• Proceedings of the KIEE Conference
• /
• 2006.07d
• /
• pp.2233-2234
• /
• 2006

Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry(MAS). In order to save the costs of slurry, the original silica slurry was diluted by de-ionized water (DIW). And then, $ZrO_2$, $CeO_2$,and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

• Proceedings of the KIEE Conference
• /
• 2006.07d
• /
• pp.2235-2236
• /
• 2006

Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry(MAS). In order to save the costs of slurry, the original silica slurry was diluted by de-ionized water (DIW). And then, $ZrO_2$, $CeO_2$,and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

• Proceedings of the KIEE Conference
• /
• 2006.07d
• /
• pp.2237-2238
• /
• 2006

CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40 %. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.

• Carbon letters
• /
• v.13 no.3
• /
• pp.157-160
• /
• 2012

In this work, iron oxide ($Fe_3O_4$) nanoparticles were deposited on multi-walled carbon nanotubes (MWNTs) by a simple chemical coprecipitation method and $Fe_3O_4$-decorated MWNTs (Fe-MWNTs)/polypyrrole (PPy) nanocomposites (Fe-MWNTs/PPy) were prepared by oxidation polymerization. The effect of the PPy on the electrochemical properties of the Fe-MWNTs was investigated. The structures characteristics and surface properties of MWNTs, Fe-MWNTs, and Fe-MWNTs/PPy were characterized by X-ray diffraction and X-ray photoelectron spectroscopy, respectively. The electrochemical performances of MWNTs, Fe-MWNTs, and Fe-MWNTs/PPy were determined by cyclic voltammetry and galvanostatic charge/discharge characteristics in a 1.0 M sodium sulfite electrolyte. The results showed that the Fe-MWNTs/PPy electrode had typical pseudo-capacitive behavior and a specific capacitance significantly greater than that of the Fe-MWNT electrode, indicating an enhanced electrochemical performance of the Fe-MWNTs/PPy due to their high electrical properties.

• Journal of the Korean Ceramic Society
• /
• v.51 no.1
• /
• pp.11-18
• /
• 2014

Onggi, which is described as a breathing pottery, has strongly influenced the traditional food culture in Korea. In this study Onggi is compared to porcelains including celadon and white porcelain to analyze the sources of pore formation. The differences in starting materials are examined for chemical and mineralogical compositions, particle size and distribution. The gas permeability of the fired samples is correlated to the matrix microstructure. The broad particle size distribution and high iron oxide content of Onggi are revealed as the major cause for the pore formation. Open pores are formed with large particles in the Onggi body while closed pores have a high iron oxide concentration. The Onggi body with increased open pores leads to the high gas permeability.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 2010.06a
• /
• pp.7-7
• /
• 2010

Indium tin oxide (ITO) - SWNT nano crystalline composites was synthesized at low temperature(${\sim}250^{\circ}C$)using Nano Cluster Deposition technique by Metal Orhoganic Chemical Vapor Deposition method. XRD patterns of ITO- SWNT composite shows pure cubic phases without any secondary phase. I-V measurement gives resistance of 12 ohms for Sn doped (3 wt %) indium oxide-SWNT composites. The electrical conductivity of the nano composites is significantly enhanced compared to the SWNT.

• Journal of the Korean Ceramic Society
• /
• v.48 no.6
• /
• pp.625-629
• /
• 2011

In this study, we show that by anodization of Nb in NaF electrolytes microcone niobium oxide layers can be formed under a range of experimental conditions. It is found that a single NaF electrolyte leads to the formation of microcones. At 1 M NaF, 40 V, 1 h, well-ordered microcones were generated on Nb discs. XRD results show that the initially formed anodic oxide is amorphous, but an amorphous to crystalline transition occurs during anodization. For the formation of favorable microcones, it is considered that proper parameters such as electrolyte concentration, voltage, anodizing time are necessary according to the kind of electrolytes.

• Transactions on Electrical and Electronic Materials
• /
• v.16 no.1
• /
• pp.49-52
• /
• 2015

The change of the chemical structure of graphene oxide (GO) was investigated by periodical sampling of GO during exfoliation by using a sonicator. A significant amount of GO was exfoliated during up to 10 hr of sonication. Raman and Fourier transform infrared spectroscopy revealed a continuous increase of the G/D or C=C/C=O peak ratio of GO, as the sonication time increases. The photoluminescence (PL) intensity of each GO sample also decreased as a function of the sonication time. PL excitation spectra with three major peaks indicate that the sizes of $sp^2$ carbon clusters were enlarged by longer sonication. In addition, new excitation at around 300 nm proves the existence of newly developed small clusters of $sp^2$ carbons as the sonication time increased.

• Proceedings of the KIEE Conference
• /
• 2006.07b
• /
• pp.1267-1268
• /
• 2006

Chemical mechanical polishing (CMP) technology has been widely used for global planarization of multi-level interconnection for ULSI applications. However, the cost of ownership and cost of consumables are relatively high because of expensive slurry. In this paper, we studied the mixed abrasive slurry (MAS). In order to save the costs of slurry, the original silica slurry was diluted by do-ionized water (DIW). And then, $ZrO_2,CeO_2$, and $MnO_2$ abrasives were added in the diluted slurry in order to promote the mechanical force of diluted slurry. We have also investigate the possibility of mixed abrasive slurry for the oxide CMP application.

• Proceedings of the KIEE Conference
• /
• 2006.07b
• /
• pp.1271-1272
• /
• 2006

CMP(chemical mechanical polishing) process has been attracted as an essential technology of multi-level interconnection. However, the COO(cost of ownership) is very high, because of high consumable cost. Especially, among the consumables, slurry dominates more than 40%. So, we focused how to reduce the consumption of raw slurry. In this paper, $ZrO_2$, $CeO_2$, and $MnO_2$ abrasives were added de-ionized water (DIW) and pH control as a function of KOH contents. We have investigate the possibility of new abrasive for the oxide CMP application.