• 제목/요약/키워드: chemical filter

검색결과 521건 처리시간 0.028초

Oxide CMP 공정에서 Slurry Filter을 사용한 Microscratch 감소에 관한 연구 (A Study of the reduction of Microscratch using Filter in oxide chemical Mechanical Polishing(CMP) Process)

  • 김상용;서용진;김태형;이우선;정헌상;김창일;장의구
    • 대한전기학회:학술대회논문집
    • /
    • 대한전기학회 1999년도 하계학술대회 논문집 D
    • /
    • pp.1888-1890
    • /
    • 1999
  • In this work, we have systematically studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in Inter-Metal Dielectric(IMD) CMP. The filter Installation in CMP polisher makes defect reduced after IMD CMP. As a result of formation micro-scratches, it shows that slurry filter plays an important role in determining consumable pad lifetime. The filter lifetime is dominated by the defects. We have acknowledged slurry filter lifetime is fixed by the degree of generating defects.

  • PDF

유연성 섬유사 여과기를 이용한 순환여과식 양식장의 부유고형물 제거 (Removal of Suspended Solids Using a Flexible Fiber Filter in a Recirculating Aquaculture System)

  • 최광수
    • 한국수산과학회지
    • /
    • 제40권2호
    • /
    • pp.73-78
    • /
    • 2007
  • The suitability of a flexible fiber filter for removing suspended solid (SS) in a recirculating aquaculture system was evaluated. This study focused on variation in the performance with a change in filtering time, influent water quality, and filtering mode duration. The particle distribution diagram of the filter effluent showed that the number of particles bigger than $5-8{\mu}m$ decreased dramatically, and the removal efficiency exceeded 80%. Although the removal efficiencies of SS and chemical oxygen demand (COD) were dependent on the quality of the influent, the SS and COD concentrations of the effluent were not affected by the influent concentrations. This was despite the deterioration if water quality after feeding in the rearing tank. The performance of the filter was not affected by the filtering mode duration, feeding conditions, or filtering time. The SS concentration and turbidity of the recirculating-type rearing tank were 30% and 50% lower, respectively, than of the a non-recirculating-type rearing tank under the same operating conditions. The flexible fiber filter was applicable to a recirculating aquaculture system that uses plenty of seawater, based on its low filtering resistance $(2kg_f/cm^2)$, high flux $(330m^3/m^2/hr)$, and high fine particle removal efficiency (80%, $5-8{\mu}m$).

Floating Bead Filter에 의한 순환여과식 양식장의 부유고형물 제거와 질산화 (Removal of Suspended Solids and Nitrification by Floating Bead Filter in Recirculating Aquaculture System)

  • 김병진;김성구;서근학
    • 한국수산과학회지
    • /
    • 제36권2호
    • /
    • pp.163-169
    • /
    • 2003
  • The floating bead filter was tested for treatment of aquacultural water in a pilot-scale recirculating aquaculture system. Performance of floating bead filter on the removal of total suspended solids (TSS) and the treatment of nitrogen sourer such as total ammonia nitrogen (TAN), nitrite nitrogen and nitrate nitrogen were evaluated. The system was stocked with Nile tilapia at an initial rearing densities of $5\%\;and\;7\%$ over 30 days. The average TSS removal rates were $43.0\;g/m^2{\cdot}day\;and\;39.5\;g/m^2{\cdot}day$ for rearing density of $5\%\;and\;7\%$, respectively. As rearing density increased from $5\%\;to\;7\%$. the TAN removal efficiency decreased from $22.0\%\;to\;17.7\%$. At the rearing densities of $5\%\;and\;7\%$, the average TAN removal rates and removal efficiencies were $38.8\;g/m^2{\cdot}day,\;15.6\%\;and\;37.8\;g/m^2{\cdot}day.\;17.7\%,$ respectively. The average TAN removal rate was $37.8-38.8\;g/m^3{\cdot}day.$ The oxygen consumption by floating bead filter was higher than theoretical oxygen consumption rate by nitrification.

CMP 공정에서 슬러리 필터설치에 따른 결함 밀도 개선 (Improvement of Defect Density by Slurry Fitter Installation in the CMP Process)

  • 김철복;서용진;김상용;이우선;김창일;장의구
    • 한국전기전자재료학회:학술대회논문집
    • /
    • 한국전기전자재료학회 2001년도 춘계학술대회 논문집 반도체재료
    • /
    • pp.30-33
    • /
    • 2001
  • Chemical mechanical polishing(CMP) process has been widely used to planarize dielectrics, which can apply to employed in integrated circuits for sub-micron technology. Despite the increased use of CMP process, it is difficult to accomplish the global planarization of free-defects in inter-level dielectrics (ILD). Especially, defects like micro-scratch lead to severe circuit failure, and affects yield. CMP slurries can contain particles exceeding $1{\mu}m$ size, which could cause micro-scratch on the wafer surface. The large particles in these slurries may be caused by particle agglomeration in slurry supply line. To reduce these defects, slurry filtration method has been recommended in oxide CMP. In this work, we have studied the effects of filtration and the defect trend as a function of polished wafer count using various filters in inter-metal dielectric(IMD)-CMP. The filter installation in CMP polisher could reduce defect after IMD-CMP. As a result of micro-scratches formation, it shows that slurry filter plays an important role in determining consumable pad lifetime.

  • PDF

ZnO 압전 박막을 이용한 고주파 SAW 필터 연구 (A Study on the ZnO Piezoelectric Thin Film SAW Filter for High Frequency)

  • 박용욱;신현용
    • 한국세라믹학회지
    • /
    • 제40권6호
    • /
    • pp.547-552
    • /
    • 2003
  • RF 마그네트론 스퍼터링법을 이용하여 유리기판위에 인가전력 100 W, 1.33Pa, Ar/O2=50 : 50, 20$0^{\circ}C$ 그리고 타겟과 기판사이의 거리 4 cm의 조건으로 ZnO 압전 박막을 성장시켰다. 증착된 박막의 결정성, 표면형상, 화학적 결합비와 전기적 특성을 XRD, SEM, AFM, RBS와 electrometer를 이용하여 측정 분석하였다 제조된 박막은 우수한 c축 우선 배향성을 보였고 또한 화학 양론적인 결합비를 나타내었다. 전극 구조가 single 및 double IDT를 갖는 ZnO/1DT/glass SAW 필터를 제작하여 특성을 분석한 결과, 전파속도는 각각 2,589 m/sec, 2,533 m/sec이었고, 삽입손실은 -11 dB과 -21 dB 값을 나타내어 박막형 SAW 필터로 응용이 기대된다.

여과에 의한 케이크 함수량의 한계와 효율적인 여과-압착 조작 조건에 대한 연구 (Study on the Limit of Water Content by Cake Filtration and Effective Operation in Filtration-Expression Process)

  • 임성삼;송연민
    • Korean Chemical Engineering Research
    • /
    • 제43권6호
    • /
    • pp.696-703
    • /
    • 2005
  • 케이크 여과에서 케이크에 대한 정의가 아직 마련되어 있지 않다. 특히 침전된 플럭(floc)의 여과에서는 케이크를 전혀 정의하지 못하였다. 본 연구에서는 '여과-투과(filtration-permeation)' 실험을 사용하여 모든 경우의 케이크를 명확히 정의하였다. 이 케이크의 정의에 대한 고찰을 통해 케이크 여과에 의해 이룩될 수 있는 케이크 함수량의 한계에 대한 연구를 수행하였다. 여과에 의해 형성된 케이크의 수분 함량을 줄이기 위한 압착조작(expression) 과정을 '고액분리 통합이론'으로 계산하고 실제 압착조작 데이터와 비교하였다. 여과와 압착조작 전체를 분석하여, 압착의 중요성을 검토했다. 그리고 회분식으로 조작되는 필터 프레스의 케이크 배출과 세척시간을 포함하여 가장 효율적인 조작조건을 계산하는 방법을 제안하였다.

살충제 Carbofuran의 수중광분해 (Aqueous Photolysis of the Organophosphorus Insecticide Carbofuran)

  • 김균;김용화
    • 한국환경농학회지
    • /
    • 제21권3호
    • /
    • pp.172-177
    • /
    • 2002
  • 살충제 carbofuran의 수중 광분해 실험을 미국 EPA 및 OECD 방법으로 수행하였다. Carbofuran은 자연광을 흡수하지 않는 화합물이지만, 야외에서 증류수로 수행한 광분해시험 결과 반감기가 9.7일, SUNTEST에서 3.4일, SUNTEST의 UV하에서 1시간으로 신속한 광분해가 일어남을 확인하였다. 특히 논물에서는 SUNTEST에서의 반감기가 14시간으로 증류수 보다 약 6배 가속화되었으며, 살균한 논물보다는 비살균 논물에서의 광분해가 다소 빠르게 일어났다. 이와 같은 결과로 볼 때 carbofuran의 경우 수도작 상황에서 sensitizer 등에 의한 간접 광분해의 가능성이 있음을 확인하였다.

The Effect of Chemical Vapor Infiltrated SiC Whiskers on the Change in the Pore Structure of a Porous SiC Body

  • Joo, Byoung-In;Park, Won-Soon;Choi, Doo-Jin;Kim, Hai-Doo
    • 한국세라믹학회지
    • /
    • 제43권4호
    • /
    • pp.199-202
    • /
    • 2006
  • In this study, SiC whiskers were grown on a porous SiC diesel particulate filter for nanoparticle filtering. To grow the whiskers at the inner pore without closing the pores, we used chemical vapor infiltration with a solution source and a dilute. As the deposition time increased, the whiskers grew and formed a network structure. After 180 min of deposition, the mean diameter of the whiskers was 174 nm and the compressive strength was 58.4 MPa. The pores shrank from $10{\mu}m\;to\;0.4{\mu}m$ and, because the whiskers filed the inner pores, the gradient of permeability decreased as the deposition time increased. However, by using the network structure of whiskers deposited for 120 min and 180 min, we obtained a diesel particulate filter with pores of $0.98{\mu}m\;and\;0.4{\mu}m$, respectively. Furthermore, the filter shows better permeability than a porous body with pores of $1{\mu}m$. In short, by filtering the nanoparticulate materials, the network structure of whiskers improves the strength, reduces the pore size and minimizes the permeability drop.

CMP (Chemical Mechanical Polishing) characteristics of langasite single crystals for SAW filter applications

  • Jang, Min-Chul;An, Jin-Ho;Kim, Jong-Cheol;Auh, Keun-Ho
    • 한국결정성장학회지
    • /
    • 제10권4호
    • /
    • pp.309-317
    • /
    • 2000
  • Langasite is a promising new piezoelectric material for SAW filter application. Little was known until recently about the methods needed to mechanically polish and chemically polish/etch this material. In this experiment, polishing, slurry chemistry and chemical wet etching for langasite is described. Conventional quartz and LN ($LiNbO_3$) polishing methods did not produce satisfactory polished surfaces, and polishing with a colloidal silica slurries has shown to be most effective. The optimum condition was investigated by changing the slurry chemistry. As the planarization effect is very important in SAW filter applications, the examination of the effective particle number effect and the particle size effect was carried out. Z-cut langasite surface which had been polished with the colloidal silica slurries was etched in a variety of etchants. Conventional quartz etchants destroyed the polished surface. Other etchants formed a thin film on the surfaces. In this experiment, the reaction between langasite and a few etching solution was analysed. And an appropriate selective etchant solution for analyzing the defects was synthesized.

  • PDF

PDP 패널용 전도막 광학 필터 제조에 관한 연구 (A Study on the Manufacture of Optical Filters for PDP Panel in Conductive Types)

  • 김태훈;강봉구;이태훈;손세모
    • 한국인쇄학회지
    • /
    • 제26권2호
    • /
    • pp.31-43
    • /
    • 2008
  • The functional dyes, which has various optical characteristics that can be applicable to field of electronic, photo electronic, such as sensor or electrode, were synthesized. Physical property and optical stability was studied with preparation of conductive type film as a kind of optical filter of plasma display panel, by adapting neon cut off dye, which can selectively absorbing between 580 and 610nm wavelength. The filter was prepared with PSA resin, which has functional group of - COOH and - OH, as binder. And the characters such as spectroscopy, heat-proof / wet-proof, thermal stability and commerciality, which must be held by functional dyes, were examined. Conductive type film is the kind of film includes only neon cut off dyes. For the neon cut off dyes, cyanine dyes can be applied. And it is observed that spectrum of before and after the durability test are not changed due to stability of dyes, as the result of coating on the mesh film with PSA binder.

  • PDF