• 한국안전학회지
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• 제18권3호
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• pp.60-63
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• 2003

For the increase the charge stability of teflon electrets for used at uncomfortable industrial circumstances with high temperature or humidity, We made an investigation into double layer effect of teflon electrets. Teflon AF film was spincoated on FEP film and then the charge storage property of AF/FEP dual film was investigated to be compared with FEP film. It was found that the AF/FEP dual film has higher surface potential than FEP film on the repeated charging and annealing process. It seems that AF/FEP dual film has higher thermal stability than FEP film through TSC measurement. If the investigations of the double layer effect of Teflon film carried out more closely with it's molecular structures and surface conditions, it may be effectively improved the stability of charge storage.

• 한국진공학회지
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• 제4권S2호
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• pp.156-162
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• 1995

For a stimulating neural electrode, the charge density should be as large as possible to provide adequate stimulation of the nervous system while allowing for miniaturization of the electrode. Since iridium oxide is able to produce high charge densities while preventing undesirable reactions due to charge storage, it has become a promising material for neural prostheses. Successful production of stable Ir and Ir oxide films on various substrates now limits the use of this material. Ir was deposited on two differently prepared surface of (mirror finish, passivation) surgical Ti-6AI-4V with several methods. Ion beam mixing of sputter deposited Ir films on passivated Ti-6AI-4V produced stable and good adherent Ir films. It was found that the increase in charge density of pure Ir on continuous cyclingis due to the accumulation of the oxide phase ( associated with a large surface area) in which the valence state of iridium changes and the double-layer capacitance increases. This study also showed that the double layer capacitance is equally or even more responsible for the high charge density of anodically formed Ir oxide.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2010년도 제39회 하계학술대회 초록집
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• pp.255-255
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• 2010

Recently, nonvolatile memories (NVM) of various types have been researched to improve the electrical performance such as program/erase voltages, speed and retention times. Also, the charge trap memory is a strong candidate to realize the ultra dense 20-nm scale NVM. Furthermore, the high charge efficiency and the thermal stability of SiC nanocrystals NVM with single $SiO_2$ tunnel barrier have been reported. [1-2] In this study, the SiC charge trap NVM was fabricated and electrical properties were characterized. The 100-nm thick Poly-Si layer was deposited to confined source/drain region by using low-pressure chemical vapor deposition (LP-CVD). After etching and lithography process for fabricate the gate region, the $Si_3N_4/SiO_2/Si_3N_4$ (NON) and $SiO_2/Si_3N_4/SiO_2$ (ONO) barrier engineered tunnel layer were deposited by using LP-CVD. The equivalent oxide thickness of NON and ONO tunnel layer are 5.2 nm and 5.6 nm, respectively. By using ultra-high vacuum magnetron sputtering with base pressure 3x10-10 Torr, the 2-nm SiC and 20-nm $SiO_2$ were successively deposited on ONO and NON tunnel layers. Finally, after deposited 200-nm thick Al layer, the source, drain and gate areas were defined by using reactive-ion etching and photolithography. The lengths of squire gate are $2\;{\mu}m$, $5\;{\mu}m$ and $10\;{\mu}m$. The electrical properties of devices were measured by using a HP 4156A precision semiconductor parameter analyzer, E4980A LCR capacitor meter and an Agilent 81104A pulse pattern generator system. The electrical characteristics such as the memory effect, program/erase speeds, operation voltages, and retention time of SiC charge trap memory device with barrier engineered tunnel layer will be discussed.

• 한국광물학회지
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• 제3권2호
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• pp.89-97
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• 1990

To examine how London energy controls the c-dimensions of phyllosilicates, London energy, as well as Coulomb and Pauli repulstion energy was calculated as a function of d(001) for 1M and d(002) for 2M 1 phyllosilicates. London and Pauli repulstion energy calcualtion use a direct interaction calculation method and Coulomb energy calculation adopts Fourier synthesis method. The energy calculations show that Coulmb and Pauli repulsion energy dominantly control the c-dimensions of phyllosilicates having the interlayer cationss, i.e., the layer charges. On the other hand, if phyllosilicates have no interlayer cations, London energy is solely responsible for holding the layers and maintain the c-dimensions. The significance of London energy in determining the c-dimensions of phyllosislicates de-creases as the layer charge increases. When the layer charge is lower than one equivalent on the basis of Oη(OH)2 formula, London energy plays an important role in determing the c-dimensions. however, if the layer charge is higher than one equivalent, London energy becomes insignifi-cant in determining the c-dimension.

• 한국세라믹학회지
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• 제22권4호
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• pp.3-8
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• 1985

The layer charge densities and interlayer C. E. C(cation exchange capacity) of ten mica-type aluminosilicates from Yong-il Pohang-prefacture were determined by n-alkylammonium method which is based on the mo-nolayer-doubelelayer structural transition of ni-alkylammonium ion in interlayer space of the layered silcates. The upper and lower limits of layer charge and interlyer C, E, C estimated were about 0.25~0.36 eq/(Si, $Al)_4$ O10 and 69~99meq/100g, respectively.

• 한국표면공학회지
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• 제47권4호
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• pp.210-214
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• 2014

We investigated emission characteristics of tandem organic light emitting devices (OLEDs) with p-type materials as charge generation layer. The tandem OLEDs were fabricated by using $MoO_x$, $WO_x$, C60 and HATCN as p-type material or not using p-type material for charge generation. When HATCN was used as p-type material, it showed high current density at low applied voltage, but increase of efficiency was small because of charge unbalance in emitting layer. In case of tandem OLED not using p-type material, applied voltage increased remarkably because of difficulty of hole injection. In case of $MoO_x$, $WO_x$ or C60 as p-type material, current emission efficiency increased greatly. In particular, current emission efficiency of tandem OLED using $MoO_x$ as p-type material increased up to 3 times than current emission efficiency of single OLED. The Commission Internationale de l'Eclairage (CIE) 1931 color coordinates were changed by overlapping of 504 nm emission wavelength. As a result, emission efficiency of tandem OLED improved compared with single OLED, but driving voltage also increased by increase of organic layer thickness.

• 방사성폐기물학회지
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• 제8권3호
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• pp.173-179
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• 2010

고준위폐기물처분장에서 완충재는 오랜 기간 동안 방사성핵종의 붕괴열과 여러가지 화학조건의 지하수에 노출되며, 이러한 열수조건은 완충재물질의 차수 및 핵종저지 방벽성능에 심각한 영향을 줄 수 있다. 본 연구에서는 국산 스멕타이트를 대상으로 열수실험을 수행하고, 열수반응에 의한 스멕타이트 점토의 팽창도, 층전하, 양이온교환능의 변화를 조사하였다. 열수실험 결과, 온도와 용액 중 칼륨농도를 증가시켰을 때, 스멕타이트의 팽창도는 감소하였고, 층전하는 더 큰 음전하를 가졌으며, 양이온교환능도 감소하였다.

• 한국재료학회:학술대회논문집
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• 한국재료학회 2012년도 춘계학술발표대회
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• pp.59.2-59.2
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• 2012

Polymer solar cells utilize bulk heterojunction (BHJ) type photo-active layer in which the electron donating polymer and electron accepting $C_{60}$ derivatives are blended. We found there is significant charge recombination at the interface between the BHJ active layer and electrode. The charge recombination at the interface was effectively reduced by inserting wide band gap inorganic interfacial layer, which resulted in efficiency and stability enhancement of BHJ polymer solar cell.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.254.2-254.2
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• 2014

The Transmission Fourier Transform Infrared spectroscopy (FTIR) of SiOx charge storage layer with the richest silicon content showed an assignment at peaks around 2000~2300 cm-1. It indicated that the existence of many silicon phases and defect sources in the matrix of the SiOx films. The total hysteresis width is the sum of the flat band voltage shift (${\Delta}VFB$) due to electron and hole charging. At the range voltage sweep of ${\pm}15V$, the ${\Delta}VFB$ values increase of 0.57 V, 1.71 V, and 13.56 V with 1/2, 2/1, and 6/1 samples, respectively. When we increase the gas ratio of SiH4/N2O, a lot of defects appeared in charge storage layer, more electrons and holes are charged and the memory window also increases. The best retention are obtained at sample with the ratio SiH4/N2O=6/1 with 82.31% (3.49V) after 103s and 70.75% after 10 years. The high charge storage in 6/1 device could arise from the large amount of silicon phases and defect sources in the storage material with SiOx material. Therefore, in the programming/erasing (P/E) process, the Si-rich SiOx charge-trapping layer with SiH4/N2O gas flow ratio=6/1 easily grasps electrons and holds them, and hence, increases the P/E speed and the memory window. This is very useful for a trapping layer, especially in the low-voltage operation of non-volatile memory devices.

• 대한전자공학회논문지
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• 제22권4호
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• pp.92-100
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• 1985

P형 Si기판에 N에피층을 성장시키고 Si-AR막 계면에서 고정양전하밀도(Qss)를 높임으로써 전지의 에미터 표면영역을 N'전하축적층으로 나타낸 새로운 형태의 N'N/P HLE 태':1전지 를 제 작하였다. 제작된 전지의 종류로는 AR막으로 SiOr층을 이용한 OCI전지와 Si,N,/sioxynitride층을 이응한 NCI전지로 구분하였다. 전지의 AR막내 Qss분포는 커패시턴스-전압 측정을 통해 조사하였으며 이로부터 NCI전 al (Qss=1.79~ 1.84$\times$1011cm-2) 가 OCI전 지 (Qss=3.03~ 4.40$\times$1011cm-1) 에 비 해 로면 전 하축 적 층 이 효과적 으로 나타남을 알 수 있었다. JCR할로겐 램프로 100mW/cm2의 인공조명을 만들어 효율특성을 분석한 결과 유효수광면적에 대한 평균(최대)변환효율이 OCI전지에서 15.18(15.46)%, NCI전지에서 16.31(17.07%)로 나타났다.