according to cleaning is Mg ionic concentration in solution. When we use Cleaner as a 7wt% HCl, cleaning time is about 80min proper. We are able to maintain pole plate performance by protecting against pole plate cut by means of electrolytic by-product, improve operating rate of facilities, and cut down on maintenance expenditure after acidic cleaning.

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Quartz Megasonic System for Cleaning Flat Panel Display (평판디스플레이 세정 용 Quartz 메가소닉 시스템)

  • Kim, Hyunse;Lee, Yanglae;Lim, Euisu
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.12
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    • pp.1107-1113
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    • 2014
  • In this article, the megasonic cleaning system for cleaning micro/nano particles from flat panel display (FPD) surfaces was developed. A piezoelectric actuator and a waveguide were designed by finite element method (FEM) analysis. The calculated peak frequency value of the quartz waveguide was 1002 kHz, which agreed well with the measured value of 1003 kHz. The average acoustic pressure of the megasonic cleaning system was 43.1 kPa, which is three times greater than that of the conventional type of 13.9 kPa. Particle removal efficiency (PRE) tests were performed, and the cleaning efficiency of the developed system was proven to be 99%. The power consumption of the developed system was 64% lower than that of the commercial system. These results show that the developed megasonic cleaning system can be an effective solution in particle removing from FPD substrate with higher energy efficiency and lower chemical and ultra pure water (UPW) consumption.

Hierarchical Nanostructure on Glass for Self Cleaning and Antireflective Properties

  • Xiong, Junjie;Das, Sachindra Nath;Kar, Jyoti Prakash;Choi, Ji-Hyuk;Myoung, Jae-Min
    • Proceedings of the Materials Research Society of Korea Conference
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    • 2010.05a
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    • pp.24.1-24.1
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    • 2010
  • In practical operation, the exposed surfaces may get dirty thus degrade the performance of devices. So the combination of self cleaning and antireflection is very desirable for use in outdoor photovoltaic and displaying devices, self cleaning windows and car windshields. For the purpose of self cleaning, the surface needs to be either superhydrophobic or superhydrophilic. However, in practice AR in the visible region and self cleaning are a pair of competitive properties. To satisfy the requirements for superhydrophobic or superhydrophilic surfaces, high surface roughness is required. But it usually cause severely light scattering. Photo-responsive coatings (TiO2, ZnO etc.) can lead to superhydrophilic. However, the refractive indices are high. Thus for porous structure, controlling pore size in the underwavelength scale to reduce the light scattering is very crucial for highly transparent and self cleaning antireflection coating. Herein, we demonstrate a simple method to make high performance broadband antireflection layer on the glass surface, by "carving" the surface by hot alkali solution. Etched glass has superhydrophilic surface. By chemical modification, it turns to superhydrophobic. Enhanced transparency (up to 97%) in a broad wavelength range was obtained by short time etching. Also antifogging effect has been demonstrated, which may offer advantage for devices working at high humidity environment or underwater. Compositional dependence of the properties was observed by comparing three different commercially available glasses.

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