• 제목/요약/키워드: channel barrier

검색결과 214건 처리시간 0.028초

마이크로 광 조형기술을 이용한 3차원의 배리어가 포함된 케닉스 마이크로 믹서의 개발 (Development of a Three-Dimensional Barrier Embedded Kenics Micromixer by Means of a Micro-Stereolithography Technology)

  • 이인환;권태헌;조동우;김동성
    • 대한기계학회논문집A
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    • 제29권6호
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    • pp.904-912
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    • 2005
  • The flow in a microchannel is usually characterized as a low Reynolds number (Re) so that good mixing is quite difficult to be achieved. In this regard, we developed a novel chaotic micromixer, named Barrier Embedded Kenics Micromixer (BEKM). In the BEKM, the higher level of chaotic mixing can be achieved by combining two general chaotic mixing mechanisms: (i) splitting/reorientation by helical elements inside the microchannel and (ii) stretching/folding via periodically located barriers on the channel wall. The fully three-dimensional geometry of BEKM was realized by a micro-stereolithography technology, in this study, along with a Kenics micromixer and a circular T-pipe. Mixing performances of three micromixers were experimentally characterized in terms of an average mixing color intensity of phenolphthalein. Experimental results show that BEKM has better mixing performance than other two micromixers. Chaotic mixing mechanism, proposed in this study, could be integrated as a mixing component with Micro-Total-Analysis-System, Lab-on-a-chip and so on.

대기압 플라즈마 정밀 Etching 기술 개발

  • 임찬주;김윤환;이상로;악흔
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.263-263
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    • 2011
  • 본 연구에서는 DBD (Dielectric Barrier Discharge)방식의 상압 플라즈마를 이용하여 FPD (flat panel display) 공정에 사용되는 a-Si, Si3N4의 식각 공정 특성을 평가하였다. 사용된 DBD 반응기는 기존의 blank planar plate 형태의 Power가 인가되는 anode 부분과 Dielectric Barrier 사이 공간을 액상의 도전체로 채워 넣은 형태의 전극이 사용 하였으며, 인가 Power는 40kHz AC 최대인가 전압 15 kVp를 사용 하였다. 방전 가스는 N2, 반응가스로는 CDA (Clean Dry Air)와 NF3, 액상의 Etchant를 사용 하였으며 모든 공정은 In-line type으로 시편을 처리 하였다. NF3의 경우 30 mm/sec 이송속도 1회 처리 기준 a-Si 1300${\AA}$, Si3N4 1900${\AA}$의 식각 두께를 보였으며 a-Si : Si3N4 선택비는 N2, CDA의 조절을 통하여 최대 1:2에서 4:1 정도까지 변화가 가능하였다. 균일도는 G2 (370 mm${\times}$470 mm)의 경우 5.8 %의 균일도를 보이고 있다. 이외에도 NF3 공정의 경우 실제 TFT-LCD 공정 중 n+ channel (n+ a-Si:H)식각 공정에 적용하여 5.5 inch LCD panel feasibility를 확인 할 수 있었다. 액상 Etchant (HF수용액, NH4HF2)는 버블러를 사용하여 기화 시켜 플라즈마 소스를 통해 1차적으로 활성화 시키고 기존 DBD 반응기에 공급해 주는 형태로 평가를 진행하였다. 식각 특성은 30mm/sec 이송속도에서 a-Si $25{\AA}$ 정도로 가스 형태의 Etchant에 비해 매우 낮은 수준이나 Etching rate 향상을 위한 factor 파악 및 개선을 위한 연구를 진행 하였다.

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Novel properties of erbium-silicided n-type Schottky barrier metal-oxide-semiconductor field-effect-transistors

  • Jang, Moon-Gyu;Kim, Yark-Yeon;Shin, Jae-Heon;Lee, Seong-Jae;Park, Kyoung-Wan
    • JSTS:Journal of Semiconductor Technology and Science
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    • 제4권2호
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    • pp.94-99
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    • 2004
  • silicided 50-nm-gate-length n-type Schottky barrier metal-oxide-semiconductor field-effect-transistors (SB-MOSFETs) with 5 nm gate oxide thickness are manufactured. The saturation current is $120{\mu}A/{\mu}m$ and on/off-current ratio is higher than $10^5$ with low leakage current less than $10{\mu}A/{\mu}m$. Novel phenomena of this device are discussed. The increase of tunneling current with the increase of drain voltage is explained using drain induced Schottky barrier thickness thinning effect. The abnormal increase of drain current with the decrease of gate voltage is explained by hole carrier injection from drain into channel. The mechanism of threshold voltage increase in SB-MOSFETs is discussed. Based on the extracted model parameters, the performance of 10-nm-gate-length SB-MOSFETs is predicted. The results show that the subthreshold swing value can be lower than 60 mV/decade.

어븀-실리사이드를 이용한 쇼트키 장벽 다결정 실리콘 박막 트랜지스터 (Schottky barrier poly-Si thin film transistor by using erbium-silicided source and drain)

  • 신진욱;구현모;정명호;최철종;정원진;조원주
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2007년도 추계학술대회 논문집
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    • pp.75-76
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    • 2007
  • Poly-Si Schottky barrier Thin Film Transistor (SB-TFT) is manufactured with erbium silicided source/drain. High quality poly-Si film was obtained by crystallizing the amorphous Si film with Excimer laser annealing (ELA) method. The fabricated poly-Si SB-TFT devices showed low leakage current and large on/off current ratio. Moreover, the electrical characteristics were considerably improved by 3% $H_2/N_2$ gas annealing, which is attributed to the reduction of trap states at the grain boundaries and interface trap states at gate oxide/poly-si channel.

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하구둑 방류와 환경적 인자에 따른 낙동강 하구 지역 해저 지형변화 연구 (Bathymetric Changes in the Nakdong River Estuary owing to Discharge from the Nakdong River Barrier and Environmental Factors)

  • 김기철;김성보
    • 한국환경과학회지
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    • 제30권7호
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    • pp.507-517
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    • 2021
  • In this study, the bathymetric data acquired from 2018 to 2020 and the precipitation and suspended sediment data were analyzed for changes in bathymetry owing to the discharge from the Nakdong River barrier and environmental factors, especially the torrential rain in 2020. Sediment erosion and deposition processes are repeated because of complex environmental factors such as discharge from the Nakdong River barrier and the influence of waves generated from the external sea. In the first half of the year after the dry season, bathymetric data showed relative erosion trends, whereas in the second half after the flood season, deposition trends were identified owing to the increase in sediment transport. However, the data from the second half of 2020 showed a large amount of erosion, resulting in tendencies different to those of erosion in the first half and deposition in the second half of the year. This result is judged to be influenced by the weather in the summer of 2020. The torrential rain in the summer of 2020 resulted in a higher force of erosion than that of deposition. In summary, the tendency for erosion is more significant than that of sedimentation, especially in the main channel area of the Nakdong River.

PDMS 블레이드 코팅법을 이용한 종이-기반 바이오센서칩 제작 (Fabrication of Paper-based Biosensor Chip Using Polydimethylsiloxane Blade Coating Method)

  • 정헌호;박차미
    • Korean Chemical Engineering Research
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    • 제59권1호
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    • pp.100-105
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    • 2021
  • 본 연구는 적은 비용으로 분석 장치 없이 질병 진단 및 경과를 모니터링할 수 있는 종이-기반 분석 장치(paper-based analytical device, PAD)를 제작하기 위해 polydimethylsiloxane (PDMS) 블레이드 코팅 방법을 제안하였다. PAD 디자인은 레이저 커팅 기술로 쉽게 몰드에 적용할 수 있으며, 제작된 몰드로 블레이드 코팅을 수행하여 완전한 소수성 장벽 형성에 필요한 조건을 확립하였다. 코팅 조건인 잉크의 두께와 종이와의 접촉시간에 따라 PDMS 소수성 장벽의 구조와 친수성 채널의 크기 변화를 분석하여 안정적으로 소수성 장벽을 형성할 수 있는 조건을 최적화하였다. 최적화된 방법을 바탕으로 PAD를 제작하여 특별한 분석기기 없이 단백질, 당, 메탈이온을 검출하여 바이오센서에 응용가능함을 증명하였다.

DFT Study of Water-Assisted Intramolecular Proton Transfer in the Tautomers of Thymine Radical Cation

  • Kim, Nam-Joon
    • Bulletin of the Korean Chemical Society
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    • 제27권7호
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    • pp.1009-1014
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    • 2006
  • Density functional theory calculations are applied to investigate the intramolecular proton transfer in the tautomers of thymine radical cation and its hydrated complexes with one water molecule. The optimized structures and energies for 6 tautomers and 6 transition states of thymine radical cation are calculated at the B3LYP/6-311++G(d,p) level. It is predicted that the order of relative stability for the keto and enol tautomers of thymine radical cation is the same with that of the neutral thymine tautomers, though the enol tautomers are more stabilized with respect to the di-keto form in the radical cation than in the neutral state. A new channel of proton transfer from >C5-$CH_{3}$ of thymine is found to open and have the lowest energy barrier of other proton transfer processes in thymine radical cation. The roles of hydration are also investigated with thymine-water 1 : 1 complex ions. The presence of water significantly lowers the barrier of the proton transfer, which clearly shows the assisting role of hydration even with one water molecule

대기오염 가스 제거효율 향상을 위한 저온 플라즈마 응용기구 연구 (Non Thermal Plasma Applicable Mechanisms for the Improvement of Air Pollutants Removal Efficiency)

  • 김대일;김형택
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2004년도 추계학술대회 논문집 Vol.17
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    • pp.648-652
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    • 2004
  • A comparative investigation of an experimental and a simulation of chemical kinetics for NOx removal from dielectric barrier discharges is presented. Several types of dielectric barrier discharges were implemented depending upon the configuration of electrodes. The simulation was based on an approximate mathematical model for plasma cleaning of waste gas. The influence of non uniform distributions of species due to the production of primary active particles in the streamer channel was taken into account. A comparison of observed experimental to the calculated removal efficiency of NOx showed acceptable agreement.

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Inclusion of Silicon Delta-doped Two-dimensional Electron Gas Layer on Multi-quantum Well Nano-structures of Blue Light Emitting Diodes

  • Kim, Keun-Joo
    • Transactions on Electrical and Electronic Materials
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    • 제5권5호
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    • pp.173-179
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    • 2004
  • The influence of heavily Si impurity doping in the GaN barrier of InGaN/GaN multi-quantum well structures of blue light emitting diodes were investigated by growing samples in metal-organic chemical vapor deposition. The delta-doped sample was compared to the sample with the undoped barrier. The delta-doped sample shows the tunneling behavior and forms the energy level of 0.32 eV for tunneling and the photoemission of the 450-nm band. The photo-luminescence shows the blue-shifted broad band of the radiative transition due to the inclusion of Si delta-doped layer indicating that the delta doping effect acts to form the higher energy level than that of quantum well. The dislocation may provide the carrier tunneling channel and plays as a source of acceptor. During the tunneling of hot carrier, there was no light emission.

비대칭 DGMOSFET의 채널도핑분포함수에 따른 드레인 유도 장벽 감소현상 분석 (Analysis of Drain Induced Barrier Lowering of Asymmetric Double Gate MOSFET for Channel Doping Profile)

  • 정학기
    • 한국정보통신학회:학술대회논문집
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    • 한국정보통신학회 2015년도 추계학술대회
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    • pp.863-865
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    • 2015
  • 본 연구에서는 비대칭 이중게이트 MOSFET의 채널 내 도핑농도분포에 대한 드레인유도장벽감소(Drain Induced Barrier Lowering; DIBL)에 대하여 분석하고자한다. DIBL은 드레인 전압에 의하여 소스 측 전위장벽이 낮아지는 효과로서 중요한 단채널 효과이다. 이를 분석하기 위하여 포아송방정식을 이용하여 해석학적 전위분포를 구하였으며 전위분포에 영향을 미치는 채널도핑농도의 분포함수변화에 대하여 DIBL을 관찰하였다. 채널길이, 채널두께, 상하단 게이트 산화막 두께, 하단 게이트 전압 등을 파라미터로 하여 DIBL을 관찰하였다. 결과적으로 DIBL은 채널도핑농도분포함수의 변수인 이온주입범위 및 분포편차에 변화를 나타냈다. 특히 두 변수에 대한 DIBL의 변화는 최대채널도핑농도가 $10^{18}/cm^3$ 정도로 고도핑 되었을 경우 더욱 현저히 나타나고 있었다. 채널길이가 감소할수록 그리고 채널두께가 증가할수록 DIBL은 증가하였으며 하단 게이트 전압과 상하단 게이트 산화막 두께가 증가할수록 DIBL은 증가하였다.

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