• 한국의류학회지
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• 제37권3호
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• pp.348-356
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• 2013

Denim washing is processed with different washing techniques such as stone washing, chemical washing, sand washing, and bio washing. Cellulase bio washing can meet environmental regulations that enhance and rectify problems associated with traditional decolorization techniques; however, stone washing needs to be added to the processing because it produces a low decolorization effect. There is also the problem of additional strength reduction. To prevent these problems, a new enzyme for bio washing is required. This study examines the optimum laccase treatment conditions on denim and evaluated the characteristics of laccase-treated denims to establish a database of eco-friendly new decolorization process on denim using a new laccase enzyme. The results show that the optimum conditions of laccase on denim are a pH of 4.0, $30^{\circ}C$, 7% (o.w.f.), and 6 hours in 10 mM of buffer concentration. UV absorbance and HPLC identified isatin coexist with anthranilic acid in solution after laccase treatment on denim. Results of the surface color, the surface morphology and the tensile strength indicate that laccase treatment shows an excellent decolorization effect without fiber damage. The wet cleaning fastness and the perspiration fastness also improved.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2012년도 제42회 동계 정기 학술대회 초록집
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• pp.273-273
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• 2012

최근 스마트 윈도우, 자가세정(Self-Cleaning), 김서림방지(Anti-Fogging), 디스플레이 표시장치, 대전방지 코팅 등 다각적으로 활용이 가능한 PTFE (Ploytetrafluoroethylene)를 Sol-gel, Sputtering, Spin-Coating, CVD (Chemical vapor deposition)방법을 이용하여 낮은 표면에너지와 나노사이즈의 표면 거칠기를 가지는 $150^{\circ}$ 이상의 초-발수성 표면에 대한 많은 연구가 진행되고 있다. 본 실험에서는 영구자석을 이용한 고밀도 플라즈마로 높은 점착성과, 균일한 박막 및 대 면적 공정이 가능한 RF-magnetron sputtering방법을 이용하여 Plasma etching으로 표면적의 거칠기와 낮은 표면에너지를 만든 뒤, 발수특성을 가진 PTFE를 증착하여 접촉각 변화와 구조적 및 광학적 특성을 측정하였다. AFM (Atomic Force Microscope)측정결과 100 w에서 가장 높은 1.7 nm의 RMS(Root mean square)값이 측정되었고, 접촉각 측정결과 Plasma etched glass는 25 w에서 125 w로 증가함에 따라 친수성을 나타내었으며, 100 w에서 가장 낮은 $15^{\circ}$의 접촉각을 나타내었다. PTFE박막을 증착하였을 때는 100 w에서 $150^{\circ}$의 초발수 특성을 나타내었고, 투과율 측정 결과 85%이상의 높은 투과율을 나타내었다. Plasma etching을 이용한 PTFE 발수 특성은 비가 오면 자동으로 이물질이 씻겨 내리는 자동차 유리등의 개발이 가능하고, 높은 투과율이 요구되는 액정표시장치(LCD)같은 차세대 대형 디스플레이의 표면 코팅에 사용이 가능 할 것이라 사료된다. 본 연구는 중소기업청에서 지원하는 2011년도 산학연 공동기술개발 지원사업의 연구수행으로 인한 결과물임을 밝힙니다.

• 열처리공학회지
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• 제13권2호
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• pp.91-97
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• 2000

The structure and mechanical properties of TiN and TiCN thin films deposited on STD61 steel substrates by the RF-sputtering methods has been studied by using XPS, XRD, micro-hardness tester, scratch tester, and wear-resistance tester. XPS results showed that the TiCN thin film formed with chemical bonding state. The TiN thin films grew with (111) orientation having the lowest strain energy by compressive stress, whereas the TiCN thin films grew with both (111) and (200) orientation, but (200) orientation having the lowest surface energy becomes dominant as carbon contents increase. The pre-etching treatment of substrate did not affect on the preferred orientation of thin films, but it played an important role in improving mechanical properties of thin films such as the hardness, adhesion and wear- resistance. Especially, the TiCN thin films showed the superior wear resistances due to high hardness and low friction coefficient compared with TiN thin films.

• 한국막학회:학술대회논문집
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• 한국막학회 1996년도 제4회 하계분리막 Workshop (초순수 제조와 막분리 공정)
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• pp.149-153
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• 1996

반도체 소자 제조 공정이 고 집적화 됨에 따라 습식 세정방법에 의한 세정공정의 중요성이 더욱 증가 되어지고 있으며, 특히 그 중에서 전체 세정공정의 약 절반을 차지하고 있는 Deionised water에 의한 rinsing 공정의 경우 ultrapure water의 quality가 최근 지속적으로 향상이 되어짐에 따라 많은 발전을 자져 왔다. 일반적으로 Deionised water에 함유하고 있는 TOC(total oxidisable components), bacteria, metallic impurity, desolved oxygen cencentration, colloidal material impurity (예를 들면 Silica, oraganic substrate)등은 ultra pure water의 quality를 결정하는데 매우 중요한 factor로 작용하고 있으며, 이러한 불순물들이 반도체 제조공정중 wafer surface에 흡착되어 졌을때 여러형태의 defect들을 유발한다고 알려져 있다. 그러나 pseudommonas, flavobacterlum, alcaligene등의 기 얄려진 bacteria들의 경우 Deionised water를 supply해주는 배관의 Inner surface에 잘 흡착 되지만 고온의 water 혹은 과산화수소수($H_{2}O_{2}$) 를 이용하여 주기적으로 처리 해줌으로 인하여 이에 대한 문제점을 어느정도 최소화 시킬수 있다. 위의 두가지 방법중 전자의 경우 chemical을 사용하지 않고, 유지 및 관리가 간편하며, 용존산소량을 줄일수 있다는 점에서 장점이 있으나, 전 ultra pure water의 system이 열적으로 안정해야 하고 경제적인 문제가 수반하는 단점을 가지고 있다. 후자의 경우, 미량의 과산화수소수 (1~10,000 ppm)를 이용해 처리 해주는 방법의 경우 경제적으로 큰 장점이 있고, 처리가 단순하다는 장점이 있으나 과산화수소수 자체에 포함하고 있는 높은 impurit level, 그리고 처리후 장시간의 flushing time을 가져야 한다는 단점등이 존재 하고 있다.

• 멤브레인
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• 제14권1호
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• pp.66-74
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• 2004

합성 하수 및 실제 하수를 이용한 금속 막의 정밀 여과 공정에서 분리 막의 전체 저항의 증가는 입자의 막 표면 축적에 의한 케이크 층의 저항 ($R_c$)에 가장 큰 영향을 받았다. 막 오염 저감을 위한 방법으로 오존 가스를 이용한 간헐적 역세정은 공기에 의한 경우보다 막 오염 저감에 훨씬 더 효과적인 것으로 나타났다. 운전 인자에 대한 영향으로 동일한 오존 주입량에서는 주입시간을 길게 하기보다는 주입 가스 유량을 크게 할수록 더 높은 막 투과 유속의 회복을 보였다. 여과시간이 길수록 오존가스를 이용한 막 오염 저감효과가 감소하는 것으로 나타나 부착층 및 막 내부에서 파울링 물질에 의한 비가역적인 막 오염이 발생하기 전에 막 세정을 실시하는 것이 바람직한 것으로 판단된다.

• Carbon letters
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• 제21권
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• pp.81-85
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• 2017

The objective of this study is the removal of chromium from tannery wastewater by electrosorption on carbon prepared from lignocellulosic natural residue "peach stones' thermally treated. The followed steps for obtaining coal in chronological order were: cleaning, drying, crushing and finally its carbonization at $900^{\circ}C$. The characterization of the carbon material resulted in properties comparable to those of many coals industrially manufactured. The study of the dynamic adsorption of chromium on the obtained material resulted in a low removal rate (33.7%) without applied potential. The application of negative potentials of -0.7 V and -1.4 increases the adsorption of chromium up to 90% and 96% respectively. Whereas a positive potential of +1.4V allows desorption of the contaminant of 138%.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2002년도 추계기술심포지움논문집
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• pp.115-121
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• 2002

In this research we have investigated the characteristics of ultra thin $HfO_2 /SiON$stack structure films using several analytical techniques. SiON layer was thermally grown on standard SCI cleaned silicon wafer at $825^{\circ}C$ for 12sec under $N_2$O ambient. $HfO_2 /SiON$$_4$/$H_2O$ as precursors and $N_2$as a carrier/purge gas. Solid HfCl$_4$was volatilized in a canister kept at $200^{\circ}C$ and carried into the reaction chamber with pure $N_2$carrier gas. $H_2O$ canister was kept at $12^{\circ}C$ and carrier gas was not used. The films were grown on 8-inch (100) p-type Silicon wafer at the $300^{\circ}C$ temperature after standard SCI cleaning, Spectroscopic ellipsometer and TEM were used to investigate the initial growth mechanism, microstructure and thickness. The electrical properties of the film were measured and compared with the physical/chemical properties. The effects of heat treatment was discussed.

• 한국철도학회:학술대회논문집
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• 한국철도학회 2006년도 추계학술대회 논문집
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• pp.1385-1390
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• 2006

Concrete structure can be deteriorated by ingress of moisture and aggressive agents. To maintain the sound performance of concrete structure during the service life, it needs to protect concrete from ingress of moisture and aggressive agents before arising deterioration of concrete. Protection of concrete is possible by surface treatment. In this study, durability of the functional nano composite inorganic activated carbon based coatings which can provide a barrier against the ingress of moisture or aggressive ions to concrete is discussed. For the durability evaluation of the coatings, fine void structure evaluation test, chloride penetration acceleration test, accelerated carbonation test, freezing and thawing test, and the accelerated test of chemical erosion are conducted. As the result of this study, the functional nano composite inorganic activated carbon based coatings which became one formed complex compound with adsorption and porosity on concrete surface, had an effect on the function of far infrared radiation, antimicrobial action, air cleaning, airing assurance, and the interception of moisture of deterioration factor, chloride ion, carbon dioxide, sulfate, and so on.

• 한국전기전자재료학회논문지
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• 제13권2호
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• pp.131-136
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• 2000

We have investigated the slurry induced metallic contaminations of undoped and doped silicate oxides surface on CMP cleaning process. The metallic contaminations by CMP slurry were evaluated in four different oxide films, such as plasma enhanced tetra-ethyl-orthyo-silicate glass(PE-TEOS), O3 boro-phos-pho-silicate glass(O3-BPSG), PE-BPSG, and phospho-silicate glass(PSG). All films were polished with KOH-based slurry prior to entering the post-CMP cleaner. The Total X-Ray fluorescence(TXRF) measurements showed that all oxide surfaces are heavily contaminated by potassium and calcium during polishing which is due to a CMP slurry. The polished O3-BPSG films presented higher potassium and calcium contaminations compared to PE-TEOS because of a mobile ions gettering ability of phosphorus. For PSG oxides, the slurry induced mobile ion contamination increased with an increase of phosphorus contents. In addition, the polishing removal rate of PSG oxides had a linear relationship as a function of phosphorus contents.

• 한국진공학회지
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• 제9권1호
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• pp.30-35
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• 2000

Indium-Tin Oxide (ITO) thin films were deposited on the commercial glass substrate by rf-magnetron sputtering. The ITO films with the thickness of 2,000~2,400 $\AA$ were prepared by changing the oxygen partial pressures of 2, 3, and 5%, as well as by changing the substrate temperature of $300^{\circ}C$ and $500^{\circ}C$. spectrophotometer, XRD, SEM, AFM, 4-point probe and Hall effect system were employed to characterize the ITO films. The optimum deposition conditions were the substrate temperature of $500^{\circ}C$ and oxygen partial pressure of 2-3%. At theses conditions, the ITO film showed the transmittance of 91%, the resistivity of $5.4\times10^{-3}\Omega$cm, the carrier concentration of $1.0\times10^{19}\textrm{cm}^{-3}$, and the carrier mobility of 150$\textrm{cm}^2$/Vsec. In XRD spectra, the (222) and (400) $In_2O_3$ planes were dominant under the optimum deposition conditions When the substrate was cleaned only by the method of ultrasonic cleaning without both pre-annealing and chemical treatment of the substrate, the ITO film exhibited the transmittance of 86%, the carrier concentration of $5.4\times10^{19}\textrm{cm}^{-3}$ and the mobility of 24$\textrm{cm}^2$/Vsec.