• 한국축산식품학회지
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• 제40권5호
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• pp.831-843
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• 2020

This study investigated the potential for using vegetable powders as a natural replacement for sodium nitrite and their effects on the physicochemical characteristics of alternatively cured pork products. We analyzed pork products subjected to four treatments: control (0.015% sodium nitrite), Chinese cabbabe powder (CCP) treatment (0.4% Chinese cabbage powder), radish powder (RP) treatment (0.4% radish powder), and spinach powder (SP) treatment (0.4% spinach powder). Among the vegetable powders prepared in this study, SP had the highest (p<0.05) nitrate content, while CCP had the lowest (p<0.05). The cooking yields from these treatments were not significantly different from each other. However, the products with vegetable powders had higher (p<0.05) pH and thiobarbituric acid reactive substances values than the control. Pork products with vegetable powders also showed lower CIE L^⁎ values and higher CIE b^⁎ values than the nitrite-added control. RP treatment had similar (p>0.05) CIE a^⁎ values to the control, while SP treatment had the lowest (p<0.05) CIE a^⁎ values. The residual nitrite content was lower (p<0.05) in the vegetable powder added pork products than in the control, although nitrosyl hemochrome and total pigment contents in the CCP and RP treatments were similar (p>0.05) to those in the control. The control, CCP, and RP treatments showed curing efficiencies greater than 80%, indicating that CCP and RP would be promising potential replacements for sodium nitrite. The results of this study suggest that RP may be a suitable natural replacement for sodium nitrite to produce alternatively cured meat products, compared to other leafy vegetable powders.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1995년도 추계학술대회 논문집
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• pp.213-216
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• 1995

Strontium niobate, $Sr_2Nb_2O_{7}$ was prepared by the molten stilt synthesis (MSS) and the chemical coprecipitation method (CCP). Single phase $Sr_2Nb_2O_{7}$ was obtained by MSS and CCP at $750^{\circ}C$ and $800^{\circ}C$, respectively. An intermediate phase of composition, $Sr_{5}Nb_4O_{15}$, appeared at $700^{\circ}C$ when CCP method was employed. The resulting powder was observed to have finer particles and more uniform distribution of particle sizes, as compared to those obtained through the conventional method. Such powder characteristics allowed the use of a much lower sintering temperature of $1400^{\circ}C$. Grain-orientation along (0k0) direction, which is advantageous for improving dielectric properties, was also observed. The sintering characteristics and the dielectric properties prepared by MSS and CCP, were better than those by the conventional method.

• 한국수학교육학회지시리즈D:수학교육연구
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• 제20권1호
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• pp.39-49
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• 2016

The History of Mathematics (HOM) was integrated in teaching the Cartesian Coordinate Plane (CCP) to Grade Seven learners of Moonwalk National High School using Lesson Study. After the lesson was taught, there were three valuable issues emerged: (1) HOM is a Springboard and/or a Medium of Motivation in Teaching CCP; (2) The History of CCP Opened a Wider Perspective about Its Real-life Application in the Modern World (3) Integration of History Developed a Sense of Purpose and an Appreciation of Mathematics Among Learners. Feedbacks solicited from the learners showed that they have understanding of the importance of studying Mathematics after they learned the life and contributions of Rene Descartes to Mathematics. Hence, integration of history plays a vital role in developing positive attitudes among learners towards Math.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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• pp.203-203
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• 2013

Low pressure plasmas play a key role in many areas including electronic, aerospace, automotive, biomedical, and toxic waste management industries, and the advantages of the plasma are well known the processing procedure is established. However, the insight behavior of the discharges remains a mystery, even though a simple geometry as capacitive discharges. In this work, we measured RF power dissipation in capacitively coupled plasma (CCP) at various experiment conditions with potential probe and RF current probe. Through the results, we will have a clearer view of the inner nature of the CCP.

• 동아시아식생활학회지
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• 제17권5호
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• pp.746-752
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• 2007

The purpose of this study was to investigate the effects of HACCP education on improvements of knowledge in school foodservice employees in Gyeonggi-do, particularly in Anyang, Ansan, Siheung and Hwasung City. A first and second questionnaire was answered both before and after HACCP education that was directed by a dietitian. The change in HACCP knowledge after education, as compared to before, was statistically significant(p<0.01). Specifically, the average score after education increased more than 30 points in CCP2 and CCP6, and more than 60 points in CCP3. Most of the school foodservice operations performed sanitary education once a month; however, they did not perform regular HACCP education. The fact that the level of sanitary knowledge was different after HACCP education than before suggests the possibility of improving the sanitary performance levels of foodservice employees through continual education.

• 농업과학연구
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• 제38권3호
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• pp.459-464
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• 2011

A simplified model for the colloidal calcium phosphate (CCP) nanocluster was developed from an active role of phosphate in the precipitation of casein (CN)/Ca mixtures and the composition of casein micelles (CM). The possible shape of the CCP nanocluster was selected as a tetrahedron, and we estimated that 4 CN molecules were involved in crosslinking a single CCP nanocluster. Similar values were obtained for the number of CN molecules involved in stabilizing the nanocluster when the number of CNs attached onto each nanocluster surface was deduced from the composition of CM. If one phosphoserine cluster consisted of 3 phosphoserine residues, the theoretical molecular weight and volume for the nanocluster were estimated to be 4,898 g/mol and 2.88 $nm^3$, respectively. It was also shown that the position of Ca present in our model were reasonably located to accommodate the serine phosphate in CN molecule.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2006년도 추계학술대회 논문집 전기물성,응용부문
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• pp.158-159
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• 2006

The resistance-capacitance (RC) delay of signals through interconnection materials becomes a big hurdle for high speed operation of semiconductors which contain multilayer interconnection layers. In order to reduce the RC delay, low-k materials will be used for inter-metal dielectric (IMD) materials. We have developed self-consistent simulation tool that includes neutral-species transport model, based on the relaxation continuum (RCT) model. We present the parametric study of the modeling results of a two-frequency capacitively coupled plasma (2f-CCP) with $N_2/H_2$ gas mixture that is known as promising one for organic low-k materials etching. We include the neutral transport model as well as plasma one in the calculation. The plasma and neutrals are calculated self-consistently by iterating the simulation of both species till a spatiotemporal steady state profile could be obtained.

• 한국산학기술학회논문지
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• 제13권8호
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• pp.3578-3585
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• 2012

유탕면류의 HACCP(Hazard Analysis Critical Control Point) 시스템 구축을 위하여 유탕 공정-CCP(Critical Control Point)에 대한 미생물학적(Biological hazards)과 화학적(Chemical hazards) 한계 기준 설정을 위한 목적으로 수행하였으며, 경기도 이천 소재의 P사에서 실행하였다. 유탕공정은 각각의 시간과 온도 측정에 따라 미생물학적, 화학적 위해요소를 제거하거나 감소에 대해 실험하였다. 실험결과 Standard plate count와 식중독균은 유탕공정(Temperature : $145{\pm}10^{\circ}C$, Time : $75{\pm}30$ sec)에 의해 검출되지 않았다. 유탕공정에 의해 생성되는 화학적 위해 기준의 산가는 법적 기준치인 0.6보다 낮은 0.2 이하였다. 증숙실과 유탕실의 공중낙하균을 측정한 결과 3 CFU/mL, 3 CFU/mL 검출되었다. 따라서 유탕공정의 CCP-BC는 일반세균과 식중독균, 산화생성물 생성을 예방, 제거하는데 좋은 대안책이 될 것이다. 결론적으로 HACCP을 위해 유탕공정에 대한 한계기준설정, 모니터링방법, 개선조치, 검증방법, 교육, 기록관리가 필요하다고 생각된다.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2011년도 제40회 동계학술대회 초록집
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• pp.472-472
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• 2011

The capacitive coupled plasma (CCP) has been extensively used in the semiconductor industry because it has not only good uniformity, but also low electron temperature. But CCP source has some problems, such as difficulty in varying the ion bombardment energy separately, low plasma density, and high processing pressure, etc. In this reason, dual frequency CCP has been investigated with a separate substrate biasing to control the plasma parameters and to obtain high etch rate with high etch selectivity. Especially, in this study, we studied on the etching of $SiO_2$ by using the pulse-time modulation in the dual-frequency CCP source composed of 60 MHz/ 2 MHz rf power. By using the combination of high /low rf powers, the differences in the gas dissociation, plasma density, and etch characteristics were investigated. Also, as the size of the semiconductor device is decreased to nano-scale, the etching of contact hole which has nano-scale higher aspect ratio is required. For the nano-scale contact hole etching by using continuous plasma, several etch problems such as bowing, sidewall taper, twist, mask faceting, erosion, distortions etc. occurs. To resolve these problems, etching in low process pressure, more sidewall passivation by using fluorocarbon-based plasma with high carbon ratio, low temperature processing, charge effect breaking, power modulation are needed. Therefore, in this study, to resolve these problems, we used the pulse-time modulated dual-frequency CCP system. Pulse plasma is generated by periodical turning the RF power On and Off state. We measured the etch rate, etch selectivity and etch profile by using a step profilometer and SEM. Also the X-ray photoelectron spectroscopic analysis on the surfaces etched by different duty ratio conditions correlate with the results above.

• 전력전자학회:학술대회논문집
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• 전력전자학회 2014년도 전력전자학술대회 논문집
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• pp.97-99
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• 2014

포항가속기 연구소에서 4세대 전자를 가속시키기 위하여 RF 공급원으로 사용하는 펄스 모듈레이터의 고전압 안정도는 50ppm 이하의 고전압이 요구된다. 200 MW 모듈레이터에 공급하기 위하여 개발된 고전압 CCPS사양은 50 kV, 120 kJ/sec, 2400mA, 20ppm이하이다. XFEL용 모듈레이터는 고정밀 고전압 CCPS를 적용하여 운전하였으며 모듈레이터 사양은 400kV, 500A, 8us, 60Hz, beam voltage stability 0.005(%)이다. 본 논문에서는 개발한 고정밀 고전압 CCPS를 사용하여 시험한 모듈레이터의 시험 결과에 대하여 발표하고자 한다.