• 제목/요약/키워드: cleaning solution

검색결과 326건 처리시간 0.02초

Surface Treatment Technology for Metal Corrosion Layer Focusing on Copper Alloy

  • Yang, Eun-Hee;Han, Won-Sik;Choi, Kwang-Sun;Lee, Young-Hoon;Ham, Chul-Hee;Hong, Tae-Kee
    • 한국응용과학기술학회지
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    • 제31권2호
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    • pp.176-182
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    • 2014
  • Using alkali treatment solution, neutrality treatment solution and acid treatment solution, the surface corrosion layer of copper plates and bronze plates that have been artificially corroded using HCl, $H_2SO_4$ and $HNO_3$ solutions were removed. In the case of alkali treatment solution, only air oxidation in the form of black tenorite and white cuproous chloride remained without being removed. In the case of using a neutrality treatment solution, a anhydrous type layer of reddish brown cupric chloride remained without being removed, together with this black and white corrosion substance. In the case of using an acid treatment solution, this red corrosion substance also remained, but all of the oxide was removed on the surface of the specimen that was treated by alternatively using alkali treatment solution and acid treatment solution. In the case of this treatment solution with the order of alkali-acid, oxidation no longer proceeded only through the distilled water cleaning process after treatment, thereby showing that oxidation from the cleaning solution no longer proceeded.

Ultrasonic Cleaning이 Resin 의치상의 안정에 미치는 영향에 관한 실험적 연구

  • 이한무
    • 대한치과의사협회지
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    • 제12권1호
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    • pp.37-42
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    • 1974
  • To ascertain if the ultrasonic cleaning technique caused any dimensional changes in heat and cold curing and fluid resin denture bases and in addition to evaluate the dimensional changes of the resin denture bases stored in water and air, the author measured the distance between the outsides of two pins embedded in methyl methacrylate test denture bases by mean of 12 inch vernier caliper, accurate to 0.02mm. The results were as follows; (1) Ultrasonic cleaning didn't cause any permanent dimensional changes, but only affected temporary dimensional expansion in 16 test denture bases. (2) Temporary expansion rate caused by 10 minutes' ultrasonic cleaning was 0.29% and at the maximal temperature of the cleaning solution it was 0.64%. (3) The half of the denture bases stored in water showed the dimensional expansion rate of 0.47% while the others stored in air showed the dimensional shrinkage rate of 0.15% after 4 months.

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수계세정제의 첨가제에 따른 세정성 평가연구 (Evaluation of Cleaning Ability of Aqueous Cleaning Agents according to their Additives)

  • 김한성;배재흠
    • 청정기술
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    • 제12권1호
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    • pp.1-9
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    • 2006
  • 산업세정제 중에서 환경친화적이라 대체 세정제로 유망한 수계세정제를 배합하고 임의 세정성을 평가하였다. 수계세정제 배합시 EO부가 몰수가 3, 5, 7인 primary alcohol ethoxylate계열의 비이온계면활성제를 주계면활성제(S)로 하고 음이온계면활성제, 알코올류 등을 보조계면활성제(A)로 하여 수계세정제를 배합하였고, 이들 배합비(A/S)에 따른 절삭유와 그리스의 혼합오염물에 대한 세정성을 평가하였다. 또한 builder인 NaOH, KOH, $Na_2CO_3$, $NaHCO_3$를 첨가하여 세정효율 향상을 평가하였다. 세정성 평가 실험결과 보조계면활성제로는 음이온계면활성제인 Triethanolamine Lauryl Sulfate(TLS) 사용 시에 가장 세정효율이 좋았고, builder로는 NaOH, $Na_2CO_3$가 우수한 세정효율을 보여주었다.

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Optimization of chemical cleaning for reverse osmosis membranes with organic fouling using statistical design tools

  • Park, Ki-Bum;Choi, Changkyoo;Yu, Hye-Weon;Chae, So-Ryong;Kim, In S.
    • Environmental Engineering Research
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    • 제23권4호
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    • pp.474-484
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    • 2018
  • The cleaning efficiency of reverse osmosis (RO) membranes inevitably fouled by organic foulants depends upon both chemical (type of cleaning agent, concentration of cleaning solution) and physical (cleaning time, flowrate, temperature) parameters. In attempting to determine the optimal procedures for chemical cleaning organic-fouled RO membranes, the design of experiments concept was employed to evaluate key factors and to predict the flux recovery rate (FRR) after chemical cleaning. From experimental results and based on the predicted FRR of cleaning obtained using the Central Composite Design of Minitab 17, a modified regression model equation was established to explain the chemical cleaning efficiency; the resultant regression coefficient ($R^2$) and adjusted $R^2$ were 83.95% and 76.82%, respectively. Then, using the optimized conditions of chemical cleaning derived from the response optimizer tool (cleaning with 0.68 wt% disodium ethylenediaminetetraacetic acid for 20 min at $20^{\circ}C$ with a flowrate of 409 mL/min), a flux recovery of 86.6% was expected. Overall, the results obtained by these experiments confirmed that the equation was adequate for predicting the chemical cleaning efficiency with regards to organic membrane fouling.

Effect of Post-CMP Cleaning On Electrochemical Characteristics of Cu and Ti in Patterned Wafer

  • Noh, Kyung-Min;Kim, Eun-Kyung;Lee, Yong-Keun;Sung, Yun-Mo
    • 한국재료학회지
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    • 제19권3호
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    • pp.174-178
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    • 2009
  • The effects of post-CMP cleaning on the chemical and galvanic corrosion of copper (Cu) and titanium (Ti) were studied in patterned silicon (Si) wafers. First, variation of the corrosion rate was investigated as a function of the concentration of citric acid that was included in both the CMP slurry and the post-CMP solution. The open circuit potential (OCP) of Cu decreased as the citric acid concentration increased. In contrast with Cu, the OCP of titanium (Ti) increased as this concentration increased. The gap in the OCP between Cu and Ti increased as citric acid concentration increased, which increased the galvanic corrosion rate between Cu and Ti. The corrosion rates of Cu showed a linear relationship with the concentrations of citric acid. Second, the effect of Triton X-$100^{(R)}$, a nonionic surfactant, in a post-CMP solution on the electrochemical characteristics of the specimens was also investigated. The OCP of Cu decreased as the surfactant concentration increased. In contrast with Cu, the OCP of Ti increased greatly as this concentration increased. Given that Triton X-$100^{(R)}$ changes its micelle structure according to its concentration in the solution, the corrosion rate of each concentration was tested.

Si기판 세정조건에 따른 산화막의 특성연구 (A Study on characteristics of thin oxides depending on Si wafer cleaning conditions)

  • 전형탁;강응렬;조윤성
    • 한국재료학회지
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    • 제4권8호
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    • pp.921-926
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    • 1994
  • Gate oxide의 특성은 세정공정에서 사용된 last세정용액에 큰 영향을 받는다. Standard RCA, HF-last, SCI-last, and HF-only 공정들은 gate oxidation하기 전 본 실험에서 행해진 세정공정들이다. 세정공정을 마친 Si기판들은 oxidation furnace에서 $900^{\circ}C$로 thermal oxidation공정을 거치게 된다. 100$\AA$의 gate oxide를 성장시킨 후 lifetime detector, VPD, AAS, SIMS, TEM, 그리고 AFM고 같은 분석장비를 이용하여 oxide의 특성을 평가했다. HF-last와 HF-only 공정에 의해 금속 불순물들이 매우 효과적으로 제거됐음을 알 수 있었다. Oxide의 표면 및 계면 형상은AFM과 TEM 측정을 통하여 관찰하였다. 표면거칠기는 SCI 세정용액을 사용한 splits 실험에서 불균일함이 관찰되었고 HF-only세정공정을 거친 시편 및 계면이 가장 smooth했다.

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나노 이산화티탄 광촉매 코팅을 적용한 모르타르의 자기정화성능 평가 (Evaluation of Self-Cleaning Performance of Mortar Using Nano-Titanium Dioxide Photocatalytic Coating)

  • 양인환;전효진;이승진
    • 한국건설순환자원학회논문집
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    • 제10권1호
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    • pp.56-65
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    • 2022
  • 본 연구에서는 시설물의 자기정화성능을 확보하기 위하여 이산화티탄 광촉매 용액을 코팅한 모르타르의 자기정화성능을 분석하였다. 광촉매 코팅 용액의 농도(1.5 %와 3.0 %), 초친수강화 용액 적용 유무 및 프라이머 용액의 사용 유무를 실험변수로 고려하였다. 광촉매 농도가 증가할수록 메틸렌블루 수용액의 색상 변화율이 증가하였으며, 이는 광촉매 농도가 증가할수록 자기정화성능이 증가하는 것을 나타낸다. 초친수성 광촉매 용액의 적용은 일반 광촉매 용액에 비해 자기정화성능을 다소 감소시킬 가능성이 있음을 나타낸다. 또한, 프라이머를 사용한 모르타르의 자기정화성능은 프라이머를 사용하지 않은 모르타르의 자기정화성능과 뚜렷한 차이를 나타내지 않는다. 한편, 낮은 농도(1.5 %)로 코팅된 모르타르에 비해 높은 농도(3.0 %)로 코팅된 모르타르 시편 표면의 코팅 균열이 미세하여 상대적으로 큰 광촉매 반응면적을 확보하고 자기정화성능 증가에 유리한 영향을 미친 것으로 판단된다.

해수전해설비의 화학세정 최적화 방안에 관한 연구 (A Study on Chemical Cleaning of Electrolytic Facilities with Sea Water)

  • 이한철;이창우;현성호
    • 한국안전학회지
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    • 제14권4호
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    • pp.114-119
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    • 1999
  • When NaOCl was generated and put into sea-water cooling machine in order to overcome the biological hindrances against sea-water cooling machine, it was converted into metallic ion, particularly Ca and Mg, as a hydrate in sea-water and is to stick to electrolyte as a side reaction. This phenomena make the distance between the electrolytes narrow to decrease the flow rate, which induces the local vortex flow which erodes the pole plate. Moreover, this increases the resistance of the electrolyte as well as voltage to decrease the electrolytic efficiency, which has curtailed a chlorine yield and caused a pole plate cut. We are able to overcome these problems by chemical cleaning and intend to extend the life-time of electrolyte and to increase output of the sea-water electrolysis facilities by studying optimal policy regarding chemical cleaning of electrolytic cell. Cleaning time of electrolytic facilities is determined when both increase in electrolytic efficiency and decrease in pole-plate voltage are 10%. At this time as operating current of electrolytic facilities is high, operating time is diminished. Whereas, parameter of end point determination according to cleaning is Mg ionic concentration in solution. When we use Cleaner as a 7wt% HCl, cleaning time is about 80min proper. We are able to maintain pole plate performance by protecting against pole plate cut by means of electrolytic by-product, improve operating rate of facilities, and cut down on maintenance expenditure after acidic cleaning.

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평판디스플레이 세정 용 Quartz 메가소닉 시스템 (Quartz Megasonic System for Cleaning Flat Panel Display)

  • 김현세;이양래;임의수
    • 한국정밀공학회지
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    • 제31권12호
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    • pp.1107-1113
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    • 2014
  • In this article, the megasonic cleaning system for cleaning micro/nano particles from flat panel display (FPD) surfaces was developed. A piezoelectric actuator and a waveguide were designed by finite element method (FEM) analysis. The calculated peak frequency value of the quartz waveguide was 1002 kHz, which agreed well with the measured value of 1003 kHz. The average acoustic pressure of the megasonic cleaning system was 43.1 kPa, which is three times greater than that of the conventional type of 13.9 kPa. Particle removal efficiency (PRE) tests were performed, and the cleaning efficiency of the developed system was proven to be 99%. The power consumption of the developed system was 64% lower than that of the commercial system. These results show that the developed megasonic cleaning system can be an effective solution in particle removing from FPD substrate with higher energy efficiency and lower chemical and ultra pure water (UPW) consumption.

Hierarchical Nanostructure on Glass for Self Cleaning and Antireflective Properties

  • Xiong, Junjie;Das, Sachindra Nath;Kar, Jyoti Prakash;Choi, Ji-Hyuk;Myoung, Jae-Min
    • 한국재료학회:학술대회논문집
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    • 한국재료학회 2010년도 춘계학술발표대회
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    • pp.24.1-24.1
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    • 2010
  • In practical operation, the exposed surfaces may get dirty thus degrade the performance of devices. So the combination of self cleaning and antireflection is very desirable for use in outdoor photovoltaic and displaying devices, self cleaning windows and car windshields. For the purpose of self cleaning, the surface needs to be either superhydrophobic or superhydrophilic. However, in practice AR in the visible region and self cleaning are a pair of competitive properties. To satisfy the requirements for superhydrophobic or superhydrophilic surfaces, high surface roughness is required. But it usually cause severely light scattering. Photo-responsive coatings (TiO2, ZnO etc.) can lead to superhydrophilic. However, the refractive indices are high. Thus for porous structure, controlling pore size in the underwavelength scale to reduce the light scattering is very crucial for highly transparent and self cleaning antireflection coating. Herein, we demonstrate a simple method to make high performance broadband antireflection layer on the glass surface, by "carving" the surface by hot alkali solution. Etched glass has superhydrophilic surface. By chemical modification, it turns to superhydrophobic. Enhanced transparency (up to 97%) in a broad wavelength range was obtained by short time etching. Also antifogging effect has been demonstrated, which may offer advantage for devices working at high humidity environment or underwater. Compositional dependence of the properties was observed by comparing three different commercially available glasses.

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